KR920021561A - Novel cephalosporins and methods for their preparation - Google Patents

Novel cephalosporins and methods for their preparation Download PDF

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Publication number
KR920021561A
KR920021561A KR1019910008525A KR910008525A KR920021561A KR 920021561 A KR920021561 A KR 920021561A KR 1019910008525 A KR1019910008525 A KR 1019910008525A KR 910008525 A KR910008525 A KR 910008525A KR 920021561 A KR920021561 A KR 920021561A
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KR
South Korea
Prior art keywords
group
hydrogen
lower alkyl
carbon atoms
compound
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KR1019910008525A
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Korean (ko)
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KR930009796B1 (en
Inventor
노일근
문치장
박세충
김명구
최영기
오세한
임성수
성무제
안상근
Original Assignee
윤영환
주식회사 대웅제약
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Priority to KR1019910008525A priority Critical patent/KR930009796B1/en
Priority to PCT/KR1991/000028 priority patent/WO1992021681A1/en
Priority to AU88551/91A priority patent/AU8855191A/en
Publication of KR920021561A publication Critical patent/KR920021561A/en
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Publication of KR930009796B1 publication Critical patent/KR930009796B1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/38Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof
    • C07D501/46Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)

Abstract

내용 없음No content

Description

신규의 세팔로스포린 및 그의 제조 방법Novel cephalosporins and methods for their preparation

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (6)

