KR900018414A - 촉매화된 하이드로퀴논을 사용하여 부식제 증발기의 부식을 방지하는 방법 - Google Patents
촉매화된 하이드로퀴논을 사용하여 부식제 증발기의 부식을 방지하는 방법 Download PDFInfo
- Publication number
- KR900018414A KR900018414A KR1019890006810A KR890006810A KR900018414A KR 900018414 A KR900018414 A KR 900018414A KR 1019890006810 A KR1019890006810 A KR 1019890006810A KR 890006810 A KR890006810 A KR 890006810A KR 900018414 A KR900018414 A KR 900018414A
- Authority
- KR
- South Korea
- Prior art keywords
- corrosion
- hydroquinone
- evaporator
- ppm
- prevent
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F14/00—Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/06—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in markedly alkaline liquids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01D—COMPOUNDS OF ALKALI METALS, i.e. LITHIUM, SODIUM, POTASSIUM, RUBIDIUM, CAESIUM, OR FRANCIUM
- C01D1/00—Oxides or hydroxides of sodium, potassium or alkali metals in general
- C01D1/04—Hydroxides
- C01D1/42—Concentration; Dehydration
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (3)
- 수성 시스템의 공급수에 하이드로퀴논 및 피로갈롤을 각각 0.5내지 1.5ppm 및 0.055내지 0.165ppm 함유하는 제제를 기함을 특징으로 하여, 상기 시스템 중에 부식제 용액을 함유하는 부식제 증발기의 금속 부식을 방지하는 방법.
- 제1항에 있어서, 부식제 용액이 28내지 32%활성 수산화나트륨이고, 금속을 니켈, 강철 및 니켈합금 중에서 선택하며, 하이드로퀴논 및 피로갈롤이 각각 0.5ppm 및 0.055ppm으로 존재하는 방법.
- 제2항에 있어서, 금속이 니켈인 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19719988A | 1988-05-23 | 1988-05-23 | |
| US197,199 | 1988-05-23 | ||
| US29587189A | 1989-01-11 | 1989-01-11 | |
| US295,871 | 1989-01-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR900018414A true KR900018414A (ko) | 1990-12-21 |
Family
ID=26892643
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890006810A KR900018414A (ko) | 1988-05-23 | 1989-05-22 | 촉매화된 하이드로퀴논을 사용하여 부식제 증발기의 부식을 방지하는 방법 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0343712A1 (ko) |
| JP (1) | JPH0222487A (ko) |
| KR (1) | KR900018414A (ko) |
| AU (1) | AU3501489A (ko) |
| NZ (1) | NZ229120A (ko) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03130710U (ko) * | 1990-04-17 | 1991-12-27 | ||
| JPH07320611A (ja) * | 1994-05-23 | 1995-12-08 | Hitachi Ltd | ガス絶縁開閉装置 |
| US6344157B1 (en) * | 1999-02-12 | 2002-02-05 | National Starch And Chemical Investment Holding Corporation | Conductive and resistive materials with electrical stability for use in electronics devices |
| US6583201B2 (en) | 2001-04-25 | 2003-06-24 | National Starch And Chemical Investment Holding Corporation | Conductive materials with electrical stability for use in electronics devices |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH337186A (de) * | 1954-08-11 | 1959-03-31 | Ici Ltd | Verfahren zum kontinuierlichen Konzentrieren von Alkalihydroxydlösungen |
| GB1042460A (en) * | 1962-12-27 | 1966-09-14 | Konink Nl Soda Ind Nv | An improved method of evaporating caustic |
| US4282178A (en) * | 1979-11-15 | 1981-08-04 | Vulcan Materials Company | Use of hydrazine compounds as corrosion inhibitors in caustic solutions |
| US4585579A (en) * | 1984-10-01 | 1986-04-29 | Occidental Chemical Corporation | Suppression of corrosion in caustic manufacturing systems |
| DE3668190D1 (de) * | 1985-09-17 | 1990-02-15 | Calgon Corp | Verfahren zur korrosionsinhibierung in dampfkesseln und zusammensetzungen hierfuer. |
-
1989
- 1989-05-15 NZ NZ229120A patent/NZ229120A/xx unknown
- 1989-05-17 JP JP1121640A patent/JPH0222487A/ja active Pending
- 1989-05-17 EP EP89201232A patent/EP0343712A1/en not_active Withdrawn
- 1989-05-19 AU AU35014/89A patent/AU3501489A/en not_active Abandoned
- 1989-05-22 KR KR1019890006810A patent/KR900018414A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0222487A (ja) | 1990-01-25 |
| NZ229120A (en) | 1991-09-25 |
| EP0343712A1 (en) | 1989-11-29 |
| AU3501489A (en) | 1989-11-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |