KR960019114U - 화학용액 순환라인의 과압제어 장치 - Google Patents
화학용액 순환라인의 과압제어 장치Info
- Publication number
- KR960019114U KR960019114U KR2019940031775U KR19940031775U KR960019114U KR 960019114 U KR960019114 U KR 960019114U KR 2019940031775 U KR2019940031775 U KR 2019940031775U KR 19940031775 U KR19940031775 U KR 19940031775U KR 960019114 U KR960019114 U KR 960019114U
- Authority
- KR
- South Korea
- Prior art keywords
- control device
- chemical solution
- circulation line
- solution circulation
- overpressure control
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Pipeline Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940031775U KR0123421Y1 (ko) | 1994-11-29 | 1994-11-29 | 화학용액 순환라인의 과압제어 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940031775U KR0123421Y1 (ko) | 1994-11-29 | 1994-11-29 | 화학용액 순환라인의 과압제어 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960019114U true KR960019114U (ko) | 1996-06-19 |
| KR0123421Y1 KR0123421Y1 (ko) | 1999-02-18 |
Family
ID=19399497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019940031775U KR0123421Y1 (ko) | 1994-11-29 | 1994-11-29 | 화학용액 순환라인의 과압제어 장치 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0123421Y1 (ko) |
-
1994
- 1994-11-29 KR KR2019940031775U patent/KR0123421Y1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR0123421Y1 (ko) | 1999-02-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| FPAY | Annual fee payment |
Payment date: 20040326 Year of fee payment: 7 |
|
| LAPS | Lapse due to unpaid annual fee |