KR940004315U - Automatic solution for wet station solution - Google Patents

Automatic solution for wet station solution

Info

Publication number
KR940004315U
KR940004315U KR2019920013008U KR920013008U KR940004315U KR 940004315 U KR940004315 U KR 940004315U KR 2019920013008 U KR2019920013008 U KR 2019920013008U KR 920013008 U KR920013008 U KR 920013008U KR 940004315 U KR940004315 U KR 940004315U
Authority
KR
South Korea
Prior art keywords
solution
automatic
wet station
wet
station
Prior art date
Application number
KR2019920013008U
Other languages
Korean (ko)
Other versions
KR950006637Y1 (en
Inventor
박용수
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR92013008U priority Critical patent/KR950006637Y1/en
Publication of KR940004315U publication Critical patent/KR940004315U/en
Application granted granted Critical
Publication of KR950006637Y1 publication Critical patent/KR950006637Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Non-Electrical Variables (AREA)
KR92013008U 1992-07-14 1992-07-14 Automatic supplying apparatus of chemical aquor in wet station KR950006637Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92013008U KR950006637Y1 (en) 1992-07-14 1992-07-14 Automatic supplying apparatus of chemical aquor in wet station

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92013008U KR950006637Y1 (en) 1992-07-14 1992-07-14 Automatic supplying apparatus of chemical aquor in wet station

Publications (2)

Publication Number Publication Date
KR940004315U true KR940004315U (en) 1994-02-24
KR950006637Y1 KR950006637Y1 (en) 1995-08-16

Family

ID=19336730

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92013008U KR950006637Y1 (en) 1992-07-14 1992-07-14 Automatic supplying apparatus of chemical aquor in wet station

Country Status (1)

Country Link
KR (1) KR950006637Y1 (en)

Also Published As

Publication number Publication date
KR950006637Y1 (en) 1995-08-16

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040719

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee