KR840004185A - Chelation of metals - Google Patents

Chelation of metals Download PDF

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Publication number
KR840004185A
KR840004185A KR1019830001023A KR830001023A KR840004185A KR 840004185 A KR840004185 A KR 840004185A KR 1019830001023 A KR1019830001023 A KR 1019830001023A KR 830001023 A KR830001023 A KR 830001023A KR 840004185 A KR840004185 A KR 840004185A
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lead
solution
tin
weight
chelating agent
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KR1019830001023A
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Korean (ko)
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드라진(외1) 세파트
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세파드 드라진
지에스피 메탈스 앤드 케미칼스 코포레이숀
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Publication of KR840004185A publication Critical patent/KR840004185A/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/34Electroplating: Baths therefor from solutions of lead
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3473Plating of solder

Abstract

내용 없음No content

Description

금속의 킬레이트화Chelation of metals

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (34)

물, 설페이트이온, 전기도금하기에 효과적인 양의주석, 및 주석 100중량부당 적어도 약 2중량부의 납이 함유된 킬레이트화 납(여기서 납은, 납과 함께 설페이트 용액에 용해될 수 있는 5또는 6원그룹을 형성할 수 있는 2작용성 킬레이트제와 킬레이트화되어 있다)으로 이루어진 도금 수용액을 형성시키고; 금속성물질과 납으로 입혀진 유리부분으로 이루어진 구성물질을 도금용액에 넣고; 용액에 전류를 통하게 하여 금속성 물질위에 납과 주석을 용착시켜 적어도 약 90중량%의 주석과 적어도 약 2중량%의 납으로 이루어진 도금액을 형성시킴을 특징으로 하여 납으로 입혀진 유리부분을 포함하는 성분의 일부인 금속성물질을 적어도 2중량%의 납과 적어도 90중량%의 주석으로 이루어진 도금액으로 처리함으로써 금속성물질을 납과 주석으로 동시에 전기도금하는 방법.Lead chelated lead containing water, sulfate ions, an amount of tin effective for electroplating, and at least about 2 parts by weight of lead per 100 parts by weight of tin (where lead is a 5 or 6 member that can be dissolved in the sulfate solution together with lead) Forming an aqueous solution of a plating consisting of a chelating agent with a bifunctional chelating agent capable of forming a group); A component material consisting of a metallic material and a glass part coated with lead is placed in a plating solution; Conducting a current through the solution to deposit lead and tin on a metallic material to form a plating solution consisting of at least about 90% by weight tin and at least about 2% by weight lead. A method of electroplating a metallic material simultaneously with lead and tin by treating a portion of the metallic material with a plating liquid consisting of at least 2% by weight lead and at least 90% by weight tin. 물, 설페이트 이온 및 전기도금하는데 효과적인 양의 킬레이트화 납으로 이루어진 도금수용액을 형성시키고; 도금 수용액내에 금속성 물질을 넣고; 용액에 전류를 통하게 하여 금속성물질상에 납을 용착시킴을 특징으로 하여 금속성 물질을 납으로 전기도금하는 방법.Forming a plating solution consisting of water, sulfate ions and an amount of lead chelated effective to electroplating; Putting a metallic material into the plating aqueous solution; A method of electroplating a metallic material with lead, characterized in that the lead is deposited on the metallic material by passing a current through the solution. 제2항에 있어서, 형성단꼐가 주석함유 도금용액을 형성하는 단계인 방법.The method of claim 2, wherein the forming step is a step of forming a tin-containing plating solution. 제2항에 있어서 납과 함께, 설페이트 용액에 용해될 수 있는 5 또는 6원그룹을 형성할 수 있는 작용성 킬레이트제와 납을 킬레이트화 시키는 방법.3. The method of claim 2, wherein the lead is chelated with a functional chelating agent capable of forming a 5 or 6 membered group that can be dissolved in the sulfate solution together with lead. 제1항 또는 4항에 있어서, 킬레이트제가 오르가노-옥시-음이온 화합물인 방법.The method according to claim 1 or 4, wherein the chelating agent is an organo-oxy-anionic compound. 제5항에 있어서, 킬레이트제가 글루콘산인 방법.The method of claim 5 wherein the chelating agent is gluconic acid. 제5항에 있어서, 킬레이트제가 EDTA인 방법.The method of claim 5 wherein the chelating agent is EDTA. 제5항에 있어서, 킬레이트제가 디에틸글리신인 방법.The method of claim 5 wherein the chelating agent is diethylglycine. 제1항 또는 2항에 있어서, 도금용액에 물 갈론당 SoSO4로서 주석이 적어도 1중량 온스 함유된 방법.The method according to claim 1 or 2, wherein the plating solution contains at least 1 ounce of tin as SoSO 4 per gallon of water. 제3항에 있어서, 도금용액에 주석 100중량부당 적어도 2중량부의 납이 함유된 방법.The method according to claim 3, wherein the plating solution contains at least 2 parts by weight of lead per 100 parts by weight of tin. 물; 설페이트 이온; 및 금속성물질을 전기도금 하는데 충분한 양의 킬레이트화 납으로 이루어진, 전기도금에 적합한 조성물.water; Sulfate ions; And a sufficient amount of lead chelated lead for electroplating metallic material. 제11항에 있어서, 금속성 물질을 전기도금하는데 효과적인 양의 주석이 함유된 조성물.12. The composition of claim 11, wherein the composition contains an amount of tin effective for electroplating metallic material. 제11항에 있어서, 주석 100중량부당 적어도 2중량부의 납이 함유된 조성물.The composition of claim 11, wherein at least 2 parts by weight of lead are contained per 100 parts by weight of tin. 제11항에 있어서, 납과 함께 설페이트 용액에 용해될 수 있는 5 또는 6원그룹을 형성할 수 있는 2 작용성 킬레이트제와 납이 킬레이트화된 조성물.12. The composition of claim 11, wherein the lead is chelated with a bifunctional chelating agent capable of forming a 5 or 6 membered group that can be dissolved together with lead in a sulfate solution. 제14항에 있어서 킬레이트제가 오르가노-옥시-음이온인 방법.The method of claim 14 wherein the chelating agent is an organo-oxy-anion. 물; 물부피의 10부피%양의 황산; 습윤제; 물 갈론당 적어도 약 0.1(중량)온스의 황산주석; 주석 100중량부당 적어도 약 2중량부의 납으로된 킬레이트화 납(여기서, 납은 납과 함께 설페이트용액에 용해될 수 있는 5 또는 6원그룹을 형성할 수 있는 2작용성 킬레이트제와 킬레이트화 되어 있다.)으로 이루어진 전기도금용액.water; Sulfuric acid in an amount of 10% by volume of water; Wetting agents; At least about 0.1 (weight) ounces of tin sulfate per gallon of water; Chelated lead with at least about 2 parts by weight of lead per 100 parts by weight of tin, where lead is chelated with a bifunctional chelating agent that can form a 5- or 6-membered group that, together with lead, can be dissolved in sulfate solution Electroplating solution consisting of 제16항에 있어서, 킬레이트가 오르가노-옥시-음이온인 용액.The solution of claim 16 wherein the chelate is an organo-oxy-anion. 제17항에 있어서, 킬레이트제가 글루콘산인 용액.The solution of claim 17 wherein the chelating agent is gluconic acid. 제17항에 있어서 킬레이트제가 EDTA인 용액.The solution of claim 17 wherein the chelating agent is EDTA. 제17항에 있어서 킬레이트제가 디에틸 글리신인 용액.The solution of claim 17 wherein the chelating agent is diethyl glycine. 상호 융착된 주석(이는 도금액의 적어도 약 50중량%의 양으로 존재)과 납(도금액의 적어도 약 2중량%의 양으로 존재)으로 이루어진 도금액으로 전기도금한 금속 기판으로 구성된 제품.A product consisting of a metal substrate electroplated with a plating liquid consisting of interfused tin (which is present in an amount of at least about 50% by weight of the plating liquid) and lead (which is present in an amount of at least about 2% by weight of the plating liquid). 제21항에 있어서, 도금액이 주로 납과 주석으로 이루어진 제품.22. The product of claim 21, wherein the plating solution consists primarily of lead and tin. 제21항 또는 22항에 있어서, 도금액에 적어도 약 95중량%의 주석이 함유된 제품.23. The product of claim 21 or 22, wherein the plating liquid contains at least about 95 weight percent tin. 제21항에 있어서, 납으로 입혀진 유리부분으로 이루어진 제품.22. The product of claim 21, consisting of a glass portion coated with lead. 제21항 또는 22항에 있어서, 도금액에 광택제가 전혀 함유되지 않은 제품.The product according to claim 21 or 22, wherein the plating liquid contains no brightening agent. 납으로 입혀진 유리부분 및 상호 융착된 주석(도금액의 적어도 약 50중량%의 양으로 존재)과 납도금액의 적어도 약 2중량%의 양으로 존재)으로 주로 이루어지고 광택제가 전혀 함유되어 있지 않은 도금액으로 전기도금한 금속기판으로 이루어진 제품.A plating solution consisting mainly of lead-coated glass and interbonded tin (in an amount of at least about 50% by weight of the plating solution) and in an amount of at least about 2% by weight of the lead plating solution and containing no glaze. Products consisting of electroplated metal substrates. 금속의 전기도금을 효과적으로 하기 위해 선태된 오르가노-헤테로-음이온성 착화제와 납의 착물을 형성시켜 설페이트 용액내에 충분히 용해될 수 있는 착물을 형성시킴으로써 납의 설페이트 수용액을 제조하는 방법.A method for preparing an aqueous solution of lead sulfate by forming a complex of lead and an organo-hetero-anionic complexing agent selected for effective electroplating of a metal to form a complex that can be sufficiently dissolved in the sulfate solution. 제27항에 있어서 선택된 오르가노-헤테로-음이온성 착화제가 오르가노-옥시-음이온으로 이루어진 그룹에서 선택된 방법.The method of claim 27 wherein the organo-hetero-anionic complexing agent selected is selected from the group consisting of organo-oxy-anions. 제28항에 있어서, 오르가노-옥시-음이온이 글리신, 카복실산 및 알킬 아세토네이트로 이루어진 그룹에서 선택된 방법.The method of claim 28, wherein the organo-oxy-anion is selected from the group consisting of glycine, carboxylic acid and alkyl acetonate. 제29항에 있어서, 오르가노-옥시-음이온의 디에틸글리신, 글루콘산 및 에틸렌디아민테트리-아세트산으로 이루어진 그룹에서 선택된 방법.30. The method of claim 29, wherein the organo-oxy-anion is selected from the group consisting of diethylglycine, gluconic acid, and ethylenediaminetetri-acetic acid. 납의 전기도금을 효과적으로 하기 위해, 치환된 글리신, 카복실산 및 알킬아세토네이트의 그룹에서 선택된 오르가노-옥시-음이온성 착화제와 납이온과의 착물을 형성시켜 설페이트 용액내에 충분히 용해될 수 있는 착물을 제조하을 특징으로 하여 설페이트 수용액내에서 이수용액에 보통 용해되지 않는 납이온과 상기 설페이트 용액에 존재하는 주석이온과의 축물을 제조하는 방법.In order to effectively lead the electroplating of lead, a complex of an organo-oxy-anionic complexing agent selected from the group of substituted glycine, carboxylic acid and alkylacetonate and lead ions is formed to prepare a complex that can be sufficiently dissolved in the sulfate solution. A method of producing a condensate of lead ions which are not normally dissolved in diluents in an aqueous solution of sulfate and tin ions present in the sulfate solution. 납이 설페이트 용액내에서 전위차의 존재로 기판위에 도금 용착물을 형성할 수 있도록, 분자량이 250g/몰 이하인 소량의 유기산 킬레이트제를 용액에 가하여 충분히 용해될 수 있는 납과의 착물을 형성시킴으로써 보통 납이온이 설페이트용액에 용해되지 않는 납의 설페이트 수용액으로부터 기판을 납으로써 전기도금하는 방법.Usually lead is formed by adding a small amount of organic acid chelating agent with a molecular weight of 250 g / mol or less to the solution to form a complex with lead that can be sufficiently dissolved so that lead can form a plated deposit on the substrate in the presence of a potential difference in the sulfate solution. A method of electroplating a substrate by lead from an aqueous sulfate solution of lead in which ions do not dissolve in the sulfate solution. 설페이트 수용액내에서 이온성 납과 킬레이트제의 용해성 착물이 형성되도록 납화합물을 유기산킬레이트제와 함께 혼합시킴을 특징으로 하여 설페이트 수용액내에서 이온성 납을 킬레이트화 시키는 방법.A method of chelating ionic lead in an aqueous solution of sulphate, wherein the lead compound is mixed with an organic acid chelating agent to form a soluble complex of ionic lead and a chelating agent in an aqueous solution of sulfate. 제1항, 2항 또는 3항의 방법으로 제조한 금속성 물질.Metallic material prepared by the method of claim 1, 2 or 3. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019830001023A 1982-03-15 1983-03-15 Chelation of metals KR840004185A (en)

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DE3440668A1 (en) * 1984-11-07 1986-05-07 Dr.-Ing. Max Schlötter GmbH & Co KG, 7340 Geislingen METHOD FOR PRESERVING THE SOLUTABILITY OF LEAD TIN
JP2819180B2 (en) * 1990-02-22 1998-10-30 信康 土肥 Tin-lead-bismuth alloy plating bath
GB9910681D0 (en) * 1999-05-07 1999-07-07 Enthone Omi Benelux Bv Alloy plating
US6387229B1 (en) 1999-05-07 2002-05-14 Enthone, Inc. Alloy plating
JP6607106B2 (en) 2015-03-26 2019-11-20 三菱マテリアル株式会社 Plating solution using sulfonium salt
WO2016152997A1 (en) * 2015-03-26 2016-09-29 三菱マテリアル株式会社 Plating solution using sulfonium salt

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US2751341A (en) * 1952-06-03 1956-06-19 Gen Motors Corp Electrodeposition of lead and lead alloys
NL111650C (en) * 1955-12-02
US3042550A (en) * 1958-05-23 1962-07-03 Corning Glass Works Solid delay line improvements
US3625837A (en) * 1969-09-18 1971-12-07 Singer Co Electroplating solder-bump connectors on microcircuits
US3875029A (en) * 1974-02-19 1975-04-01 R O Hull & Company Inc Plating bath for electrodeposition of bright tin and tin-lead alloy
US3956123A (en) * 1974-02-19 1976-05-11 R. O. Hull & Company, Inc. Additive for electrodeposition of bright tin and tin-lead alloy

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WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid