KR850001780B1 - Process for the preparation of sulfato ethyl sulfon derivatives - Google Patents
Process for the preparation of sulfato ethyl sulfon derivatives Download PDFInfo
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- KR850001780B1 KR850001780B1 KR1019830004104A KR830004104A KR850001780B1 KR 850001780 B1 KR850001780 B1 KR 850001780B1 KR 1019830004104 A KR1019830004104 A KR 1019830004104A KR 830004104 A KR830004104 A KR 830004104A KR 850001780 B1 KR850001780 B1 KR 850001780B1
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C315/00—Preparation of sulfones; Preparation of sulfoxides
- C07C315/04—Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
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Abstract
Description
본 발명은 설페이토 에틸설폰 화합물의 제조방법에 관한 것이다.The present invention relates to a method for preparing a sulfatoethylsulfone compound.
특히, 본 발명은 농약, 의약 및 염류 등의 화합물의 제조에 많이 사용되는, 다음 일반식(I)의 유리산 형태인 아미노설페이트 에틸설폰 화합물을 제조하는 방법에 관한 것이다.In particular, the present invention relates to a method for preparing an aminosulfate ethylsulfone compound, which is a free acid form of the general formula (I), which is widely used for the preparation of compounds such as pesticides, medicines and salts.
(여기서 X1,X2는 각각 수소원자, 메틸기, 메톡시기, 또는 염소원자를 나타낸다)Where X 1 and X 2 each represent a hydrogen atom, a methyl group, a methoxy group or a chlorine atom
현재에는 아세틸아미노술핀산 화합물에 에틸렌옥사이드를 가압하에 반응시키고, 이의 반응 생성물을 농황산이나 발연황산 중에서 에스테르화 및 가수분해시켜 아미노설페이토 에틸설폰 화합물을 제조하고 있는데 이의 반응식을 표시하면 다음과 같다.Currently, an acetylaminosulfonic acid compound is reacted with ethylene oxide under pressure, and the reaction product thereof is esterified and hydrolyzed in concentrated sulfuric acid or fuming sulfuric acid to prepare an aminosulphate ethylsulfone compound. .
(여기서 X1및 X2는 위에서 정의한 바와 동일하다.)Where X 1 and X 2 are as defined above.
그러나 이러한 제조방법은 (1)제조과정에서 폭발위험성이 큰 에틸렌옥사이드를 사용하기 때문에 공정중 반응기내에 불활성 질소가스하에서 반응시켜야 하는 어려운 면이 있고, (2) 에틸렌옥사이드의 안전저장 및 취급을 위하여 특수 냉각샤워-저장조와 화제 및 폭발에 대비한 장치등 많은 특수장치를 구비하여야 하는 복잡성이 있고, (3) 고압하에서 반응시켜야 하기 때문에 고가의 오오토클레이브를 설치하여야 하며, 그리고 (4) 가압하의 기체-액체반응이기 때문에 수율이 나쁘고 고순도의 생성물을 얻기 어려운 등의 여러 결점을 내포하고 있다.However, this manufacturing method is difficult to react under inert nitrogen gas in the reactor because (1) ethylene oxide has a high explosion risk in the manufacturing process, and (2) special storage for safe storage and handling of ethylene oxide. It is complicated to have many special devices such as cooling shower-storage and fire and explosion protection device, and (3) expensive autoclave should be installed because it needs to react under high pressure, and (4) pressurized gas -Because of the liquid reaction, it has many disadvantages such as poor yield and difficulty in obtaining high purity products.
본 발명의 목적은 종래의 상기와 같은 문제점을 해결하고자 에틸렌옥사이드 대신에 상온에서 액체이며, 안정한 에틸렌크로로 하이드린을 하이드록시에틸화제로 사용하여, 반응장치를 간편히 하고, 취급을 안전히 함과 동시에, 고수율 및 고순도의 설페이토에틸설폰 화합물의 제조방법을 제공하는 데 있다.An object of the present invention is to use a liquid at room temperature instead of ethylene oxide to solve the above problems of the prior art, by using hydrin as a hydroxyethylating agent with a stable ethylene chromium, to simplify the reaction apparatus, and to handle safely To provide a method for producing a high yield and high purity sulfoethylsulfone compound.
본 발명에 따른 다음 일반식(I)의 설페이토 에틸설폰 화합물은, 다음 일반식(Ⅱ)의 아세틸아미노 술핀산 화합물 수용액에 에틸렌클로로 하이드린을 가하여 65 내지 80℃로 가열, 축합 반응시켜 다음 일반식(Ⅲ)의 아세틸아미노 하이드록시 에틸설폰 화합물을 제조한 다음, 이를 분리, 건조시킨 후 농황산 또는 발연황산으로 처리함으로써 제조할 수 있다.Sulphate ethyl sulfone compound of the following general formula (I) according to the present invention, by adding ethylene chloro hydrin to the aqueous solution of acetylamino sulfinic acid compound of the general formula (II), heated to 65 to 80 ℃, condensation reaction It can be prepared by preparing an acetylamino hydroxyethylsulfone compound of formula (III), then separating and drying it, followed by treatment with concentrated sulfuric acid or fuming sulfuric acid.
(여기서 X1및 X2는 위에서 정의한 바와 동일하다.)Where X 1 and X 2 are as defined above.
본 발명에서 출발물질로 사용한 일반식(Ⅱ)의 화합물의 예는 다음과 같다.Examples of the compound of formula (II) used as starting materials in the present invention are as follows.
4-아세틸아미노 나프탈렌-1-술핀산,4-acetylamino naphthalene-1-sulfinic acid,
5-아세틸아미노 나프탈렌-1-술핀산,5-acetylamino naphthalene-1-sulfinic acid,
6-아세틸아미노 나프탈렌-2-술핀산,6-acetylamino naphthalene-2-sulfinic acid,
3-아세틸아미노페닐-1-술핀산,3-acetylaminophenyl-1-sulfonic acid,
3-아세틸아미노페닐-4-메톡시-1-술핀산,3-acetylaminophenyl-4-methoxy-1-sulfinic acid,
3-아세틸아미노페닐-6-메톡시-1-술핀산,3-acetylaminophenyl-6-methoxy-1-sulfinic acid,
3-아세틸아미노페닐-4-메틸-1-술핀산,3-acetylaminophenyl-4-methyl-1-sulfinic acid,
3-아세틸아미노페닐-6-메틸-1-술핀산,3-acetylaminophenyl-6-methyl-1-sulfinic acid,
3-아세틸아미노페닐-6-클로로-1-술핀산,3-acetylaminophenyl-6-chloro-1-sulfinic acid,
4-아세틸아미노페닐-1-술핀산,4-acetylaminophenyl-1-sulfinic acid,
4-아세틸아미노페닐-3-클로로-술핀산,4-acetylaminophenyl-3-chloro-sulfonic acid,
4-아세틸아미노페닐-3,6-디메톡시-1-술핀산 및4-acetylaminophenyl-3,6-dimethoxy-1-sulfinic acid and
4-아세틸아미노페닐-3-메톡시-6-메틸-1-술핀산.4-acetylaminophenyl-3-methoxy-6-methyl-1-sulfinic acid.
본 발명을 실시예를 통해 더욱 자세히 설명하면 다음과 같다.The present invention will be described in more detail with reference to the following Examples.
[실시예 1]Example 1
4-메톡시-3-아세틸아미노페닐 술핀산 23g을 물 100㎖에 가하고, 가성소다로 중화, 용해시킨 다음, 에틸렌클로로 하이드린 11g을 가한다.23 g of 4-methoxy-3-acetylaminophenyl sulfinic acid is added to 100 ml of water, neutralized and dissolved in caustic soda, and then 11 g of ethylenechlorohydrin is added.
반응 혼합물을 65내지 70℃로 가열하고, 이때 생성되는 염산을 10%가성소다액으로 제거한 다음 pH를 8내지 8.5로 유지시킨다.The reaction mixture is heated to 65-70 ° C., at which time the resulting hydrochloric acid is removed with 10% caustic soda solution and the pH is maintained at 8-8.5.
반응 종료후 5℃까지 냉각하고, 여과하여 형성된 케이크를 건조시킨 결과, 4-메톡시-3-아세틸아미노페닐-β-하이드록시 에틸설폰(건조량 28.7g, 수율 99%)이 생성되었다.After the completion of the reaction, the mixture was cooled to 5 ° C. and filtered to dry the cake. As a result, 4-methoxy-3-acetylaminophenyl-β-hydroxyethylsulfone (dry amount 28.7 g, yield 99%) was produced.
상기 중간 생성물을 황산 45 내지 50g에 용해시키고, 40 내지 50℃로 3시간동안 유지시킨 다음, 얼음 60g과 물 60㎖중에 배출시키고 40내지 50℃에서 8시간 동안 교반한 결과 최종 생성물인 4-메톡시-3-아미노페닐-β-설페이토 에틸설폰을 얻었다.The intermediate product was dissolved in 45-50 g of sulfuric acid, maintained at 40-50 ° C. for 3 hours, then discharged in 60 g of ice and 60 ml of water and stirred for 8 hours at 40-50 ° C. to yield 4-meth as the final product. Toxy-3-aminophenyl-β-sulfato ethylsulfone was obtained.
수득량 41g(wet cake), 수율 98%.Yield 41 g (wet cake), yield 98%.
[실시에 2][Example 2]
4-아세틸 아미노페닐 술핀산 20g을 물 90㎖에 가하고, 가성소다로 중화, 용해시킨 다음, 에틸렌클로로 하이드린 11.5g을 가하고, 70℃로 가열한 후 생성된 산을 10% 가성소다액으로 제거하여 pH를 8 내지 8.5로 유지시킨다. 반응 종료후 5내지 10℃까지 냉각하고, 여과하여 형성된 케이크를 건조시킨 결과 4-아세틸아미노페닐-β-하이드록시에틸설폰이 생성되었다(건조량 26g, 수율 99%).20 g of 4-acetyl aminophenyl sulfinic acid are added to 90 ml of water, neutralized and dissolved in caustic soda, 11.5 g of ethylenechlorohydrin is added, heated to 70 ° C., and the resulting acid is removed with 10% caustic soda solution. To keep the pH between 8 and 8.5. After the completion of the reaction, the mixture was cooled to 5 to 10 ° C., and the cake formed by filtration was dried. As a result, 4-acetylaminophenyl-β-hydroxyethylsulfone was produced (dry amount 26 g, yield 99%).
이후는 실시예 1에서의 방법과 동일하게 수행한 결과 최종생성물인 4-아미노페닐-β-설페이토에틸설폰 38(wet cake)(수율 98%)을 얻었다.After the same procedure as in Example 1 to obtain the final product 4-aminophenyl-β-sulfatoethylsulfone 38 (wet cake) (yield 98%).
[실시예 3-6]Example 3-6
실시예 1과 2의 방법으로 다음과 같은 술핀산과 반응시킨 결과 고순도의 최종 생성물을 얻었다.As a result of reacting with sulfinic acid as described in Examples 1 and 2, a high purity final product was obtained.
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