KR960007683A - Polyacetal resin composition - Google Patents

Polyacetal resin composition Download PDF

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Publication number
KR960007683A
KR960007683A KR1019940019631A KR19940019631A KR960007683A KR 960007683 A KR960007683 A KR 960007683A KR 1019940019631 A KR1019940019631 A KR 1019940019631A KR 19940019631 A KR19940019631 A KR 19940019631A KR 960007683 A KR960007683 A KR 960007683A
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KR
South Korea
Prior art keywords
epoxy resin
weight
parts
polyacetal resin
lower alkyl
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Application number
KR1019940019631A
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Korean (ko)
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KR970011956B1 (en
Inventor
이정진
김경제
금종구
Original Assignee
성재갑
주식회사 엘지화학
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Priority to KR1019940019631A priority Critical patent/KR970011956B1/en
Publication of KR960007683A publication Critical patent/KR960007683A/en
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Publication of KR970011956B1 publication Critical patent/KR970011956B1/en

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L59/00—Compositions of polyacetals; Compositions of derivatives of polyacetals
    • C08L59/04—Copolyoxymethylenes

Abstract

본 발명은 (가)85-95%의 옥시메틸렌기(-OCH2-)를 반복단위로 갖고, 하기 일반식(I)로 표시되는 관능기가 -OCH2-반복단위 사이에 분산된 폴리아세탈 수지:The present invention relates to a polyacetal resin in which (a) 85-95% of an oxymethylene group (-OCH 2- ) is a repeating unit, and a functional group represented by the following general formula (I) is dispersed between -OCH 2 -repeating units :

상기 식에서, R1과 R2는 서로 독립적으로 수소, 저급알킬 또는 할로겐 치환된 저급알킬 라디칼이고, R3는 메틸렌, 옥시 메틸렌, 저급알킬 또는 할로알킬이 치환된 옥시메틸렌 라디칼이며, n은 0 내지 3의 정수를 나타낸다.Wherein R 1 and R 2 are independently of each other a hydrogen, lower alkyl or halogen substituted lower alkyl radical, R 3 is an oxymethylene radical substituted with methylene, oxy methylene, lower alkyl or haloalkyl and n is 0 to The integer of 3 is shown.

(나)상기 (가)성분 100중량부에 대해 0.01∼10중량부이 이소시아네이트 화합물 및 (다) 상기 (가)성분 100중량부에 대해 0.01∼10중량부의 에폭시 화합물로 구성됨을 특징으로 하는 폴리아세탈 수지 조성물에 관한 것이다.(B) 0.01 to 10 parts by weight of an isocyanate compound and (c) 0.01 to 10 parts by weight of an epoxy compound based on 100 parts by weight of the component (a) and (a) a polyacetal resin It relates to a composition.

Description

폴리아세탈 수지 조성물Polyacetal resin composition

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (4)

(가) 85-95%의 옥시메틸렌기(-OCH2-)를 반복단위로 갖고, 하기 일반식(Ⅰ)로 표시되는 관능기가 -OCH2- 반복단위 사이에 분산된 폴리아세탈 수지 :(A) Polyacetal resin having 85-95% of oxymethylene group (-OCH 2- ) in repeating units and functional group represented by the following general formula (I) dispersed between -OCH 2 -repeating units: 상기에서, R1과 R2는 서로 독립적으로 수소, 저급알킬 또는 할로겐 치환된 저급알킬 라디칼이고, R3는 메틸렌, 옥시 메틸렌, 저급알킬 또는 할로알킬이 치환된 옥시메틸렌 라디칼이며, n은 0 내지 3의 정수를 나타낸다.In the above, R 1 and R 2 are independently of each other hydrogen, lower alkyl or halogen substituted lower alkyl radical, R 3 is oxymethylene radical substituted with methylene, oxy methylene, lower alkyl or haloalkyl and n is 0 to The integer of 3 is shown. (나) 상기 (가)성분 100중량부에 대해 0.01~10중량부의 이소시아네이트 화합물 및(B) 0.01 to 10 parts by weight of isocyanate compound based on 100 parts by weight of the component (A) and (다) 상기 (가)성분 100중량부에 대해 0.01~10중량부의 에폭시 화합물(C) 0.01 to 10 parts by weight of the epoxy compound based on 100 parts by weight of the component (A) 로 구성됨을 특징으로 하는 폴리아세탈 수지 조성물.Polyacetal resin composition, characterized in that consisting of. 제1항에 있어서, 이소시아네이트 화합물은 일반식 RNCX)n(상기에서, X는 산소 또는 황원자, n은 2,3 R은 탄소수가 1-20인 지방족, 지환족, 방향족기임)로 나타냄을 특징으로 하는 폴리아세탈 수지 조성물.The compound of claim 1, wherein the isocyanate compound is of the general formula R NCX) n (wherein X is an oxygen or sulfur atom, n is 2,3 R is an aliphatic, alicyclic, aromatic group having 1-20 carbon atoms) polyacetal resin composition. 제1항 또는 제2항에 있어서, 이소시아네이트 화합물은 OCN-R-NCO, SCN-R-NCS, OCN-R-NCS로서 R은 탄소수가 1-20인 지방족, 지환족, 방향족기 임을 특징으로 하는 폴리아세탈 수지 조성물.The isocyanate compound according to claim 1 or 2, wherein the isocyanate compound is OCN-R-NCO, SCN-R-NCS, OCN-R-NCS, wherein R is an aliphatic, alicyclic or aromatic group having 1-20 carbon atoms. Polyacetal resin composition. 제1항에 있어서, 에폭시 수지는 비스페놀 A형 에폭시 수지, 페놀노블락형 에폭시 수지, 크레졸 노블락형 에폭시 수지, 글리시딜 에테르형 에폭시 수지, 글리시딜아민형 에폭시 수지, 선상지방족 에폭시 수지, 지환식 에폭시 수지, 할로겐화 에폭시 수지로서 1분자중에 에폭시기를 2개 이상 갖고 있는 것으로서 1종 또는 2종 이상 혼합하여 사용함을 특징으로 하는 폴리아세탈 수지 조성물.The epoxy resin of claim 1, wherein the epoxy resin is bisphenol A epoxy resin, phenol noblock type epoxy resin, cresol noblock type epoxy resin, glycidyl ether type epoxy resin, glycidylamine type epoxy resin, linear aliphatic epoxy resin, alicyclic type A polyacetal resin composition comprising an epoxy resin or a halogenated epoxy resin, having two or more epoxy groups in one molecule and mixing one or two or more thereof. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940019631A 1994-08-09 1994-08-09 Polyacetal resin composition KR970011956B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940019631A KR970011956B1 (en) 1994-08-09 1994-08-09 Polyacetal resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940019631A KR970011956B1 (en) 1994-08-09 1994-08-09 Polyacetal resin composition

Publications (2)

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KR960007683A true KR960007683A (en) 1996-03-22
KR970011956B1 KR970011956B1 (en) 1997-08-08

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102302379B1 (en) 2020-03-18 2021-09-14 이기정 Apparatus for continuous feeding material for blanking

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102302379B1 (en) 2020-03-18 2021-09-14 이기정 Apparatus for continuous feeding material for blanking

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KR970011956B1 (en) 1997-08-08

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