KR950021339A - Stage device - Google Patents

Stage device Download PDF

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Publication number
KR950021339A
KR950021339A KR1019940032505A KR19940032505A KR950021339A KR 950021339 A KR950021339 A KR 950021339A KR 1019940032505 A KR1019940032505 A KR 1019940032505A KR 19940032505 A KR19940032505 A KR 19940032505A KR 950021339 A KR950021339 A KR 950021339A
Authority
KR
South Korea
Prior art keywords
stage
leaf spring
base
substrate
points
Prior art date
Application number
KR1019940032505A
Other languages
Korean (ko)
Inventor
히데아끼 사까모또
Original Assignee
오노 시게오
가부시끼가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오노 시게오, 가부시끼가이샤 니콘 filed Critical 오노 시게오
Publication of KR950021339A publication Critical patent/KR950021339A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

경사보정 테이블상에 웨이퍼 척을 통해서 웨이퍼를 올려놓는다. 경사보정 테이블에 3개의 나사를 통해서 고리형상의 판스프링(25)를 부착하고, 이 판스프링(25)을 다른 3갱의 나사를 통해서 베이스 플레이트상에 부착한다. 베이스 플레이트 상의 구동부재에 의하여 경사보정 테이블의 3개의 선회축을 상하방향으로 변위시킴에 따라서 웨이퍼의 경사각 및 높이를 조정한다.The wafer is placed on the tilt correction table through the wafer chuck. The annular leaf spring 25 is attached to the inclination correction table through three screws, and the leaf spring 25 is attached to the base plate through the screws of the other three shafts. The inclination angle and height of the wafer are adjusted by displacing the three pivot axes of the inclination correction table in the vertical direction by the drive member on the base plate.

선택도 : 제1도Selectivity: first degree

Description

스테이지장치Stage device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 제1실시예에 따른 경사보정 스테이지의 개략적인 구성을 도시한 정면도.1 is a front view showing a schematic configuration of a tilt correction stage according to the first embodiment of the present invention.

Claims (11)

