KR950004787U - Semiconductor high temperature oxidation/diffusion device - Google Patents

Semiconductor high temperature oxidation/diffusion device

Info

Publication number
KR950004787U
KR950004787U KR2019930014407U KR930014407U KR950004787U KR 950004787 U KR950004787 U KR 950004787U KR 2019930014407 U KR2019930014407 U KR 2019930014407U KR 930014407 U KR930014407 U KR 930014407U KR 950004787 U KR950004787 U KR 950004787U
Authority
KR
South Korea
Prior art keywords
high temperature
temperature oxidation
diffusion device
semiconductor high
semiconductor
Prior art date
Application number
KR2019930014407U
Other languages
Korean (ko)
Other versions
KR960000143Y1 (en
Inventor
이경희
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930014407U priority Critical patent/KR960000143Y1/en
Publication of KR950004787U publication Critical patent/KR950004787U/en
Application granted granted Critical
Publication of KR960000143Y1 publication Critical patent/KR960000143Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any preceding group
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Especially adapted for treating semiconductor wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR2019930014407U 1993-07-29 1993-07-29 Semiconductor high tempeature oxidization/diffusion apparatus KR960000143Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930014407U KR960000143Y1 (en) 1993-07-29 1993-07-29 Semiconductor high tempeature oxidization/diffusion apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930014407U KR960000143Y1 (en) 1993-07-29 1993-07-29 Semiconductor high tempeature oxidization/diffusion apparatus

Publications (2)

Publication Number Publication Date
KR950004787U true KR950004787U (en) 1995-02-18
KR960000143Y1 KR960000143Y1 (en) 1996-01-04

Family

ID=19360217

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930014407U KR960000143Y1 (en) 1993-07-29 1993-07-29 Semiconductor high tempeature oxidization/diffusion apparatus

Country Status (1)

Country Link
KR (1) KR960000143Y1 (en)

Also Published As

Publication number Publication date
KR960000143Y1 (en) 1996-01-04

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Legal Events

Date Code Title Description
A201 Request for examination
O032 Opposition [utility model]: request for opposition
E902 Notification of reason for refusal
E601 Decision to refuse application
O061 Decision on refusal after opposition [utility model]: decision to refuse application