KR900012219U - 알루미늄 증착장치 - Google Patents
알루미늄 증착장치Info
- Publication number
- KR900012219U KR900012219U KR2019880021432U KR880021432U KR900012219U KR 900012219 U KR900012219 U KR 900012219U KR 2019880021432 U KR2019880021432 U KR 2019880021432U KR 880021432 U KR880021432 U KR 880021432U KR 900012219 U KR900012219 U KR 900012219U
- Authority
- KR
- South Korea
- Prior art keywords
- deposition equipment
- aluminum deposition
- aluminum
- equipment
- deposition
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/88—Vessels; Containers; Vacuum locks provided with coatings on the walls thereof; Selection of materials for the coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/88—Coatings
- H01J2229/882—Coatings having particular electrical resistive or conductive properties
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019880021432U KR910001804Y1 (ko) | 1988-12-24 | 1988-12-24 | 알루미늄 증착장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019880021432U KR910001804Y1 (ko) | 1988-12-24 | 1988-12-24 | 알루미늄 증착장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900012219U true KR900012219U (ko) | 1990-07-03 |
KR910001804Y1 KR910001804Y1 (ko) | 1991-03-28 |
Family
ID=19282480
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019880021432U KR910001804Y1 (ko) | 1988-12-24 | 1988-12-24 | 알루미늄 증착장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR910001804Y1 (ko) |
-
1988
- 1988-12-24 KR KR2019880021432U patent/KR910001804Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR910001804Y1 (ko) | 1991-03-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20020227 Year of fee payment: 12 |
|
LAPS | Lapse due to unpaid annual fee |