KR830000455Y1 - Plate Automatic Processing Equipment - Google Patents

Plate Automatic Processing Equipment Download PDF

Info

Publication number
KR830000455Y1
KR830000455Y1 KR2019790001149U KR790001149U KR830000455Y1 KR 830000455 Y1 KR830000455 Y1 KR 830000455Y1 KR 2019790001149 U KR2019790001149 U KR 2019790001149U KR 790001149 U KR790001149 U KR 790001149U KR 830000455 Y1 KR830000455 Y1 KR 830000455Y1
Authority
KR
South Korea
Prior art keywords
tank
treatment
plate
processing
process liquid
Prior art date
Application number
KR2019790001149U
Other languages
Korean (ko)
Inventor
도시하루 유끼
마사요시 와까바야시
가즈오 오까다
Original Assignee
이시다 도꾸지로오
다이닛뽕 스크린 세이죠 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 도꾸지로오, 다이닛뽕 스크린 세이죠 가부시끼 가이샤 filed Critical 이시다 도꾸지로오
Priority to KR2019790001149U priority Critical patent/KR830000455Y1/en
Application granted granted Critical
Publication of KR830000455Y1 publication Critical patent/KR830000455Y1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)

Abstract

내용 없음.No content.

Description

판재 자동처리장치Plate Automatic Processing Equipment

제1도는 본 고안에 의한 장치의 개략 구성도.1 is a schematic configuration diagram of an apparatus according to the present invention.

제2도는 처리액 순환계통의 일부단면도.2 is a partial cross-sectional view of the treatment liquid circulation system.

제3도와 제5도는 각각 분무 노즐이 다른 실시예를 그 토출방향에서 본 견취도.3 and 5 show the embodiment in which the spray nozzles are different from each other in the discharge direction.

제4도는 제3도의 IV-IV선 단면도.4 is a cross-sectional view taken along the line IV-IV of FIG.

제6도는 제5도의 VI-VI선 단면도.6 is a sectional view taken along the line VI-VI of FIG.

본 고안은 PS판 등의 판재 자동 처리장치에 관한 것으로 특히 포지타입(posi-Type) 및 네가타입(Nega-Type) 판재의 한면 또는 양면현상이 간단한 조작으로 절환이 되는 처리액 순환방식의 판재 자동처리장치에 관한 것이다.The present invention relates to a plate automatic processing device such as PS plate, and in particular, the plate liquid of the processing liquid circulation type in which one-sided or double-sided phenomenon of posi-type and negative-type plate is switched by simple operation. It relates to a processing apparatus.

처리액 순환방식의 판재자동처리장치는 통상 그 처리장치안에 내장되어 있는 처리액조로부터 현상액 등의 처리액을 노즐 등을 거쳐서 판재위에 공급하여 처리후 이 액을 이 처리액조에 다시 회수하여 순환사용함으로서 판재의 처리를 행하여왔다.The plate liquid processing apparatus of the processing liquid circulation method is generally supplied from the processing liquid tank built into the processing apparatus to a plate material through a nozzle or the like, and then collected and circulated again in this processing liquid tank after treatment. The sheet material has been processed.

그러나 판재에는 포지타입과 네가타입의 두 종류가 있으며 이들 판재의 현상액은 그 성분이 각각 다르기 때문에 상기의 장치로서 포지타입과 네가타입의 판재를 현상할 필요가 있는 경우에는, 현상액을 포지용에서 네가용으로 혹은 네가용에서 포지용으로 바꾸어 넣어 교환할 필요가 있다.However, there are two kinds of plate types, forge type and negative type, and the developing solution of these plate materials is different. Therefore, if it is necessary to develop the plate type of forge type and negative type as the above apparatus, It is necessary to exchange them for dragons or for fours for forge.

이러한 수고를 피하기 위해서는 포지타입전용 및 네가타입 전용으로서 적어도 2대의 처리장치가 필요하며, 설치 면적의 문제와 함께, 코스트가 높아지는 등 경제성에도 문제가 있다.In order to avoid such troubles, at least two processing apparatuses are required, one for the positive type and one for the negative type, and there is a problem in economical efficiency, such as a problem in the installation area and a high cost.

본 고안은 이러한 불편을 해소하고 포지타입 및 네가 타입 판재의 한면 혹은 양면처리가 간단한 절환조작으로서 가능하게 되는 판재자동 처리장치를 제공하는 것을 그 목적으로 한다.It is an object of the present invention to provide an automatic plate processing apparatus which eliminates such inconvenience and enables one-sided or double-sided processing of a forge type and a negative type plate as a simple switching operation.

제1도는 본 고안에 의한 판재 자동처리장치의 일예를 나타내는 개략구성도로서 처리조(1), 수세조(2), 제1처리액조(3), 제2처리액조(4) 및 배수조(5) 등으로 구성되어 있다.1 is a schematic configuration diagram showing an example of an automatic plate processing apparatus according to the present invention, which is a treatment tank 1, a water washing tank 2, a first treatment liquid tank 3, a second treatment liquid tank 4, and a drainage tank ( 5) and the like.

처리조(1)의 내부에는, 처리할 판재가 탈락되지 않게끔 적당한 간격으로 설치되어 있는 다수의 반송롤러(6), (6)…, 반송롤러겸 압착롤러(7), (7), 브러쉬롤러(8), (8)이 배설되고, 이러한 반송롤러(6)등으로 형성되는 반송로를 거쳐서 적당한 수의 상, 하측 분무노즐(10), (13) 및 (11), (14)가 대향으로 설치되어 있다.In the processing tank 1, a plurality of conveying rollers 6, 6,... Which are provided at appropriate intervals so as not to drop off the plate to be processed. , Conveying rollers and pressing rollers (7), (7), brush rollers (8), (8) are disposed, and a suitable number of upper and lower spray nozzles through a conveying path formed of such conveying rollers (6), etc. 10), (13), (11) and (14) are provided oppositely.

이 분무노즐(10), (11)은 예를 들면 포지용 현상액이 들어있는 제1처리액조(3)에, 펌프(9) 및 이 펌프의 양수압조정용밸브(17)을 거쳐서 접속배관되어 있고, 분무노즐(13), (14)는 예를들면 네가용 현상액이 들어있는 제2처리액조(4)에, 펌프(12) 및 이 펌프의 양수압조정용 밸브(17)을 거쳐서 접속배관되어 있다.The spray nozzles 10 and 11 are connected to, for example, a first processing liquid tank 3 containing forge developer through a pump 9 and a pump for adjusting the water pressure of the pump 17. , The spray nozzles 13 and 14 are connected to, for example, a second processing liquid tank 4 containing negative developer through a pump 12 and a pump for adjusting the pumping pressure of the pump. .

수세조(2)의 내부에는, 처리조(1)과 마찬가지로 적당한 간격으로 반송롤러(6), (6), 압착롤러(21)가 배설되어 있고 수도물 등의 수원에 솔레노이밸브(19)를 거쳐서 접속 배관되어 있는 상, 하측 분무노즐(20), (20)이 대향으로 설치되어 있다. 즉 같은도면에 점선으로 표시되어 있는 솔레노이드 밸브(15), (16)은 판재의 양면을 처리하는 경우에만 개방되도록 구성되어 있다. 또 처리조(1) 및 수세조(2)의 저부에는 각각 배수구(18) 및 (22)가 설치되어 있으며, 배수구(18)은 다음과 같이 제1처리액조(3), 제2처리액조(4) 및 배수조(5)에 마음대로 절환되어 접속되도록 구성되어 있다. 이러한 구성의 판재자동 처리장치로서 현상처리를 행하는 경우, 먼저 처리시킬 판재가 포지타입이냐, 네가타입이냐에 따라, 제1처리액조(3) 혹은 제2처리액조(4)의 어느 현상액을 사용할 것인가를 선택할 필요가 있다.In the water washing tank 2, the conveying rollers 6, 6 and the pressing roller 21 are disposed at appropriate intervals in the same manner as the treatment tank 1, and the solenoid valve 19 is placed in a water source such as tap water. The upper and lower spray nozzles 20, 20, which are connected to each other via pipes, are provided to face each other. That is, the solenoid valves 15 and 16, which are indicated by dotted lines in the same drawing, are configured to open only when both surfaces of the sheet are processed. Further, drains 18 and 22 are provided at the bottoms of the treatment tank 1 and the water washing tank 2, respectively, and the drain port 18 includes the first treatment liquid tank 3 and the second treatment liquid tank ( 4) and the sump 5 are comprised so that it may be switched and connected at will. In the case of developing a plate automatic processing apparatus having such a structure, first, which developer of the first processing liquid tank 3 or the second processing liquid tank 4 is to be used, depending on whether the plate to be processed is a forge type or a negative type. You need to choose.

