KR950025871U - 자동 헬륨 조절장치 - Google Patents

자동 헬륨 조절장치

Info

Publication number
KR950025871U
KR950025871U KR2019940003147U KR19940003147U KR950025871U KR 950025871 U KR950025871 U KR 950025871U KR 2019940003147 U KR2019940003147 U KR 2019940003147U KR 19940003147 U KR19940003147 U KR 19940003147U KR 950025871 U KR950025871 U KR 950025871U
Authority
KR
South Korea
Prior art keywords
automatic helium
regulator
helium regulator
automatic
helium
Prior art date
Application number
KR2019940003147U
Other languages
English (en)
Other versions
KR200156800Y1 (ko
Inventor
남윤준
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940003147U priority Critical patent/KR200156800Y1/ko
Publication of KR950025871U publication Critical patent/KR950025871U/ko
Application granted granted Critical
Publication of KR200156800Y1 publication Critical patent/KR200156800Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019940003147U 1994-02-21 1994-02-21 자동 헬륨 조절장치 KR200156800Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940003147U KR200156800Y1 (ko) 1994-02-21 1994-02-21 자동 헬륨 조절장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940003147U KR200156800Y1 (ko) 1994-02-21 1994-02-21 자동 헬륨 조절장치

Publications (2)

Publication Number Publication Date
KR950025871U true KR950025871U (ko) 1995-09-18
KR200156800Y1 KR200156800Y1 (ko) 1999-10-01

Family

ID=19377569

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940003147U KR200156800Y1 (ko) 1994-02-21 1994-02-21 자동 헬륨 조절장치

Country Status (1)

Country Link
KR (1) KR200156800Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100237823B1 (ko) * 1996-06-07 2000-01-15 윤종용 반도체 공정챔버로의 냉각용 헬륨가스 공급 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100237823B1 (ko) * 1996-06-07 2000-01-15 윤종용 반도체 공정챔버로의 냉각용 헬륨가스 공급 장치

Also Published As

Publication number Publication date
KR200156800Y1 (ko) 1999-10-01

Similar Documents

Publication Publication Date Title
DE69409481D1 (de) Regler
FI942218A0 (fi) Automatiskt styrningssystem foer obemannat fordon
DE59608100D1 (de) Supraleitende Spule
DE59603476D1 (de) Aufbewahrungseinrichtung
DE69230131D1 (de) Apoptoseregulator
DE69424896D1 (de) Editiergerät
DE59301342D1 (de) Bestäubungsgerät
DE69423742D1 (de) Bandabstands-Referenzschaltung
BR9400738A (pt) Conjunto fixador
DE69535345D1 (de) Fixiergerät
DE59709026D1 (de) Strahlregler
DE69528106D1 (de) Energieregler
DE69502981D1 (de) Lagereinrichtung
BR9103209A (pt) Conjunto regulador pre-ajustado
KR950025871U (ko) 자동 헬륨 조절장치
DE59402782D1 (de) Spuleneinheit
KR960002720U (ko) 자동 전압조정기
FI931637A0 (fi) Reglerbar tryckventil
KR960025786U (ko) 시리즈 레귤레이터
DE69612816D1 (de) Supraleitende Spule
KR960013946U (ko) 시트 자동 보정장치
KR960008357U (ko) 윈도우 레귤레이터
IT1269653B (it) Dispositivo regolatore di assetto
BR9404726A (pt) Torno mecânico automático portátil
KR960018918U (ko) Itc 조정 장치

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20050524

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee