KR830004226A - Method for preparing iso gil acetic acid derivative - Google Patents

Method for preparing iso gil acetic acid derivative Download PDF

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Publication number
KR830004226A
KR830004226A KR1019800003456A KR800003456A KR830004226A KR 830004226 A KR830004226 A KR 830004226A KR 1019800003456 A KR1019800003456 A KR 1019800003456A KR 800003456 A KR800003456 A KR 800003456A KR 830004226 A KR830004226 A KR 830004226A
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KR
South Korea
Prior art keywords
group
acid derivative
general formula
following general
acetic acid
Prior art date
Application number
KR1019800003456A
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Korean (ko)
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KR840000192B1 (en
Inventor
게이이찌 이시미쓰
이사무 가사하라
도미오 야마다
마찌히꼬 마쓰다
히데미쓰 다까하시
슈우찌 소오마
Original Assignee
모리사와 요시오
닛뽕 소오다 가부시기 가이샤
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Priority to KR1019800003456A priority Critical patent/KR840000192B1/en
Publication of KR830004226A publication Critical patent/KR830004226A/en
Application granted granted Critical
Publication of KR840000192B1 publication Critical patent/KR840000192B1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C215/00Compounds containing amino and hydroxy groups bound to the same carbon skeleton

Abstract

내용 없음No content

Description

이소 길초산 유도체의 제조방법Method for preparing iso gil acetic acid derivative

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

Claims (1)

하기 일반식(Ⅱ)로 표시되는 이소 길초산과 하기 일반식(Ⅲ)으로 표시되는 벤질알콜과를 반응시킴을 특징으로 하는 하기 일반식(Ⅰ)로 표시되는 이소길초산 유도체의 제조 방법.A method for producing an isogilic acid derivative represented by the following general formula (I), characterized by reacting an isogilonic acid represented by the following general formula (II) with a benzyl alcohol represented by the following general formula (III). 상기 식들에 있어서,In the above formulas, X는 할로겐치환페닐기, 저급 알킬기, 저급 할로알킬기, 저급 할로알콕시기, 3,4-메틸렌디옥시기 또는 니트로기, 나프탈기, 스티릴기 또는 염소치환 저급 알케닐기를 나타내고,X represents a halogen-substituted phenyl group, a lower alkyl group, a lower haloalkyl group, a lower haloalkoxy group, a 3,4-methylenedioxy group or a nitro group, a naphthal group, a styryl group or a chlorine-substituted lower alkenyl group, R1은 수소원자, 시아노기 또는 에티닐기를 나타내며,R 1 represents a hydrogen atom, a cyano group or an ethynyl group, R2는 수소원자, 저급 알킬기, 저급 알케닐기 또는 저급 알키닐기를 나타내며,R 2 represents a hydrogen atom, a lower alkyl group, a lower alkenyl group or a lower alkynyl group, Z는 페닐기 또는 할로페닐기를 나타낸다.Z represents a phenyl group or a halophenyl group. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019800003456A 1980-09-02 1980-09-02 Process for the preparation of isovaleric acid derivatives KR840000192B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019800003456A KR840000192B1 (en) 1980-09-02 1980-09-02 Process for the preparation of isovaleric acid derivatives

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019800003456A KR840000192B1 (en) 1980-09-02 1980-09-02 Process for the preparation of isovaleric acid derivatives

Publications (2)

Publication Number Publication Date
KR830004226A true KR830004226A (en) 1983-07-09
KR840000192B1 KR840000192B1 (en) 1984-02-28

Family

ID=19217587

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800003456A KR840000192B1 (en) 1980-09-02 1980-09-02 Process for the preparation of isovaleric acid derivatives

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KR (1) KR840000192B1 (en)

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Publication number Publication date
KR840000192B1 (en) 1984-02-28

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