KR910012327A - e-beam deposition method - Google Patents
e-beam deposition method Download PDFInfo
- Publication number
- KR910012327A KR910012327A KR1019890018820A KR890018820A KR910012327A KR 910012327 A KR910012327 A KR 910012327A KR 1019890018820 A KR1019890018820 A KR 1019890018820A KR 890018820 A KR890018820 A KR 890018820A KR 910012327 A KR910012327 A KR 910012327A
- Authority
- KR
- South Korea
- Prior art keywords
- beam deposition
- deposition method
- mesh
- interlocked
- shutter
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
내용 없음No content
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018820A KR920000244B1 (en) | 1989-12-18 | 1989-12-18 | Process for the electrodeposition of e-beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019890018820A KR920000244B1 (en) | 1989-12-18 | 1989-12-18 | Process for the electrodeposition of e-beam |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910012327A true KR910012327A (en) | 1991-08-07 |
KR920000244B1 KR920000244B1 (en) | 1992-01-10 |
Family
ID=19293084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890018820A KR920000244B1 (en) | 1989-12-18 | 1989-12-18 | Process for the electrodeposition of e-beam |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR920000244B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI281691B (en) | 2004-08-23 | 2007-05-21 | Ind Tech Res Inst | Method for manufacturing a quantum-dot element |
-
1989
- 1989-12-18 KR KR1019890018820A patent/KR920000244B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR920000244B1 (en) | 1992-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20080104 Year of fee payment: 17 |
|
LAPS | Lapse due to unpaid annual fee |