KR950028683U - Wafer position detection device using pressure switch - Google Patents

Wafer position detection device using pressure switch

Info

Publication number
KR950028683U
KR950028683U KR2019940005583U KR19940005583U KR950028683U KR 950028683 U KR950028683 U KR 950028683U KR 2019940005583 U KR2019940005583 U KR 2019940005583U KR 19940005583 U KR19940005583 U KR 19940005583U KR 950028683 U KR950028683 U KR 950028683U
Authority
KR
South Korea
Prior art keywords
detection device
position detection
pressure switch
wafer position
wafer
Prior art date
Application number
KR2019940005583U
Other languages
Korean (ko)
Other versions
KR200181171Y1 (en
Inventor
이성덕
조대복
전봉선
여태현
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019940005583U priority Critical patent/KR200181171Y1/en
Publication of KR950028683U publication Critical patent/KR950028683U/en
Application granted granted Critical
Publication of KR200181171Y1 publication Critical patent/KR200181171Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR2019940005583U 1994-03-18 1994-03-18 Detecting apparatus for wafer location using pressure switch KR200181171Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940005583U KR200181171Y1 (en) 1994-03-18 1994-03-18 Detecting apparatus for wafer location using pressure switch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940005583U KR200181171Y1 (en) 1994-03-18 1994-03-18 Detecting apparatus for wafer location using pressure switch

Publications (2)

Publication Number Publication Date
KR950028683U true KR950028683U (en) 1995-10-20
KR200181171Y1 KR200181171Y1 (en) 2000-05-15

Family

ID=19379242

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940005583U KR200181171Y1 (en) 1994-03-18 1994-03-18 Detecting apparatus for wafer location using pressure switch

Country Status (1)

Country Link
KR (1) KR200181171Y1 (en)

Also Published As

Publication number Publication date
KR200181171Y1 (en) 2000-05-15

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050120

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee