KR20240040357A - Heat shielding film and variable window including the same - Google Patents

Abstract

The present invention relates to a heat insulating film, and more specifically, a heat insulating film that has a significantly excellent heat insulating function, is capable of changing physical properties depending on the application of power, and exhibits excellent visibility when the power is applied and invisibility when the power is not applied, and This relates to a variable window including this.

Description

Heat shielding film and variable window including the same}

The present invention relates to a heat insulating film, and more specifically, a heat insulating film that has a significantly excellent heat insulating function, is capable of changing physical properties depending on the application of power, and exhibits excellent visibility when the power is applied and invisibility when the power is not applied, and This relates to a variable window including this.

Recently, as interest in the environment and energy increases, the demand for energy-saving industrial products is increasing, and as one of them, the heat blocking effect of shielding members such as glass applied to houses, buildings, automobiles, etc. is required. Typically, in the case of buildings, the cause of more than 35% of building energy loss is the building's window performance, and if window performance deteriorates, the building's cooling/heating air conditioning efficiency may also decrease.

To solve this problem, colored and vacuum-coated plastic films have been applied to shielding members such as glass used in houses, buildings, automobiles, etc. However, colored films generally do not block near-infrared solar energy, and thus have the problem of being ineffective as heat blocking films. In addition, the colored film often has a problem of discoloration due to exposure to sunlight, which leads to a short usage cycle and increased costs due to frequent replacement. Furthermore, when the colored film is made with multiple dyes, the degree of discoloration by sunlight varies depending on the type of dye, so the shielding member such as glass to which the film is attached has problems such as stains or increased turbidity, which reduces the aesthetic appearance. .

Accordingly, there is an urgent need to develop a heat insulating film that has a significantly excellent heat insulating function, is capable of changing physical properties depending on the application of power, and at the same time exhibits excellent visibility when the power is applied and invisibility when the power is not applied.

KR 10-0753917 B1(2007.08.24)

The present invention was developed to solve the above-mentioned problems, and is a heat-insulating film that has a significantly excellent heat-insulating function, is capable of changing physical properties depending on the application of power, and exhibits excellent visibility when the power is applied and invisibility when the power is not applied. The purpose is to provide a variable window including the same.

In order to solve the above-described problem, the present invention includes: a liquid crystal display comprising an electrode layer, a heat-shielding electrode layer, and a liquid crystal layer interposed between the electrode layer and the heat-shielding electrode layer; And, a base portion provided on one or both sides of the liquid crystal display; and provides a heat shield film that satisfies all of the following conditions (1) to (3).

(1) A1:A2 is 1:3.8 ~ 305

(2) B1 is 0.3 to 8 and B2 is 5 to 35

(3) C1:C2 is 1:0.0045 ~ 0.18

At this time, A1 is the average transmittance (%) measured every 10 nm at a wavelength of 380 ~ 780 nm, B1 is the average transmittance (%) measured every 50 nm at a wavelength of 350 ~ 2100 nm, C1 is turbidity (%), and A2 is B2 is the average transmittance (%) measured every 10 nm in the wavelength range of 380 to 780 nm by applying a voltage of 110 V, B2 is the average transmittance (%) measured every 50 nm in the wavelength range of 350 to 2100 nm by applying a voltage of 110 V, and C2 is the voltage. Indicates turbidity (%) measured by applying 110V.

In addition, the present invention provides a liquid crystal display including an electrode layer, a heat-shielding electrode layer, and a liquid crystal layer interposed between the electrode layer and the heat-shielding electrode layer; And, a base unit provided on one or both sides of the liquid crystal part; and an average transmittance measured every 50 nm at a wavelength of 350 to 2100 nm of 0.3 to 8%, and an average transmittance measured every 50 nm at a wavelength of 350 to 2100 nm. We provide a heat-insulating film with an average reflectance of 33 to 47%.

According to an embodiment of the present invention, all of the following conditions (1) to (3) can be satisfied.

(1) A1:A2 is 1:5.2~180

(2) B1 is 0.5 to 6.5 and B2 is 5.5 to 33

(3) C1:C2 is 1:0.0095 ~ 0.15.

Additionally, the average transmittance measured every 10 nm at a wavelength of 380 to 780 nm may be 0.3 to 15%, and the turbidity may be 85 to 99.7%.

Additionally, by applying a voltage of 110 V, the average transmittance measured every 10 nm at a wavelength of 380 to 780 nm may be 60 to 90%, and the turbidity may be 0.5 to 15%.

Additionally, the heat shield electrode layer may include at least two or more metal-derived layers.

Additionally, the liquid crystal layer may have a thickness of 3 to 40 ㎚, the electrode layer may have a thickness of 3 to 150 ㎚, and the heat shield electrode layer may have a thickness of 3 to 250 ㎚.

Additionally, the base portion may have a thickness of 10 to 240 μm.

Additionally, the base unit may be provided on both sides of the liquid crystal display.

In addition, it may further include an adhesive layer disposed on the back of the base portion opposite to the heat shield electrode layer.

Additionally, the adhesive layer may have a thickness of 2 to 160 μm.

