KR850003720A - Method for preparing ureido derivative - Google Patents

Method for preparing ureido derivative Download PDF

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KR850003720A
KR850003720A KR1019840007315A KR840007315A KR850003720A KR 850003720 A KR850003720 A KR 850003720A KR 1019840007315 A KR1019840007315 A KR 1019840007315A KR 840007315 A KR840007315 A KR 840007315A KR 850003720 A KR850003720 A KR 850003720A
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웨트너 링컨하비
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아놀드 자일러, 에른스트 알테르
시바-가이기 에이지
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/28Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/30Oxygen or sulfur atoms
    • C07D233/32One oxygen atom

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Description

우레이도 유도체의 제조방법Method for preparing ureido derivative

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (13)

일반식(Ⅳ)의 화합물을 폐환시키거나, 일반식(Ⅴ)의 화합물을 일반식(Ⅵ)의 화합물과 반응시킨 후, 보호된 작용상 그룹을 유리 작용성 그룹으로 전환시키고, 필요한 경우, 생성된 화합물을 일반식(Ⅰ)의 다른 화합물로 전환시키고/시키거나, 필요한 경우 생성된 유리화합물을 염으로 또는 생성된 염을 유리화합물이나 다른 염으로 전환시키고/시키거나, 필요한 경우 생성된 이성체 혼합물을 그의 개개 이성체로 분리시킴을 특징으로 하여, 일반식(Ⅰ)의 화합물 및 그의 염을 제조하는 방법.After ringing the compound of formula (IV) or reacting a compound of formula (V) with a compound of formula (VI), the protected functional group is converted into a free functional group and, if necessary, generated. Converted compounds into other compounds of general formula (I), and / or convert the resulting free compounds into salts and / or the resulting salts into free or other salts, and / or the resulting isomeric mixture, if necessary. Isolating the individual isomers thereof to prepare compounds of formula (I) and salts thereof. 상기식에서, Ar은 모노시클릭 또는 임의로 부분적으로 포화된 비시클릭 카보시클릭 또는 헤테로시클릭 방향족 라디칼이고; R은 수소, 알카노일 또는 알로일이며, R1및 R2는 독립적으로 수소 또는 저급알킬이거나, R1및 R2는 함께 결합하여 2개 내지 4개의 탄소원자에 의해 이들에 부착된 두개의 질소원자를 분리하는, 탄소수가 2내지 7인 알킬렌이고; R3및 R4는 독립적으로 수소 또는 저급알킬이며; X는 속소 또는 티오이고; 일반식(Ⅳ)에서, 라디칼 X1및 X2중의 하나는 수소이고 따른 하나는 카본산 반-유도체의 아실, 라디칼이며; 일반식(Ⅴ) 및 (Ⅵ)에서, R1및 X1이 함께 일반식 =C=X(Ⅳa)의 그룹을 나타내고, X2는 수소이며 R3는 수소 또는 저급알킬이거나, 또는 R2및 R2가 함께 일반식 =C=X(Ⅳa)의 그룹을 나타내고, X1은 수소이며, R1은 수소 또는 저급알킬이고, 일반식(Ⅳ), (Ⅴ) 및 (Ⅳ)화합물에서 반응에 참여하지 않는 작용성 그룹은 보호된 형태로 존재할 수 있다.Wherein Ar is a monocyclic or optionally partially saturated bicyclic carbocyclic or heterocyclic aromatic radical; R is hydrogen, alkanoyl or alloyl and R 1 and R 2 are independently hydrogen or lower alkyl, or R 1 and R 2 are bonded together and two nitrogens attached to them by 2 to 4 carbon atoms Alkylene having 2 to 7 carbon atoms separating the atoms; R 3 and R 4 are independently hydrogen or lower alkyl; X is soxo or thio; In formula (IV), one of the radicals X 1 and X 2 is hydrogen and the other one is the acyl, radical of the carboxylic acid semi-derivative; In formulas (V) and (VI), R 1 and X 1 together represent a group of formula = C = X (IVa), X 2 is hydrogen and R 3 is hydrogen or lower alkyl, or R 2 and R 2 together represent a group of formula = C = X (IVa), X 1 is hydrogen, R 1 is hydrogen or lower alkyl and participates in the reaction in compounds of formulas (IV), (V) and (IV) Unfunctional groups may exist in protected form. 제1항에 있어서, R1및 R2가 함께 바람직하게는 제1항에 정의된 것과 같은 알킬렌그룹을 형성하는 일반식(Ⅳ)의 출발물질에서, 카본산 반-유도체의 아실 라디칼 X1또는 X2가 카본산 반-에스테르, 카본산 반-할라이드 또는 카본산 반-아미드의 상응하는 라디칼인 방법.The acyl radical X 1 of the carboxylic acid semi-derivative according to claim 1, in which R 1 and R 2 together form a alkylene group, preferably as defined in claim 1, in the starting material of formula (IV). Or X 2 is the corresponding radical of carboxylic acid half-ester, carboxylic acid half-halide or carboxylic acid half-amide. 제1항에 있어서, X1및 X2가 둘다 수소인 일반식(Ⅳ)의 출발물질을 카본산의 반응성 유도체와 반응시켜 R1및 R2가 함께 제1항에 정의된 것과 같은 알킬렌그룹을 형성하는 일반식(Ⅳ)의 출발물질을 동일반응계 내에서 제조하는 방법.The method of claim 1 wherein, X 1 and X 2 are both alkylene groups, such as the hydrogen in the starting material of formula (Ⅳ) with is reacted with a carbonic acid reactive derivative, R 1 and R 2 defined in claim 1 Process for preparing a starting material of the general formula (IV) to form a in situ. 제3항에 있어서, 카본산의 반응성 유도체가 디-저급알킬-카보네이트인 같은 상응하는 디에스테르, 포스겐과 같은 디할라이드, 저급 알킬할로게노카보네이트와 같은 할로게노-카본산에스테르, 카방산할라이드 또는, N,N′-카보닐-디이미다졸과 같은 카본산 디-아미드인 방법.4. The corresponding diester of claim 3, wherein the reactive derivative of carbonic acid is a di-lower alkyl-carbonate, a dihalide such as phosgene, a halogeno-carboxylic acid ester such as lower alkylhalogenocarbonate, a carbasan halide or , Carboxylic acid di-amides such as N, N′-carbonyl-diimidazole. 제1항 내지 4항중 어느 하나에 있어서, Ar은 임의로 치환된 페닐, 피리딜, 나프틸, 테트라하이드로나프틸, 3,4-디하이드로-1(2H)-나프탈레노닐, 3,4-디하이드로-2(1H)-퀴놀로닐, 3,4-디하이드로-1(2H)-이소퀴놀로닐, 인돌릴 또는 1,2,5-티아디아졸릴이고, R,R1, R2,R3,R4및 X는 제1항에 정의된 바와 같은 일반식(Ⅰ)의 화합물 또는 그의 염을 제조하는 방법.The compound of claim 1, wherein Ar is optionally substituted phenyl, pyridyl, naphthyl, tetrahydronaphthyl, 3,4-dihydro-1 (2H) -naphthalenonyl, 3,4- Dihydro-2 (1H) -quinoloyl, 3,4-dihydro-1 (2H) -isoquinoloyl, indolyl or 1,2,5-thiadiazolyl, R, R 1 , R 2 , R 3 , R 4 and X are processes for preparing compounds of formula (I) or salts thereof as defined in claim 1. 제1항 내지 4항중 어느 하나에 있어서, Ar은 페닐, 또는 저급(알킬, 알케닐, 알키닐, 알카노일, 모노-또는 디-알킬 아미노, 알카노일아미노, 알킬설포닐아미노, 알콕시카보닐, 알킬카바모일, 알킬설파모일, 알콕시, 알킬티오, 알킬설피닐, 알킬설포닐, 알케닐옥시 및 알키닐옥시), 하이드록시, 시아노, 할로내노, 피롤릴, 아미노, 5내지 7원-(알킬렌-, 옥사알킬렌-, 티아알킬렌-)이미노,벤질옥시, 페닐, 5내지 7원 시클로알킬, 카바모일, 설파모일 및 3내지 7원 시클로알킬-, 페닐-, 하이드록시-, 저급알콕시, 저급알콕시카보닐아미노-, 저급알킬티오-, 저급알킬설피닐-, 저급알킬설포닐-, 및 카바모일-치환된 (저급알킬 및 저급알콕시) 중에서 선택된 1개 내지 3개의 치환제에 의해 치환된 페닐이고; R은 수소, 저급 알카노일 또는 아로일이며, R1및 R2는 수소 또는 저급알킬이거나, R1및 R2는 함께 결합하여 2개 내지 4개의 탄소원자에 의해 이들에 부착된 2개의 질소 원자를 분리하는, 탄소수가 2내지 5인 알킬렌이고, R3및 R4는 수소 또는 저급알킬이며, X는 O 또는 S인 일반식(Ⅰ)의 화합물 또는 그의 염을 제조하는 방법.The compound of claim 1, wherein Ar is phenyl, or lower (alkyl, alkenyl, alkynyl, alkanoyl, mono- or di-alkyl amino, alkanoylamino, alkylsulfonylamino, alkoxycarbonyl, Alkylcarbamoyl, alkylsulfamoyl, alkoxy, alkylthio, alkylsulfinyl, alkylsulfonyl, alkenyloxy and alkynyloxy), hydroxy, cyano, haloranono, pyrrolyl, amino, 5-7 member- Alkylene-, oxaalkylene-, thiaalkylene-) imino, benzyloxy, phenyl, 5- to 7-membered cycloalkyl, carbamoyl, sulfamoyl and 3- to 7-membered cycloalkyl-, phenyl-, hydroxy-, To one to three substituents selected from lower alkoxy, lower alkoxycarbonylamino-, lower alkylthio-, lower alkylsulfinyl-, lower alkylsulfonyl-, and carbamoyl-substituted (lower alkyl and lower alkoxy) Phenyl substituted by; R is hydrogen, lower alkanoyl or aroyl and R 1 and R 2 are hydrogen or lower alkyl, or R 1 and R 2 are bonded together and two nitrogen atoms attached to them by 2 to 4 carbon atoms A process for preparing a compound of formula (I) or a salt thereof, wherein alkylene having 2 to 5 carbon atoms, R 3 and R 4 are hydrogen or lower alkyl, and X is O or S. 제1항 내지 4항중 어느 하나에 있어서, Ar은 제6항에 정의된 바와 같고, R은 수소이며, R1및 R2는 함께 결합하여 탄소수가 2내지 4인 알킬렌을 나타내어 5-, 6- 또는 7원환이 형성되도록하고, R3및 R4는 수소 또는 저급알킬이며, X는 O또는 S인 일반식(Ⅰ)의 화합물 또는 그의 염을 제조하는 방법.The compound according to any one of claims 1 to 4, wherein Ar is as defined in claim 6, R is hydrogen, and R 1 and R 2 are bonded together to represent alkylene having 2 to 4 carbon atoms. Or a 7-membered ring, wherein R 3 and R 4 are hydrogen or lower alkyl and X is O or S. 제1항 내지 4항중 어느 하나에 있어서, 일반식(Ⅱ)의 화합물 또는 그의 염을 제조하는 방법.The process according to any one of claims 1 to 4, wherein the compound of formula (II) or a salt thereof is prepared. 상기식에서, R은 수소 또는 저급알카노일이고, R1및 R2는 수소이거나, R1및 R2는 함께 결합하여 탄소수가 2내지 4인 직쇄 알킬렌을 나타내며, R3및 R4는 독립적으로 수소 또는 저급알킬이고, R5및 R6은 각각 독립적으로 수소, 저급(알킬, 알케닐, 알키닐, 알콕시, 알케닐옥시 또는 알키닐옥시), 하이드록시, 시아노, 할로게노, 아미노, 저급(모노- 또는 디-일킬아미노, 알카노일아미노, 알킬설포닐아미노, 알킬티오, 알킬설피닐 또는 알킬설포닐), 몰폴리노, 1-또는 2-피롤릴, 페닐, 5내지 7원 시클로알킬, 저급알카노일, 저급알콕시카보닐, 카바모일 또는 설파모일이며, R6은 또한 탄소수가 3내지 6인 시클로알킬, 페닐, 저급알콕시, 하이로록시, 저급알콕시카보닐아미노, 저급알킬-(티오, 설피닐 및 설포닐) 또는 카바모일로 치환된 저급(알킬 또는 알콕시)이고, X는 O또는 S이다.Wherein R is hydrogen or lower alkanoyl, R 1 and R 2 are hydrogen, or R 1 and R 2 are bonded together to represent straight chain alkylene having 2 to 4 carbon atoms, R 3 and R 4 independently Hydrogen or lower alkyl, R 5 and R 6 are each independently hydrogen, lower (alkyl, alkenyl, alkynyl, alkoxy, alkenyloxy or alkynyloxy), hydroxy, cyano, halogeno, amino, lower (Mono- or di-ylalkylamino, alkanoylamino, alkylsulfonylamino, alkylthio, alkylsulfinyl or alkylsulfonyl), morpholino, 1- or 2-pyrrolyl, phenyl, 5- or 7-membered cycloalkyl , Lower alkanoyl, lower alkoxycarbonyl, carbamoyl or sulfamoyl, R 6 is also cycloalkyl, phenyl, lower alkoxy, hydroxy, lower alkoxycarbonylamino, lower alkyl- (thio, Sulfinyl and sulfonyl) or lower (alkyl or alkoxy) substituted with carbamoyl And, X is O or S. 제1항 내지 4항중 어느 하나에 있어서, R,R1및 R2는 제8항에 정의한 바와 같고, R3,R4및 R5는 수소이며, R6는 저급알킬, 저급알케닐, 저급알키닐, 저급알킬(티오, 설피닐 또는 설포닐), 저급알콕시, 저급알케닐옥시, 시아노, 저급알콕시카보닐, 카바모일, 저급알카노일아미노, 몰폴리노, 피롤릴, 5내지 7원 시클로알킬이고, R6는 또한 탄소수가 3내지 5인 시클로알킬, 페닐, 저급알콕시 또는 카바모일로 치환된 저급(알킬 또는 알콕시)이고, X가 0인, 제8항에 따른 일반식(Ⅱ)의 화합물 또는 그의 염을 제조하는 방법.5. The compound of claim 1 , wherein R, R 1 and R 2 are as defined in claim 8, R 3 , R 4 and R 5 are hydrogen, R 6 is lower alkyl, lower alkenyl, lower Alkynyl, lower alkyl (thio, sulfinyl or sulfonyl), lower alkoxy, lower alkenyloxy, cyano, lower alkoxycarbonyl, carbamoyl, lower alkanoylamino, morpholino, pyrrolyl, 5- to 7-membered Cycloalkyl, R 6 is also lower (alkyl or alkoxy) substituted with cycloalkyl, phenyl, lower alkoxy or carbamoyl having 3 to 5 carbon atoms, and X is 0, and the general formula (II) according to claim 8 Method for preparing a compound or a salt thereof. 제1항 내지 4항중 어느 하나에 있어서, 일반식(Ⅲ)의 화합물 또는 그의 염을 제조하는 방법.The process according to any one of claims 1 to 4, wherein the compound of formula (III) or a salt thereof is prepared. 상기식에서, R3는 수소 또는 저급 알킬이고, R7은 시아노, 저급알콕시카보닐, 피롤릴, 몰폴리노, 탄소수가 3내지 6인 알케닐옥시, 탄소수가 3내지 6인 일키닐옥시, 또는 시클로프로필로 치환된 탄소수가 1내지 3인 알콕시이다.Wherein R 3 is hydrogen or lower alkyl, R 7 is cyano, lower alkoxycarbonyl, pyrrolyl, morpholino, alkenyloxy having 3 to 6 carbon atoms, ilkynyloxy having 3 to 6 carbon atoms, Or alkoxy having 1 to 3 carbon atoms substituted with cyclopropyl. 제1항 내지 4항중 어느 하나에 있어서, 시스-1-{4-〔〔3-(2-알릴옥시-펜옥시)-2-하이드록시-프로필〕-아미노〕-시클로헥실}-2-이미다졸리디논 또는 그의 염을 제조하는 방법.The cis-1- {4-[[3- (2-allyloxy-phenoxy) -2-hydroxy-propyl] -amino] -cyclohexyl-2--2-imide according to any one of claims 1 to 4. A process for preparing dazolidinones or salts thereof. 제1항 내지 4항중 어느 하나에 있어서, 시스-1-{4-〔〔3-(2-시클로프로필메톡시)-2-펜옥시하이드록시-프로필〕-아미노〕-시클로헥실}-2-이미다졸리디논 또는 그의 염을 제조하는 방법.The cyclohexyl -2--2- of any one of claims 1 to 4, wherein cis-l- 4- [[3- (2-cyclopropylmethoxy) -2-phenoxyhydroxy-propyl] -amino] -cyclohexyl-2--2- Process for preparing imidazolidinone or salts thereof. 제1항 내지 4항중 어느 하나에 있어서, (S)-시스-1-{4-[C3-(2-시클로프로필메톡시-펜옥시)-2-하이드록시-프로필]-아미노]-시클로헥실}-2-이미다졸리디논 또는 그의 염을 제조하는 방법.(S) -cis-1-'4- [C3- (2-cyclopropylmethoxy-phenoxy) -2-hydroxy-propyl] -amino] -cyclohexyl according to any one of claims 1 to 4. VII-2-imidazolidinone or a method for producing a salt thereof. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019840007315A 1983-11-23 1984-11-22 Method for preparing ureido derivative KR850003720A (en)

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US554852 1983-11-23

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KR850003720A true KR850003720A (en) 1985-06-26

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KR1019840007315A KR850003720A (en) 1983-11-23 1984-11-22 Method for preparing ureido derivative

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JP (1) JPS60136568A (en)
KR (1) KR850003720A (en)
DD (1) DD229124A5 (en)
DK (1) DK554884A (en)
ES (1) ES8706642A1 (en)
FI (1) FI844573L (en)
GR (1) GR81002B (en)
HU (1) HU193303B (en)
NO (1) NO844658L (en)
PT (1) PT79531B (en)

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JPS60136568A (en) 1985-07-20
DD229124A5 (en) 1985-10-30
FI844573A0 (en) 1984-11-21
NO844658L (en) 1985-05-24
HU193303B (en) 1987-09-28
FI844573L (en) 1985-05-24
ES8706642A1 (en) 1987-07-01
ES537831A0 (en) 1987-07-01
DK554884A (en) 1985-05-24
HUT36097A (en) 1985-08-28
GR81002B (en) 1985-03-15
DK554884D0 (en) 1984-11-22
PT79531A (en) 1984-12-01
PT79531B (en) 1986-12-11

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