KR950027524U - 도금용 납합금 전극 - Google Patents
도금용 납합금 전극Info
- Publication number
- KR950027524U KR950027524U KR2019940005623U KR19940005623U KR950027524U KR 950027524 U KR950027524 U KR 950027524U KR 2019940005623 U KR2019940005623 U KR 2019940005623U KR 19940005623 U KR19940005623 U KR 19940005623U KR 950027524 U KR950027524 U KR 950027524U
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- lead alloy
- alloy electrode
- electrode
- lead
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94005623U KR960006991Y1 (en) | 1994-03-19 | 1994-03-19 | Lead alloy electrode for plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR94005623U KR960006991Y1 (en) | 1994-03-19 | 1994-03-19 | Lead alloy electrode for plating |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950027524U true KR950027524U (ko) | 1995-10-18 |
KR960006991Y1 KR960006991Y1 (en) | 1996-08-16 |
Family
ID=19379274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR94005623U KR960006991Y1 (en) | 1994-03-19 | 1994-03-19 | Lead alloy electrode for plating |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960006991Y1 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020111758A1 (ko) * | 2018-11-30 | 2020-06-04 | 엘지전자 주식회사 | 릴레이 설치 위치가 개선된 전기 포트 |
-
1994
- 1994-03-19 KR KR94005623U patent/KR960006991Y1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR960006991Y1 (en) | 1996-08-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
NORF | Unpaid initial registration fee |