먼저 제1처리액조(3)을 선택한 경우에 관하여 설명하면, 상기 선택과 타이머로서 처리시간의 설정이 완료된 후, 처리시킬 판재를 처리조(1)의 시작단(28)에 삽입하고 처리조(1) 안에 설치되어 있는 마이크로스윗치등의 검출기가 해당판재를 검출하고 이 검출신호에 따라 처리조(1) 내의 반송롤러(6), 반송롤러겸 압착롤러(7) 및 브러쉬롤러(8)가 회전하고, 분무노즐(10), (11)에서 현상액이 해당판재에 분사된다.First, the case where the first processing liquid tank 3 is selected will be described. After the selection and the setting of the processing time as the timer are completed, the plate to be processed is inserted into the start end 28 of the processing tank 1 and the processing tank ( 1) A detector such as a microswitch installed inside detects the sheet material, and the conveying roller 6, the conveying roller and the pressing roller 7 and the brush roller 8 in the processing tank 1 rotate according to the detection signal. Then, the developer is sprayed onto the plate from the spray nozzles (10) and (11).

상기와 같이 해당판재가 반송되면서 현상되는 사이에 현상처리에 사용된 처리조(1) 내의 현상액은 배출구(18)로부터 제1처리액조(3)에 되돌아가고 펌프(9)에 의하여 순환된다. 이리하여 현상된 후 해당판재는 수세조(2)에 반송되어 분무노즐(20)에서 분출되는 수도물등에 의하여 수세된 후 압착롤러(21)에서 압착되어 종단(29)으로부터 배출된다.As described above, the developing solution in the processing tank 1 used for the developing treatment while being developed while being conveyed is returned to the first processing liquid tank 3 from the outlet 18 and circulated by the pump 9. After development, the plate is conveyed to the washing tank 2, washed with tap water sprayed from the spray nozzle 20, and then pressed in the pressing roller 21 to be discharged from the terminal 29.

다음에 이 제1처리액조(3)의 현상액에 의하여 현상 처리되고 계속하여 제2처리액조(4)에 들어있는 현상액을 사용하여 현상처리를 행하는 경우, 현상액의 절환은 다음과 같은 수단으로 행한다.Next, in the case where the developing treatment is carried out by the developing solution of the first processing solution tank 3 and subsequently using the developing solution contained in the second processing solution tank 4, switching of the developing solution is performed by the following means.

제2도는 이러한 수단을 나타내는 1부단면도로서 (30)은 처리조(1)의 밑판, (31)은 처리조(1)의 배수구(18)에 대응하는 개구부(38)에 고정되며 그 외주면에 나사로 새겨져 있는 원통부재, (32)는 원통부재(31)에 ○형링(33)을 거쳐 서로 접속되어 있는 접속원통부재로서, 원통부재(31)의 나사에 이가 맞는 나사를 내주면에 가지는 커버-부재(34)에 의하여 탈락되지 않도록 보지되어 있다. (35)는 여러가지 사구(蛇口)상의 형상으로된 배수관으로, 그 한쪽 끝은 접속원통부재(32)에 고정되어 이 접속원통부재(32)와 함께 회전되고, 다른 끝은 예를 들면 제1처리액조(3)의 상부 개구단에 대향으로 되어, 현상처리에 제공된 현상액이 이 제1처리액조(3)에 돌아오게끔 되어 있다. (36)은 이 배수관(35)에 일체적으로 취부되는 스프로케트이며, 이 스프로케트(36)은 체인(37)에 의하여 제어반(도시되지 않음)상의 절환레버에 연동하여 회전하는 스프로케트에 접속되어 있다. 그러므로 절환레버를 소정량 회전시키면 스프로케트(35)가 연동되어 회전하고, 배수관(36)의 상기 다른 끝을 제1처리액조(3)로부터 제2처리액조(4)에 대향으로 놓을 수가 있어서 순환사용되는 현상액의 절환이 된다.2 is a one-part cross-sectional view showing such a means, in which 30 is the bottom plate of the treatment tank 1, and 31 is fixed to the opening 38 corresponding to the drainage port 18 of the treatment tank 1, The cylindrical member engraved with the screw 32 is a connecting cylindrical member which is connected to the cylindrical member 31 via a ring ring 33, and has a screw on the inner circumferential surface thereof that matches the screw of the cylindrical member 31. It is hold | maintained so that it may not fall off by the member 34. Reference numeral 35 is a drain pipe having a shape of various sand dunes, one end of which is fixed to the connecting cylindrical member 32 and rotated together with the connecting cylindrical member 32, and the other end thereof is, for example, a first treatment. It faces the upper opening end of the liquid tank 3, and the developing solution provided for the developing process is returned to this 1st processing liquid tank 3. As shown in FIG. Reference numeral 36 denotes a sprocket integrally mounted to the drain pipe 35, and the sprocket 36 is connected to a sprocket that rotates in conjunction with a switching lever on a control panel (not shown) by a chain 37. It is. Therefore, when the switching lever is rotated by a predetermined amount, the sprocket 35 is interlocked to rotate, and the other end of the drain pipe 36 can be placed opposite to the second processing liquid tank 4 from the first processing liquid tank 3 so that the circulation The developer used is switched.

또한 상기 현상액의 절환조작과 연동되는, 예를들면 리레이 등에 의하여 현상액을 순환시킬 수 있는 펌프(9), (12)로서도 절환되지만 상기 절환을 더 확실하게 하기 위해서는, 배수관(35)의 상기 다른 끝이 각 처리액조(3) 및 (4)의 상구 개구단과 대향하는가를 검출하는 근접 스위치등의 검출기를 설치하여 이 검출기로부터의 신호가 없는 경우에는 현상액을 순환시키는 각 펌프가 작동되지 않도록 되어 있다.It is also switched to the pumps 9 and 12 which can circulate the developer by, for example, a relay or the like, which is linked to the switching operation of the developer, but in order to ensure the switching more, the other part of the drain pipe 35 When a detector such as a proximity switch for detecting whether the end faces the upper opening end of each of the processing liquid tanks 3 and 4 is provided, and there is no signal from this detector, each pump for circulating the developer is not operated. have.

또한 본 고안에 의거한 장치에는 판재의 양면을 동시에 처리하도록 하기 위하여 판재 반송로의 하측에도 분무노즐(11), (14)가 배설되어 있으며, 예를 들면 판재의 한면 처리의 경우에 상측의 분무노즐만을 사용한 후에, 현상액을 절환하기전의 현상액의 처리조(1) 및 하측 분무노즐(11), (14)의 분사구멍 내부에 약간 잔류하며, 성분이 다른 2종의 현상액이 섞이는 폐단이 있다.In addition, in the apparatus according to the present invention, spray nozzles 11 and 14 are disposed in the lower side of the plate conveying path so that both sides of the plate can be simultaneously processed. After using only a nozzle, there exists a closed end which remains slightly in the injection hole of the processing tank 1 and the lower spray nozzles 11 and 14 of the developing solution before switching a developing solution, and mixes two types of developing solution from which a different component is mixed.

상기의 폐단은 현상액을 절환할 때에 있어서, 배수관(35)의 다른 끝을 배수조(5)에 대향으로 한 후, 처리조(1) 내부를 수세함과 동시에, 분무노즐의 분사공을 제3도 내지 제6도에서 도시된 것처럼 비교적 급준한 테퍼를 가지고 돌출되도록 하고, 분무노즐의 관의면에 수직으로 돌출되는 구조로 하므로서 최소한으로 억제할 수가 있다.In the above closed end, when switching the developer, the other end of the drain pipe 35 faces the drain tank 5, and then the inside of the treatment tank 1 is washed with water and the spray hole of the spray nozzle is discharged to the third. As shown in Figs. 6 to 6, it is possible to protrude with a relatively steep taper and to minimize the structure by protruding perpendicularly to the surface of the tube of the spray nozzle.

본 고안의 요지는, 성분이 다른 복수종류의 처리액을, 그 처리액이 들어있는 복수의 처리액조로부터 단일의 처리조에 해당 처리액이 서로 섞이지 않게 순환시키기 위한 값싸고 확실한 수단을 갖추는 점에 있는바, 예를들면 포지타입 및 네가티입의 판재현상처리가 현상액순환계의 간단한 절환에 의하여 동일한 처리장치에서 행할 수가 있으며, 종래와 같은 처리액을 바꾸어 넣는 수고 및 시간을 필요로 하지않고, 처리장치를 복수의 대수로 설치할 필요도 없는등, 실용상 다대한 이점을 가진 것이다.The gist of the present invention is to provide an inexpensive and reliable means for circulating a plurality of types of treatment liquids having different components from a plurality of treatment liquid tanks containing the treatment liquid to a single treatment tank so that the treatment liquids do not mix with each other. For example, the plate development process of the forge type and the negative type can be performed in the same processing apparatus by simple switching of the developer circulation system, and the processing apparatus is eliminated without requiring the trouble and time of replacing the conventional processing liquid. It does not need to be installed in plural numbers, and has a great advantage practically.

또한 상기 설명에서는, 판재를 다른 성분의 현상액에 의하여 현상처리하는 경우를 예로들어 설명하였지만, 본 고안에 의거한 장치는 상기 경우 이외에, 예를들면 부식장치로서 사용할 수도 있다.In the above description, the case where the plate is developed by using a developing solution of another component has been described as an example, but the apparatus based on the present invention can be used as a corrosion apparatus, for example, in addition to the above cases.

Claims (1)

처리조내 및 수세조내의 전장에 걸쳐 배설되어 있는 판재반송(搬送) 수단, 처리조 내에 배설되어, 반송(搬送)되는 판재에 처리액을 공급하는 복수의 처리액 공급수단, 다른 성분의 처리액을 수용하는 복수의 처리액조, 각처리액조의 처리액을, 해당의 각 처리액조와 대응하는 처리액공급수단에 보내기 위한 처리액송출작동수단, 처리조와 보수의 처리액조와를 선택 접속시킬 수 있는 절환수단등으로 구성되는 판재 자동처리장치.Plate conveyance means disposed throughout the entire length of the treatment tank and the washing tank, a plurality of treatment liquid supply means disposed in the treatment tank and supplying the treatment liquid to the conveyed sheet material, and treatment liquids of other components. A plurality of process liquid tanks to be accommodated, a process liquid delivery operation means for sending the process liquid of each process liquid tank to the process liquid supply means corresponding to each process liquid tank, and a switch capable of selectively connecting the process tank and the process liquid tank for maintenance Plate automatic processing device composed of means.
KR2019790001149U 1979-03-02 1979-03-02 Plate Automatic Processing Equipment KR830000455Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019790001149U KR830000455Y1 (en) 1979-03-02 1979-03-02 Plate Automatic Processing Equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019790001149U KR830000455Y1 (en) 1979-03-02 1979-03-02 Plate Automatic Processing Equipment

Publications (1)

Publication Number Publication Date
KR830000455Y1 true KR830000455Y1 (en) 1983-04-04

Family

ID=19211354

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019790001149U KR830000455Y1 (en) 1979-03-02 1979-03-02 Plate Automatic Processing Equipment

Country Status (1)

Country Link
KR (1) KR830000455Y1 (en)

Similar Documents

Publication Publication Date Title
US3871914A (en) Etchant rinse apparatus
US3800702A (en) Inking apparatus having automatic wash-up means
US3896730A (en) Wash-up system for flexographic printers
JPH08220722A (en) Apparatus for pouring of photographic chemicals into mixing tank from container and for cleaning of container
EP0623844A1 (en) Automatic processors
US5420658A (en) Modular processing channel for an automatic tray processor
KR830000455Y1 (en) Plate Automatic Processing Equipment
US3622357A (en) Automatic feed system for treating brewery pasteurizer water
US5445193A (en) Apparatus for preparing and dispensing liquids for the treatment of photosensitive material
CN109019951A (en) A kind of industrial wastewater treatment system
US6241378B1 (en) Dosing apparatus for detergent paste
US4349267A (en) Processing solution circulating device for film processor
US6026986A (en) Chemical spray system and waste liquid tank used in same
US5398094A (en) Slot impingement for an automatic tray processor
US4313824A (en) Waste water treatment system and process
CA2121441C (en) Counter cross flow for an automatic tray processor
EP0801970A1 (en) Washing liquid circuit for waste gas scrubbers
KR930008140B1 (en) Apparatus for treatment of waste of photoresist
KR100511393B1 (en) Auto filter
US4313833A (en) Waste water treatment system and process
JP2001347235A (en) Washing liquid circulating and concentrating system for continuously washing apparatus
KR930001512Y1 (en) Strainer cleaner
KR0122429Y1 (en) A device for dissolving detergent of washing machine
EP0471268B1 (en) Device for injecting a plurality of liquids into a tank
DE2204910C3 (en) Device for destroying cyanides from waste liquors