KR950025891A - Method of manufacturing photoresist pattern of semiconductor device - Google Patents
Method of manufacturing photoresist pattern of semiconductor device Download PDFInfo
- Publication number
- KR950025891A KR950025891A KR1019940001955A KR19940001955A KR950025891A KR 950025891 A KR950025891 A KR 950025891A KR 1019940001955 A KR1019940001955 A KR 1019940001955A KR 19940001955 A KR19940001955 A KR 19940001955A KR 950025891 A KR950025891 A KR 950025891A
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist
- semiconductor device
- photoresist pattern
- photoresist residue
- residue
- Prior art date
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- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
본 발명은 반도체 소자의 제조방법에 관한 것으로서, 반도체웨이퍼상에 일차로 포지티브 감광막을 도포한 후, 전면노광 및 형상하여 성장결정이나 단차등에 의해 토플로지의 변화가 심한 부분에 감광수지 잔류물이 남도록하고, 상기 감광수지 잔류물을 재차 노광하며, 상기 구조상에 형성하고자 하는 감광막 패턴을 형성하였으므로, 토폴로지 변화가 심한 부분에 감광수지 잔류물이 남지않아 신뢰성 및 공정수율을 향상시킬 수 있으며, 노광에너지 및 촛점심도를 높이지 않아 공정마진이 증가되므로 반도체 소자의 고집적화가 유리하다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor device, wherein a positive photoresist film is first applied onto a semiconductor wafer, and then the photoresist residue is left in a region where the topography changes due to growth crystallization or a step due to front exposure and shape. In addition, since the photoresist residue is exposed again and a photoresist pattern to be formed on the structure is formed, the photoresist residue does not remain in a portion with a high topology change, thereby improving reliability and process yield. Higher integration of semiconductor devices is advantageous because process margins are increased without increasing the depth of focus.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도(A) 및 (B)는 종래의 기술의 다른 실시예에 따라 감광막패턴의 제조공정도.2A and 2B are manufacturing process diagrams of a photosensitive film pattern according to another embodiment of the prior art.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940001955A KR950025891A (en) | 1994-02-03 | 1994-02-03 | Method of manufacturing photoresist pattern of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940001955A KR950025891A (en) | 1994-02-03 | 1994-02-03 | Method of manufacturing photoresist pattern of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR950025891A true KR950025891A (en) | 1995-09-18 |
Family
ID=66663133
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940001955A KR950025891A (en) | 1994-02-03 | 1994-02-03 | Method of manufacturing photoresist pattern of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950025891A (en) |
-
1994
- 1994-02-03 KR KR1019940001955A patent/KR950025891A/en not_active Application Discontinuation
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