KR900006907A - Voltage supply circuit - Google Patents

Voltage supply circuit

Info

Publication number
KR900006907A
KR900006907A KR1019890014725A KR890014725A KR900006907A KR 900006907 A KR900006907 A KR 900006907A KR 1019890014725 A KR1019890014725 A KR 1019890014725A KR 890014725 A KR890014725 A KR 890014725A KR 900006907 A KR900006907 A KR 900006907A
Authority
KR
South Korea
Prior art keywords
supply circuit
voltage supply
voltage
circuit
supply
Prior art date
Application number
KR1019890014725A
Other languages
Korean (ko)
Other versions
KR0169095B1 (en
Inventor
히데끼 아라까와
Original Assignee
소니 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 소니 가부시끼가이샤 filed Critical 소니 가부시끼가이샤
Publication of KR900006907A publication Critical patent/KR900006907A/en
Application granted granted Critical
Publication of KR0169095B1 publication Critical patent/KR0169095B1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
KR1019890014725A 1988-10-25 1989-10-14 Voltage supply circuit KR0169095B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63270254A JPH02115361A (en) 1988-10-25 1988-10-25 Sputtering film formation
JP270524 1988-10-25

Publications (2)

Publication Number Publication Date
KR900006907A true KR900006907A (en) 1990-05-09
KR0169095B1 KR0169095B1 (en) 1999-02-01

Family

ID=17483684

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890014725A KR0169095B1 (en) 1988-10-25 1989-10-14 Voltage supply circuit

Country Status (2)

Country Link
JP (1) JPH02115361A (en)
KR (1) KR0169095B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8679301B2 (en) 2007-08-01 2014-03-25 HGST Netherlands B.V. Repeatability for RF MgO TMR barrier layer process by implementing Ti pasting
CN104411860B (en) * 2012-06-20 2017-07-28 国立研究开发法人科学技术振兴机构 The manufacture method of the film of C12A7 electron compounds and the film of C12A7 electron compounds
CN110408905B (en) 2018-04-28 2021-01-08 北京北方华创微电子装备有限公司 Sputtering method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635001B2 (en) * 1973-08-04 1981-08-14
JPS6012129A (en) * 1983-06-17 1985-01-22 テキサス・インスツルメンツ・インコ−ポレイテツド Anneal treatment of polysilicone membrane

Also Published As

Publication number Publication date
JPH02115361A (en) 1990-04-27
KR0169095B1 (en) 1999-02-01

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20040914

Year of fee payment: 7

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