Additionally, the average reflectance measured every 10 nm at a wavelength of 380 to 780 nm may be 1.5 to 6.5%, and the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm may be 33 to 47%.

Additionally, the average reflectance measured every 10 nm at a wavelength of 380 to 780 nm may be 1.5 to 6.5%.

In addition, compared to the average reflectance measured every 10 nm at a wavelength of 380 ~ 780 nm, the deviation of the average reflectance measured every 10 nm at a wavelength of 380 ~ 780 nm after applying a voltage of 110 V may be within ±5%, and the deviation of the average reflectance measured every 10 nm at a wavelength of 380 ~ 780 nm may be within ±5%, and Compared to the average reflectance measured every 50 nm, the deviation of the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm after applying a voltage of 110 V may be within ±5%.

In addition, the present invention provides a variable window including the above-described heat shield film.

The heat insulating film of the present invention and the variable window containing the same have a significantly excellent heat insulating function, can change physical properties depending on the application of power, and can exhibit excellent visibility when power is applied and can exhibit the effect of expressing invisibility when power is not applied. there is.

Figure 1 is a cross-sectional view of a heat-insulating film according to an embodiment of the present invention.
Figure 2 is a cross-sectional view of a variable window according to an embodiment of the present invention.

Hereinafter, with reference to the attached drawings, embodiments of the present invention will be described in detail so that those skilled in the art can easily implement the present invention. The present invention may be implemented in many different forms and is not limited to the embodiments described herein. In order to clearly explain the present invention in the drawings, parts not related to the description are omitted, and identical or similar components are given the same reference numerals throughout the specification.

The term 'deviation' used in the present invention refers to the 'ratio of the value after applying voltage to the initial value'. For example, if the initial value is 100 and the value after applying voltage is 97, the deviation is -3%, If the initial value is 100 and the value after voltage application is 102, the deviation can be said to be +2%.

As shown in FIG. 1, the heat shield film according to an embodiment of the present invention includes an electrode layer 11, a heat shield electrode layer 12, and a liquid crystal layer 13 interposed between the electrode layer 11 and the heat shield electrode layer 12. It includes a liquid part 10 and base parts 20 and 30 provided on one or both sides of the liquid part 10.

First, before explaining each layer provided in the heat-insulating film 100 according to an embodiment of the present invention, the heat-insulating film 100 according to the present invention must satisfy all of the following conditions (1) to (3). Explain why.

If the average transmittance measured every 10 nm in the wavelength of 380 ~ 780 nm of the heat insulating film is low, the desired visibility may not be achieved after power is applied, and if the average transmittance measured every 10 nm in the wavelength of 380 ~ 780 nm of the heat insulating film is high. In this case, if power is not applied, invisibility may not be achieved at the desired level. In addition, if the average transmittance measured every 50 nm in the wavelength of 350 ~ 2100 nm of the heat insulating film is low, the desired visibility may not be achieved when power is applied, and the average transmittance measured every 50 nm in the wavelength of 350 ~ 2100 nm in the heat insulating film may be low. If this is high, invisibility may not be achieved at the desired level when power is not applied, and heat insulation performance may be poor. In addition, if the turbidity of the heat insulating film is low, the invisibility may not be achieved at the desired level when power is not applied, and the heat insulating performance may be reduced, and if the turbidity of the heat insulating film is high, the desired visibility may not be achieved when power is applied. You can.

In addition, if the average transmittance measured every 10 nm in the wavelength range of 380 to 780 nm by applying a voltage of 110 V is low, or if the average transmittance measured every 50 nm in the wavelength of 350 to 2100 nm by applying a voltage of 110 V is low, visibility may be poor. In addition, if the average transmittance measured every 10 nm at a wavelength of 380 ~ 780 nm by applying a voltage of 110 V is high, or the average transmittance measured every 50 nm at a wavelength of 350 ~ 2100 nm by applying a voltage of 110 V is high, the heat shielding performance may not be good. and visibility may be reduced when power is not applied. In addition, if the turbidity measured by applying a voltage of 110V is low, the heat shielding performance may be reduced and visibility may be reduced when power is not applied, and if the turbidity measured by applying a voltage of 110V is high, visibility may be poor.

Accordingly, the heat shield film must exhibit a predetermined ratio between the average transmittance at a wavelength of 380 to 780 nm and the average transmittance at a wavelength of 380 to 780 nm measured by applying a voltage of 110 V, and the average transmittance at a wavelength of 350 to 2100 nm and The average transmittance at a wavelength of 350 to 2100 nm measured by applying a voltage of 110 V must represent a predetermined ratio, and the turbidity and turbidity measured by applying a voltage of 110 V must represent a predetermined ratio. Accordingly, the heat-insulating film 100 according to the present invention is designed to satisfy all of the following conditions (1) to (3).

As condition (1), A1:A2 may be 1:3.8 to 305, and preferably A1:A2 may be 1:5.2 to 180. As condition (2), B1 may be 0.3 to 8 and B2 may be 5 to 35, Preferably, B1 may be 0.5 to 6.5 and B2 may be 5.5 to 33, and as condition (3), C1:C2 may be 1:0.0045 to 0.18, and preferably C1:C2 may be 1:0.0095 to 0.15.

