KR830000455A - Gate circuit - Google Patents

Gate circuit Download PDF

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Publication number
KR830000455A
KR830000455A KR1019740003718A KR740003718A KR830000455A KR 830000455 A KR830000455 A KR 830000455A KR 1019740003718 A KR1019740003718 A KR 1019740003718A KR 740003718 A KR740003718 A KR 740003718A KR 830000455 A KR830000455 A KR 830000455A
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KR
South Korea
Prior art keywords
semiconductor region
conductivity type
semiconductor
gate circuit
region
Prior art date
Application number
KR1019740003718A
Other languages
Korean (ko)
Other versions
KR830002606B1 (en
Inventor
요시오 이시가끼
다까시 오까다
마사아끼 사까이
기오츠께 스즈끼
스스무 호시미
가즈오 가나꼬
마꼬도 오까자와
유우조오 후세
요시오 오사까베
Original Assignee
모리다 아끼오
소니 가부시끼 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 모리다 아끼오, 소니 가부시끼 가이샤 filed Critical 모리다 아끼오
Priority to KR1019740003718A priority Critical patent/KR830002606B1/en
Publication of KR830000455A publication Critical patent/KR830000455A/en
Application granted granted Critical
Publication of KR830002606B1 publication Critical patent/KR830002606B1/en

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Abstract

내용 없음No content

Description

게이트 회로Gate circuit

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음This content is subject to disclosure, so the full text is not included.

제1도는 본 발명에 사용하는 반도체 소자의 구조를 표시한 단면도,1 is a cross-sectional view showing the structure of a semiconductor device used in the present invention;

제2도는 그 다른 실시예의 단면도.2 is a cross-sectional view of another embodiment thereof.

Claims (1)

제1도전형의 제1반도체 영역과, 이것에 접하는 제2도전형의 제2반도체 영역과, 또 이에 접하는 제1도전형의 제3반도체영역으로 구성되고, 상기 제1반도체 영역내에 성기 제 1 및 제2 반도체영역사이의 접합에 대향하고 이 접합에서의 거리가 상기 제1반도체 영역의 소수 캐리어의 확산거리 보다 작은 위치에서 상기 소수 캐리어의 에너지 이상의 전위 장벽을 가지고 있고, 상기 제1, 제2, 제3의 반도체 영역에서 각각 제1, 제2, 제3전극이 도출된 반도체 소자가 형성되고, 상기 제1 및 제3전극에 각각 입력 신호원과 부하가 접속되고, 상기 제2전극에 게이트 펄스가 공급되도록한 게이트 회로.Consisting of a first semiconductor region of the first conductivity type, a second semiconductor region of the second conductivity type in contact with the region, and a third semiconductor region of the first conductivity type in contact therewith, and the first semiconductor region in the first semiconductor region And a potential barrier equal to or greater than the energy of the minority carriers at a position opposite to the junction between the second semiconductor regions and where the distance at the junction is smaller than the diffusion distance of the minority carriers in the first semiconductor region, and the first and second , In a third semiconductor region, a semiconductor device from which first, second, and third electrodes are derived, respectively, is formed, an input signal source and a load are connected to the first and third electrodes, respectively, and a gate is connected to the second electrode. A gate circuit that allows pulses to be supplied. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed according to the contents of the initial application.
KR1019740003718A 1974-09-28 1974-09-28 Gate circuit KR830002606B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019740003718A KR830002606B1 (en) 1974-09-28 1974-09-28 Gate circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019740003718A KR830002606B1 (en) 1974-09-28 1974-09-28 Gate circuit

Publications (2)

Publication Number Publication Date
KR830000455A true KR830000455A (en) 1983-03-30
KR830002606B1 KR830002606B1 (en) 1983-11-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019740003718A KR830002606B1 (en) 1974-09-28 1974-09-28 Gate circuit

Country Status (1)

Country Link
KR (1) KR830002606B1 (en)

Also Published As

Publication number Publication date
KR830002606B1 (en) 1983-11-16

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