스테이지장치로서, 테이블과, 상기 테이블상의 적어도 1개의 제1고정점을 통하여 부착된 판스프링과, 상기 제1고정점 이외의 적어도 1개의 제2고정점을 통하여 상기 판스프링에 부착된 베이스와, 상기 판스프링상의 상기 제2고정점 이외에 3개 이상의 지지점을 상기 베이스에 대하여 지지하는 3개 이상의 지지부재와, 그리고 상기 3개 이상의 지지점중에서 적어도 2개의 지지점을 상기 베이스에 대하여 변위시키는 구동부재를 포함하고 있는 스테이지장치.A stage device comprising: a table, a leaf spring attached through at least one first anchor point on the table, a base attached to the leaf spring via at least one second anchor point other than the first anchor point, Three or more support members for supporting at least three support points with respect to the base in addition to the second fixing point on the leaf spring, and a drive member for displacing at least two support points from the three or more support points with respect to the base. Stage device doing. 제1항에 있어서, 상기 지지점의 수는 3개이며, 상기 판스프링상의 상기 3개의 지지점을 통과하는 원주의 중심이 상기 테이블의 중심의 근방에 배치되어 있는 스테이지장치.The stage apparatus according to claim 1, wherein the number of the supporting points is three, and the center of the circumference passing through the three supporting points on the leaf spring is arranged near the center of the table. 제1항에 있어서, 상기 제1고정점의 수와 상기 제2고정점의 수는 같고, 상기 판스프링에는 상기 제1고정점과 상기 제2고정점과의 사이로 슬릿이 형성되어 있는 스테이지장치.The stage apparatus according to claim 1, wherein the number of the first fixing points and the number of the second fixing points are the same, and the slit is formed in the leaf spring between the first fixing point and the second fixing point. 제1항에 있어서, 상기 베이스를 올려놓고 2차원으로 이동하는 스테이지를 더 포함하고 있는 스테이지장치.The stage device according to claim 1, further comprising a stage for placing the base and moving in two dimensions. 제4항에 있어서, 상기 베이스를 상기 지지점의 변위방향으로 이동시키는 구동부재를 더 포함하고 있는 스테이지장치.5. The stage apparatus according to claim 4, further comprising a drive member for moving said base in the displacement direction of said support point. 제1항에 있어서, 상기 베이스를 올려놓고 2차원으로 이동가능하게 제공된 스테이지와, 상기 테이블상에 설치되어서 서로 직교하는 2개의 반사면을 갖춘 지지밀러와, 그리고 상기 밀러의 반사면에 광빔을 투사시키는 광파간섭계를 더 포함하고 있는 스테이지장치.2. A stage according to claim 1, wherein the stage is provided to be movable in two dimensions with the base mounted thereon, a support mirror provided on the table and having two reflective surfaces orthogonal to each other, and projecting a light beam onto the mirror's reflective surface. And a stage apparatus further comprising an optical wave interferometer. 제6항에 있어서, 상기 구동부재에 의한 상기 테이블의 기울어짐에 관현하여서 상기 광파간섭계의 출력신호에 따라 상기 스테이지를 이동시키는 구동장치를 더 포함하고 있는 스테이지장치.7. The stage apparatus according to claim 6, further comprising a driving device for moving said stage in accordance with an output signal of said optical wave interferometer by observing the inclination of said table by said driving member. 제1항에 있어서, 상기 테이블상에 유지되는 물체에 광빔을 조사시키며 상기 물체에서 반사한 광을 광전검출함으로써 상기 물체의 경사량에 따른 신호를 출력하는 센서를 더 포함하고 있으며, 상기 구동장치가 상기 센서로부터의 신호에 따라서 적어도 2개의 상기 지지점을 변위시키는 스테이지장치.The apparatus of claim 1, further comprising a sensor for irradiating a light beam to an object held on the table and outputting a signal according to the amount of tilt of the object by photodetecting the light reflected from the object. And a stage device for displacing at least two said support points in response to a signal from said sensor. 제1항에 있어서, 상기 테이블이 감광성 기판을 유지시키며, 상기 기판에 마스크상의 패턴의 상을 투영시키는 투영광학계를 포함하고 있는 스테이지장치.The stage apparatus according to claim 1, wherein said table holds a photosensitive substrate and comprises a projection optical system for projecting an image of a pattern on a mask onto said substrate. 제1항에 있어서, 상기 기판상에 광빔을 조사시키며 상기 기판으로 부터의 반사광을 수광함에 따라서 상기 투영광학계의 상면(像面)에 대한 상기 기판의 경사량 및 상기 투영광학계의 광축방향으로의 상기 상면과 상기 기판 사이의 편차량을 검출하는 검출장치를 더 포함하고 있으며, 상기 구동장치가 상기 투영광학계의 상면과 상기 기판이 합치하도록 상기 검출장치의 검출장치의 검출결과에 근거하여 3개 이상의 상기 중에서 적어도 3개의 지지점을 상기 베이스에 대하여 변위시키는 스테이지장치.The method according to claim 1, wherein the amount of inclination of the substrate with respect to the image plane of the projection optical system and the projection optical system in the direction of the optical axis as the light beam is irradiated onto the substrate and the reflected light from the substrate is received. And a detection device for detecting an amount of deviation between an upper surface and the substrate, wherein the driving device is adapted to match the upper surface of the projection optical system with the substrate based on a detection result of the detection device of the detection apparatus. A stage device for displacing at least three support points with respect to the base. 스테이지장치로서, 테이블과 상기 테이블상에 적어도 1개의 제1고정점을 통하여 부착된 1장의 판스프링과, 상기 제1고정점 이외의 적어도 1개의 제2고정점을 통하여 상기 판스프링에 부착된 베이스와, 그리고 상기 판스프링상의 상기 제2고정점 이외의 적어도 2개의 지지점을 상기 베이스에 대하여 변위시키는 구동부재를 포함하고 있는 스테이지장치.A stage apparatus comprising: a table and one leaf spring attached to the table via at least one first anchor point, and a base attached to the leaf spring through at least one second anchor point other than the first anchor point. And a drive member for displacing at least two support points other than the second fixed point on the leaf spring with respect to the base. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940032505A 1993-12-02 1994-12-02 Stage device KR950021339A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP30269593A JPH07161799A (en) 1993-12-02 1993-12-02 Stage device
JP1993-302695 1993-12-02

Publications (1)

Publication Number Publication Date
KR950021339A true KR950021339A (en) 1995-07-26

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Application Number Title Priority Date Filing Date
KR1019940032505A KR950021339A (en) 1993-12-02 1994-12-02 Stage device

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KR (1) KR950021339A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5991005A (en) * 1996-04-11 1999-11-23 Nikon Corporation Stage apparatus and exposure apparatus having the same
KR100253091B1 (en) * 1997-11-21 2000-04-15 윤종용 Elevator apparatus for transporting semiconductor boat
US11499666B2 (en) * 2018-05-25 2022-11-15 Applied Materials, Inc. Precision dynamic leveling mechanism with long motion capability

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Publication number Publication date
JPH07161799A (en) 1995-06-23

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