KR920009144B1 - Multi-step focusing electron gun - Google Patents

Multi-step focusing electron gun Download PDF

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KR920009144B1
KR920009144B1 KR1019890003605A KR890003605A KR920009144B1 KR 920009144 B1 KR920009144 B1 KR 920009144B1 KR 1019890003605 A KR1019890003605 A KR 1019890003605A KR 890003605 A KR890003605 A KR 890003605A KR 920009144 B1 KR920009144 B1 KR 920009144B1
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South Korea
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electrode
lens
electron gun
electrodes
forming hole
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KR1019890003605A
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Korean (ko)
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KR900015237A (en
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조석래
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삼성전관 주식회사
김정배
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Priority to KR1019890003605A priority Critical patent/KR920009144B1/en
Priority to US07/349,589 priority patent/US5015911A/en
Priority to JP1117185A priority patent/JPH02152144A/en
Priority to DE68918405T priority patent/DE68918405T2/en
Priority to EP89108412A priority patent/EP0369101B1/en
Publication of KR900015237A publication Critical patent/KR900015237A/en
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Publication of KR920009144B1 publication Critical patent/KR920009144B1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/80Arrangements for controlling the ray or beam after passing the main deflection system, e.g. for post-acceleration or post-concentration, for colour switching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube

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  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)

Abstract

The multistep focusing type electron gun for CRT includes a cathode (K), electrodes (G1,G2) and electrodes (G3-G8) for forming two unipotential auxiliary lenses and a bipotential major lens in the main lens. The electrodes (G4-G7) are so constituted as to satisfy the specific formulas. The size of a lens forming aperture (H3) is smaller than the size of a lens forming aperture (H4). The electron gun can reduce the bean spot size and the halo size formed around the beam spot. Further the electron gun improves the spherical aberration, and provides the flexibility in designing for different purposes, as well as improving the image quality on the screen.

Description

다단집속형 전자총Multi-Stage Gun

제1도는 종래의 다단집속형 전자총의 종단면도.1 is a longitudinal sectional view of a conventional multi-stage focused electron gun.

제2도는 본 발명에 다른 다단집속형 전자총의 종단면도.2 is a longitudinal sectional view of a multi-stage focused electron gun according to the present invention.

제3도는 제2도에 도시된 다단집속형 전자총의 G3전극을 나타낸 것으로서,3 shows the G 3 electrode of the multi-stage electron gun shown in FIG.

a도는 정면도이며, b도는 단면도이다.a is a front view, and b is a sectional drawing.

제4도는 제2도에 도시된 다단접속형 전자총의 G5a전극을 나타낸 것으로서, a도는 정면도이며, b도는 단면도이다.4 is a G 5 a electrode of the multistage connected electron gun shown in FIG. 2, in which a is a front view and b is a sectional view.

* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for the main parts of the drawings

G1∼G8: 전극 H3: G3전극의 렌즈 형성공G 1 to G 8 : Electrode H 3 : Lens forming hole of G 3 electrode

H4: G4전극의 렌즈 형성공 G5a : G5a전극의 렌즈 형성공H 4 : Lens forming hole of G 4 electrode G 5 a: Lens forming hole of G 5 a electrode

본 발명은 다단집속형 전자총에 관한 것으로서, 상세하게는 상기 전자총을 이루는 전극에 의하여 유니 포텐셜 포커스형 렌즈를 구성할 때는 전자 렌즈의 오목렌즈 효과를 억제하는 한편 블록렌즈의 효과를 증대시켜 이를 통과하는 전자빔의 발산 작용을 줄임으로써 포커스특성을 향상시킨 것에 관한 것이다.The present invention relates to a multi-stage focusing electron gun. Specifically, when constructing a unipotential focus type lens by the electrode constituting the electron gun, the concave lens effect of the electronic lens is suppressed while the effect of the block lens is increased to pass therethrough. The present invention relates to improving the focus characteristic by reducing the diverging action of the electron beam.

