KR950025891A - Method of manufacturing photoresist pattern of semiconductor device - Google Patents

Method of manufacturing photoresist pattern of semiconductor device Download PDF

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Publication number
KR950025891A
KR950025891A KR1019940001955A KR19940001955A KR950025891A KR 950025891 A KR950025891 A KR 950025891A KR 1019940001955 A KR1019940001955 A KR 1019940001955A KR 19940001955 A KR19940001955 A KR 19940001955A KR 950025891 A KR950025891 A KR 950025891A
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KR
South Korea
Prior art keywords
photoresist
semiconductor device
photoresist pattern
photoresist residue
residue
Prior art date
Application number
KR1019940001955A
Other languages
Korean (ko)
Inventor
배상만
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019940001955A priority Critical patent/KR950025891A/en
Publication of KR950025891A publication Critical patent/KR950025891A/en

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  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

본 발명은 반도체 소자의 제조방법에 관한 것으로서, 반도체웨이퍼상에 일차로 포지티브 감광막을 도포한 후, 전면노광 및 형상하여 성장결정이나 단차등에 의해 토플로지의 변화가 심한 부분에 감광수지 잔류물이 남도록하고, 상기 감광수지 잔류물을 재차 노광하며, 상기 구조상에 형성하고자 하는 감광막 패턴을 형성하였으므로, 토폴로지 변화가 심한 부분에 감광수지 잔류물이 남지않아 신뢰성 및 공정수율을 향상시킬 수 있으며, 노광에너지 및 촛점심도를 높이지 않아 공정마진이 증가되므로 반도체 소자의 고집적화가 유리하다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor device, wherein a positive photoresist film is first applied onto a semiconductor wafer, and then the photoresist residue is left in a region where the topography changes due to growth crystallization or a step due to front exposure and shape. In addition, since the photoresist residue is exposed again and a photoresist pattern to be formed on the structure is formed, the photoresist residue does not remain in a portion with a high topology change, thereby improving reliability and process yield. Higher integration of semiconductor devices is advantageous because process margins are increased without increasing the depth of focus.

Description

반도체 소자의 감광막패턴 제조방법Method of manufacturing photoresist pattern of semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도(A) 및 (B)는 종래의 기술의 다른 실시예에 따라 감광막패턴의 제조공정도.2A and 2B are manufacturing process diagrams of a photosensitive film pattern according to another embodiment of the prior art.

Claims (1)

패턴을 형성하고자 하는 반도체웨이퍼상에 포지티브 감광막을 형성하는 공정과, 상기 감광막을 전면노광한 후 현상하여 토폴리지 변화가 심한 부분에 감광수지 잔류물이 남도록하는 공정과, 상기 감광수지 잔류물을 노광하는 공정과, 상기 구조상에 이차로 감광막패턴을 형성하는 공정을 구비하는 반도체소자의 감광막패턴 제조방법.Forming a positive photoresist film on a semiconductor wafer to form a pattern, developing the photoresist film after full exposure and leaving the photoresist residue in a region where the topological change is severe, and exposing the photoresist residue. And a step of forming a second photosensitive film pattern on the structure. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940001955A 1994-02-03 1994-02-03 Method of manufacturing photoresist pattern of semiconductor device KR950025891A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940001955A KR950025891A (en) 1994-02-03 1994-02-03 Method of manufacturing photoresist pattern of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940001955A KR950025891A (en) 1994-02-03 1994-02-03 Method of manufacturing photoresist pattern of semiconductor device

Publications (1)

Publication Number Publication Date
KR950025891A true KR950025891A (en) 1995-09-18

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ID=66663133

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940001955A KR950025891A (en) 1994-02-03 1994-02-03 Method of manufacturing photoresist pattern of semiconductor device

Country Status (1)

Country Link
KR (1) KR950025891A (en)

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