KR900005847B1 - Electrolytic coating method of tungsten electrode - Google Patents
Electrolytic coating method of tungsten electrode Download PDFInfo
- Publication number
- KR900005847B1 KR900005847B1 KR1019880006442A KR880006442A KR900005847B1 KR 900005847 B1 KR900005847 B1 KR 900005847B1 KR 1019880006442 A KR1019880006442 A KR 1019880006442A KR 880006442 A KR880006442 A KR 880006442A KR 900005847 B1 KR900005847 B1 KR 900005847B1
- Authority
- KR
- South Korea
- Prior art keywords
- tungsten electrode
- electrode
- electrolytic
- coating method
- electrolytic coating
- Prior art date
Links
- 0 C1C2C1C*C2 Chemical compound C1C2C1C*C2 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Abstract
Description
제1도는 종래의 초고압 수은등에서 볼 수 있는 벌브와 텅스텐 전극 사이의 단층 확대도.1 is an enlarged tomographic view of a bulb and a tungsten electrode found in a conventional ultra-high pressure mercury lamp.
제2도는 본 발명에 이용되는 전해장치의 개략도.2 is a schematic diagram of an electrolytic apparatus used in the present invention.
제3도는 본 발명의 전해연마에 있어서 전해욕 전압에 따른 양극 전류의 변화를 나타내는 그래프.3 is a graph showing the change of the anode current according to the electrolytic bath voltage in the electropolishing of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 전해조 3 : 교반기1: electrolyzer 3: agitator
4 : 전원공급장치 5 : 텅스텐전극4 power supply 5 tungsten electrode
6 : 구리전극6: copper electrode
본 발명은 텅스덴 전극의 표면처리 방법에 관한 것으로서, 보다 상세하게는 나트륨 등, 수은 등과 같이 초고압으로 유지되는 전등의 텅스텐 전극표면을 평활히 하는 표면처리 방법에 관한 것이다.The present invention relates to a tungsten electrode surface treatment method, and more particularly to a surface treatment method for smoothing the surface of the tungsten electrode, such as sodium, mercury, etc., maintained at a high pressure.
전등에 있어서 텅스텐 전극은 스템측에서 벌브 넥크에 의해 둘러싸여 밀봉되어 진다. 이 경우에 텅스텐전극과 밀봉 유리 사이의 접촉상태는 전등의 성능과 수명에 직접적인 영향을 주게된다.In the lamp, the tungsten electrode is sealed by a bulb neck on the stem side. In this case, the contact state between the tungsten electrode and the sealing glass directly affects the performance and life of the lamp.
텅스텐 전극과 밀봉 유리 사이의 접촉상태를 살펴보면, 제1도의 도시와 같이 텅스텐 전극(A)과 밀봉 유리(B)는 상호 요철면을 형성한 채로 접속하고 있어서, 양자 사이에는 항시 미세간극이 존재하게 된다.Looking at the contact state between the tungsten electrode and the sealing glass, as shown in FIG. 1, the tungsten electrode A and the sealing glass B are connected with the uneven surface formed therebetween, so that there is always a minute gap between them. do.
이 미세간극은 일반 전등에서는 그다지 큰 문제를 일으키지 않는 것이므로 무시되어도 좋으나, 초고압전등에 있어서는 내압 누출 통로가 되어 수명의 단축화 및 심한 경우에는 전등의 파손까지 초래하게 된다.This microgap may be ignored because it does not cause a great problem in a general lamp, but in an ultra high voltage lamp, it becomes a breakdown passage of internal pressure, resulting in a shortened life and, in severe cases, even a lamp failure.
한편, 상술한 미세간극의 형성은 텅스텐 전극의 표면이 요철상을 이루고 있는 그대로 밀봉 유리에 의해 밀봉되어짐에 따라 생기게 되는 것으로, 텅스텐 전극의 표면을 평활히 하여 주면 해결할 수 있는 것으로 알려져 있다.On the other hand, the above-mentioned formation of the microgap is caused by being sealed by the sealing glass as it is, and the surface of the tungsten electrode is irregular, and is known to be solved by smoothing the surface of the tungsten electrode.
그런데 주지된 바와 같이 초고압 전등에 사용되는 텅스텐 전극은 직경이 0.005cm 정도의 미세한 크기이므로 그 표면처리가 쉽지 않다는 문제를 안고 있다.However, as is well known, the tungsten electrode used for the ultra-high voltage lamp has a problem that its surface treatment is not easy because its diameter is about 0.005 cm in size.
본 발명은 상기한 문제를 해결하기 위하여, 텅스텐 전극을 전해하여 평활히 할 수 있는 표면처리 방법을 제공함에 그 목적이 있다.In order to solve the above problems, an object of the present invention is to provide a surface treatment method that can be smoothed by electrolytic tungsten electrode.
본 발명의 주된 특징으로 텅스텐 전극을 전해함에 있어서 전해 전각의 침적길이와 앙 전극간의 거리 및 전해욕전압, 전류밀도 그리고 통전시간을 일정치로 하여 행함에 있다.The main feature of the present invention is to conduct a tungsten electrode with a fixed value of the deposition length of the electrolytic full width, the distance between the electrode and the electrolytic bath voltage, the current density, and the energization time.
본 발명에서 사용될 수 있는 전해액은 HNO3-HF, Na OH, KOH 용액 등이 있고, 바람직하게는 5% Na OH 용액이 좋은 결과를 나타냈다. 또, 전해전극은 +측에 텅스텐 전극을 연결하고, -측에 구리전극을 연결하는 것이며, 이 경우에 있어서 양 전해전극간의 거리와 침적길이에 따라 전류가 변화하므로 유의해야 한다.The electrolyte solution that can be used in the present invention is HNO 3 -HF, Na OH, KOH solution and the like, preferably 5% Na OH solution showed good results. In addition, the electrolytic electrode is to connect a tungsten electrode to the + side and a copper electrode to the-side, and in this case, care should be taken because the current changes depending on the distance between the electrolytic electrodes and the deposition length.
한편, 양호한 평활도가 나타나는 전류치는 0.45A에서 전류밀도는 0.78-0.86A/cm2범위일 때 였으며, 이때의 인가전압은 5-7V 범위로 된다. 또, 전해전극간의 거리는 6cm, 전극의 침적길이 3.5cm로 하였을 때 가장 바람직한 전류밀도를 얻을 수 있었다.On the other hand, the current value exhibiting good smoothness was at 0.45A when the current density was in the range of 0.78-0.86A / cm 2 , and the applied voltage was in the range of 5-7V. The most preferable current density was obtained when the distance between the electrolytic electrodes was 6 cm and the deposition length of the electrode was 3.5 cm.
전압인가 시간도 텅스텐 전극의 평활도에 직접적인 영향을 주는 인자로 되며, 본 발명에서는 15-20초 사이에서 바람직한 평활도를 얻을 수 있었고, 그 이상에서는 두께 감소 현상이 나타났다.The voltage application time is also a factor directly affecting the smoothness of the tungsten electrode. In the present invention, a smoothness is obtained between 15 and 20 seconds, and a thickness reduction phenomenon is observed.
이하 본 발명을 첨부 도면 제2도 및 제3도를 참조하여 실시예로서 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings, FIGS. 2 and 3.
[실시예]EXAMPLE
전해조(1)에 5% Na OH 용액을 전해액(2)으로 하여 넣어두고, 이 전해액(2)을 교반봉(3)으로 서서히 교반시키면서, 전원 공급장치(4)의 +측에 텅스텐 전극(5)을 또한 -측에 구리전극(6)을 접속시킨 다음, 이들 양 전극(5)(6)을 전해액(2)내로 3.5cm 정도 침적하여 놓는다. 이때의 텅스텐전극(5)은 직경 0.05cm의 크기로 된 몇 개의 시료를 준비하여 둔다. 이들 시료는 전해시의 조건 변경에 따라 일련번호를 부여한다.A 5% Na OH solution is placed in the electrolytic cell 1 as the electrolyte solution 2, and the tungsten electrode 5 is placed on the + side of the power supply device 4 while gradually stirring the electrolyte solution 2 with the stirring rod 3. ), And the
전해는 양 전극(5)(6)이 흔들리지 않는 상태가 되도록 서서히 교반봉(3)을 구동시킨다. 시료별 전해조건가 그 결과는 다음 표와 같이 나타났다.Electrolysis gradually drives the stirring rod 3 so that both
[표][table]
또한, 전해액의 농도를 10% Na OH로 교체하여 동일할 실험을 행한 결과, 전극의 평활면이 생성되지 않았고, 인가전압에 따른 전류의 변화는 제3도의 그래프와 같이 나타났다.In addition, the same experiment was performed by replacing the concentration of the electrolyte with 10% Na OH, and no smooth surface of the electrode was generated.
상술한 실시예에 의하여 텅스덴 전극의 표면처리는 전해시의 인가전압과 통전시간에 밀접한 관계가 있음을 알 수 있다.According to the above embodiment, it can be seen that the surface treatment of the tungsten electrode has a close relationship with the applied voltage during electrolysis and the energization time.
그러므로 본 발명에서 바람직한 인가전압치는 전류치가 0.45A에서 전류밀도 0.78-0.86A/cm2범위로 되는 5-7V 범위로 또한 통전시간은 15-20초로 제한한다.Therefore, in the present invention, the applied voltage value is preferably in the range of 5-7V, in which the current value is 0.45A to the current density of 0.78-0.86A / cm 2 , and the energization time is limited to 15-20 seconds.
이와 같이 표면 처리된 텅스텐 전극은 그 평활면에 의해 밀봉 유리와 긴밀하게 접촉될 수 있어서, 초고압전등의 사용수명을 연장시켜주는 이점을 나타낸다.The surface-treated tungsten electrode can be in intimate contact with the sealing glass by the smooth surface thereof, thereby providing an advantage of extending the service life of an ultrahigh voltage lamp.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019880006442A KR900005847B1 (en) | 1988-05-31 | 1988-05-31 | Electrolytic coating method of tungsten electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019880006442A KR900005847B1 (en) | 1988-05-31 | 1988-05-31 | Electrolytic coating method of tungsten electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR890017392A KR890017392A (en) | 1989-12-16 |
| KR900005847B1 true KR900005847B1 (en) | 1990-08-13 |
Family
ID=19274807
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019880006442A KR900005847B1 (en) | 1988-05-31 | 1988-05-31 | Electrolytic coating method of tungsten electrode |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR900005847B1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5583985B2 (en) * | 2010-02-19 | 2014-09-03 | 住友電気工業株式会社 | Metal laminated structure |
-
1988
- 1988-05-31 KR KR1019880006442A patent/KR900005847B1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR890017392A (en) | 1989-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4236992A (en) | High voltage electrolytic cell | |
| US4316787A (en) | High voltage electrolytic cell | |
| ES2149491T3 (en) | ELECTROLYTIC PROCEDURE FOR THE CLEANING OF ELECTROCONDUCTIVE SURFACES. | |
| Pajkossy et al. | Impedance of fractal blocking electrodes | |
| US2964453A (en) | Etching bath for copper and regeneration thereof | |
| KR900005847B1 (en) | Electrolytic coating method of tungsten electrode | |
| MY123861A (en) | Process and device for electrolytic pickling of metal strips | |
| EP0318442A2 (en) | Electrode structure | |
| Cachet et al. | Influence of perfluorinated and hydrogenated surfactants upon hydrogen evolution on gold electrodes | |
| US20190189312A1 (en) | Pretreatment of Thick-Film Aluminum Electrode for Metal Plating | |
| DE3168559D1 (en) | Process and apparatus for treating photographic baths | |
| KR940013301A (en) | Method of manufacturing metal foil by electrolysis | |
| KR100889488B1 (en) | Manufacturing method of etchant based on alcl3 and hydrochloric acid electrolyte using ac electrolytic etching | |
| KR100516484B1 (en) | Plating apparatus having a plurality of power supply and plating method using the same | |
| Naneva et al. | Zero charge potential and structure of the electric double layer of the (0001) face of a cadmium single crystal in NaF solution | |
| ES8302121A1 (en) | Method of generating halogen, an electrode-membrane assembly, an electrolytic cell and a semipermeable ion-exchange membrane for said method. | |
| US3291709A (en) | Dry method of forming a silver chloride electrode having silver filaments from surface to surface | |
| SU1018839A1 (en) | Method of dimensional electrochemical working of tungsten and tungsten-base alloys | |
| US3846260A (en) | Tantalum pellet system and methods of making and using the same | |
| Vuković et al. | Electrochemical Investigation of an Electrodeposited and Thermally Treated Ruthenium Electrode in Alkaline Solution | |
| KR950013598B1 (en) | Method for treating a surface of aluminum or aluminum alloy | |
| JPS62222097A (en) | Oxide film coated tungsten wire and its production | |
| GB523322A (en) | Improvements in and relating to methods of and apparatus for coating stainless steelsurfaces | |
| US4892630A (en) | Process for the passivating anodization of copper in a medium of molten fluorides, and use for the protection of copper parts of fluorine electrolysers | |
| JPH0419019A (en) | Manufacture of probe |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| G160 | Decision to publish patent application | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20020730 Year of fee payment: 13 |
|
| LAPS | Lapse due to unpaid annual fee |