KR940016531A - Semiconductor Wafer Cleaning Equipment - Google Patents

Semiconductor Wafer Cleaning Equipment Download PDF

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Publication number
KR940016531A
KR940016531A KR1019920023811A KR920023811A KR940016531A KR 940016531 A KR940016531 A KR 940016531A KR 1019920023811 A KR1019920023811 A KR 1019920023811A KR 920023811 A KR920023811 A KR 920023811A KR 940016531 A KR940016531 A KR 940016531A
Authority
KR
South Korea
Prior art keywords
cleaning liquid
supply
cleaning
detection device
time
Prior art date
Application number
KR1019920023811A
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Korean (ko)
Other versions
KR100247907B1 (en
Inventor
박태훈
안성규
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019920023811A priority Critical patent/KR100247907B1/en
Publication of KR940016531A publication Critical patent/KR940016531A/en
Application granted granted Critical
Publication of KR100247907B1 publication Critical patent/KR100247907B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 반도체 웨이퍼 세정장치에 관한하여 기술한다.The present invention relates to a semiconductor wafer cleaning apparatus.

본 발명의 세정장치는, 세정액이 공급되는 공급관에 세정액 유동여부에 따라 그 위치가 변화되는 코크를 구비하고, 이 코크의 근방에는 이를 검지하는 센서와 센서로 부터 출력되는 신호를 연산하여 코크가 부유된 시간 즉, 세정액이 공급된 시간을 누적 산출하여 전체 세정액 공급량을 산출하는 연산장치를 구비한다. 이러한 본 발명 세정장치는 세정액의 농도를 실시간 측정할 수 있다는 점에 그 특징이 있는 것으로서, 종래 레벨센서등의 오동작에 의한 농도의 오측정에 의한 문제점을 개선할 수 있어서, 세정공정중 웨이퍼 세정의 안정성을 확보하여 세정 잘못에 의한 웨이퍼의 불량화를 방지할 수 있다.The cleaning apparatus of the present invention includes a coke whose position is changed in a supply pipe to which the cleaning liquid is supplied, depending on whether or not the cleaning liquid flows. And an arithmetic unit for accumulating the accumulated time, that is, the time the cleaning liquid is supplied, to calculate the total cleaning liquid supply amount. Such a cleaning apparatus of the present invention is characterized in that the concentration of the cleaning liquid can be measured in real time, and the problem caused by the incorrect measurement of the concentration due to a malfunction of a conventional level sensor or the like can be solved. It is possible to secure stability and prevent wafer defects due to cleaning errors.

Description

반도체 웨이퍼 세정장치Semiconductor Wafer Cleaning Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제 1 도는 본 발명에 따른 반도체 웨이퍼 세정장치의 구조를 보여주는 얼개도, 제 2 도는 본 발명의 세정장치에 의한 세정액 농도 실측치와 이론치와의 비교선도, 제 3 도는 본 발명 세정장치에 적용되는 광학적 검지장치의 개략도.1 is a schematic diagram showing the structure of a semiconductor wafer cleaning apparatus according to the present invention, FIG. 2 is a comparative diagram of the measured concentration and theoretical values of the cleaning liquid concentration by the cleaning apparatus of the present invention, and FIG. 3 is an optical detection applied to the cleaning apparatus of the present invention. Schematic diagram of the device.

Claims (3)

세정액이 저장되는 세정조의 일측에, 세정액이 공급되는 다수의 세정액 공급라인과, 상기 공급라인으로 세정액을 압송하는 펌프와, 상기 공급라인의 어느 하나에 설치되어 해당 공급라인으로 관류하는 세정액의 유동 여부를 검지하는 광학적 검지부와, 상기 광학적 검지부로 부터의 신호를 연산 공급시간을 얻고, 공급시간을 연산하여 세정액의 공급량을 얻어내는 연산장치가 마련된 것을 특징으로 하는 반도체 웨이퍼 세정장치.On one side of the cleaning tank in which the cleaning liquid is stored, a plurality of cleaning liquid supply lines for supplying the cleaning liquid, a pump for pumping the cleaning liquid into the supply line, and whether the cleaning liquid is installed in any one of the supply lines and flows through the corresponding supply line. And an optical detecting unit for detecting a signal, and an calculating device for obtaining a calculation supply time from a signal from the optical detection unit, and calculating a supply time to obtain a supply amount of a cleaning liquid. 제 1 항에 있어서, 상기 광학적 검지장치는, 상기 공급관의 어느 일측에 소정 용적의 레귤레이터가 마련되고, 이 레귤레이터내에 광학적 검지장치의 일요소로서, 세정액의 공급에 따른 유동압력에 따라 그 위치가 변화되는 부유구로서의 코크가 마련되고, 그리고, 세정액의 공급에 의한 코크의 위치를 검지하는 검지센서가 부유구에 인접된 부위에 마련되는 것에 의해 구성되는 것을 특징으로 하는 반도체 웨이퍼 세정장치.2. The optical detection device according to claim 1, wherein a regulator having a predetermined volume is provided on one side of the supply pipe, and the position of the optical detection device is a component of the optical detection device, and the position thereof changes according to the flow pressure due to the supply of the cleaning liquid. And a detection sensor for detecting the position of the cock by the supply of the cleaning liquid is provided at a portion adjacent to the floating port. 제 2 항에 있어서, 상기 검지장치는 상기 부유구의 변화에 따른 세정액의 공급되는 시간을 누적 연산하여 공급된 세정액의 총공급량을 산출하는 연산장치에 연결되는 것을 특징으로 하는 반도체 웨이퍼 세정장치.3. The semiconductor wafer cleaning apparatus according to claim 2, wherein the detection device is connected to a computing device that calculates the total supply amount of the cleaning liquid supplied by accumulating the time for supplying the cleaning liquid according to the change of the floating port. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019920023811A 1992-12-10 1992-12-10 Apparatus for cleaning of semiconductor wafer KR100247907B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019920023811A KR100247907B1 (en) 1992-12-10 1992-12-10 Apparatus for cleaning of semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019920023811A KR100247907B1 (en) 1992-12-10 1992-12-10 Apparatus for cleaning of semiconductor wafer

Publications (2)

Publication Number Publication Date
KR940016531A true KR940016531A (en) 1994-07-23
KR100247907B1 KR100247907B1 (en) 2000-03-15

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KR1019920023811A KR100247907B1 (en) 1992-12-10 1992-12-10 Apparatus for cleaning of semiconductor wafer

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100585091B1 (en) 2003-06-12 2006-05-30 삼성전자주식회사 Apparatus and method for cleaning wafer anticipatable fault of pump

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KR100247907B1 (en) 2000-03-15

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