KR880008084A - Photosensitive compositions based on diazonium salt polycondensation products and photosensitive recording materials prepared from the compositions - Google Patents

Photosensitive compositions based on diazonium salt polycondensation products and photosensitive recording materials prepared from the compositions Download PDF

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KR880008084A
KR880008084A KR870014802A KR870014802A KR880008084A KR 880008084 A KR880008084 A KR 880008084A KR 870014802 A KR870014802 A KR 870014802A KR 870014802 A KR870014802 A KR 870014802A KR 880008084 A KR880008084 A KR 880008084A
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group
aromatic
photosensitive
substituted
groups
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KR870014802A
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KR950007569B1 (en
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파블로브스키 게오르그
페터레만
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베틀라우퍼 오일러
훽스트 아크티엔게젤샤프트
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/60Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Abstract

내용 없음.No content.

Description

디아조늄염 중축합 생성물을 기본으로하는 감광성 조성물 및 이 조성물로부터 제조된 감광성 기록물질Photosensitive compositions based on diazonium salt polycondensation products and photosensitive recording materials prepared from the compositions

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (11)

디아조늄 염 중축합 생성물 및 알칼리성 수용액에 가용성이거나 적어도 팽윤성(swellable)이고 유기 폴리카복실 산의 분자내 무수물과 하이드록실 그룹을 함유하고 산 무수물과 반응할 수 있는 추가의 작용 그룹을 갖지 않는 중합체와의 반응 생성물을 함유하는 카복실 측쇄 그룹함유 비-감광성 중합성 결합제 (여기에서, 결합제는 유기 이소시아네이트와 중합체의 하이드록실 그룹을 반응시켜 형성된 측쇄의 우레탄 그룹-함유 치환체를 추가로 함유한다)를 함유하는 감광성 조성물.With polymers soluble or at least swellable in diazonium salt polycondensation products and alkaline aqueous solutions, containing intramolecular anhydrides and hydroxyl groups of organic polycarboxylic acids and having no further functional groups capable of reacting with acid anhydrides. Photosensitive containing a carboxyl side chain group-containing non-photosensitive polymerizable binder containing a reaction product, wherein the binder further contains a side chain urethane group-containing substituent formed by reacting an organic isocyanate with a hydroxyl group of the polymer. Composition. 제1항에 있어서, 유기 폴리카복실 산이 디카복실산 또는 트리카복실산을 함유하는 감광성 조성물.The photosensitive composition of claim 1, wherein the organic polycarboxylic acid contains dicarboxylic acid or tricarboxylic acid. 제2항에 있어서, 산 무수물이 일반식(Ⅰ), (Ⅱ) 및 (Ⅲ)중의 하나에 상응하는 화합물을 함유하는 감광성 조성물.The photosensitive composition according to claim 2, wherein the acid anhydride contains a compound corresponding to one of the general formulas (I), (II) and (III). 상기식에서, R1및 R2는 각기 수소원자, 할로겐 원자 또는 알킬 그룹이거나, 상호 연결되어 둘 이하의 방향족 또는 치환족과 융합될 수 있는 방향족 또는 헤테로 방향족이고 비치환 또는 치환되었으며 임의로 부분적으로 수소화된 5원 또는 6원 환을 형성하고, R3, R4및 R5는 각기 수소원자 또는 알킬 그룹이거나, R3및 R5는 상호연결 되어 X를 포함하여 5원 또는 6원 환일 수 있는 비치환 또는 치환된 포화 또는 불포화 지방족환을 형성하고, R6및 R7은 수소원자 또는 알킬 그룹이며, X는 단일 결합, 비치환 또는 치환된 1,1-알킬렌 그룹 또는 1,1-사이클로 알킬렌 그룹, 산소원자 또는 황원자이고, Y는 산소 원자 또는 황원자, 1,1-또는 1,2-알킬렌 그룹 또는 1,2-알케닐렌 그룹이고, 이는 방향족 또는 치환족 환과 임의로 융합될 수 있으며, Z는 포화 또는 불포화되고 비치환 또는 치환된 환을 완성하는데 요구되는 환 성분이고, 이 환은 임의로 둘 이하의 방향족 또는 치환족 환과 융합된다.Wherein R 1 and R 2 are each a hydrogen atom, a halogen atom or an alkyl group or an aromatic or heteroaromatic which can be interconnected and fused with up to two aromatics or substituents and is unsubstituted or substituted and optionally partially hydrogenated An unsubstituted 5- or 6-membered ring, wherein R 3 , R 4 and R 5 are each hydrogen or an alkyl group, or R 3 and R 5 are interconnected to be a 5- or 6-membered ring including X; Or form a substituted saturated or unsaturated aliphatic ring, R 6 and R 7 are hydrogen atoms or alkyl groups, X is a single bond, unsubstituted or substituted 1,1-alkylene group or 1,1-cyclo alkylene Group is an oxygen atom or a sulfur atom, Y is an oxygen atom or sulfur atom, a 1,1-or 1,2-alkylene group or a 1,2-alkenylene group, which may be optionally fused with an aromatic or substituted ring, Z Is saturated or unsaturated And a ring component which is required to complete an unsubstituted or substituted ring, this ring is fused aromatic rings or substituted group of more or less arbitrarily. 제1항에 있어서, 유기 이소시아네이트가 모노이소시아네이트를 함유하는 감광성 조성물.The photosensitive composition of claim 1, wherein the organic isocyanate contains monoisocyanate. 제4항에 있어서, 모노이소시아네이트가 일반식(Ⅳ) 및 (Ⅴ)중 어느 하나에 상응하는 감광성 조성물.The photosensitive composition according to claim 4, wherein the monoisocyanate corresponds to any one of general formulas (IV) and (V). Ra-NCO (Ⅳ) Rc-O-CONH-Rb-NCO (Ⅴ)R a -NCO (Ⅳ) R c -O-CONH-R b -NCO (Ⅴ) 상기식에서, Ra및 Rc는 비치환 또는 치환된 알킬, 알케닐 또는 아릴그룹이고, Rb는 비치환 또는 치환된 알킬렌, 사이클로 알킬렌, 아릴렌 또는 아릴렌-알킬렌 그룹이다.Wherein R a and R c are unsubstituted or substituted alkyl, alkenyl or aryl groups, and R b is unsubstituted or substituted alkylene, cyclo alkylene, arylene or arylene-alkylene groups. 제1항에 있어서, 하이드록실 그룹을 함유하는 중합체가 폴리비닐 아세탈, 유리 하이드록실 구룹을 갖는 폴리비닐 아세테이트, 또는 하이드록시알킬 아크릴레이트 또는 하이드록시알킬 메타크릴레이트의 공중합체를 함유하는 감광성 조성물.The photosensitive composition of claim 1, wherein the polymer containing hydroxyl groups contains polyvinyl acetal, polyvinyl acetate with free hydroxyl group, or a copolymer of hydroxyalkyl acrylate or hydroxyalkyl methacrylate. 제1항에 있어서, 결합제가 우레탄 그룹 1내지 15중량%를 함유하는 감광성 조성물.The photosensitive composition according to claim 1, wherein the binder contains 1 to 15% by weight of urethane group. 제1항에 있어서, 결합제의 산가가 10내지 120인 감광성 조성물.The photosensitive composition according to claim 1, wherein the acid value of the binder is 10 to 120. 제1항에 있어서, 네가티브-워킹(negative working) 디아조늄 염 중축합생성물이 반복 단위 A-N2Q 및 B (여기에서, A는 포름알데히드와 축합될 수 있는 방향족 디아조늄 화합물 라디칼이고, B는 디아조늄 그룹을 함유하지 않으며 포름 알데히드와 축합할 수 있는 화합물의 라디칼 특히 방향족 아민, 페놀, 페놀에테르, 방향족 티오에테르, 방향족 탄화수소, 방향족 헤테로 사이클릭 화합물 또는 유기산 아미드의 라디칼 이다)를 함유하고, 이들 반복단위가 축합가능 카보닐 화합물에서 유도된 중간체 성분(바람직하게는 메틸렌 그룹)에 의해 결합되는 감광성 조성물.The negatively working diazonium salt polycondensate of claim 1 wherein the repeating units AN 2 Q and B, wherein A is an aromatic diazonium compound radical capable of condensation with formaldehyde, and B is a dia Radicals of compounds capable of condensation with formaldehyde, which do not contain zonium groups, in particular aromatic amines, phenols, phenolethers, aromatic thioethers, aromatic hydrocarbons, aromatic heterocyclic compounds or radicals of organic acid amides) A photosensitive composition wherein units are bound by intermediate components (preferably methylene groups) derived from condensable carbonyl compounds. 제9항에 있어서, 디아조늄 염 중축합 생성물이 반복단위 A-N2Q및 B를 함유하고, 이들 반복단위가 축합가능 카보닐 화합물로부터 유도된 2가 중간체 성분에 의해 결합되는, 단위 A-N2Q가 하기 일반식의 화합물에서 유도되고 B가 방향족 아민, 페놀, 티오페놀, 페놀에테르, 방향족 티오에테르, 방향족 탄화수소, 방향족헤테로 사이클릭 화합물, 또는 유기산 아미드의 라디칼이며 디아조늄 그룹을 함유하지 않는, 감광성 조성물.The method of claim 9, wherein the diazonium salt polycondensation product is repeat units AN 2 Q, and containing B, and a unit AN 2 Q is coupled by a bivalent intermediate component induction these repeating units from the condensation can be carbonyl compounds A photosensitive composition derived from a compound of the general formula wherein B is a radical of an aromatic amine, phenol, thiophenol, phenolether, aromatic thioether, aromatic hydrocarbon, aromatic heterocyclic compound, or organic acid amide and does not contain diazonium groups . (R8-R9-)pR10-N2Q(R 8 -R 9- ) p R 10 -N 2 Q 상기식에서, Q는 디아조늄 화합물의 음이온이고, P는 1내지 3의 정수이며, R3은 하나 이상의 위치에서 활성카보닐 화합물과 축합될 수 있는 방향족 라디칼이고, R10은 비치환 또는 치환된 페닐렌 그룹이며, R9는 단일 결합 또는 하기 그룹들중 하나이다 :Wherein Q is an anion of the diazonium compound, P is an integer from 1 to 3, R 3 is an aromatic radical capable of condensation with the active carbonyl compound at one or more positions, and R 10 is unsubstituted or substituted phenyl R 9 is a single bond or one of the following groups: [여기에서, q는 0내지 5이고, r은 2내지 5이며, R11은 수소원자, 탄소수 1내지 5의 알킬 그룹, 탄소수 7내지 12의 아랄킬 그룹 또는 탄소수 6내지 12의 아릴 그룹이고, R12는 탄소수 6내지 12의 아릴렌 그룹이다.][Wherein q is 0 to 5, r is 2 to 5, R 11 is a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, an aralkyl group of 7 to 12 carbon atoms or an aryl group of 6 to 12 carbon atoms, R 12 is an arylene group having 6 to 12 carbon atoms.] 지지체, 및 제1항에 청구된 조성물을 함유하는 감광성 층을 포함함을 특징으로 하는 감광성 기록 물질.A photosensitive recording material comprising a support and a photosensitive layer containing the composition as claimed in claim 1. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019870014802A 1986-12-23 1987-12-23 Light-sensitive mixture with diazonium salt polycondensation products and light-sensitive registration material prepared therewith KR950007569B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863644161 DE3644161A1 (en) 1986-12-23 1986-12-23 LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF
DEP3644161.9 1986-12-23

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KR880008084A true KR880008084A (en) 1988-08-30
KR950007569B1 KR950007569B1 (en) 1995-07-12

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KR1019870014802A KR950007569B1 (en) 1986-12-23 1987-12-23 Light-sensitive mixture with diazonium salt polycondensation products and light-sensitive registration material prepared therewith

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EP (1) EP0273263B1 (en)
JP (1) JPS63172153A (en)
KR (1) KR950007569B1 (en)
BR (1) BR8707010A (en)
DE (2) DE3644161A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651929B2 (en) * 1988-06-20 1997-09-10 岡本化学工業株式会社 Photosensitive layer for printing plate
JPH0299953A (en) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd Pattern forming material
JPH02106753A (en) * 1988-10-14 1990-04-18 Matsushita Electric Ind Co Ltd Pattern forming method

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* Cited by examiner, † Cited by third party
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AR205345A1 (en) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg PHOTOSENSITIVE ORGANOPHILIC COMPOSITION AND LITHOGRAPHIC PLATE PREPARED WITH THE SAME
DE3036077A1 (en) * 1980-09-25 1982-05-06 Hoechst Ag, 6000 Frankfurt LIGHT-CURABLE MIXTURE AND LIGHT-SENSITIVE COPY MATERIAL MADE THEREOF
DE3404366A1 (en) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON A DIAZONIUM SALT POLYCONDENSATION PRODUCT AND LIGHT SENSITIVE RECORDING MATERIAL MADE THEREOF

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EP0273263B1 (en) 1993-06-09
EP0273263A3 (en) 1988-09-28
BR8707010A (en) 1988-08-02
JPS63172153A (en) 1988-07-15
EP0273263A2 (en) 1988-07-06
KR950007569B1 (en) 1995-07-12
DE3786155D1 (en) 1993-07-15
DE3644161A1 (en) 1988-07-07

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