KR910008818A - Integrated CMOS circuit - Google Patents

Integrated CMOS circuit Download PDF

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Publication number
KR910008818A
KR910008818A KR1019900016859A KR900016859A KR910008818A KR 910008818 A KR910008818 A KR 910008818A KR 1019900016859 A KR1019900016859 A KR 1019900016859A KR 900016859 A KR900016859 A KR 900016859A KR 910008818 A KR910008818 A KR 910008818A
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KR
South Korea
Prior art keywords
row
channel
rows
transistor
channel transistor
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Application number
KR1019900016859A
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Korean (ko)
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KR0185976B1 (en
Inventor
요세피우스 마리아 베엔드리크 헨드리쿠스
안토니우스 요한네스 마리아 반 덴 엘샤우트 안트레이스
빌렘 하르베르트스 디르크
Original Assignee
프레데릭 얀 스미트
엔. 브이. 필립스 글로아이람펜파브리켄
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Publication of KR910008818A publication Critical patent/KR910008818A/en
Application granted granted Critical
Publication of KR0185976B1 publication Critical patent/KR0185976B1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits
    • H01L27/11803Masterslice integrated circuits using field effect technology
    • H01L27/11807CMOS gate arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Tone Control, Compression And Expansion, Limiting Amplitude (AREA)
  • Logic Circuits (AREA)

Abstract

A gate array circuit comprising a row of consecutively arranged n-channel transistors and an adjacent row of p-channel transistors. Both rows are composed of at least three subrows with two subrows of narrow transistors and one subrow of wide transistors, of which the channel width is at least three times the width of the narrow transistors. The gate electrodes are common to the three subrows. Preferably, the wide subrow is arranged centrally between the narrow subrows. This construction affords the advantage of a very high density and a very high flexibility in designing the functions to be realized.

Description

집적 CMOS 회로Integrated CMOS circuit

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제4도는 제1도에서, 각각 라인 II-II, III-III 및 IV-IV에 따라 자른 회로의 단면도.4 is a cross-sectional view of the circuit in FIG. 1 taken along lines II-II, III-III and IV-IV, respectively.

제5도는 배타적 NOR게이트 (EXC, NOR)의 회로 다이어그램 도시도.5 is a circuit diagram illustration of an exclusive NOR gate (EXC, NOR).

Claims (3)

2개의 로우 전면에 방향에 횡단으로 연장되는 전도체 트랙 형태로 공통 게이트 전극을 가지는 n-채널 MOS 트랜지스터 제1로우 및 인접 병렬 제2로우와, 2개의 로우 전면에 로우 방향에 횡단으로 연장되는 전도체 트랙형태로 공통 게이트 전극을 가지는 P-채널 트랜지스터 제1로우 및 인접 병렬 제2로우가 한면에 제공된 반도체 몸체를 갖고 있는 게이트 배열 형태의 집적 CMOS 회로에 있어서, n-채널 트랜지스터 제1 및 제2로우와 P-채널트랜지스터 제1 및 제2로우 외에도, n-채널 트랜지스터와 P-채널 트랜지스의 (최소한)각각의 하나의 다른 로우가(제3로우로서 표시된)배치되며, 이는 제1및 제2로우에 병렬로 연결되며, n-채널 트랜지스터 제1 및 제2로우의 게이트 전극은 동시에 n-채널 트랜지스터의 제3로우의 게이트 전극을 구성하며 P-채널 트랜지스터의 제1 및 제2로우 게이트 전극은 동시에 P-채널 트랜지스터의 제3로우 게이트 전극을 구성하며, 반면 n-채널 트랜지스터 및 P-채널 트랜지스터 제3로우 트랜지스터 각각은, n-채널 트랜지스터 및 P-채널 트랜지스터 각각의 제1 및 제2로우의 트랜지스터 폭의 적어도 3배인 폭을 가지는 것을 특징으로 하는 집적 CMOS회로.N-channel MOS transistor first row and adjacent parallel second row having a common gate electrode in the form of conductor tracks extending transversely in the direction of the two rows, and conductor tracks extending transversely in the row direction on the two rows in front A gate array type integrated CMOS circuit having a semiconductor body provided with a first row of P-channel transistors having a common gate electrode and a second parallel row adjacent to each other, wherein the n-channel transistors have a first row and a second row. In addition to the P-channel transistors first and second rows, one (at least) each other row of the (at least) of the n-channel transistor and the P-channel transistors is placed (denoted as the third row), which is the first and second rows. Connected in parallel to each other, the gate electrodes of the n-channel transistors first and second rows simultaneously constitute the gate electrodes of the third row of the n-channel transistors, and the first and second gate electrodes of the P-channel transistors. The two low gate electrodes simultaneously constitute the third low gate electrode of the P-channel transistor, while the n-channel transistor and the P-channel transistor each of the third low transistors are the first of each of the n-channel transistor and the P-channel transistor. And a width that is at least three times the width of the transistor in the second row. 제1항에 있어서, n-채널 트랜지스터 제3로우와 P-채널 트랜지스터의 제3로우의 전계효과와 트랜지스터 폭은 각각, n-채널 트랜지스터 제1 및 제2로우와 P-채널 트랜지스터의 제1 및 제2로우 각각의 전계효과 트랜지스터 폭의 적어도 4배인 것을 특징으로 하는 집적 CMOS 회로.2. The field effect and transistor width of the third row of the n-channel transistor and the third row of the P-channel transistor are respectively equal to the first and second rows of the n-channel transistor and the first row of the n-channel transistor and the P-channel transistor. And at least four times the width of each field effect transistor in each of the second rows. 제1항 또는 제2항에 있어서, n-채널 트랜지스터 및 P-채널 트랜지스터의 제3로우 각각은 n-채널 트랜지스터 제1 및 제2로우 사이와 P-채널 트랜지스터 제1 및 제2로우 사이에 배치되는 것을 특징으로 하는 집적 CMOS회로.3. The third row of claim 1 or 2, wherein the third rows of the n-channel transistor and the P-channel transistor are each disposed between the n-channel transistor first and second rows and between the P-channel transistors first and second rows. Integrated CMOS circuit, characterized in that. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019900016859A 1989-10-24 1990-10-22 Integrated cmos circuit KR0185976B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8902629 1989-10-24
NL8902629A NL8902629A (en) 1989-10-24 1989-10-24 INTEGRATED CMOS CIRCUIT.

Publications (2)

Publication Number Publication Date
KR910008818A true KR910008818A (en) 1991-05-31
KR0185976B1 KR0185976B1 (en) 1999-04-15

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Application Number Title Priority Date Filing Date
KR1019900016859A KR0185976B1 (en) 1989-10-24 1990-10-22 Integrated cmos circuit

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EP (1) EP0425032B1 (en)
JP (1) JP3060235B2 (en)
KR (1) KR0185976B1 (en)
AT (1) ATE147543T1 (en)
DE (1) DE69029642T2 (en)
NL (1) NL8902629A (en)
RU (1) RU2025829C1 (en)
UA (1) UA27693C2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5391943A (en) * 1994-01-10 1995-02-21 Mahant-Shetti; Shivaling S. Gate array cell with predefined connection patterns

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60130140A (en) * 1983-12-17 1985-07-11 Toshiba Corp Semiconductor ic device
JPH0695570B2 (en) * 1985-02-07 1994-11-24 三菱電機株式会社 Semiconductor integrated circuit device

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Publication number Publication date
KR0185976B1 (en) 1999-04-15
ATE147543T1 (en) 1997-01-15
RU2025829C1 (en) 1994-12-30
EP0425032A1 (en) 1991-05-02
JP3060235B2 (en) 2000-07-10
JPH03152970A (en) 1991-06-28
NL8902629A (en) 1991-05-16
UA27693C2 (en) 2000-10-16
DE69029642T2 (en) 1997-07-10
EP0425032B1 (en) 1997-01-08
DE69029642D1 (en) 1997-02-20

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