KR890002019A - 8-substituted quinoline carboxylic acid derivatives and preparation method thereof - Google Patents

8-substituted quinoline carboxylic acid derivatives and preparation method thereof Download PDF

Info

Publication number
KR890002019A
KR890002019A KR1019870006875A KR870006875A KR890002019A KR 890002019 A KR890002019 A KR 890002019A KR 1019870006875 A KR1019870006875 A KR 1019870006875A KR 870006875 A KR870006875 A KR 870006875A KR 890002019 A KR890002019 A KR 890002019A
Authority
KR
South Korea
Prior art keywords
hydrogen
lower alkyl
compound
formula
methyl
Prior art date
Application number
KR1019870006875A
Other languages
Korean (ko)
Inventor
구니요시 마수자와
세이꼬 수주에
게이지 히라이
다까요시 이시자기
Original Assignee
하기하라 히데
교린 세이야꾸 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 하기하라 히데, 교린 세이야꾸 가부시끼 가이샤 filed Critical 하기하라 히데
Priority to KR1019870006875A priority Critical patent/KR890002019A/en
Publication of KR890002019A publication Critical patent/KR890002019A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/48Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
    • C07D215/54Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3
    • C07D215/56Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 3 with oxygen atoms in position 4
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/18Halogen atoms or nitro radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/36Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D215/00Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/38Nitrogen atoms
    • C07D215/40Nitrogen atoms attached in position 8
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Quinoline Compounds (AREA)

Abstract

내용 없음No content

Description

8-위치 치환된 퀴놀론 가복실산 유도체 및 그의 제조방법8-position substituted quinolone diacid derivative and preparation method thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (7)

다음 일반식(Ⅰ)의 화합물, 및 구의 수화물 및 약제학적으로 허용되는 염.The compounds of formula (I) and the hydrates of the spheres and pharmaceutically acceptable salts. 상기식에서 R은 염소, 브롬, 니트로, 시아노, -RO2, -SR2, 또는 -NR2R3(여기에서, R2및 R3는 각각 독립적으로 수소 또는 저급 알킬이다.)를 나타내며 : R1은 에틸, 4-플루오르페닐 또는 2.4-디플루오로 페닐을 나타내고 : Z는 일반식의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는 저급 알콕시카보닐이고, R5는 수소 또는 저급 알킬이다) 또는 일반식의 피롤리딘 그룹(여기에서, n은 0 또는 1 이도, R6는 수소 또는 메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급알킬, 저급아실 또는 알콕시카보닐이다)을 나타내며 : 단, R1이 에틸이고 R이 염소이면, Z는 피페라지노 또는 4-메틸피페라지노가 아니다.Wherein R represents chlorine, bromine, nitro, cyano, -RO 2 , -SR 2 , or -NR 2 R 3 , wherein R 2 and R 3 are each independently hydrogen or lower alkyl. R 1 represents ethyl, 4-fluorophenyl or 2.4-difluoro phenyl: Z is of the general formula A piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl A pyrrolidine group wherein n is 0 or 1 degree, R 6 is hydrogen or methyl, R 7 is hydrogen or lower alkyl, and R 8 is hydrogen, lower alkyl, lower acyl or alkoxycarbonyl Provided that if R 1 is ethyl and R is chlorine, then Z is not piperazino or 4-methylpiperazino. 다음 일반식(Ⅱ)의 화합물을 니트로화시키고, R9이 저급 알킬인 경우에는 생성된 축합 생성물을 가수분해시켜 카복실산 유도체를 생성시킴을 특징으로 하여, 다음일반식(Ⅲ')의 화합물을 제조하는 방법.The compound of formula (II) is nitrated, and when R 9 is lower alkyl, the resulting condensation product is hydrolyzed to produce a carboxylic acid derivative, thereby preparing a compound of formula (III ′) How to. 상기식에서, R1은 에틸, 4-플루오로페닐 또는 2.4-디플루오로 페닐을 나타내고 : Z은 일반식 의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는저급 알콕시카보닐이고, R5는 수소 또는 저급알킬이다). 또는 일반식의 피롤리딘 그룹(여기에서, n은 0또는 1이고, R6은 수소 또는 메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급 알킬, 저급 아실 또는 저급 알콕시카보닐이다)을 나타내며 : R9는 수소 또는 저급 알킬을 나타낸다.Wherein R 1 represents ethyl, 4-fluorophenyl or 2.4-difluoro phenyl: Z is of the general formula The piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl. Or general formula A pyrrolidine group wherein n is 0 or 1, R 6 is hydrogen or methyl, R 7 is hydrogen or lower alkyl, R 8 is hydrogen, lower alkyl, lower acyl or lower alkoxycarbonyl R 9 represents hydrogen or lower alkyl. 다음 일반식(Ⅲ)의 화합물을 환원시키고, R9이 저급 알킬인 경우에는 생성된 생성물을 가수 분해시켜 카복실산 유도체를 생성시킴을 특징으로 하여, 다음 일반식(Ⅳ')의 화합물을 제조 하는 방법.The compound of formula (III) is reduced, and when R 9 is lower alkyl, the resulting product is hydrolyzed to form a carboxylic acid derivative, thereby producing a compound of formula (IV ′) . 상기식에서, R1은 에틸, 4-플루오로페닐 또는 2.4-디플루오로페닐을 나타내고,Z는 일반식 의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는 저급 알콕시카보닐이고, R5는 수소 또는 저급 알킬이다). 또는 일반식의 피롤리딘 그룹(여기에서, n은 0 또는 1이고 R6는수소 또는 메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급 알킬, 저급 아실 또는 저급 알콕시카보닐이다)을 나타내며 : R9는 수소 또는 저급 알킬을 나타낸다.Wherein R 1 represents ethyl, 4-fluorophenyl or 2.4-difluorophenyl, and Z is a general formula A piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl. Or general formula A pyrrolidine group wherein n is 0 or 1, R 6 is hydrogen or methyl, R 7 is hydrogen or lower alkyl, and R 8 is hydrogen, lower alkyl, lower acyl or lower alkoxycarbonyl R 9 represents hydrogen or lower alkyl. 다음 일반식(Ⅳ)의 화합물을 디아조화시키고, 이어서 생성된 화합물을 할로겐화 금속 또는 시안화금속과 반응시키고, R9이 저급알킬인 경우에는 생성된 측합생성물을 가수 분해시켜 카복실산 유도체를 생성시킴을 특징으로 하여, 다음 일반식(Ⅴ')의 화합물을 제조하는 방법.Diazotizing the compound of the following formula (IV), and then reacting the resulting compound with a metal halide or metal cyanide, and when R 9 is lower alkyl, hydrolysis of the resultant side product produces a carboxylic acid derivative. To prepare a compound of formula (V ′). 상기식에서, R1은 에틸, 4-플루오로페닐 또는 2.4-디플루오로페닐을 나타내며 : R10은 염소, 브롬 또는 시아노를 나타내고 : Z는 일반식의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는 저급 알콕시카보닐이고, R5는 수소 또는 저급 아킬이다). 또는 일반식의 피롤리딘 그룹 (여기에서,n은 0 또는 1이고, R6는 수소 또는 메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급알킬, 저급 아실 또는 저급 알콕시카보닐이다)을 나타내며 ; R9는 수소 또는 저급 알킬을 나타내고 : 단, R1이 에틸이고, R10이 염소이면 Z는 피페라지노 또는 4-메틸피페라지노가 아니다.Wherein R 1 represents ethyl, 4-fluorophenyl or 2.4-difluorophenyl: R 10 represents chlorine, bromine or cyano and Z is a general formula The piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl. Or general formula Pyrrolidine group of wherein n is 0 or 1, R 6 is hydrogen or methyl, R 7 is hydrogen or lower alkyl, R 8 is hydrogen, lower alkyl, lower acyl or lower alkoxycarbonyl Represents; R 9 represents hydrogen or lower alkyl, provided that if R 1 is ethyl and R 10 is chlorine then Z is not piperazino or 4-methylpiperazino. 