KR900010047A - Deposition equipment - Google Patents

Deposition equipment

Info

Publication number
KR900010047A
KR900010047A KR1019890019521A KR890019521A KR900010047A KR 900010047 A KR900010047 A KR 900010047A KR 1019890019521 A KR1019890019521 A KR 1019890019521A KR 890019521 A KR890019521 A KR 890019521A KR 900010047 A KR900010047 A KR 900010047A
Authority
KR
South Korea
Prior art keywords
deposition equipment
deposition
equipment
Prior art date
Application number
KR1019890019521A
Other languages
Korean (ko)
Other versions
KR930006121B1 (en
Inventor
아끼라 오꾸다
Original Assignee
마쯔시다덴기 산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마쯔시다덴기 산교 가부시기가이샤 filed Critical 마쯔시다덴기 산교 가부시기가이샤
Publication of KR900010047A publication Critical patent/KR900010047A/en
Application granted granted Critical
Publication of KR930006121B1 publication Critical patent/KR930006121B1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019890019521A 1988-12-27 1989-12-26 Vapor deposition device KR930006121B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP88332888A JPH02175871A (en) 1988-12-27 1988-12-27 Vapor deposition device
JP63-332888 1988-12-27

Publications (2)

Publication Number Publication Date
KR900010047A true KR900010047A (en) 1990-07-06
KR930006121B1 KR930006121B1 (en) 1993-07-07

Family

ID=18259922

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890019521A KR930006121B1 (en) 1988-12-27 1989-12-26 Vapor deposition device

Country Status (2)

Country Link
JP (1) JPH02175871A (en)
KR (1) KR930006121B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4516304B2 (en) * 2003-11-20 2010-08-04 株式会社アルバック Winding type vacuum deposition method and winding type vacuum deposition apparatus
WO2007148539A1 (en) * 2006-06-23 2007-12-27 Ulvac, Inc. Take up type vacuum vapor deposition device
JP2010163693A (en) * 2010-04-12 2010-07-29 Ulvac Japan Ltd Winding type vacuum deposition method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6130669A (en) * 1984-07-24 1986-02-12 Matsushita Electric Ind Co Ltd Production of thin metallic film

Also Published As

Publication number Publication date
JPH02175871A (en) 1990-07-09
KR930006121B1 (en) 1993-07-07

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060626

Year of fee payment: 14

LAPS Lapse due to unpaid annual fee