KR830006309A - Process for preparing cefem compound - Google Patents

Process for preparing cefem compound Download PDF

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KR830006309A
KR830006309A KR1019810002223A KR810002223A KR830006309A KR 830006309 A KR830006309 A KR 830006309A KR 1019810002223 A KR1019810002223 A KR 1019810002223A KR 810002223 A KR810002223 A KR 810002223A KR 830006309 A KR830006309 A KR 830006309A
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alkyl
amino
carboxy
group
substituted
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KR1019810002223A
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Korean (ko)
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쯔도무 데라지
가즈오 사까네
지로오 고오또
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후지자와 도모기찌로오
후지사와 야꾸힝 고오교오 가부시기가이샤
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Priority to KR1019810002223A priority Critical patent/KR830006309A/en
Publication of KR830006309A publication Critical patent/KR830006309A/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/02Preparation
    • C07D501/04Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/38Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof
    • C07D501/46Methylene radicals, substituted by nitrogen atoms; Lactams thereof with the 2-carboxyl group; Methylene radicals substituted by nitrogen-containing hetero rings attached by the ring nitrogen atom; Quaternary compounds thereof with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)

Abstract

내용 없음No content

Description

세펨화합물의 제조방법Process for preparing cefem compound

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (59)

다음 구조식 화합물 또는 이들의 염을The following structural compounds or salts thereof R3a가 적합한 치환될 수 있는 티아졸 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 알킬카르바모일, 카르복시, 보호된 카르복시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬, 카르복시(저급)알킬과 하이드록시이미노(저급)알킬로 치환된 피리딘인 구조식의 화합물과 반응시켜 다음 구조식의 신규 세펨화합물 또는 약학적으로 받아들여질 수 있는 이들의 염류를 제조하는 방법.Thiazole or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkylcarbamoyl, carboxy, protected carboxy, lower alkyl, hydroxy, where R 3a may be suitable substituted Reacted with a compound of the formula: pyridine substituted with (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, carboxy (lower) alkyl and hydroxyimino (lower) alkyl A process for preparing novel cefem compounds of the formula or their pharmaceutically acceptable salts. 상기식에서In the above formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2는 수소, 적합한치환체로 치환될 수 있는 저급지방족 탄화수소그룹, 사이클로(저급)알킬 또는 사이클로(저급)알켄일;이고R 2 is hydrogen, a lower aliphatic hydrocarbon group which may be substituted with a suitable substituent, cyclo (lower) alkyl or cyclo (lower) alkenyl; and R3는 적합한 치환체로 치환될 수 있는 티아졸리오그룹 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 알킬카르바모일, 카르복시, 저급알킬하이드록시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬, 카르복시(저급)알킬과 하이드록시이미노(저급)알킬로부터 선택된 치환체로 치환된 피리디니오그룹;R 3 is a thiazio group or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkylcarbamoyl, carboxy, lower alkylhydroxy, which may be substituted with suitable substituents, A pyri substituted with a substituent selected from lower alkyl, hydroxy (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, carboxy (lower) alkyl and hydroxyimino (lower) alkyl Dinio group; R4는 구조식 R3의 그룹으로 치환할 수 있는 그룹이다R 4 is a group which may be substituted with a group of the structural formula R 3 다음 구조식 화합물 또는 아미노그룹에서 이것의 반응성유도체 또는 이들의 염을In the following structural compounds or amino groups, the reactive derivatives thereof or salts thereof 다음 구조식 화합물 또는 카르복시 그룹에서 이것의 반응성 유도체 또는 이들의 염과And the reactive derivatives thereof or salts thereof in the following structural compounds or carboxy groups 반응시켜 다음 구조식 화합물의 신규세펨화합물 또는 약학적으로 받아들여 질 수 있는 이들의 염류를 제조하는 방법.Reacting to produce novel cefem compounds of the following structural compounds or pharmaceutically acceptable salts thereof. 상기식에서In the above formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2는 수소, 적합한치환체로 치환될 수 있는 저급지방족 탄화수소그룹, 사이클로(저급)알킬 또는 사이클로(저급)알켄일;이고R 2 is hydrogen, a lower aliphatic hydrocarbon group which may be substituted with a suitable substituent, cyclo (lower) alkyl or cyclo (lower) alkenyl; and R3는 적합한 치환체로 치환될 수 있는 티아졸리오그룹 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 알킬카르바모일, 카르복시, 보호된 카르복시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬,R 3 is a thiazio group or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkylcarbamoyl, carboxy, protected carboxy, lower which may be substituted with suitable substituents Alkyl, hydroxy (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, 카르복시(저급)알킬과 하이드록시아미노(저급)알킬로 치환된 피리디노그룹Pyridino groups substituted with carboxy (lower) alkyl and hydroxyamino (lower) alkyl 다음 구조식 화합물 또는 이들의 염을 아미노-보호 그룹의 제거반응으로 맞춰The following structural compounds or salts thereof are tailored to the elimination of amino-protecting groups 다음 구조식의 신규 세펨화합물 또는 약학적으로 받아들여 질 수 있는 이들의 염류를 제조하는 방법.A method for preparing a novel cefem compound of the formula or a pharmaceutically acceptable salt thereof. 