일반적으로 잔자총에 의하여 형성되는 전자렌즈는 광학계의 렌즈와는 달리 블록 및 오목렌즈를 동시에 갖고 있는 바 상기 오목렌즈의 효과를 줄이면 포커스 특성이 향상되어서 형광면상에 렌딩되는 빔스포트의 단면을 최적의 상태로 유지하여 해상도를 향상시킬 수 있다.In general, the electron lens formed by the residual gun has a block and a concave lens at the same time, unlike the lens of the optical system. When the effect of the concave lens is reduced, the focus characteristic is improved to optimize the cross section of the beam spot rendered on the fluorescent surface. You can improve the resolution by keeping it in the state.

종래의 다단집속형 전자총은, 제1도에 도시된 바와같이 G2전극, G4전극, G6전극에 0∼1KV의 등전위의 전압(V1)이 인가되고 G3전극, G5전극 및 G7전극에는 6∼10KV의 등전위의 전압(V2)이 인가되는 한편, G8전극에는 20KV의 고전압(V3)가 인가되도록 되어 있다. 여기에서 상기와 같은 전압인가 방식에 따라 G3전극에는 G4전극 및 G5전극 G6전극 G7전극에는 유니포텐셜형 제1보조렌즈 및 제2보조렌즈가 형성된다. 여기에서 제1보조렌즈가 형성되는 G3전극과 G5전극 사이의 축상 공간전압의 분포를 살펴보기로 한다. 상기 G3전극의 빔 출사측으로 부터 G4전극내의 중앙부 사이(Ⅰ)에서 까지의 축상 공간전압은 점점 감소되는 한편 상기 G4전극의 중심부에서 G5전극의 입사측 사이(Ⅱ)에서는 점점 증가하게 된다. 따라서 Ⅰ구간을 통과하는 전자빔은 축 방향의 공간전압이 감소함에 따라 발산하게 되며 또한 Ⅱ구간에서는 축상공간 전압이 증가하게 되어 속도가 증가된다.In the conventional multi-stage focused electron gun, as shown in FIG. 1, a voltage V 1 having an equipotential of 0 to 1 KV is applied to the G 2 electrode, the G 4 electrode, and the G 6 electrode, and the G 3 electrode, the G 5 electrode, An equipotential voltage V 2 of 6 to 10 KV is applied to the G 7 electrode, while a high voltage V 3 of 20 KV is applied to the G 8 electrode. Here, in accordance with the voltage applied in the same way as the electrode G 3 G 4 G 5 electrode and electrode G 6 electrode 7 electrode G, the uni-potential type first auxiliary lens and a second auxiliary lens is formed. Here, the distribution of the axial spatial voltage between the G 3 electrode and the G 5 electrode on which the first auxiliary lens is formed will be described. The axial space voltage is the other hand, the G 4 electrode incident side between (Ⅱ) of G 5 electrode from the center of which is gradually reduced from the side of the beam emitted for the G 3 electrode to at G 4 electrode (Ⅰ) between the central portion in the growing do. Therefore, the electron beam passing through section I diverges as the space voltage in the axial direction decreases, and the velocity increases as the space voltage on the axis increases in section II.

그리고 종래의 전자총은 G3전극의 출사측면 후방에 위치된 각 전극에 형성된 레즈 형성공이 모두 일정하게 형성되어 있으므로 제1보조렌즈를 이루는 전계 분포는 G4전극의 등전위선이 G3의 출사측 렌즈 형성공과 G5전극의 입사측 렌즈 형성공에 깊숙히 침투하게 됨으로써 발산구간(Ⅰ)과 접속구간(Ⅱ)의 전계의 범위가 커지게 된다. 따라서 상기 발산구간(Ⅰ)를 통과하는 전자빔은 G4전극의 전계영향을 받아 급격하게 감속됨과 아울러, 공간전위의 등전위선에 수직 방향의 힘을 받아 발산하게 된다. 그리고 G4전극의 중앙부를 지나면서 다시 접속되게 된다. 즉 빔이 접속구간 Ⅱ를 통과할 때 이 구간에 형성된 등전위에 의한 수직 방향의 힘을 받아 접속되는것이다. 여기에서 음극선관의 포커스특성은 주 렌즈계의 구면수차에 큰 영향을 받게 되는데, 상기의 발산구간에서는 G4전극에 의한 전계의 침투로 말미암아 전자빔이 급격히 감속 및 발산되며, 이에 의해 접속구간 Ⅱ로의 유입되는 전자빔의 입사각이 급격하게 커지게 되는 바람직하지 못한 상태가 되어 좋은 포커스 특성을 얻을 수 없게 된다.In addition, in the conventional electron gun, all of the red-forming holes formed in each electrode positioned behind the emission side of the G 3 electrode are uniformly formed, so that the electric field distribution constituting the first auxiliary lens has an equal potential line of the G 4 electrode at the emission side of G 3 . By penetrating deeply into the lens forming hole and the incident side lens forming hole of the G 5 electrode, the range of the electric field in the diverging section I and the connecting section II becomes large. Therefore, the electron beam passing through the diverging section (I) is rapidly decelerated under the influence of the electric field of the G 4 electrode, and is diverged under a force perpendicular to the equipotential line of the space potential. The connection is made again while passing through the center portion of the G 4 electrode. That is, when the beam passes through the connection section II, it is connected by the force in the vertical direction by the equipotential formed in this section. Here, the focus characteristic of the cathode ray tube is greatly influenced by the spherical aberration of the main lens system. In the diverging section, the electron beam is rapidly decelerated and diverged due to the penetration of the electric field by the G 4 electrode, thereby inducing the inflow into the connecting section II. It becomes an undesirable state that the incident angle of the electron beam becomes large rapidly, and it becomes impossible to obtain a good focus characteristic.

그리고 상기의 G3전극은 두 개의 전극편(G3a)(G3b)으로 이루어진 것으로서 제조가공이 어려운 단점이 있는 동시에 제조원가의 상승 원인이 되는 등 많은 문제점을 안고 있다.In addition, the G 3 electrode is composed of two electrode pieces (G 3 a) (G 3 b) and has a number of problems such as difficulty in manufacturing and cause increase in manufacturing cost.

따라서 본 발명은 전자총의 전극 구조체를 개선하여 전자빔이 발산효과를 적절히 보정함으로써 접속 작용이 향상되고 이에 의하여 포커스 특성이 개선된 것을 특징으로 하는 다단접속형 전자총을 제공함에 그 목적이 있다.Accordingly, an object of the present invention is to provide a multistage connected electron gun, which is characterized by improving the electrode structure of the electron gun to properly correct the divergence effect of the electron beam, thereby improving the focus characteristic.

상기의 목적을 달성하개 위하여 본 발명은, 유니 포텐셜 포커스형 전자렌즈를 이루는 것으로서, 전자빔이 통과하는 순서대로 전치 집속전극, 포커스전극, 후치 집속전극으로 정열되는 최소한의 3개의 전극을 구비하되 상기 포커스전극에 형성된 렌즈형성공보다 상기 전치 집속 전극의 렌즈형성공은 적게 형성하고 후치 집속 전극의 렌즈 형성공은 크게 형성하여 된 점에 그 특징이 있다.In order to achieve the above object, the present invention is to form a unipotential focus type electron lens, provided with at least three electrodes arranged as a pre-focusing electrode, a focusing electrode, a post-focusing electrode in the order that the electron beam passes through the focus The lens forming hole of the pre-focusing electrode is formed less than the lens forming hole formed in the electrode, and the lens-forming hole of the post-focusing electrode is formed larger.

이하 첨부된 도면에 의하여 본 발명을 더욱 상세하게 설명하기로 한다. 제2도 및 제3도에는 본 발명에 따른 다단집속형 전자총이 도시되어 있는바 전치 삼극관부를 이루는 캐소오드, G1전극, G2전극과, 보조렌즈 및 주렌즈계를 이루어 전자빔을 접속 및 가속하는 G3전극, G4전극, G5전극, G6전극 및 G8전극으로 구성되되, 상기 G3전극은 제3도에 도시된 바와같이 하나의 몸체로 된 전극 구조체로 형성되고, 이 전극에 형성된 출사측의 렌즈 형성공(H3)은 상기 G4전극의 렌즈 형성공(H4)보다 작게 형성된다. 그리고 상기 G5전극은, 두 개의 G5a전극과 G5b전극이 하나로 결합되어 이루어지되, G5a전극의 렌즈 형성공(H5a)은G4전극의 렌즈 형성공(H4)보다 크게 형성되는 한편 이와 결합되는 G5b전극의 렌즈 형성공(H5b)은 G4전극의 렌즈 형성공(H4)과 동일하게 된다.Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings. 2 and 3 show a multi-stage focused electron gun according to the present invention, which forms a cathode, a G 1 electrode, a G 2 electrode, an auxiliary lens, and a main lens system for connecting and accelerating an electron beam. It consists of a G 3 electrode, G 4 electrode, G 5 electrode, G 6 electrode and G 8 electrode, the G 3 electrode is formed of an electrode structure of one body as shown in Figure 3, The formed lens forming hole H 3 on the exit side is smaller than the lens forming hole H 4 of the G 4 electrode. And wherein G 5 electrodes, two G 5 a electrode and G 5 b electrodes jidoe done in combination with one, G 5 a electrode of the lenticular success (H 5 a) is a lenticular success of G 4 electrode (H 4) more significantly lenticular success of the G electrode 5 b are the other hand this bond formed (H 5 b) is the same as the lens of the type G 4 electrode success (H 4).

이와 같은 구성은 전자총의 G2전극, G4전극, G6전극에는 0∼10KV의 등전위 전압(V1)을 인가하고 상기 G3,G5, G7전극에는 등전위의 6∼10KV의 포커스전압(V2)를 인가하는 한편 G8전극에는 20∼30KV의 전압(V3)을 인가함이 바람직하다.This configuration applies an equipotential voltage (V 1 ) of 0 to 10 KV to the G 2 , G 4 , and G 6 electrodes of the electron gun, and a focus voltage of 6 to 10 KV of the equipotential to the G 3, G 5 , and G 7 electrodes. It is preferable to apply (V 2 ) while applying a voltage (V 3 ) of 20 to 30 KV to the G 8 electrode.

상기와 같이 구성된 다단집속형 전자총은 G3전극, G4전극, G5전극에 의하여 형성된 유니포텐셜 포커스형 전자렌즈는 발산 쟉용보다는 집속 작용을 향상 시킬 수 있도록 되어 있다. 즉 G3전극의 출사평면에 형성된 렌즈 형성공(H3)을 이에 대향되는 G4전극의 렌즈 형성공(H4)보다 작게 형성 함으로써 G4전극에 의한 전계 침투를 억제하여 전자렌즈의 발산구간(Ⅰ')을 줄일수 있으며, 상기 G4전극의 렌즈 형성공(H4)에 대향되는 G5a전극의 렌즈 형성공(H5a)은 상기 H4렌즈형성공 보다 크게 형성하여 G4전극의 전계가 G5a전극의 렌즈 형성공(H5a)에 침투 될수 있도록 함으로써 집속구간(Ⅱ')은 종래의 집속구간(Ⅱ)보다 크게하여 집속작용을 더욱 증가시킬 수 있는 것이다.The multi-stage focused electron gun configured as described above has a unipotential focus-type electron lens formed by the G 3 electrode, the G 4 electrode, and the G 5 electrode, so that the focusing action can be improved rather than the divergence. That is, by forming the lens forming hole (H 3 ) formed in the emission plane of the G 3 electrode smaller than the lens forming hole (H 4 ) of the G 4 electrode opposite thereto, the penetration of the electron lens by suppressing the electric field penetration by the G 4 electrode (I ′) can be reduced, and the lens forming hole (H 5 a) of the G 5 a electrode opposite to the lens forming hole (H 4 ) of the G 4 electrode is formed larger than the H 4 lens forming hole (G 4). By allowing the electric field of the electrode to penetrate into the lens forming hole H 5 a of the G 5 a electrode, the focusing section II 'is larger than the conventional focusing section II, thereby further increasing the focusing effect.

이와 같은 유니포텐셜형 포커스 전자렌즈를 광학적 등가렌즈로써 더욱 상세하게 설명하면, 상기 Ⅰ'발산 구간은 광학렌즈의 오목렌즈와 같은 작용을 하는것으로서 G2전극과 G3전극 사이에 형성된 프리 포커스렌즈에서 예비 집속된 전자빔이 발산되는 영역이며, 그리고 상기 Ⅱ'집속구간은 광학렌즈의 볼록렌즈와 같은 작용을 할 수 있도록 전계가 형성됨으로써 전술한 Ⅰ'발산구간으로부터 진입된 전자빔을 다시 집속하는 영역인 것이다. 여기에서 상기 발산구간(Ⅰ')에서 발산력이 저감되는 집속구간(Ⅱ')에서는 집속력이 강화되도록 상기와 같은 본 발명에 의해 각 전극의 구조가 개선되어 있는 바, 보다 나은 포커스 특성을 얻을 수 있게 되는 것이다. 그리고 상기의 G3전극은 단일의 몸체를 가진 판상형 전극으로 구성되는 한편 G5a전극은 일정 두께를 갖는 단일 판상 전극으로 제작됨으로써 전극의 평탄도 및 전극 렌즈형성공(H5a) 진원도를 향상시킬 수 있다.In more detail, such a unipotential focus electron lens is described as an optical equivalent lens, and the 'I' diverging section acts like a concave lens of an optical lens, so that a prefocus lens formed between a G 2 electrode and a G 3 electrode is formed. The pre-focused electron beam diverges, and the II 'focusing section is an area for refocusing the electron beam entered from the above-mentioned I' diverging section by forming an electric field to act like a convex lens of the optical lens. . Here, in the focusing section (II ') in which the diverging force is reduced in the diverging section (I'), the structure of each electrode is improved by the present invention as described above so that the focusing force is enhanced, and thus better focus characteristics can be obtained. It will be possible. In addition, the G 3 electrode is composed of a plate-shaped electrode having a single body, while the G 5 a electrode is made of a single plate-shaped electrode having a predetermined thickness, thereby improving electrode flatness and electrode lens forming hole (H 5 a) roundness. You can.

따라서 본 발명은 전자총의 집속 렌즈계에서의 발산력은 적절히 줄이고 집속력은 강화시킴으로써 포커스 특성을 개선할 수 있는 바 선명한 화면을 가진 칼라 음극선관을 실현할 수 있게 된다.Therefore, the present invention can realize a color cathode ray tube with a clear screen, which can improve the focus characteristic by appropriately reducing the divergence force in the focusing lens system of the electron gun.

Claims (1)

전치 삼극관부를 이루는 캐소오드, G1전극, G2전극을 포함하여 최소한 하나의 유니포텐설형 포커스형 전자렌즈를 이루는 다수의 전극을 구비한 것에 있어서, 상기 유니포텐셜형 포커스형 전자렌즈를 이루는 인접된 세개의 전극 중 그 중앙에 위치된 전극의 렌즈형성공(H4)보다 그 전치전극의 렌즈형성공(H3)은 그 직격을 작게 형성하는 한편 그 후치전극의 렌즈형성공(H5a)은 그 직격을 크게 형성하도록 하고, 상기 중앙전극에는 상기 전치 및 후치전극에 비해 낮은 전압을 인가하여 되는 것을 특징으로 하는 다단집속형 전자총.A plurality of electrodes comprising at least one unipotential focus type electron lens including a cathode forming a transposition triode, a G 1 electrode, and a G 2 electrode, wherein the adjacent electrodes constituting the unpotential focus type electron lens are provided. Of the three electrodes, the lens forming hole H 3 of the preelectrode is smaller than the lens forming hole H 4 of the electrode located at the center thereof, and the direct contact is made smaller, while the lens forming hole H 5 a of the post electrode is formed. Is to form a large direct line, and the central electrode is a multi-stage electron gun, characterized in that to apply a lower voltage than the pre and post electrodes.
KR1019890003605A 1988-11-17 1989-03-22 Multi-step focusing electron gun KR920009144B1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1019890003605A KR920009144B1 (en) 1989-03-22 1989-03-22 Multi-step focusing electron gun
US07/349,589 US5015911A (en) 1988-11-17 1989-05-09 Multistep focusing electron gun for cathode ray tube
JP1117185A JPH02152144A (en) 1988-11-17 1989-05-10 Multistage focusing type electron gun for cathode ray tube
DE68918405T DE68918405T2 (en) 1988-11-17 1989-05-10 Multi-step focusing electron generation system for cathode ray tubes.
EP89108412A EP0369101B1 (en) 1988-11-17 1989-05-10 Multistep focusing electron gun for cathode ray tube

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