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Application filed by 문정환, 금성일렉트론 주식회사filedCritical문정환
Priority to KR1019910000572ApriorityCriticalpatent/KR920015472A/en
Publication of KR920015472ApublicationCriticalpatent/KR920015472A/en
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
Claims (2)
감광제 제거 반응로에 주가스로서 산소가스를 유입시킴과 동시에 완충가스로서 상기 산소가스에 대해 일정 비율의 산화질소가스를 유입한 다음 발생된 반응 생성물은 펌프로 배기시키는 것을 특징으로 하는 감광제 제거방법.A method of removing a photosensitive agent, characterized in that oxygen gas is introduced as a main gas into the photosensitive agent removal reactor and at the same time a nitrogen oxide gas is introduced into the oxygen gas as a buffer gas.제1항에 있어서, 산화가스에 대한 산화질소가스의 비율은 약5-10%정도로 함을 특징으로 하는 감광제 제거 방법.The method of claim 1, wherein the ratio of nitric oxide gas to oxidizing gas is about 5-10%.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019910000572A1991-01-151991-01-15
How to remove photosensitizer
KR920015472A
(en)