KR960012664U - Automatic purging device for process gas supply line - Google Patents

Automatic purging device for process gas supply line

Info

Publication number
KR960012664U
KR960012664U KR2019940025095U KR19940025095U KR960012664U KR 960012664 U KR960012664 U KR 960012664U KR 2019940025095 U KR2019940025095 U KR 2019940025095U KR 19940025095 U KR19940025095 U KR 19940025095U KR 960012664 U KR960012664 U KR 960012664U
Authority
KR
South Korea
Prior art keywords
supply line
gas supply
process gas
purging device
automatic purging
Prior art date
Application number
KR2019940025095U
Other languages
Korean (ko)
Other versions
KR200168402Y1 (en
Inventor
성원호
김경태
마경수
이차행
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940025095U priority Critical patent/KR200168402Y1/en
Publication of KR960012664U publication Critical patent/KR960012664U/en
Application granted granted Critical
Publication of KR200168402Y1 publication Critical patent/KR200168402Y1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/42Auxiliary equipment or operation thereof
    • B01D46/4272Special valve constructions adapted to filters or filter elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940025095U 1994-09-28 1994-09-28 Automatic purging apparatus for pipe line KR200168402Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940025095U KR200168402Y1 (en) 1994-09-28 1994-09-28 Automatic purging apparatus for pipe line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940025095U KR200168402Y1 (en) 1994-09-28 1994-09-28 Automatic purging apparatus for pipe line

Publications (2)

Publication Number Publication Date
KR960012664U true KR960012664U (en) 1996-04-17
KR200168402Y1 KR200168402Y1 (en) 2000-02-01

Family

ID=19394188

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940025095U KR200168402Y1 (en) 1994-09-28 1994-09-28 Automatic purging apparatus for pipe line

Country Status (1)

Country Link
KR (1) KR200168402Y1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313601B1 (en) * 1998-12-19 2002-03-21 김영환 Process gas supply device for semiconductor manufacturing
KR20210156216A (en) * 2020-06-17 2021-12-24 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus and method of purging gas supply pipes

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4124838B2 (en) * 1996-04-26 2008-07-23 株式会社神戸製鋼所 Pressure gas supply device
KR200446431Y1 (en) 2007-11-14 2009-10-28 현대제철 주식회사 Apparatus of preventing dew condensation of local panel in rolling facilities

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313601B1 (en) * 1998-12-19 2002-03-21 김영환 Process gas supply device for semiconductor manufacturing
KR20210156216A (en) * 2020-06-17 2021-12-24 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus and method of purging gas supply pipes

Also Published As

Publication number Publication date
KR200168402Y1 (en) 2000-02-01

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20081027

Year of fee payment: 10

EXPY Expiration of term