At this time, A1 is the average transmittance (%) measured every 10 nm at a wavelength of 380 ~ 780 nm, B1 is the average transmittance (%) measured every 50 nm at a wavelength of 350 ~ 2100 nm, C1 is turbidity (%), and A2 is B2 is the average transmittance (%) measured every 10 nm in the wavelength range of 380 to 780 nm by applying a voltage of 110 V, B2 is the average transmittance (%) measured every 50 nm in the wavelength range of 350 to 2100 nm by applying a voltage of 110 V, and C2 is the voltage. Indicates turbidity (%) measured by applying 110V.

In condition (1) above, if A1:A2 is less than 1:3.8, invisibility may not be achieved at the desired level when power is not applied, visibility may be poor when power is applied, and A1:A2 exceeds 1:305. Otherwise, the desired visibility may not be achieved after power is applied, heat insulation performance may be poor, and invisibility may be reduced when power is not applied. Additionally, in condition (2) above, if B1 is less than 0.3 or B2 is less than 5, visibility may be poor when power is applied, and if B1 exceeds 8 or B2 exceeds 35, heat insulation performance may be poor. , If power is not applied, visibility may be reduced. In addition, if C1:C2 is less than 1:0.0045 in the above condition (3), the desired visibility may not be achieved when power is applied, heat shielding performance may be reduced, and invisibility may be reduced when power is not applied, and C1 : If C2 exceeds 1:18, thermal insulation performance may deteriorate, visibility may be reduced when power is not applied, and visibility may be poor when power is applied.

Hereinafter, each layer provided in the heat shield film 100 will be described.

First, the electrode layer 11 will be described.

The electrode layer 11 is disposed on one side of the liquid crystal layer 13, which will be described later, and supplies the applied power to the liquid crystal layer 13 when power is applied, thereby rotating/driving the liquid crystal included in the liquid crystal layer 13 to apply power. It performs the function of changing the physical properties of the heat insulating film depending on whether it is used or not.

The electrode layer 11 can be used without limitation as long as it is a material capable of performing the above-described functions in the art, and preferably includes one or more of a conductive polymer, a conductive metal, a conductive nanowire, or a metal oxide, More preferably, it may contain a metal oxide, and even more preferably, it may be ITO (Indium Tin Oxide), which may be more advantageous for achieving the purpose of the present invention.

Additionally, the electrode layer 11 may have a thickness of 3 to 150 nm, and preferably may have a thickness of 4 to 130 nm. If the thickness of the electrode layer is less than 3 nm, the reaction speed may be reduced due to high resistance, and the desired level of invisibility may not be achieved when power is not applied. If the thickness of the electrode layer exceeds 150 nm, the transmittance by wavelength may decrease. It may be degraded, and visibility may be reduced when power is applied.

In addition, the electrode layer 11 may have a sheet resistance of 5 to 250 Ω/□, and preferably may have a sheet resistance of 8 to 230 Ω/□. If the sheet resistance of the electrode layer is less than 5Ω/□, the transmittance for each wavelength may be reduced and visibility may be reduced when power is applied. If the sheet resistance is more than 250 Ω/□, the reaction speed may be reduced due to high resistance, If power is not applied, the desired level of invisibility may not be achieved.

Next, the heat shield electrode layer 12 will be described.

The heat shield electrode layer 12 is disposed on the other side of the liquid crystal layer 13, which will be described later, in addition to the electrode layer 11 described above, and supplies the applied power to the liquid crystal layer 13 when power is applied, thereby forming the liquid crystal layer 13. It performs the function of changing the physical properties of the heat insulating film depending on whether power is applied by rotating/driving the liquid crystal included in and simultaneously improves the heat insulating performance of the heat insulating film 100. In other words, the heat-shielding electrode layer serves as an electrode that rotates/drives the liquid crystal and also exhibits heat-shielding performance.

The heat shield electrode layer 11 can be used without limitation as long as it is a material capable of performing the above-described functions in the art, but is preferably made of gold, silver, copper, aluminum, platinum, titanium, iron, nickel, chromium, palladium, and indium. , one or more types selected from the group consisting of metals containing at least one of tin and zinc, alloys containing at least two of the above metals, and metal oxides containing at least one of the above metals may be used. Preferably a metal containing at least one of gold, silver, copper, aluminum, nickel, chromium, indium, tin, and zinc, an alloy containing at least two of the above metals, and an alloy containing at least one of the above metals. One or more types selected from the group consisting of metal oxides may be used.

Meanwhile, the heat-shielding electrode layer 11 may be implemented as a multi-layered heat-shielding electrode layer (not shown) to include at least two metal-derived layers. Preferably, the multi-layered heat-shielding electrode layer includes 3 to 7 metal-derived layers. It may include, more preferably, 3 to 6 metal-derived layers, and even more preferably 3 to 5 metal-derived layers. When the heat-shielding electrode layer 11 is implemented as a multi-layered heat-shielding electrode layer (not shown) to include at least two metal-derived layers, if the number of metal-derived layers in the multi-layered heat-shielding electrode layer is less than 3 or more than 7, the The effect of the invention may not be achieved at the desired level.

