KR930010070U - Plasma generator - Google Patents
Plasma generatorInfo
- Publication number
- KR930010070U KR930010070U KR2019910017066U KR910017066U KR930010070U KR 930010070 U KR930010070 U KR 930010070U KR 2019910017066 U KR2019910017066 U KR 2019910017066U KR 910017066 U KR910017066 U KR 910017066U KR 930010070 U KR930010070 U KR 930010070U
- Authority
- KR
- South Korea
- Prior art keywords
- plasma generator
- plasma
- generator
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019910017066U KR950004756Y1 (en) | 1991-10-14 | 1991-10-14 | Plasma generating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019910017066U KR950004756Y1 (en) | 1991-10-14 | 1991-10-14 | Plasma generating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930010070U true KR930010070U (en) | 1993-05-26 |
KR950004756Y1 KR950004756Y1 (en) | 1995-06-14 |
Family
ID=19320545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019910017066U KR950004756Y1 (en) | 1991-10-14 | 1991-10-14 | Plasma generating apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR950004756Y1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100428813B1 (en) * | 2001-09-18 | 2004-04-29 | 주성엔지니어링(주) | Plama generation apparatus and SiO2 thin film etching method using the same |
-
1991
- 1991-10-14 KR KR2019910017066U patent/KR950004756Y1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100428813B1 (en) * | 2001-09-18 | 2004-04-29 | 주성엔지니어링(주) | Plama generation apparatus and SiO2 thin film etching method using the same |
Also Published As
Publication number | Publication date |
---|---|
KR950004756Y1 (en) | 1995-06-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20060308 Year of fee payment: 12 |
|
EXPY | Expiration of term |