다음 일반식(Ⅵ)의 화합물을 알칼리 금속 알콜레이트, 알칼리 금속 알칼티올레이트, 알칼리 금속 수산화물, 알칼리 금속 황산수소염 또는 일반식 HNR2R3의 아민(여기에서 R2및 R3는 각각 독립적으로 수소 또는 저급알킬을 나타낸다)과 반응 시키고, R9이 저급 알킬인 경우에는 생성된 축합 생성물을 가수분해시켜 카복실산 유도체를 생성시킴을 특징으로 하여, 일반식(Ⅶ)의 화합물을 제조하는 방법.The compound of formula (VI) may be selected from the group consisting of alkali metal alcoholates, alkali metal alkalthiolates, alkali metal hydroxides, alkali metal hydrogen sulphates or amines of the general formula HNR 2 R 3 , wherein R 2 and R 3 are each independently hydrogen Or lower alkyl), and when R 9 is lower alkyl, the resulting condensation product is hydrolyzed to produce a carboxylic acid derivative, thereby producing a compound of formula (VII). 상기식에서 R1은 에틸, 4-플루오로페닐 또는 2,4-디플루오로 페닐을 나타내며 : R13은 -OR2, -SR2또는 -NR2R3(여기에서, R2및 R3는 각각 독립적으로 수소 또는 저급알킬이다)를 나타내고 : Z는 일반식의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는 저급알콕시카보닐이고 R5는 수소 또는 저급알킬이다), 도는 일반식의 피롤리딘 그룹(여기에서,n은 0또는1이고, R6는 수소 또는 메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급 알킬, 저급 아실 또는 저급알콕시카보닐이다)을 나타내며 : Hal은 할로겐을 나타내고 : R9는 수소 또는 저급 알킬을 나타낸다.Wherein R 1 represents ethyl, 4-fluorophenyl or 2,4-difluoro phenyl: R 13 represents -OR 2 , -SR 2 or -NR 2 R 3 , wherein R 2 and R 3 are Each independently hydrogen or lower alkyl): Z is a general formula A piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl, or Pyrrolidine group of wherein n is 0 or 1, R 6 is hydrogen or methyl, R 7 is hydrogen or lower alkyl, R 8 is hydrogen, lower alkyl, lower acyl or lower alkoxycarbonyl Hal represents halogen and R 9 represents hydrogen or lower alkyl. 다음 일반식(Ⅸ)의 화합물을 일반식(Ⅶ)의 화합물과 반응시키고, R9이 저급 알킬인 경우에는 생성된 축합생성물을 가수분해시켜 카복실산 유도체를 생성시킴을 특징으로 하여, 일반식(Ⅰ)의 화합물을 제조하는 방법.The compound of formula (VII) is reacted with a compound of formula (VII), and when R 9 is lower alkyl, the resulting condensation product is hydrolyzed to produce a carboxylic acid derivative. To prepare a compound. 상기식에서, R은 염소, 브롬, 니트로, 시아노, -OR2, -SR2또는 -NR2R3(여기에서, R2및 R3는 각각 독립적으로 수소 또는 swj급 알킬이다)를 나타내며 : R1은 에틸, 4-플루오로페닐 또는 2.4-디플루오로페닐을 나타내고 : Z는 일반식의 피페라지노 그룹(여기에서, R4는 수소, 메틸 또는 저급알콕시카보닐이고, R5는 수소 또는 저급알킬이다), 또는 일반식의 피록리딘(여기에서, nd,s 0 또는 1이고, R6는 수소 또는 수메틸이며, R7은 수소 또는 저급 알킬이고, R8은 수소, 저급 알킬, 저급 아실 또는 저급 알콕시카보닐이다)을 나타내며 : R9는 수소 또는 저급 알킬을 나타내고 : Z1는 할로겐원자를 나타내며 : 단, R1이 에틸이고, R이 염소이면 Z는 피페라지노 또는 4-메틸피페라지노가 아니다.Wherein R represents chlorine, bromine, nitro, cyano, -OR 2 , -SR 2 or -NR 2 R 3 (wherein R 2 and R 3 are each independently hydrogen or swj-class alkyl): R 1 represents ethyl, 4-fluorophenyl or 2.4-difluorophenyl: Z is a general formula A piperazino group of wherein R 4 is hydrogen, methyl or lower alkoxycarbonyl and R 5 is hydrogen or lower alkyl, or a general formula Pyrrolidine, wherein nd, s 0 or 1, R 6 is hydrogen or hydromethyl, R 7 is hydrogen or lower alkyl, R 8 is hydrogen, lower alkyl, lower acyl or lower alkoxycarbonyl R 9 represents hydrogen or lower alkyl; Z 1 represents a halogen atom, provided that if R 1 is ethyl and R is chlorine then Z is not piperazino or 4-methylpiperazino. 제 1항에서 정의한 화합물 적어도 하나와 역제학적으로 허용되는 불활성 담체로 이루어짐을 특징으로 하는 항균성 약제학적 조성물.An antimicrobial pharmaceutical composition comprising at least one compound as defined in claim 1 and an inert pharmaceutical acceptable carrier. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019870006875A 1987-07-01 1987-07-01 8-substituted quinoline carboxylic acid derivatives and preparation method thereof KR890002019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019870006875A KR890002019A (en) 1987-07-01 1987-07-01 8-substituted quinoline carboxylic acid derivatives and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019870006875A KR890002019A (en) 1987-07-01 1987-07-01 8-substituted quinoline carboxylic acid derivatives and preparation method thereof

