KR880001085B1 - An electron gun - Google Patents

Abstract

The structure of electric gun has several electronic lenses. The 1st grid (13), the 2nd grid (14) and the fouth grid are plate types and the fouth grid (16) is connected to the second grid (14) by wire. The 7KV electric potential is applied to the lower parts of the third and fifth grid and the 25KV elecric potential is maintained in the vicinity of the sixth grid through the convergence electrode (19). The first electronic lense is set between the third grid and the fouth and fifth grid, and the second electronic lense (kettle lense) being between the fifth grid and the sixth grid.

Description

Electron gun structure

1 is an enlarged axial cross-sectional view of a conventional electron gun structure.

2 is a cross-sectional view of the first embodiment of the electron gun structure according to the present invention.

FIG. 3 is an explanatory diagram in which FIG. 2 is modeled. FIG. 3 (b) is an explanatory diagram of an electrode arrangement corresponding to FIG. 3 (a).

4 is a sectional view of a second embodiment of an electron gun structure of the present invention.

5 is a cross-sectional view of a third embodiment of the electron gun structure of the present invention.

The present invention relates to an electron gun structure, and more particularly, to an improvement of an electron gun structure having a plurality of electron lenses.

For example, as shown in FIG. 1, the color gun tube electron gun structure 10 having an inline integrated structure includes a cathode 2 having a heater 1 therein, a first grid 3 formed integrally with each other, The bottom part of the user cylinder which consists of the 2nd grid 4, the 3rd grid 5, and the 4th grid 6, and the main electron lens 7 is formed mechanically. In the same way as the third grid 5 having the opening axis 5B, 5G, 5R, which is formed centering on the total axis Z _G of the central electron gun and the total axis Z _B of the both electron guns, Z _R. be eccentric (離心) with respect to the mechanical integrally the opening (6G) and (Z _B) (Z _R) axes of both the electron gun cheonseol to the bottom of the seat cylinder by loading a chongchuk (Z _G) of the center electron gun is formed a cheonseol opening It is formed between (6B) and 6R. In this case, in the central electron gun, the openings 5G and 6G are laid out centering on the total axis Z _G , and the electron beam 8G goes straight in the direction of screening as it is not shown. Since the electric field is asymmetrical due to eccentricity or inclination, the electron beams 8B and 8R passing through this electric field are bent in the direction of the electron beam 8G, and these three electron beams 8G and 8B and 8R are Convergence on the screen. The eccentricity described above is about 0.15 mm.

The electron gun structure having the above structure is called an in-line integrated structure electron gun structure as described above, and it is necessary to use an eccentric opening to concentrate at least three electron beams on the spline. Of course, as long as the two electron beams can be corrected and deflected in a predetermined direction in addition to the eccentric openings, another method, for example, the method of inclining the electrode can be used.

However, the integrated structure is preferable in terms of cost and precision because the configuration of each electrode is mechanically simple and the relative position of each electron lens of each electron gun of the three electron guns is accurately determined. It is becoming.

In other words, the central or beam openings are used to concentrate the three electron beams on the screen. Since the deflection amount of the electron beam by this eccentric or inclined opening is approximately proportional to the eccentricity or the inclination amount and the potential difference between the electrodes forming the electron lens, at least the potential difference between the electrodes forming the electron lens is not accurate. If you do not achieve the desired purpose.

In other words, the deflection angle (amount) due to the asymmetric electron lens is approximately given by the following equation.

θ = K · P · q... … … … … … … … … … … … … … … … … … … … … (One)

Where θ is deflection angle, K is constant, P is eccentricity, and electron lens diameter is standardized, q is voltage ratio of electron lens.

Therefore, if the applied voltage between the electrodes is incorrect, the deflection angle θ changes, resulting in a difference in the static convergence of the color picture tube.

In particular, in the case of the preset type in which the latest color receiving tube is adjusted as the receiving tube before being installed in the opening, and after being mounted in the receiver, the above-described structure is similar to the electron gun structure. In particular, when the potential difference between the electrodes forming the electron lens is required to be accurate, the operating conditions of the electron gun, in particular, the voltage applied to the third grid 5 during the adjustment of the water tube are incorrect. You must.

As is well known, the adjustment of the water pipe is to adjust the magnetic field strength of the permanent magnet installed on the outer wall of the water pipe neck, but again the adjustment of the permanent magnet is performed again.

As another example, a permanent magnet material is attached to the inside of the color receiver tube, that is, around the electron gun, and it is appropriately magnetized from the outside so that the electron beam is accurately aligned on the screen. At least it is impossible to readjust the receiver assembly idle.

As described above, in the case of the conventional integrated electron gun, there is a drawback that if the operating conditions of the electron gun are changed, even if they are adjusted in advance, they must be readjusted again.

An object of the present invention is to provide an electron gun structure in which the color water tube is made in view of the defects of the conventional electron gun structure, and which is not readjusted even after the water tube is mounted on the receiver.

Next, a first embodiment of the electron gun structure of the present invention will be described with reference to FIG.

That is, the electron gun structure 20 is provided with an insulating support rod (not shown) between the heater 11, the cathode 12, the first grid 13, the second grid 14, and the third grid 15. And a fourth grid 16, a fifth grid 17 and a sixth grid 18, respectively, corresponding to the cathode 12, that is, the total axis Z _C (Z _B ) (Z _R ) of each electron gun. It has an opening for electron beam passing in one position, the first grid 13, the second grid 14, the fourth grid 16 is in the form of a plate, the fourth grid 16 is, for example The user body is connected to the second grid 14 by the conducting wire 21 and is maintained at a low voltage, and the third grid 15 and the fifth grid 17 each have an opening for passing the electron beam at the bottom thereof. 15 ₁ ) (15 ₂ ) and (17 ₁ ) (17 ₂ ), which are connected by conducting wires 22 and given a potential of about 7 KV, and the sixth grid 18 shown in the bottom has an opening for electron beam passing through the bottom. As user body having And, an approximately 25KV voltage supply source of the anode voltage of a color kinescope given through the conveyor presence electrode 19.

In the electron gun structure 20 having the above-described structure, a first electron lens is formed between the third grid 15, the fourth grid 16, and the fifth grid 17, and the fifth grid 17 is formed. A second electron lens (main electron lens) is formed between the sixth grid and the sixth grid 18.

Next, the paths of the electron beams of the three electron guns installed in the first electron lens, the second electron lens, and the electron gun structure 20 are described in more detail. In other words, when the heater 11 is placed inside the cathode 12 and the three electron guns (12 _B ) (12 _G ) (12 _R ), the electron beams 21 _B (21 _G ) (21 _R ) respectively emitted from Each of the total axes Z _B and Z _G is formed by the cathode 11, the first grid 13, and the third pole portion formed by the second grid 14, and the third grid 15 and the fourth grid 16. The center electron beam 21G exits in parallel with (Z _R ), and the opening part 17 _{1G in} the center of the user cylinder 17 _{1 in} the lower part of the fifth grid 17 is centered around the total axis ZG. As it is, it passes through the 1st electron lens which became as symmetrical expansion. However, the electron beam (21 _B) (21 _R) is an opening (17 _1B) (17 _1R) opposite to each chongchuk (Z _B) (Z _R) chongchuk of the central electron gun from the (Z _G) at opposite sides of the two sides 21G electron beam of the middle-aged child because it passes through the first electron lens formed as an asymmetrical electric field formed by centering the axis Z _B1 (Z _R1 ), which is further away from the predetermined distance in the direction. Is biased to be close to).

The amount of this deflection is proportional to the eccentricity of the openings 17 _1B and 17 _1R of the user body of the fourth grid 16 and the fifth grid 17. Next, the electron beams 21 _B and 21 _R on both sides are provided with openings 17 _2B and 17 _2R of the user cylinder 17 ₂ of the fifth grid 17, and respective total axes Z _B and Z. The opening 18 of the sixth grid 18 installed so as to be centered on the axis Z _B2 (Z _R2 ), which is spaced a predetermined distance away from the total axis Z _G of the central electron gun from _R ). _B ) Straight through the second electron lens as a symmetric deployment formed between (17 _2G ) and (18 _2G ) as it passes through the second electron lens as an asymmetric deployment formed between (18 _R ). The three electron beams 21B, 21G, 21R are formed at one point above the screen which is not shown in figure, further approaching the center electron beam 21G.

As described above, the action of the first electron lens and the second electron lens is often dependent on the voltage difference applied to the counter electrode forming these electron lenses. Therefore, in the first electron lens, the second It should be noted that the characteristics of both lenses are less than the deflection of the electron lens. However, the characteristics of both lenses act to cancel each other by the potential of the fifth grid 17 which is most susceptible to voltage fluctuation as the electron gun structure, that is, the fifth grid. When the voltage of (17) decreases, the deflection of the first electron lens becomes small, and the deflection of the second electron lens becomes large. In the opposite case, that is, when the voltage of the fifth grid 17 increases, the deflection of the first electron lens becomes larger and the deflection of the second electron lens becomes smaller.

Therefore, as in the conventional example as shown in FIG. 1, the margin applied to the voltage applied to the fifth grid 17 of the present embodiment is compared with the structure in which the electron beam is concentrated on the screen using the same electron lens. Tolerance occurs, and final adjustment as the receiving pipe is made possible, so that after adjustment is made to the water receiver, no adjustment is possible.

Next, the specific design method of the electron gun structure of this invention is described.

FIG. 3 is a model of FIG. 2, which is formed of a fourth grid (G ₄ ) 16, a fifth grid (G ₅ ) 17, and a sixth grid (G ₆ ) 18. It shows how the two electron beams are deflected by the electron lenses G ₄ / G ₅ and G ₅ / G _{6 of} 2 degrees.

That is, when the applied voltage of the fifth grid 17 is an arbitrary value Vt, in FIG. 3 (a), the electron beam 21B is formed by the fourth grid G ₄ and the fifth grid G ₅ . The fluorescent surface 24 is deflected at the point (A) of the first electron lens to be formed and at the point (B) of the second electron lens to be formed by the fifth grid G ₅ and the sixth grid G ₆ . When (VO) is encountered and the voltage applied to the fifth grid (G ₅ ) is lowered by (ΔV _f ), the point (A) of the first electron lens and (C) of the second electron lens are At the point where it is deflected and hits the point (O) on the fluorescent surface 24 through the path of the electron beam 23B, the electron beam 21B is designed to orbit the electron beam 23B. The margin for the applied voltage of the grid G ₅ is increased.

Here, FIG. 3 (b) shows a model of a part of the electron gun corresponding to the biaxial electron beam 21B of FIG. 2, and corresponds to FIG. 3 (a) as it is.

In order to obtain the margin in the above-mentioned third figure (a), the amount of eccentricity Sg which satisfies the following expression 2 may be obtained.

Sg = θ ₁ 1+ (θ ₁ + θ ₂ ) ₁ Sg. … … … … … … … … … … … … … … … … … … … (2)

Sg = (θ ₁ + Δθ ₁ ) · 1 + (θ ₁ + θ ₂ -Δθ ₁ + Δθ ₂ ) 1Sg. … … … … … … … … (3)

Here, the angle θ _1, θ ₂ is the deflection angle of the electron beam (21 _B), the angle △ θ _1, △ θ ₂ is the amount of change in flat hyanggak of went down the applied voltage △ V _f as of the fifth grid (G ₅₎ is the distance between the first and second electron lenses, 1Sg is the distance between the second electron lens and the fluorescent surface 24, and in FIG. 3, Z _B , Z _B1 , and Z _B2 are the total axes of the respective electrodes. , P ₁ , P ₂ is the amount of eccentricity.

Equation (2) and (3) can be obtained by adding equation (1), that is, the relationship between the eccentricity and the deflection amount and the optical characteristics of the lens, and the eccentric amount can be obtained, and the maximum value can be easily obtained experimentally.

For example, a 19-inch 90 ° deflecting color water tube, for example, when the diameter of the electron gun is 5.5 mm, the amount of eccentricity of the first electron lens is about 30 to 20 microns, and the amount of eccentricity is outside the range of component imbalance.

Next, a second embodiment of the electron gun structure of the present invention will be described with reference to FIG.

That is, the electron gun structure 40 includes the heater 41, the cathode 42, the first grid 43, the second grid 44, the third grid 45, the fourth grid 46, and the fifth grid 47. ) And the sixth grid 48 are substantially the same as the first embodiment, but the openings for electron beam passing on both sides of the first grid 43 and the second grid 44 are each axis Z _B. (Z _R), an opening (45 _1B), the axis (Z _B1) of the _(45-1R) corresponding to the both side electron beam of the seat cylinder of the third grid (45) with the center on the (Z _R1) is the axis of the central electron beam (Z _G ) is eccentric in the opposite direction. That is, the electron beam emitted from the cathode 42 with the first electron lens asymmetric is arranged so that the first beam is eccentrically deflected in the axial direction of the central electron beam by the first asymmetric electron lens.

Further, the axes Z _B2 and Z _{R2 of} the openings 48B and 48R corresponding to the electron beams on both sides of the user cylindrical electrode of the sixth grid 48 correspond to the openings 47 _2B of the fifth grid 47. With respect to (47 _2R ) it is more eccentric to the axis Z _G of the center electron beam.

That is, both electron beams are arranged to be more deflected in the axial direction of the center beam by the second asymmetric electron lens. In such a configuration, as described above, a margin is generated in the voltage applied to the fifth grid 47.

Further, in the embodiment, the openings for passing the electron beams on both sides of the second grid 44 with respect to the axis are relatively eccentric inward with respect to the axis Z _B (Z _R ), and the openings of the third grid 45 are with the axis. Even when it is above (Z _B ) (Z _R ), it is water that there is no change in the function of the first electron lens.

Next, a third embodiment of the electron gun structure of the present invention will be described with reference to FIG.

That is, the electron gun structure 50 of the present embodiment includes a heater 51, a cathode 52, a first grid 53, a second grid 54, a third grid 55, a fourth grid 56, and a fifth. The grid 57 and the sixth grid 58 are substantially the same as the above-described embodiment, but as shown in the drawing, both sides of the user body corresponding to the fourth grid 56 of the fifth grid 57 are provided. Openings 57 _1B and 57 _1R corresponding to the electron beams 21B and 21R and the openings 58B and 58R of the user body of the sixth grid 58 respectively correspond to the openings of the electrodes provided correspondingly. It is characterized by the inclination.

That is, the first electron lens formed by the fourth grid 56 and the fifth grid 57 and both electron beams passing through the second electron lens formed by the fifth grid 57 and the sixth grid 58. Since the one corresponding to the opening portion is an asymmetric lens, the same effects as those of the other embodiments described above can be obtained.

The electron gun structure of the present invention is not limited to the above embodiments, and may be a combination of an eccentricity and an inclination, for example, and other zoned gun structures, for example, a bilateral type, a universal potential type, a pyriodic potential type and a dry type. It can be applied to everything including potential type.

That is, since a general electron gun structure has a plurality of electron lenses, for example, in the electron gun structure in which the main lens portion has only one electron lens, such as a bipotential type, for example, the electron lenses between the second grid and the third grid are asymmetric. By doing so, the above-described effects can be obtained.

The number of asymmetrical electron lenses is not limited to two as in the above embodiment, but may be three or more, and may include an electron lens that deflects the electron beam in the opposite direction.

This is evident from the fact that the vortexing of the effect of the asymmetry amount should be the same as that of the two asymmetric lenses as in the embodiment.

As described above, the electron gun structure of the present invention can obtain the foxness of the voltage applied to the electrode mainly forming the electron lens in the electron gun structure, and therefore its industrial value is extremely large.

Claims (1)

Electron gun that focuses both electron beams to the central electron beam side by converging three electron beams of the center electron beam and the electron beams on both sides to the first focusing field and using the focusing field of both electron beams as an asymmetric electric field In the front end of the first focusing field, a second focusing field is formed to be an asymmetrical electric field with respect to both electron beams, and the front end of the first focusing electric field is formed as an asymmetrical electric field with respect to both electron beams. And a second focusing electric field, wherein said first focusing electric field and said second focusing electric field have means for mutually compensating for each of the two electron beams.

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