하기 일반식(I)로 표시되는 화합물 및 그의 약학적으로 허용 가능한 염.Compound represented by the following general formula (I) and its pharmaceutically acceptable salt. 상기식에서 R1a는 수소 또는 아미노 보호기이고, R1b는 탄소수 1-4의 알킬 또는(R3와 R4는 서로 같거나 다르며 각각 수소 또는 탄소수 1-3의 저급 알킬이며, R5는 수소, 알칼리금속 또는 카르복시보호기이다)이며, R2는 탄소수 1 내지 4의 저급 알킬기, 또는 카르복시기, 아미노기, 히드록시기로 치환된 탄소수 1-4의 저급알킬기이고, Q는 탄소 또는 질소이다.Wherein R 1a is hydrogen or an amino protecting group, R 1b is alkyl having 1-4 carbons or (R 3 and R 4 are the same as or different from each other and are each hydrogen or lower alkyl having 1 to 3 carbon atoms, R 5 is hydrogen, an alkali metal or a carboxy protecting group), and R 2 is a lower alkyl group having 1 to 4 carbon atoms, or a carboxy group , A C1-4 lower alkyl group substituted with an amino group, a hydroxy group, and Q is carbon or nitrogen. 제1항에 있어서, 일반식(I)의 화합물이 R1a는 수소, R1b는 메틸 또는R2는 탄소수 1-4의 저급알킬, 또는 카르복시기, 아미노기, 히드록시기로 치환된 탄소수 1-4의 저급알킬인 화합물 및 그의 약학적 허용가능한 염.A compound of formula (I) wherein R 1a is hydrogen, R 1b is methyl or R 2 is lower alkyl having 1 to 4 carbon atoms, or lower alkyl having 1 to 4 carbon atoms substituted with a carboxyl group, an amino group or a hydroxy group and a pharmaceutically acceptable salt thereof. 제1항 또는 제2항에 있어서, 일반식(I)의 화합물이 알칼리금속염, 알칼리토금속염, 염기성염, 유기산염, 또는 무기산염인 화합물.The compound according to claim 1 or 2, wherein the compound of general formula (I) is an alkali metal salt, alkaline earth metal salt, basic salt, organic acid salt, or inorganic acid salt. 하기 일반식(II)의 화합물과 하기 일반식(III)의 화합물을 치환 반응시킨 후 아미노 보호기 또는 카르복시보호기가 있다면 이를 제거함을 특징으로 하는 하기 일반식(I)의 화합물과 그의 약학적으로 허용 가능한 염의 제조방법.A compound of the general formula (I) and a pharmaceutically acceptable compound thereof, wherein the compound of the general formula (II) and the compound of the general formula (III) Preparation of Salts. 상기식에서, R1a는 수소 또는 아미노 보호기이고, R1b는 탄소수 1-4의 알킬 또는(R3와 R4는 각각 수소 또는 탄소수 1-3의 저급 알킬이며, 서로 같거나 다르고, R5는 수소, 알칼리금속 또는 카르복시보호기이다)이며, R2는 탄소수 1 내지 4의 저급알킬기, 또는 히드록시, 카르복시기, 아미노기로 치환된 탄소수 1-4의 저급알킬기이고, R6는 수소, 알칼리금속, 또는 카르복시보호기이며, Q는 탄소 또는 질소이고, L은 아세톡시기 또는 할로겐원자이다.Wherein R 1a is hydrogen or an amino protecting group, R 1b is alkyl having 1-4 carbons or (R 3 and R 4 are each hydrogen or lower alkyl having 1 to 3 carbon atoms, the same as or different from each other, R 5 is hydrogen, an alkali metal or a carboxy protecting group), and R 2 is a lower alkyl group having 1 to 4 carbon atoms, or A lower alkyl group having 1 to 4 carbon atoms substituted with a hydroxy, carboxyl or amino group, R 6 is hydrogen, an alkali metal, or a carboxyprotecting group, Q is carbon or nitrogen, and L is an acetoxy group or a halogen atom. 하기 일반식(IV)의 화합물과 하기 일반식(V)의 화합물 또는 이의 활성화 유도체를 아실화 반응시킨후 아미노 보호기 또는 카르복시 보호기를 제거하는 것을 특징으로 하는 하기 일반식(I)의 화합물과 그의 약학적으로 허용 가능한 염의 제조방법.Compounds of the general formula (I) and pharmaceuticals thereof characterized by removing an amino protecting group or a carboxy protecting group after acylating a compound of the general formula (IV) and a compound of the general formula (V) Method for the preparation of salts which are generally acceptable. 상기식에서, R1a는 수소 또는 아미노 보호기이고, R1b는 탄소수 1-4의 알킬 또는(R3와 R4는 각각 수소 또는 탄소수 1-3의 저급 알킬이며, 서로 같거나 다르고, R5는 수소, 알칼리금속 또는 카르복시보호기이다)이며, R2는 탄소수 1 내지 4의 저급알킬기, 또는 카르복시기, 아미노기, 히드록시기로 치환된 탄소수 1-4의 저급 알킬이고, R6는 수소, 알칼리금속, 또는 카르복시 보호기이며, R7은 포밀기, 살리실 알데히드기 또는 벤즈알데히드기이고, Q는 탄소 또는 질소이며, X는 할로겐 또는 산잔기이고, L은 아세톡시기 또는 할로겐이다.Wherein R 1a is hydrogen or an amino protecting group, R 1b is alkyl having 1-4 carbons or (R 3 and R 4 are each hydrogen or lower alkyl having 1 to 3 carbon atoms, the same as or different from each other, R 5 is hydrogen, an alkali metal or a carboxy protecting group), and R 2 is a lower alkyl group having 1 to 4 carbon atoms, or Lower alkyl having 1 to 4 carbon atoms substituted with carboxyl, amino, or hydroxy groups, R 6 is hydrogen, an alkali metal, or a carboxy protecting group, R 7 is a formyl group, salicylic aldehyde group or benzaldehyde group, Q is carbon or nitrogen , X is a halogen or an acid residue, and L is an acetoxy group or a halogen. 제약적으로 허용되는 담체 부형제와 혼합된, 상기 제1항에 따른 하나 또는 그 이상의 일반식(I)의 화합물을 유효성분으로 함유하는 약제학적 조성물.A pharmaceutical composition comprising, as an active ingredient, one or more compounds of formula (I) according to claim 1, mixed with a pharmaceutically acceptable carrier excipient. ※ 참고사항:최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019910008525A 1991-05-25 1991-05-25 Cephalosporin derivatives KR930009796B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019910008525A KR930009796B1 (en) 1991-05-25 1991-05-25 Cephalosporin derivatives
PCT/KR1991/000028 WO1992021681A1 (en) 1991-05-25 1991-10-29 Novel cephalosporins and processes for preparation thereof
AU88551/91A AU8855191A (en) 1991-05-25 1991-10-29 Novel cephalosporins and processes for preparation thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910008525A KR930009796B1 (en) 1991-05-25 1991-05-25 Cephalosporin derivatives

Publications (2)

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KR920021561A true KR920021561A (en) 1992-12-18
KR930009796B1 KR930009796B1 (en) 1993-10-11

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AU (1) AU8855191A (en)
WO (1) WO1992021681A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE7908896L (en) * 1978-10-27 1980-04-28 Glaxo Group Ltd cephalosporin
EP0062321B1 (en) * 1981-04-03 1989-03-01 Fujisawa Pharmaceutical Co., Ltd. New cephem compounds, processes for their preparation, pharmaceutical compositions containing them and their starting compounds
PH22107A (en) * 1984-06-07 1988-06-01 Takeda Chemical Industries Ltd 3-pyrazolo(1,5-a)pyrdinium cephem compounds
US4826834A (en) * 1985-09-27 1989-05-02 Takeda Chemical Industries, Ltd. Cephem compounds

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AU8855191A (en) 1993-01-08
WO1992021681A1 (en) 1992-12-10
KR930009796B1 (en) 1993-10-11

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