상기구조식에서In the above structural formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2는 수소, 적합한치환체로 치환될 수 있는 저급지방족 탄화수소그룹, 사이클로(저급)알킬 또는 사이클로(저급)알켄일;이고R 2 is hydrogen, a lower aliphatic hydrocarbon group which may be substituted with a suitable substituent, cyclo (lower) alkyl or cyclo (lower) alkenyl; and R3c는 아미노(저급)알킬로 치환된 피리디니오그룹R 3c is a pyridinio group substituted with amino (lower) alkyl R3b는 보호된 아미노(저급)알킬로 치환된 피리디니오그룹R 3b is a pyridinio group substituted with a protected amino (lower) alkyl 다음 구조식 화합물 또는 이들의 염을 카르복시-보호그룹의 제거반응으로 맞춰The following structural compounds or salts thereof are tailored to the removal of carboxy-protecting groups 다음 구조식의 신규세펨화합물 또는 약학적으로 받아들여 질수 잇는 이들의 염류를 제조하는 방법.A method for producing a novel cefem compound of the formula or a pharmaceutically acceptable salt thereof. 상기식에서In the above formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2b는 카르복시(저급)알킬;이고R 2b is carboxy (lower) alkyl; R3는 적합한 치환체로 치환될 수 있는 티아졸리오 그룹 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 아킬카르바모일, 카르복시, 보호된 카르복시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬, 카르복시(저급)알킬과 하이드록시이미노(저급)알킬;R 3 is a thiaziolio group which may be substituted with a suitable substituent or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkcarbamoyl, carboxy, protected carboxy, lower Alkyl, hydroxy (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, carboxy (lower) alkyl and hydroxyimino (lower) alkyl; R2a는 보호된 카르복시(저급)알킬,R 2a is a protected carboxy (lower) alkyl, 다음 구조식 화합물을 카르복시-보호그룹의 제거반응으로 맞춰The following structural compound is matched by the removal of the carboxy-protecting group 다음 구조식의 신규 세펨화합물 또는 약학적으로 받아들여 질 수 있는 이들의 염류를 제조하는 방법.A method for preparing a novel cefem compound of the formula or a pharmaceutically acceptable salt thereof. 상기 구조식에서In the above structural formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2는 수소, 적합한 치환체로 치환될 수 있는 저급지방족, 탄화수소그룹, 사이클로(저급)알킬 또는 사이클로(저급)알켄일;이고R 2 is hydrogen, lower aliphatic, hydrocarbon group, cyclo (lower) alkyl or cyclo (lower) alkenyl, which may be substituted with a suitable substituent; R3는 적합한 치환체로 치환될 수 있는 티아졸리오 그룹 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 아킬카르바모일, 카르복시, 보호된 카르복시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬, 카르복시(저급)알킬과 하이드록시이미노(저급)알킬로 구성되는 그룹으로부터 선택된 치환체로 치환된 피리디니오 그룹;R 3 is a thiaziolio group which may be substituted with a suitable substituent or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkcarbamoyl, carboxy, protected carboxy, lower A substituent selected from the group consisting of alkyl, hydroxy (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, carboxy (lower) alkyl and hydroxyimino (lower) alkyl Substituted pyridinio groups; R5는 보호된 카르복시 그룹이고R 5 is a protected carboxy group X는 산잔류물이다.X is an acid residue. 다음 구조식 화합물 또는 이들의 염을 환원시켜By reducing the following structural compounds or salts thereof 다음 구조식 화합물 또는 이들의 염을 제조하는 방법.Next method for preparing the structural compounds or salts thereof. 상기 구조식에서In the above structural formula R1은 아미노 또는 보호된 아미노그룹;R 1 is an amino or protected amino group; R2는 수소, 적합한 치환체로 치환될 수 있는 저급지방족, 탄화수소그룹, 사이클로(저급)알킬 또는 사이클로(저급)알켄일;R 2 is hydrogen, lower aliphatic, hydrocarbon group, cyclo (lower) alkyl or cyclo (lower) alkenyl which may be substituted with a suitable substituent; R3는 적합한 치환체로 치환될 수 있는 티아졸리오 그룹 또는 할로겐, 시아노, 하이드록시, 아미노, 아실아미노, 저급알카노일, 하이드록시카르바모일, 아킬카르바모일, 카르복시, 보호된 카르복시, 저급알킬, 하이드록시(저급)알킬, 설포(저급)알킬, 보호된 아미노(저급)알킬, 아미노(저급)알킬, 카르복시(저급)알킬과 하이드록시이미노(저급)알킬;R 3 is a thiaziolio group which may be substituted with a suitable substituent or halogen, cyano, hydroxy, amino, acylamino, lower alkanoyl, hydroxycarbamoyl, alkcarbamoyl, carboxy, protected carboxy, lower Alkyl, hydroxy (lower) alkyl, sulfo (lower) alkyl, protected amino (lower) alkyl, amino (lower) alkyl, carboxy (lower) alkyl and hydroxyimino (lower) alkyl; R5는 보호된 카르복시 그룹;R 5 is a protected carboxy group; X는 산잔류물;X is acid residue; ※참고사항:최초출원 내용에 의하여 공개하는 것임.※ Note: This is to be disclosed based on the first application.
KR1019810002223A 1981-06-18 1981-06-18 Process for preparing cefem compound KR830006309A (en)

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