KR910006923Y1 - Electro plating device of an umbrella frame - Google Patents
Electro plating device of an umbrella frame Download PDFInfo
- Publication number
- KR910006923Y1 KR910006923Y1 KR2019890008067U KR890008067U KR910006923Y1 KR 910006923 Y1 KR910006923 Y1 KR 910006923Y1 KR 2019890008067 U KR2019890008067 U KR 2019890008067U KR 890008067 U KR890008067 U KR 890008067U KR 910006923 Y1 KR910006923 Y1 KR 910006923Y1
- Authority
- KR
- South Korea
- Prior art keywords
- plating
- stopper
- energizing
- shaft
- synthetic resin
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
- C25D17/20—Horizontal barrels
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
내용 없음.No content.
Description
제1도는 본 고안의 도금통에 대한 일부분해사시도.1 is a partial exploded view of the plating barrel of the present invention.
제2도는 본 고안의 도금통에 대한 일부단면도.Figure 2 is a partial cross-sectional view of the plating barrel of the present invention.
제3도는 본 고안의 도금통 측면예시도.Figure 3 is a side view of the plating barrel of the present invention.
제4도는 본 고안의 도금실 마개고정구 단면도.4 is a cross-sectional view of the plating chamber stopper fixture of the present invention.
제5도는 본 고안의 사용상태 예시도이다.5 is an exemplary view showing a state of use of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1, 1a : 지지원판 2 : 톱니1, 1a: support disc 2: tooth
3, 3a : 회전축 4 : 통전축3, 3a: rotating shaft 4: energizing shaft
5 : 통전보올 6 : 통전축5: energizing bowl 6: energizing shaft
7 : 리테너 8 : 통전선7: retainer 8: power line
9 : 전극판 10 : 도금통9 electrode plate 10 plating cylinder
10a : 통수공 11 : 마개10a: water pipe 11: plug
11a : 마개 손잡이 12 : 마개압지구11a: stopper handle 12: stopper pressure zone
12a : 연결봉 13 : 코일스프링12a: connecting rod 13: coil spring
14 : 안내공 15 : 피도금체14: guide 15: plated body
16 : 고정보울트 16a : 고정너트16: high information nut 16a: fixing nut
17 : 승강장치 18 : 전해조17 lifting device 18 electrolytic cell
19 : 전해액 20 : 음극19: electrolyte 20: negative electrode
21 : 전원공급축 22 : 통전홈21: power supply shaft 22: energized groove
23 : 양극23: anode
본 고안은 양산살대날 우산살대와 같이 가늘고 긴 금속소재에 전기도금을 실시하기 위해 고안된 전기도금장치에 관한 것으로 보다 구체적인 특징은 도금하고저하는 양산살대나 우산살대를 구획된 도금통속에 분리하여 장착시키고 전해조 일측에 음극을 장치하고 회전축에 양극을 장치하여 도금통을 약간 기울이며 도금하고저하는 소재가 음극에 접촉하여 전기도금이 성취되게한 것인바 이는 도금이 양호하게 되고 도금도중에 소재가 엉키거나 휘어져서 불량도금이 발생되는 것을 방지할수 있게하면서 양질의 도금을 능률적으로 실시할수 있게한 것이다.The present invention relates to an electroplating apparatus designed for electroplating thin metal materials such as umbrella blades for umbrellas. The anode is mounted on one side of the electrolyzer and the anode is mounted on the rotating shaft, so that the plating can be tilted slightly and the plated material is in contact with the cathode to achieve electroplating. The plating is good and the material is entangled or bent during plating. Therefore, it is possible to prevent high quality plating while efficiently preventing poor plating.
종래의 도금장치는 큰 통속에 중간부로 음곡도선을 설치하고 도금할 소재를 대량으로 투입시켜 전해조에 침지시키고 윤동시켜 도금을 실시하도록된 구성이므로 도금될 소재가 도금통내에서 서로 엉키는 율이높아 휘어지거나 변형되는 요소가 많을뿐아니라 음극이 가운데로 위치하므로 양극소재와의 접촉이 불량하여 도금이 잘되지 않고 도금표면이 거칠게 되는 등의 불편이 있었다.Conventional plating equipment is configured to install a negative lead in the middle of a large barrel, and to put a large amount of material to be plated to immerse in the electrolytic cell, and to perform plating by plating, so that the material to be plated is entangled with each other in the plating container. Not only there are many deformable elements but also the cathode is located in the center, so that the contact with the anode material is poor, so that the plating is not good and the plating surface is rough.
본 고안은 위와같은 종래의 결점을 시정하기 위하여 인출한 것으로 이를 도면에 의거가 보다 상세히 설명하면 다음과 같다.The present invention is drawn out to correct the above conventional drawbacks, which will be described in more detail based on the drawings as follows.
외주에 톱니(2)(2a)가 형성되고 양측 중심부로 회전측(3)(3a)이 형성된 합성수지제 지지원판(1)(1a)을 양측으로 배치하여 내측으로 수개의 삽성수지제 도금통(10)을 횡가하여 고정보울트(16)와 너트(16a)를 지지원판 사이에 고정시킨후 각 도금통은 외주에 수개의 통수공(10a)을 뚫고 도금통의 투입구를 일측 지지원판(1a)의 통공부로 돌출시켜 합성수지제 마개(11)를 착설하되 각 마개(11)는 지지원판에 코일스프링(13)으로 장진되게 설치된 마개압지구(12)로써 압지되게 구성시키고 도금통 내측벽에는 전극판(9)을 장치하여 회전축(3) 중심부로 형성된 외부 통전축(6)과 통전선(8)으로 연결시킨후 통전축(6)은 전선공급축(21)의 통전홈(22)에 투입하여 통전보올(5)과 접촉되게 하여 양극(23)을 접속하고 결합부에 방수리테너(7)를 개입시키며 지지원판(1)(1a)의 양측 회전축은 승강장치(17)에 설치하고 전해조에는 음극(21)을 넣고 도금통은 전극판쪽이 낮도록 비스듬히 설치하여 회전시킬 수 있게한 구조이다.The resin support disks (1) (1a) having teeth (2) (2a) formed on the outer circumference and rotating sides (3) (3a) formed on both sides of the center are disposed on both sides, and several insertable resin plating cylinders are placed inwards ( 10) and then the high information bolt 16 and the nut 16a are fixed between the support discs, and each plating tube drills several water holes 10a on the outer circumference thereof, and the inlet of the plating cylinder is connected to one side of the support disc 1a. Protruding through the hole to install a synthetic stopper (11), each stopper 11 is configured to be pressed by a stopper pressure strip 12 installed in the support plate with a coil spring (13) prolonged, and the electrode plate on the inner wall of the plating barrel (9) to the outer conduction shaft (6) formed in the center of the rotary shaft (3) connected to the conduction line (8), the conduction shaft (6) is introduced into the conduction groove (22) of the wire supply shaft (21) The positive electrode 23 is connected by contact with the energizing bowl 5 and the waterproof retainer 7 is connected to the coupling part, and both rotating shafts of the support discs 1 and 1a are It is installed in the elevating device 17, the cathode 21 is put into the electrolytic cell, and the plating can be rotated by installing it at an angle so that the electrode plate side is low.
이와같이된 본 고안은 승강장치를 상승시켜 도금통(10)이 설치된 지지원판(1)(1a)을 인양하여 각 도금통(10)내에 도금하고저하는 소재(15)를 투입하고 투입구를 마개(11)로 막아 승강장치를 작동시켜 지지원판(1)(1a)을 저내조(18)에 장입하여 도금통(10)의 전극판(9) 위치가 투입구보다 약간 낮게 유지시켜 지지원판(1)(1a)을 회전시키면 도금통내의 소재(15)가 전극판(9) 내면으로 접촉되게 정열되면서 전해액이 도금통내에 침입하여 전기도금원리에 의거 도금이 달성되므로 표면이 깨끗한 도금을 실시할 수 있고 각 소재가 엉키거나 굴절될 염려가 없어 로스발생률이 낮은 경제성이었으며 양극은 전기공급축(21)의 통전홈(22)에서 통전보올(5)을 통해 통전축(6)과 접해 전극판(9)에 도통되므로 통전작용이 원활하고 접촉부의 마찰이 부드러운 이점이 이점이있으며 입구에 설치된 방수리테너(7)로 인해 내부에 전해액이 침투될 염려가 없는 안전성이 있으며 도금통(10)과 마개 및 지지원판이 모두 합성수지제이므로 누전이 염려가 없어 필요없이 도금액이 침착되어 허실될 염려가 없는 장점이 있으며 사용하기도 좋은 실용적인 도금장치를 얻는 것이다.In this way, the present invention raises the elevating device to lift the supporting disks (1) (1a) on which the plating cylinders (10) are installed, and put the material (15) to be plated and lowered in each plating cylinder (10) and plug the inlet (11). The support plate (1) (1a) into the low inner tank (18) to keep the position of the electrode plate (9) of the plating vessel (10) slightly lower than the inlet. Rotating) allows the material 15 in the plating barrel to be aligned with the inner surface of the electrode plate 9, and the electrolyte penetrates into the plating chamber, thereby achieving plating according to the electroplating principle. There is no fear of tangling or refraction, so the loss rate is low, and the anode contacts the conduction shaft 6 through the conduction bowl 5 in the conduction groove 22 of the electricity supply shaft 21 to the electrode plate 9. As it is conductive, it has the advantage of smooth conduction and smooth friction of contact. Due to the waterproof retainer (7) installed on the inside, there is no risk of the electrolyte penetrating into the inside, and since the plating container 10, the stopper, and the support disc are all made of synthetic resin, there is no fear of leakage and there is a fear that the plating solution is deposited without loss. There is no merit and there is a practical plating device that is easy to use.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019890008067U KR910006923Y1 (en) | 1989-06-09 | 1989-06-09 | Electro plating device of an umbrella frame |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019890008067U KR910006923Y1 (en) | 1989-06-09 | 1989-06-09 | Electro plating device of an umbrella frame |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR910000759U KR910000759U (en) | 1991-01-23 |
| KR910006923Y1 true KR910006923Y1 (en) | 1991-09-17 |
Family
ID=19287015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019890008067U KR910006923Y1 (en) | 1989-06-09 | 1989-06-09 | Electro plating device of an umbrella frame |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR910006923Y1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102017456B1 (en) * | 2019-04-18 | 2019-10-21 | 한성테크(주) | Cylinder electrode for hard chromium coatings |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102165404B1 (en) | 2019-12-05 | 2020-10-15 | 권태용 | Catch device for wild animals |
-
1989
- 1989-06-09 KR KR2019890008067U patent/KR910006923Y1/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102017456B1 (en) * | 2019-04-18 | 2019-10-21 | 한성테크(주) | Cylinder electrode for hard chromium coatings |
Also Published As
| Publication number | Publication date |
|---|---|
| KR910000759U (en) | 1991-01-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR910008177A (en) | Apparatus and method for electroplating of metal strips | |
| KR910006923Y1 (en) | Electro plating device of an umbrella frame | |
| US3658663A (en) | Method for effecting partial metal plating | |
| CN211057260U (en) | Wafer electroplating machine | |
| US4133738A (en) | Electrode with a graded electrical resistance substrate | |
| CA1158198A (en) | Plating barrel contact | |
| CN214088717U (en) | Horizontal electroplating pool with laterally-pulled anode for wafers | |
| CN109518261A (en) | A kind of electroplating clamp | |
| CN112391668A (en) | Electroplating device for hollow parts | |
| CN209759601U (en) | Electrolytic cell capable of changing working electrode area | |
| JP2807567B2 (en) | Electrode element for storage battery | |
| CN210560844U (en) | Electroplating device for crystalline silicon solar cell electrode | |
| CN211947242U (en) | Electrolytic cell corner conduction optimization device with high stability | |
| US2315272A (en) | Electroplating apparatus | |
| RU14935U1 (en) | CURRENT SUPPLY | |
| CN213232547U (en) | Continuous electrolysis device | |
| CN221588739U (en) | Centrifugal electroplating basket | |
| CN213417059U (en) | Shaft assembly of barrel body of electroplating barrel | |
| CN111496019A (en) | Device for eliminating curved surface deformation of front frame of O L ED display | |
| CN214361785U (en) | Rotary electroplating device | |
| CN221895169U (en) | Electroplating rotary drum and electroplating device | |
| US4946573A (en) | Pump-attached dipole electro-plating barrel | |
| CN215947425U (en) | Novel electrolytic anode lead-free tin bar | |
| CN219470166U (en) | Connection structure for rotating cathode | |
| CN218089863U (en) | Continuous gold-plating corrosion-resistant equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| NORF | Unpaid initial registration fee |