KR900010046A - Substrate temperature control device - Google Patents

Substrate temperature control device

Info

Publication number
KR900010046A
KR900010046A KR1019890019522A KR890019522A KR900010046A KR 900010046 A KR900010046 A KR 900010046A KR 1019890019522 A KR1019890019522 A KR 1019890019522A KR 890019522 A KR890019522 A KR 890019522A KR 900010046 A KR900010046 A KR 900010046A
Authority
KR
South Korea
Prior art keywords
control device
temperature control
substrate temperature
substrate
temperature
Prior art date
Application number
KR1019890019522A
Other languages
Korean (ko)
Other versions
KR930006120B1 (en
Inventor
토시유끼 스에미쯔
마사히데 요꼬야마
히데토시 카와
Original Assignee
마쯔시다 덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마쯔시다 덴기산교 가부시기가이샤 filed Critical 마쯔시다 덴기산교 가부시기가이샤
Publication of KR900010046A publication Critical patent/KR900010046A/en
Application granted granted Critical
Publication of KR930006120B1 publication Critical patent/KR930006120B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
KR1019890019522A 1988-12-27 1989-12-26 Substrate temperature controller KR930006120B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63332907A JP2987838B2 (en) 1988-12-27 1988-12-27 Substrate cooling device
JP63-332907 1988-12-27

Publications (2)

Publication Number Publication Date
KR900010046A true KR900010046A (en) 1990-07-06
KR930006120B1 KR930006120B1 (en) 1993-07-07

Family

ID=18260136

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890019522A KR930006120B1 (en) 1988-12-27 1989-12-26 Substrate temperature controller

Country Status (2)

Country Link
JP (1) JP2987838B2 (en)
KR (1) KR930006120B1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005082837A (en) * 2003-09-05 2005-03-31 Shin Meiwa Ind Co Ltd Vacuum film deposition method and apparatus, and filter manufactured by using the same
JP5055801B2 (en) * 2006-03-23 2012-10-24 富士通セミコンダクター株式会社 Sputtering apparatus and sputtering method
US7593096B2 (en) * 2006-05-15 2009-09-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101659414B1 (en) * 2014-03-11 2016-09-23 주식회사 삼원진공 sputter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3787390T2 (en) * 1986-04-04 1994-06-16 Materials Research Corp Cathode and target arrangement for a coating device for atomization.
JPH0288771A (en) * 1988-09-22 1990-03-28 Kawasaki Steel Corp Strip temperature controller in continuous dry-plating equipment

Also Published As

Publication number Publication date
KR930006120B1 (en) 1993-07-07
JPH02175869A (en) 1990-07-09
JP2987838B2 (en) 1999-12-06

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Legal Events

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E902 Notification of reason for refusal
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Payment date: 20010627

Year of fee payment: 9

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