The heat shield electrode layer 12 may have a thickness of 3 to 250 nm, and preferably may have a thickness of 4 to 230 nm. If the thickness of the heat shield electrode layer is less than 3 nm, the heat shield performance may be reduced, the reaction speed may be reduced due to high resistance, and the desired level of invisibility may not be achieved when power is not applied, and the thickness of the heat shield electrode layer may be low. If it exceeds 250 nm, the transmittance for each wavelength may decrease and visibility may decrease when power is applied.

In addition, the heat shield electrode layer 12 may have a sheet resistance of 3 to 70 Ω/□, and preferably may have a sheet resistance of 4 to 55 Ω/□. If the sheet resistance of the heat shielding electrode layer is less than 3Ω/□, the transmittance for each wavelength may be reduced and visibility may be reduced when power is applied, and if the sheet resistance exceeds 70Ω/□, the heat shielding performance may be reduced, and the resistance is high. The reaction speed may decrease, and the desired level of invisibility may not be achieved when power is not applied.

Next, the liquid crystal layer 13 interposed between the electrode layer 11 and the heat-shielding electrode layer 12 will be described.

The liquid crystal layer 13 functions to change the physical properties of the heat shield film by changing its state to transparent, translucent, or opaque when power is applied. Specifically, when power is not applied to the liquid crystal layer 13, the liquid crystal is provided in a random orientation, and when power is applied to the liquid crystal layer 13, the liquid crystal is aligned in a direction (ㅣ) parallel to the thickness direction of the heat shield film. The physical properties can be changed by being rotated/driven.

The liquid crystal layer 13 can be used without limitation as long as it has a liquid crystal layer composition that can be commonly used in the art, and therefore, this is not particularly limited in the present invention.

Additionally, the liquid crystal layer 13 may have a thickness of 3 to 40 μm, and preferably may have a thickness of 6 to 35 μm. If the thickness of the liquid crystal layer is less than 3㎛, the desired level of invisibility may not be achieved when power is not applied, and the change in physical properties according to power application may be minimal, and if the thickness exceeds 40㎛, the transmittance for each wavelength may decrease. and visibility may be reduced when power is turned on.

Next, the base portions 20 and 30 provided on one or both sides of the liquid crystal display 10 will be described.

The base units 20 and 30 may be provided on one or both sides of the liquid crystal unit 10, and preferably may be provided on both surfaces of the liquid crystal unit 10. Accordingly, while performing the role of a support layer for the above-described electrode layer 11 and the heat shield electrode layer 12, it also functions to protect the heat shield film 100.

The base portions 20 and 30 are limited to any material common in the art that can function as a support layer for the above-described electrode layer 11 and the heat-shielding electrode layer 12 while protecting the heat-shielding film 100. It can be used without, and preferably, PET film can be used.

Additionally, the base portions 20 and 30 may have a thickness of 10 to 240 μm, and preferably may have a thickness of 15 to 220 μm. If the thickness of the base part is less than 10㎛, the base part may be deformed or broken during the manufacturing process, and thickness variations of the base part and/or each layer due to uneven tension of the base part may occur, resulting in appearance and optical properties (transmittance and turbidity). Defects may occur, and if the thickness of the substrate exceeds 240㎛, curl defects may occur, and problems may occur in which the desired turbidity range cannot be expressed.

Meanwhile, according to another embodiment of the present invention, as shown in FIG. 2, the heat-insulating film 100' includes an adhesive layer ( 40) may further be included.

The adhesive layer 40 functions to adhere the heat insulating film 100, 100' to the window 200, and any component of the adhesive layer commonly used in the industry can be used without limitation, preferably polyester. One type selected from the group consisting of resin, urethane resin, acrylic resin, or their derivatives can be used.

Additionally, the adhesive layer 40 may have a thickness of 2 to 160 μm, and preferably may have a thickness of 3 to 150 μm. If the thickness of the adhesive layer is less than 2㎛, the adhesive strength may decrease, and if the thickness exceeds 160㎛, the cost of raw materials increases and the curing time becomes longer, resulting in a decrease in production speed and the need for a large amount of heat, which may lead to problems of increased energy consumption. Visibility may be reduced when power is applied to the heat shield film due to differences in surface roughness and refractive index of the adhesive layer.

The heat shield film 100 according to the present invention may have an average transmittance of 0.3 to 15% measured every 10 nm at a wavelength of 380 to 780 nm to satisfy the above-mentioned condition (1), and preferably at a wavelength of 380 to 780 nm. The average transmittance measured every 10 nm may be 0.5 to 12%. If the average transmittance measured every 10 nm at the wavelength of 380 ~ 780 nm is less than 0.3%, the desired visibility may not be achieved after power is applied, and if the average transmittance measured every 10 nm at the wavelength of 380 ~ 780 nm is 15%. If it exceeds %, invisibility may not be achieved at the desired level when power is not applied, and heat shielding performance may not be good.

In addition, the heat shield film 100 according to the present invention has an average transmittance of 60 to 90% measured every 10 nm at 380 to 780 nm by applying a voltage of 110V to satisfy the above-mentioned condition (1), preferably at a voltage of 110V. The average transmittance measured every 10 nm from 380 to 780 nm may be 65 to 88%. If the average transmittance measured every 10 nm from 380 to 780 nm by applying a voltage of 110 V is less than 60%, visibility may be poor, and the average transmittance measured every 10 nm from 380 to 780 nm by applying a voltage of 110 V is 90%. If it exceeds %, heat insulation performance may be poor, and visibility may be reduced when power is not applied.

In addition, the heat shield film 100 according to the present invention may have a turbidity of 85 to 99.7% to satisfy the above-mentioned condition (3), and preferably may have a turbidity of 88 to 99.5%. If the turbidity is less than 85%, the desired level of invisibility may not be achieved when power is not applied and the heat shielding performance may be deteriorated. If the turbidity exceeds 99.7%, the desired visibility may not be achieved when power is applied. there is.

In addition, the heat shield film 100 according to the present invention has a turbidity of 0.5 to 15% as measured by applying a voltage of 110V to satisfy the above-mentioned condition (3), preferably a turbidity of 1% as measured by applying a voltage of 110V. It could be ~13%. If the turbidity measured by applying the voltage of 110V is less than 0.5%, the heat shielding performance may be reduced and visibility may be reduced when power is not applied. If the turbidity measured by applying the voltage of 110V is more than 15%, visibility may be poor. It may not be possible.

The heat shield film 100 according to the present invention may have an average reflectance of 1.5 to 6.5% measured every 10 nm at a wavelength of 380 to 780 nm, and preferably have an average reflectance of 2% measured every 10 nm at a wavelength of 380 to 780 nm. It may be ~ 6%, and the average reflectance measured every 50 nm at a wavelength of 350 ~ 2100 nm may be 33 ~ 47%, and preferably the average reflectance measured every 50 nm at a wavelength of 350 ~ 2100 nm is 35 ~ 45%. It can be. If the average reflectance measured every 10 nm in the wavelength 380 ~ 780 nm is less than 1.5%, or if the average reflectance measured every 50 nm in the wavelength 350 ~ 2100 nm is less than 33%, the heat shielding performance may deteriorate, and when power is not applied, Invisibility may not be achieved at the desired level, and the average reflectance measured every 10 nm from 380 to 780 nm exceeds 6.5%, or the average reflectance measured every 50 nm from 350 to 2100 nm exceeds 47%. If it is exceeded, the desired visibility may not be achieved when power is turned on.

Meanwhile, a heat shield film (100, 100') according to another embodiment of the present invention includes a liquid crystal layer including an electrode layer, a heat shield electrode layer, and a liquid crystal layer interposed between the electrode layer and the heat shield electrode layer; And, a base unit provided on one or both sides of the liquid crystal part; and an average transmittance of 0.3 to 8% measured every 50 nm at a wavelength of 350 to 2100 nm, and an average transmittance measured every 50 nm at a wavelength of 350 to 2100 nm. The average reflectance is 33 to 47%. Preferably, the average transmittance measured every 50 nm at a wavelength of 350 to 2100 nm may be 0.5 to 6.5%, and the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm may be 35 to 45%. If the average transmittance in the wavelength range of 350 ~ 2100 nm is less than 0.3%, the desired visibility may not be achieved after power is applied. If the average transmittance in the wavelength range of 350 ~ 2100 nm exceeds 8%, the desired visibility may not be achieved when power is not applied. It may not be expressed at the same level, and heat insulation performance may not be good.

On the other hand, the heat shield film (100, 100') according to an embodiment of the present invention has an average reflectance measured every 10 nm at a wavelength of 380 to 780 nm after applying a voltage of 110 V, compared to an average reflectance measured every 10 nm at a wavelength of 380 to 780 nm. The deviation may be within ±5%, and preferably, the deviation of the average reflectance measured every 10 nm at a wavelength of 380 to 780 nm after applying a voltage of 110 V is ±4 compared to the average reflectance measured every 10 nm at a wavelength of 380 to 780 nm. It may be within %, and compared to the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm, the deviation of the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm after applying a voltage of 110 V may be within ±5%, and is preferable. In other words, compared to the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm, the deviation of the average reflectance measured every 50 nm at a wavelength of 350 to 2100 nm after applying a voltage of 110 V may be within ±4%. Accordingly, it can be more advantageous in that it has excellent heat insulation properties and can change physical properties depending on the application of power, while simultaneously demonstrating excellent visibility when power is applied and invisibility when power is not applied.

Meanwhile, the heat-insulating film 100 according to an embodiment of the present invention may be manufactured through a manufacturing method described later, but is not limited thereto.

The heat shield film 100 according to the present invention includes forming a first laminate by forming a heat shield electrode layer 12 on one base portion 20, and forming an electrode layer 11 on the other substrate portion 30. Manufactured through a manufacturing method comprising forming a second laminate by forming a second laminate, forming a liquid crystal layer 13 on the first laminate, and laminating a second laminate on the liquid crystal layer 13. It can be.

At this time, the electrode layer 11 and the heat-shielding electrode layer 12 can be formed without limitation as long as it is a formation method commonly used in the art, and can preferably be formed through a deposition process.

In addition, the liquid crystal layer 13 can be formed using any forming method commonly used in the art without limitation, and can preferably be formed through methods such as coating and filling, and more preferably coating. It can be formed through .

Meanwhile, in the method of manufacturing a heat shield film according to another embodiment of the present invention, after the step of laminating the second laminate, an adhesive layer 40 is formed on the back of the base portion 20 opposite the heat shield electrode layer 12. ) may further include the step of forming.

At this time, the adhesive layer 40 can be formed without limitation as long as it is a formation method commonly used in the art, and is preferably formed through a laminating process.

Meanwhile, the present invention provides a variable window 1000 including the above-described heat shield films 100 and 100'.

The variable window 1000 is implemented by including the above-described heat shield films 100 and 100' on at least one side of the window 200. The heat shield film may be fixed on at least one surface of the window 200 through the adhesive layer 40 described above, but is not limited thereto.

The heat insulating film of the present invention has a significantly excellent heat insulating function, can change its physical properties depending on the application of power, and can exhibit excellent visibility when power is applied, and can exhibit invisibility when power is not applied. Accordingly, when applying the heat-insulating film of the present invention to a window, it is possible to implement a variable window. Therefore, the heat shield film according to the present invention and the variable window including the same can be applied to various technical fields. In particular, when applied to a car, it can be placed on the side window of the rear seat or sunroof.

The present invention will be described in more detail through the following examples, but the following examples do not limit the scope of the present invention, and should be interpreted to aid understanding of the present invention.

<Example 1>

First, two sheets of PET substrate (XG7PH8, Toray Advanced Materials) with a thickness of 125㎛ were prepared as the substrate. By applying a power of 2 kW with a 200 kHz pulse on one of the substrate parts, a base vacuum of 2.5 Х 10 ^-5 torr was secured, and then 5% by weight of argon gas was added based on 250 sccm (standard cubic centimeter per minute). Zinc tin oxide (ZTO) with a thickness of 35 nm, silver-palladium-copper alloy (Ag-Pd-Cu; APC) with a thickness of 15 nm, and zinc with a thickness of 35 nm were produced using a DC sputter under nitrogen gas conditions. The first laminate was formed by sequentially depositing tin oxide (ZTO) to form a heat-shielding electrode layer including three metal-derived layers. Then, 2 kW of power was applied with a 200 kHz pulse on the other substrate to ensure a base vacuum of 2.5 Х 10 ^-5 torr, and then nitrogen at a rate of 5% by weight based on 250 sccm (standard cubic centimeter per minute) of argon gas was applied. A second laminate was formed by depositing ITO (Indium Tin Oxide) with a thickness of 50 nm using a DC sputter under gas conditions to form an electrode layer.

Afterwards, a nematic liquid crystal compound, a urethane oligomer, and a thiol-based prepolymer mixture, a nucleic acid diol diacrylate monomer, and an ultraviolet photoinitiator are placed between the first and second laminates prepared above (= forming an absorption peak in the wavelength range of 380 nm. A liquid crystal dispersion composition containing a photoinitiator) was coated using a gap roll method and UV cured to form a liquid crystal layer with a thickness of 20 ㎛ to prepare a heat insulating film as shown in Figure 1.

<Examples 2 to 4 and Comparative Examples 1 to 5>

Heat-insulating films were manufactured in the same manner as in Example 1, but changing the type and thickness of the heat-insulating metal layer material, as shown in Tables 1 and 2 below.

<Experimental Example 1>

For each heat insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, each heat insulating film was attached to regular glass with an average thickness of 3 mm, and the following physical properties were evaluated and shown in Tables 1 and 2. It was.

1. Measurement of average transmittance and average reflectance for each wavelength band

For each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, KS L 2016:2014, 6.3 Optical measurement using a spectrophotometer (UV-VIS-NIR Spectrophotometer, Perkin-Elmer, Lambda 950, U.S.A.) Based on the performance test, the average transmittance and average reflectance are measured at wavelengths of 380 ~ 2100 nm, respectively. By measuring the transmittance and reflectance at every 10 nm of wavelength at 380 ~ 780 nm, the average transmittance and average reflectance are measured at wavelengths of 380 ~ 780 nm, respectively. The reflectance was measured, and the average transmittance and reflectance were measured at wavelengths of 350 to 2100 nm, respectively, by measuring the transmittance and reflectance every 50 nm. At this time, the transmittance and reflectance at a wavelength of 380 to 780 nm were measured based on the electrode layer side, and the transmittance and reflectance at a wavelength of 350 to 2100 nm were measured based on the heat shield electrode layer side.

2. Turbidity measurement

For each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, the opaque state due to diffusion in addition to reflection or absorption of light transmitted through the film was measured. (BYK, haze-gard plus)

3. Measurement of average transmittance and average reflectance by wavelength (power on)

For each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, the average transmittance and reflectance for each wavelength band were measured in the same manner as in "1", but by applying a voltage of 110V, the average transmittance and reflectance for each wavelength band were measured. The reflectance was measured for each.

4. Turbidity measurement (power on)

For each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, turbidity was measured in the same manner as in “2”, except that the turbidity was measured by applying a voltage of 110V.

5. Evaluation of thermal insulation characteristics

For each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5, the performance was measured according to the KS L 9107 solar heat gain coefficient (SHGC) measurement method of window glass film, and the The value is shown.

6. Invisibility and visibility assessment

Each heat-insulating film manufactured according to Examples 1 to 4 and Comparative Examples 1 to 5 was visually evaluated by 30 professional personnel with more than 15 years of industry experience, and the invisibility before and after applying a voltage of 110 V was evaluated using the 7-point method. and visibility were evaluated respectively.

* Evaluation of invisibility before applying voltage: 1-very poor, 2-bad, 3-slightly bad, 4-average, 5-slightly good, 6-good, 7-very good.

* Visibility evaluation after applying voltage: 1-very poor, 2-bad, 3-slightly bad, 4-average, 5-slightly good, 6-good, 7-very good

division Example
One Example
2 Example
3 Example
4 heat shield
Electrode layer stacking
structure Type/Thickness (㎚) ZTO/35 ZTO/
1.5 ZTO/95 - Type/Thickness (㎚) APC/15 APC/
One APC/40 APC/
2.5 Type/Thickness (㎚) ZTO/35 ZTO/1.5 ZTO/95 - Total thickness (㎚) 85 4 230 2.5 Average transmittance (%) Wavelength 380~780㎚, "A1" 5.5 11.5 0.55 15.5 Wavelength 380~780nm (voltage applied), "A2" 86.5 87.8 68.7 91.4 Condition(1), A1:A2 15.73 7.63 124.9 5.9 Wavelength 350~2100㎚, "B1" 3 6.4 0.55 5.9 Wavelength 350~2100㎚ (voltage applied), "B2" 17.5 31.2 6.6 29.8 Turbidity (%) "C1" 94.5 88.5 99 81.2 “C2” (voltage applied) 6 1.4 12.1 0.4 condition(3), C1:C2 0.063 0.016 0.12 0.0049 Average reflectance (%) Wavelength 380~780㎚ 4 2.1 5.8 1.4 Wavelength 380~780㎚ (voltage applied) 3.97 2.1 5.8 1.3 Wavelength 350~2100㎚ 40 35.5 43 34.3 Wavelength 350~2100nm (voltage applied) 39.8 35.4 43.1 34.3 Solar heat gain rate (SHGC) 0.1 0.2 0.1 0.2 Invisibility (/7 points, no voltage applied) 6.7 6.7 6.8 5.8 Visibility (/7 points, voltage applied) 6.8 6.8 6.6 6.8

division Comparative example
One Comparative example
2 Comparative example
3 Comparative example
4 Comparative example
5 heat shield
Electrode layer stacking
structure Type/Thickness (㎚) ZTO/100 ZTO/
2 - ZTO/
115 ZTO/
112.5 Type/Thickness (㎚) APC/70 APC/
One APC/
2 APC/30 APC/29 Type/Thickness (㎚) ZTO/100 ZTO/2 - ZTO/
115 ZTO/
112.5 Total thickness (㎚) 270 5 2 260 254 Average transmittance (%) Wavelength 380~780㎚, "A1" 0.4 9.1 24.5 0.1 0.2 Wavelength 380~780nm (voltage applied), "A2" 59.6 86.8 91.9 59 60.3 Condition(1), A1:A2 149 9.54 3.75 590 301.5 Wavelength 350~2100㎚, "B1" 0.25 8.2 4.1 1.2 1.2 Wavelength 350~2100㎚ (voltage applied), "B2" 4.8 37.4 28 8.3 8.2 Turbidity (%) "C1" 94 90.7 75.3 99.8 99.7 “C2” (voltage applied) 15.5 1.8 0.3 15.9 18.4 condition(3), C1:C2 0.16 0.02 0.004 0.159 0.185 Average reflectance (%) Wavelength 380~780㎚ 7.9 1.7 1.2 7.1 7.0 Wavelength 380~780㎚ (voltage applied) 7.8 1.7 1.2 7.0 7.0 Wavelength 350~2100㎚ 48 32 33.7 45.4 45.5 Wavelength 350~2100nm (voltage applied) 48.2 31.8 33.6 45.5 45.5 Solar heat gain rate (SHGC) 0.1 0.7 0.2 0.2 0.2 Invisibility (/7 points, no voltage applied) 6.7 6.7 5.4 6.8 6.8 Visibility (/7 points, voltage applied) 5.2 6.8 6.8 5.7 5.7

As can be seen from Tables 1 and 2, Examples 1 to 3 satisfy all the types and thicknesses of the heat-insulating metal layer material according to the present invention, and Example 4 and Comparative Examples 1 to 5 fail to satisfy any one of them. It can be confirmed that the thermal insulation properties are significantly superior compared to the above, and the physical properties can be changed depending on the power application, and the effects of excellent visibility when power is applied and excellent invisibility when power is not applied can all be achieved at the same time.

<Comparative Example 6>

A heat shield film was manufactured in the same manner as in Example 1, except that the heat shield electrode layer including three metal-derived layers was changed to ITO (Indium Tin Oxide) with a thickness of 50 nm, which is the same material as the electrode layer.

<Experimental Example 2>

For each heat-insulating film manufactured according to Example 1 and Comparative Example 6, the performance was measured according to the solar heat gain coefficient (SHGC) measurement method of KS L 9107 window glass film, and the values were shown. .

division Example
One Comparative example
6 Heat shielding electrode layer substance type ZTO/APC/ZTO ITO Solar heat gain rate (SHGC) 0.1 0.8

As can be seen in Table 3, it can be seen that Example 1, which includes a heat-shielding electrode layer according to the present invention, has significantly superior heat-shielding properties compared to Comparative Example 6, which includes an electrode layer other than a heat-shielding electrode layer.

Although one embodiment of the present invention has been described above, the spirit of the present invention is not limited to the embodiment presented in the present specification, and those skilled in the art who understand the spirit of the present invention can add components within the scope of the same spirit. , other embodiments can be easily proposed by change, deletion, addition, etc., but this will also be said to be within the scope of the present invention.

10: LCD panel
11: electrode layer
12: Heat shield electrode layer
13: Liquid crystal layer
20, 30: Ministry of Strategy and Finance
40: Adhesive layer
100: Heat insulation film
200: Windows
1000: variable window

Claims (15)

A liquid crystal display comprising an electrode layer, a heat-shielding electrode layer, and a liquid crystal layer interposed between the electrode layer and the heat-shielding electrode layer; and,
It includes a base unit provided on one or both sides of the liquid crystal display,
A heat shield film that satisfies all of the following conditions (1) to (3):
(1) A1:A2 is 1:3.8 ~ 305
(2) B1 is 0.3 to 8 and B2 is 5 to 35
(3) C1:C2 is 1:0.0045 ~ 0.18
At this time, A1 is the average transmittance (%) measured every 10 nm at a wavelength of 380 ~ 780 nm, B1 is the average transmittance (%) measured every 50 nm at a wavelength of 350 ~ 2100 nm, C1 is turbidity (%), and A2 is B2 is the average transmittance (%) measured every 10 nm in the wavelength range of 380 to 780 nm by applying a voltage of 110 V, B2 is the average transmittance (%) measured every 50 nm in the wavelength range of 350 to 2100 nm by applying a voltage of 110 V, and C2 is the voltage. Indicates turbidity (%) measured by applying 110V. A liquid crystal display comprising an electrode layer, a heat-shielding electrode layer, and a liquid crystal layer interposed between the electrode layer and the heat-shielding electrode layer; and,
It includes a base unit provided on one or both sides of the liquid crystal display,
The average transmittance measured every 50 nm at a wavelength of 350 ~ 2100 nm is 0.3 ~ 8%,
A heat shield film with an average reflectance of 33 to 47% measured every 50 nm at a wavelength of 350 to 2100 nm. According to paragraph 1,
A heat shield film that satisfies all of the following conditions (1) to (3):
(1) A1:A2 is 1:5.2~180
(2) B1 is 0.5 to 6.5 and B2 is 5.5 to 33
(3) C1:C2 is 1:0.0095 ~ 0.15. According to claim 1 or 2,
The average transmittance measured every 10 nm at a wavelength of 380 to 780 nm is 0.3 to 15%,
Heat-insulating film with a turbidity of 85 to 99.7%. The method of claim 1 or 2, by applying a voltage of 110V,
The average transmittance measured every 10 nm at a wavelength of 380 to 780 nm is 60 to 90%,
Heat-insulating film with a turbidity of 0.5 to 15%. According to claim 1 or 2,
The heat shield electrode layer is a heat shield film including at least two metal-derived layers. According to claim 1 or 2,
The liquid crystal layer has a thickness of 3 to 40㎛,
The electrode layer has a thickness of 3 to 150 nm,
The heat shield electrode layer is a heat shield film with a thickness of 3 to 250 nm. According to claim 1 or 2,
The base material is a heat-insulating film with a thickness of 10 to 240㎛. According to claim 1 or 2,
The base material is a heat-insulating film provided on both sides of the liquid crystal display. According to claim 1 or 2,
A heat shield film further comprising an adhesive layer disposed on the back of the base portion facing the heat shield electrode layer. According to clause 10,
The adhesive layer is a heat insulating film with a thickness of 2 to 160㎛. According to paragraph 1,
The average reflectance measured every 10 nm at a wavelength of 380 to 780 nm is 1.5 to 6.5%,
A heat shield film with an average reflectance of 33 to 47% measured every 50 nm at a wavelength of 350 to 2100 nm. According to paragraph 2,
A heat shield film with an average reflectance of 1.5 to 6.5% measured every 10 nm at a wavelength of 380 to 780 nm. According to claim 1 or 2,
Compared to the average reflectance measured every 10 nm at a wavelength of 380 ~ 780 nm, the deviation of the average reflectance measured every 10 nm at a wavelength of 380 ~ 780 nm after applying a voltage of 110 V is within ±5%,
A heat shield film with a deviation of within ±5% of the average reflectance measured every 50 nm from 350 to 2100 nm after applying a voltage of 110 V, compared to the average reflectance measured every 50 nm from 350 to 2100 nm. A variable window comprising: a heat shield film according to any one of claims 1 to 3, 12, and 13.

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