KR930009724U - Ion implantation device for semiconductor manufacturing - Google Patents

Ion implantation device for semiconductor manufacturing

Info

Publication number
KR930009724U
KR930009724U KR2019910017597U KR910017597U KR930009724U KR 930009724 U KR930009724 U KR 930009724U KR 2019910017597 U KR2019910017597 U KR 2019910017597U KR 910017597 U KR910017597 U KR 910017597U KR 930009724 U KR930009724 U KR 930009724U
Authority
KR
South Korea
Prior art keywords
ion implantation
semiconductor manufacturing
implantation device
semiconductor
manufacturing
Prior art date
Application number
KR2019910017597U
Other languages
Korean (ko)
Other versions
KR940007494Y1 (en
Inventor
김창현
홍승우
Original Assignee
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자 주식회사 filed Critical 삼성전자 주식회사
Priority to KR2019910017597U priority Critical patent/KR940007494Y1/en
Publication of KR930009724U publication Critical patent/KR930009724U/en
Application granted granted Critical
Publication of KR940007494Y1 publication Critical patent/KR940007494Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation

Landscapes

  • Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
KR2019910017597U 1991-10-21 1991-10-21 Iron implanting apparatus for semiconductor manufacture KR940007494Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019910017597U KR940007494Y1 (en) 1991-10-21 1991-10-21 Iron implanting apparatus for semiconductor manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019910017597U KR940007494Y1 (en) 1991-10-21 1991-10-21 Iron implanting apparatus for semiconductor manufacture

Publications (2)

Publication Number Publication Date
KR930009724U true KR930009724U (en) 1993-05-26
KR940007494Y1 KR940007494Y1 (en) 1994-10-22

Family

ID=19320914

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019910017597U KR940007494Y1 (en) 1991-10-21 1991-10-21 Iron implanting apparatus for semiconductor manufacture

Country Status (1)

Country Link
KR (1) KR940007494Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100325747B1 (en) * 1999-11-12 2002-03-06 류정열 an accel lever

Also Published As

Publication number Publication date
KR940007494Y1 (en) 1994-10-22

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E701 Decision to grant or registration of patent right
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