KR960019109U - Bath type liquid chemicals constant temperature bath - Google Patents

Bath type liquid chemicals constant temperature bath

Info

Publication number
KR960019109U
KR960019109U KR2019940031676U KR19940031676U KR960019109U KR 960019109 U KR960019109 U KR 960019109U KR 2019940031676 U KR2019940031676 U KR 2019940031676U KR 19940031676 U KR19940031676 U KR 19940031676U KR 960019109 U KR960019109 U KR 960019109U
Authority
KR
South Korea
Prior art keywords
bath
constant temperature
type liquid
liquid chemicals
chemicals constant
Prior art date
Application number
KR2019940031676U
Other languages
Korean (ko)
Other versions
KR0134903Y1 (en
Inventor
이재홍
김동석
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940031676U priority Critical patent/KR0134903Y1/en
Publication of KR960019109U publication Critical patent/KR960019109U/en
Application granted granted Critical
Publication of KR0134903Y1 publication Critical patent/KR0134903Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
KR2019940031676U 1994-11-28 1994-11-28 Chemical bath for semiconductor process KR0134903Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940031676U KR0134903Y1 (en) 1994-11-28 1994-11-28 Chemical bath for semiconductor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940031676U KR0134903Y1 (en) 1994-11-28 1994-11-28 Chemical bath for semiconductor process

Publications (2)

Publication Number Publication Date
KR960019109U true KR960019109U (en) 1996-06-19
KR0134903Y1 KR0134903Y1 (en) 1999-03-20

Family

ID=19399410

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940031676U KR0134903Y1 (en) 1994-11-28 1994-11-28 Chemical bath for semiconductor process

Country Status (1)

Country Link
KR (1) KR0134903Y1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100741475B1 (en) * 2006-01-25 2007-07-20 우암신소재(주) In-line heater of etching and cleaning solutions for semiconductor wafer
KR102142759B1 (en) * 2018-07-03 2020-08-07 주식회사 포스코 Heating apparatus

Also Published As

Publication number Publication date
KR0134903Y1 (en) 1999-03-20

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040920

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee