KR910003137A - Metallic material with fluorodynamic layer formed thereon and apparatus using the metallized material - Google Patents

Metallic material with fluorodynamic layer formed thereon and apparatus using the metallized material Download PDF

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Publication number
KR910003137A
KR910003137A KR1019890010370A KR890010370A KR910003137A KR 910003137 A KR910003137 A KR 910003137A KR 1019890010370 A KR1019890010370 A KR 1019890010370A KR 890010370 A KR890010370 A KR 890010370A KR 910003137 A KR910003137 A KR 910003137A
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KR
South Korea
Prior art keywords
metal
metal material
alloy
nickel
copper
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Application number
KR1019890010370A
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Korean (ko)
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KR950012809B1 (en
Inventor
다다히로 오미
마사히로 미끼
마다고로 마에노
히로히사 기구야마
Original Assignee
하시모또 미찌노스께
하시모또 가가꾸 고오교 가부시끼가이샤
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Priority claimed from JP63181225A external-priority patent/JPH02175855A/en
Priority claimed from JP1006892A external-priority patent/JP2867376B2/en
Application filed by 하시모또 미찌노스께, 하시모또 가가꾸 고오교 가부시끼가이샤 filed Critical 하시모또 미찌노스께
Publication of KR910003137A publication Critical patent/KR910003137A/en
Application granted granted Critical
Publication of KR950012809B1 publication Critical patent/KR950012809B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

내용 없음.No content.

Description

불화부동태막이 형성된 금속재료 및 그 금속재료를 사용한 장치Metallic material with fluorodynamic layer formed thereon and apparatus using the metallized material

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명의 1실시예를 나타내는 가스처리장치의 모식도.1 is a schematic diagram of a gas treatment apparatus showing one embodiment of the present invention.

제2도는 반응챔버의 불소화 방법의 1예를 나타내는 모식도.2 is a schematic diagram showing an example of a fluorination method of a reaction chamber.

제3도는, 고순도 N2가스중에서 500℃, 1시간 베어킹 한후 100％F2가스로 350℃, 1∼5시간 불소화한때의 니켈표면의 ESCA 챠트.3 is an ESCA chart of the surface of nickel when fluorinated at 350 ° C. for 1 to 5 hours with 100% F 2 gas after 500 ° C. for 1 hour in high purity N 2 gas.

Claims (7)

금속표면의 적어도 1부분에, 화학양론비를 만족하는 금속불화물을 주성분으로 하는 불화부동태막이 형성되어 있는 것을 특징으로 하는 부동태막의 형성된 금속재료.A metal material formed with a passivation film, wherein at least one portion of the metal surface is provided with a fluorinated passive film composed mainly of a metal fluoride having a stoichiometric ratio. 제1항에 있어서, 거울같이 매끈매끈하게된 금속표면에, 상기한 불화부동태막을 형성시키는 것을 특징으로 하는 부동태막의 형성된 금속재료.2. The metal material as set forth in claim 1, wherein said fluorinated passive film is formed on a mirror-smooth metal surface. 제1항에 있어서, 언급된 금속이 니켈, 니켈합금, 알루미늄, 알루미늄합금, 구리, 구리합금 및 크롬 가운데 시의 적어도 1종인 것을 특징으로 하는 부동태막의 형성된 금속재료.2. The formed metal material of the passivation film according to claim 1, wherein the metal mentioned is at least one of nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy and chromium. 제1항에 있어서, 언급된 금속재료가 기재로되는 물질표면에 니켈, 니켈합금, 알루미늄, 알루미늄합금, 구리, 구리합금 및 크롬가운데서의 적어도 1종의 금속막이 형성된 것을 특징으로 하는 부동태막의 형성된 금속재료.The metal formed of the passivation film according to claim 1, wherein at least one metal film of nickel, nickel alloy, aluminum, aluminum alloy, copper, copper alloy and chromium is formed on the surface of the material on which the mentioned metal material is based. material. 제1항, 제2항 제3항 및 제4항에 기재한 금속재료를 장치의 구성부분의 적어도 1부분에 사용한 것을 특징으로 하는 금속재료를 사용한 장치.An apparatus using a metal material, wherein the metal material according to any one of claims 1, 2 and 3 is used for at least one part of a component part of the device. 제5항에 있어서, 언급된 장치가 가스 처리장치에 해당하는 금속재료를 사용한 장치.An apparatus according to claim 5, wherein the apparatus mentioned above uses a metal material corresponding to the gas treatment apparatus. 제6항에 있어서, 언급된 장치가 가스저장용, 가스배송용 또는 가스반응장치인 금속재료를 사용한 장치.7. An apparatus according to claim 6, wherein the apparatus mentioned is for gas storage, gas delivery or gas reaction apparatus. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019890010370A 1988-07-20 1989-07-20 Metal material with film passivated by fluorination and apparatus composed of the metal material KR950012809B1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP181225/1988 1988-07-20
JP63181225A JPH02175855A (en) 1988-07-20 1988-07-20 Metallic material having formed fluorinated passive state film and device using its metallic material
JP31263988 1988-12-09
JP312639/1988 1988-12-09
JP1006892A JP2867376B2 (en) 1988-12-09 1989-01-13 Metal material having fluorinated passivation film formed thereon, gas apparatus using the metal material, and method of forming fluorinated passivation film
JP6892/1989 1989-01-13

Publications (2)

Publication Number Publication Date
KR910003137A true KR910003137A (en) 1991-02-27
KR950012809B1 KR950012809B1 (en) 1995-10-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010370A KR950012809B1 (en) 1988-07-20 1989-07-20 Metal material with film passivated by fluorination and apparatus composed of the metal material

Country Status (1)

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KR (1) KR950012809B1 (en)

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KR950012809B1 (en) 1995-10-21

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