Publications (1)

Publication Number Publication Date
KR890002019A true KR890002019A (en) 1989-04-07

Family

ID=68279750

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870006875A KR890002019A (en) 1987-07-01 1987-07-01 8-substituted quinoline carboxylic acid derivatives and preparation method thereof

Country Status (1)

Country Link
KR (1) KR890002019A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100384206B1 (en) * 1994-10-07 2003-10-08 가부시키가이샤 구라레 Antimicrobial adhesive composition for dental uses

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100384206B1 (en) * 1994-10-07 2003-10-08 가부시키가이샤 구라레 Antimicrobial adhesive composition for dental uses

Similar Documents

Publication Publication Date Title
KR870008846A (en) 8-position substituted quinolonecarboxylic acid derivative and its preparation method
KR870010005A (en) Preparation of quinoline derivatives and their esters or salts
KR870007128A (en) Method for preparing 8-alkoxyquinolone carboxylic acid derivative
KR900018034A (en) Substituted 4- (quinolin-2-yl-methoxy) phenyl-acetic acid derivatives
KR850003890A (en) Method for preparing 1H-imidazo [4,5c] -quinolin-4-amine
IE44879L (en) Quinoline derivatives
KR880006206A (en) Quinazolinone derivatives and preparation methods thereof
KR870003998A (en) Method for preparing quinazoline derivatives
KR850000426A (en) Method for preparing dihydro benzopyran derivatives
KR880012526A (en) l-phenyl-3-naphthalenyloxypropanamine
KR870004019A (en) Method for preparing quinoline derivative
KR860004025A (en) Process for preparing quinolone carboxylic acid
ES8606330A1 (en) Quinolinecarboxylic acid derivatives and process for their preparation.
KR860008111A (en) Process for preparing indine and naphthalene derivatives
GB1237059A (en) Anti-virally effective quinoline derivatives
KR860003239A (en) Process for preparing quinolone carboxylic acid derivative
KR890002019A (en) 8-substituted quinoline carboxylic acid derivatives and preparation method thereof
KR850006411A (en) Method for preparing isoxazole derivative
KR870008867A (en) 7- (1-pyrrolidinyl) -quinolone carboxylic acid derivative and preparation method thereof
KR890009912A (en) Quinoline derivatives and their preparation
KR870007127A (en) Process for preparing quinolone carboxylic acid derivative
KR920012056A (en) 1,4-benzothiazine-2-acetic acid derivative and preparation method thereof
KR840005717A (en) Method for preparing benzamide derivative
IE820078L (en) Quinolones
ES8201140A1 (en) Substituted phenylamino-2-imidazoline-2 derivatives, their acid addition salts, medicaments containing them and process for their preparation.

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination