KR950010201U - Double head nozzle assembly for spraying coating liquid of semiconductor coating equipment - Google Patents
Double head nozzle assembly for spraying coating liquid of semiconductor coating equipmentInfo
- Publication number
- KR950010201U KR950010201U KR2019930017866U KR930017866U KR950010201U KR 950010201 U KR950010201 U KR 950010201U KR 2019930017866 U KR2019930017866 U KR 2019930017866U KR 930017866 U KR930017866 U KR 930017866U KR 950010201 U KR950010201 U KR 950010201U
- Authority
- KR
- South Korea
- Prior art keywords
- nozzle assembly
- head nozzle
- double head
- coating liquid
- semiconductor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019930017866U KR960008671Y1 (en) | 1993-09-08 | 1993-09-08 | Double head nozzle assembly for coating material of semiconductor coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019930017866U KR960008671Y1 (en) | 1993-09-08 | 1993-09-08 | Double head nozzle assembly for coating material of semiconductor coater |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR950010201U true KR950010201U (en) | 1995-04-24 |
| KR960008671Y1 KR960008671Y1 (en) | 1996-10-07 |
Family
ID=19363017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019930017866U KR960008671Y1 (en) | 1993-09-08 | 1993-09-08 | Double head nozzle assembly for coating material of semiconductor coater |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR960008671Y1 (en) |
-
1993
- 1993-09-08 KR KR2019930017866U patent/KR960008671Y1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR960008671Y1 (en) | 1996-10-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| FPAY | Annual fee payment |
Payment date: 20040920 Year of fee payment: 9 |
|
| LAPS | Lapse due to unpaid annual fee |