KR960007446A - Method for producing high purity free chlorine dioxide - Google Patents

Method for producing high purity free chlorine dioxide Download PDF

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Publication number
KR960007446A
KR960007446A KR1019940020586A KR19940020586A KR960007446A KR 960007446 A KR960007446 A KR 960007446A KR 1019940020586 A KR1019940020586 A KR 1019940020586A KR 19940020586 A KR19940020586 A KR 19940020586A KR 960007446 A KR960007446 A KR 960007446A
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KR
South Korea
Prior art keywords
acid
chlorine dioxide
weight
aqueous solution
free chlorine
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KR1019940020586A
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Korean (ko)
Inventor
유준달
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심경옥
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Priority to KR1019940020586A priority Critical patent/KR960007446A/en
Publication of KR960007446A publication Critical patent/KR960007446A/en

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Abstract

목적: 본 발명는 아염소산나트륨, 차아염소산나트륨 및 탄산나트륨 또는 제2인산나트륨의 수용액에 무기 또는 유기산을 첨가하여 강산성의 이산화염소의 수용액을 제조하여 유리 이산화염소의 농도가 최대 약 20,000ppm 이하 함유되게 하는데 그 목적이 있다.PURPOSE: The present invention is to add an inorganic or organic acid to an aqueous solution of sodium chlorite, sodium hypochlorite and sodium carbonate or dibasic sodium phosphate to prepare an aqueous solution of strongly acidic chlorine dioxide so that the concentration of free chlorine dioxide is contained up to about 20,000 ppm or less. The purpose is.

구성: 0.1~4.0중량%의 아염소산나트륨, 0.1~1.0중량%의 차아염소산나트륨 및 0.1~0.3중량%의 탄산나트륨 또는 제2인산나트륨으로 이루어진 수용액에 0.1~9.0중량%의 무기 또는 유기산을 가하여 강산성의 고순도 유리 이산화염소 수용액을 제조한다.Composition: Strongly acidic by adding 0.1-9.0% by weight inorganic or organic acid to an aqueous solution consisting of 0.1-4.0% by weight sodium chlorite, 0.1-1.0% by weight sodium hypochlorite and 0.1-0.3% by weight sodium carbonate or dibasic sodium phosphate A high purity free chlorine dioxide aqueous solution is prepared.

Description

고순도 유리 이산화염소의 제조방법Method for producing high purity free chlorine dioxide

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (5)

0.1~4.0중량%의 아염소산나트륨, 0.1~1.0중량%의 차아염소산나트륨 및 0.1~0.3중량%의 탄산나트륨 또는 제2인산나트륨으로 이루어진 수용액에 0.1~9.0중량%의 무기 또는 유기산을 가하여 강산성의 고순도 유리 이산화염소 수용액의 제조방법.0.1-9.0% by weight of inorganic or organic acid is added to an aqueous solution consisting of 0.1-4.0% by weight of sodium chlorite, 0.1-1.0% by weight of sodium hypochlorite, and 0.1-0.3% by weight of sodium carbonate or dibasic sodium phosphate to give high acidity and high purity. Method for producing free chlorine dioxide aqueous solution. 제1항에 있어서, 0.1~9.0중량%의 무기 또는 유기산을 가하여 pH가 1~4임을 특징으로 하는 강산성의 고순도 유리 이산화염소 수용액의 제조방법.The method for producing a strongly acidic high purity free chlorine dioxide aqueous solution according to claim 1, wherein the pH is 1-4 by adding 0.1 to 9.0% by weight of an inorganic or organic acid. 제1항에 있어서, 수용액중에 다량의 유리 이산화염소의 농도가 최대 약 20,000ppm 이하임을 특징으로 하는 강산성의 고순도 유리 이산화염소의 제조방법.The method of claim 1, wherein the concentration of the large amount of free chlorine dioxide in the aqueous solution is at most about 20,000 ppm or less. 제1항에 있어서, 유기산은 초산 또는 구연산 또는 말레인산 등의 유기옥시카르본산임을 특징으로 하는 강산성의 고순도 유리 이산화염소의 제조방법.The method of producing highly acidic high purity free chlorine dioxide according to claim 1, wherein the organic acid is an organic oxycarboxylic acid such as acetic acid or citric acid or maleic acid. 제1항에 있어서, 무기산은 황산 또는 염산 또는 인산임을 특징으로 하는 강산성의 고순도 유리 이산화염의 제조방법.The method of claim 1, wherein the inorganic acid is sulfuric acid or hydrochloric acid or phosphoric acid. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940020586A 1994-08-20 1994-08-20 Method for producing high purity free chlorine dioxide KR960007446A (en)

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Application Number Priority Date Filing Date Title
KR1019940020586A KR960007446A (en) 1994-08-20 1994-08-20 Method for producing high purity free chlorine dioxide

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Application Number Priority Date Filing Date Title
KR1019940020586A KR960007446A (en) 1994-08-20 1994-08-20 Method for producing high purity free chlorine dioxide

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KR960007446A true KR960007446A (en) 1996-03-22

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100582202B1 (en) * 2003-10-13 2006-05-23 엘지.필립스 엘시디 주식회사 Fabrication apparatus and method of thin film transistor array substrate
KR101477311B1 (en) * 2007-03-15 2014-12-29 다이꼬 야꾸힝 가부시끼가이샤 Composition for stabilizing chlorine dioxide

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100582202B1 (en) * 2003-10-13 2006-05-23 엘지.필립스 엘시디 주식회사 Fabrication apparatus and method of thin film transistor array substrate
KR101477311B1 (en) * 2007-03-15 2014-12-29 다이꼬 야꾸힝 가부시끼가이샤 Composition for stabilizing chlorine dioxide

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