KR890700176A - 선택적 도금장치 및 이에 사용되는 양극 조립체 - Google Patents
선택적 도금장치 및 이에 사용되는 양극 조립체Info
- Publication number
- KR890700176A KR890700176A KR1019880701020A KR880701020A KR890700176A KR 890700176 A KR890700176 A KR 890700176A KR 1019880701020 A KR1019880701020 A KR 1019880701020A KR 880701020 A KR880701020 A KR 880701020A KR 890700176 A KR890700176 A KR 890700176A
- Authority
- KR
- South Korea
- Prior art keywords
- assembly used
- anode assembly
- plating device
- selective plating
- selective
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/026—Electroplating of selected surface areas using locally applied jets of electrolyte
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US946,401 | 1986-12-23 | ||
US06/946,401 US4687562A (en) | 1986-12-23 | 1986-12-23 | Anode assembly for selectively plating electrical terminals |
US06/946,467 US4690747A (en) | 1986-12-23 | 1986-12-23 | Selective plating apparatus |
US946,467 | 1986-12-23 | ||
PCT/US1987/003193 WO1988004699A2 (en) | 1986-12-23 | 1987-12-04 | Improved selective plating apparatus and anode assembly therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890700176A true KR890700176A (ko) | 1989-03-10 |
KR950006837B1 KR950006837B1 (ko) | 1995-06-23 |
Family
ID=27130237
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019880701020A KR950006837B1 (ko) | 1986-12-23 | 1987-12-04 | 선택적 도금장치 및 이에 사용되는 양극 조립체 |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP0294426B1 (ko) |
JP (1) | JP2654443B2 (ko) |
KR (1) | KR950006837B1 (ko) |
DE (2) | DE3788287T2 (ko) |
WO (1) | WO1988004699A2 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115976617A (zh) * | 2022-11-23 | 2023-04-18 | 西安空间无线电技术研究所 | 一种辅助阳极及铝合金多弯波导零件镀银工艺方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4473445A (en) * | 1983-12-22 | 1984-09-25 | Amp Incorporated | Selectively plating interior surfaces of loose piece electrical terminals |
-
1987
- 1987-12-04 JP JP63500695A patent/JP2654443B2/ja not_active Expired - Lifetime
- 1987-12-04 WO PCT/US1987/003193 patent/WO1988004699A2/en active IP Right Grant
- 1987-12-04 DE DE3788287T patent/DE3788287T2/de not_active Expired - Fee Related
- 1987-12-04 EP EP88900318A patent/EP0294426B1/en not_active Expired - Lifetime
- 1987-12-04 DE DE8888900318T patent/DE3778884D1/de not_active Expired - Fee Related
- 1987-12-04 KR KR1019880701020A patent/KR950006837B1/ko not_active IP Right Cessation
- 1987-12-04 EP EP90202904A patent/EP0423904B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR950006837B1 (ko) | 1995-06-23 |
DE3788287D1 (de) | 1994-01-05 |
EP0423904A1 (en) | 1991-04-24 |
DE3788287T2 (de) | 1994-06-30 |
JPH01501637A (ja) | 1989-06-08 |
JP2654443B2 (ja) | 1997-09-17 |
DE3778884D1 (de) | 1992-06-11 |
WO1988004699A2 (en) | 1988-06-30 |
EP0294426A1 (en) | 1988-12-14 |
EP0294426B1 (en) | 1992-05-06 |
WO1988004699A3 (en) | 1988-07-28 |
EP0423904B1 (en) | 1993-11-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 19990413 Year of fee payment: 5 |
|
LAPS | Lapse due to unpaid annual fee |