KR20230155035A - Water Treatment Apparatus With Gas Leak Detection and Gas Leak Dection Method - Google Patents

Abstract

The present invention relates to a water treatment device equipped with a gas leak detection function and a gas leak detection method, and more specifically, to a raw water storage tank; a foreign matter removal unit that removes foreign substances contained in the water of the raw water storage tank; A gas storage tank storing gas at a predetermined pressure; Two or more sealed treatment tanks positioned in parallel and receiving water from which foreign substances have been removed and gas from the gas storage tank; And a control unit that calculates and compares the amount of gas supplied to the treatment tank and the amount of gas to be filled in the two or more treatment tanks, wherein the treatment tank includes a water level sensor for sensing the water level and a pressure inside the treatment tank. The present invention relates to a water treatment device equipped with a gas leak detection function and a gas leak detection method, characterized by being provided with a pressure sensor and an open/close valve.

Description

Water Treatment Apparatus With Gas Leak Detection and Gas Leak Dection Method}

The present invention relates to a water treatment device equipped with a gas leak detection function and a gas leak detection method. More specifically, the present invention relates to a water treatment device equipped with a gas leak detection function that can determine whether nitrogen is leaking without using a nitrogen gas sensor, and a water treatment device equipped with a gas leak detection function and a gas leak detection method. It relates to a gas leak detection method.

Ultrapure water, which is required in various fields such as semiconductor manufacturing processes, can be defined as water from which all foreign substances such as particulate matter, dissolved ions, and dissolved gases other than water (H ₂ O) have been removed. To increase purity by removing these foreign substances, It is common to perform multiple unit processes in a complex manner while minimizing contact with the outside.

In particular, in the ultra-pure water production process, a degassing process is performed to remove gas components such as oxygen and carbon dioxide, and high-purity nitrogen is injected into the water storage tank to prevent the above-mentioned gas components from dissolving.

However, nitrogen is a colorless and odorless gas, making it difficult to detect leaks in pipelines or water storage tanks. Of course, detection devices that can detect nitrogen leaks are being sold, but not only is the detection area narrow, but the leaked nitrogen is diluted with air and has a low concentration, so detection is still difficult.

Korea Patent Publication No. 2020-0057351 Korean Patent Publication No. 1709626

The present invention was conceived to solve the above-mentioned problems, and its purpose is to provide a water treatment device equipped with a gas leak detection function and a gas leak detection method that can easily determine whether there is a leak of nitrogen gas used in the ultrapure water production process. do.

In addition, the purpose of the present invention is to provide a water treatment device and a gas leak detection method equipped with a gas leak detection function that can determine whether there is a leak of nitrogen gas used in the ultrapure water production process without using a separate nitrogen gas leak device. .

A water treatment device equipped with a gas leak detection function of the present invention to solve the above problem includes a raw water storage tank; a foreign matter removal unit that removes foreign substances contained in the water of the raw water storage tank; A gas storage tank storing gas at a predetermined pressure; One or more sealed treatment tanks positioned in parallel and receiving water from which foreign substances have been removed and gas from the gas storage tank; And a control unit that calculates and compares the amount of gas supplied to the treatment tank and the amount of gas to be filled in the one or more treatment tanks, wherein the treatment tank includes a water level sensor for sensing the water level and a pressure inside the treatment tank. It is characterized by being provided with a pressure sensor and an opening/closing valve.

Additionally, in the water treatment device equipped with the gas leak detection function of the present invention, the opening/closing valve is operated to open when the pressure of the treatment water tank is higher than a predetermined pressure and to close when the pressure is lower than the predetermined pressure.

Additionally, in the water treatment device equipped with the gas leak detection function of the present invention, the water level of the treatment tank fluctuates.

In addition, in the water treatment device equipped with a gas leak detection function of the present invention, the foreign matter removal unit includes a degassing membrane for removing gas contained in the liquid, and the degassing membrane receives gas from the gas storage tank, and the degassing membrane is It is characterized in that it is located in parallel with the treatment tank.

Additionally, in the water treatment device equipped with a gas leak detection function of the present invention, the degassing membrane is characterized by being equipped with a flow meter.

Additionally, in the water treatment device equipped with a gas leak detection function of the present invention, the gas is nitrogen.

In addition, a gas leak detection method of a water treatment device equipped with the above-described gas leak detection function includes a first step of measuring the supply amount from the gas storage tank; A second step of calculating the amount of gas to be filled in the one or more treatment tanks connected in parallel with the gas storage tank; and a third step of comparing the amount supplied in the first step with the amount of gas to be filled in the second step, wherein the gas is nitrogen.

Additionally, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, the amount of gas to be filled in the second step is characterized in that it varies depending on the water level of the one or more treatment water tanks.

In addition, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, in the second step, the amount of gas flowing into the degassing membrane connected in parallel with the one or more treatment water tanks is measured, and the third The step may include a third step of comparing the amount of gas supplied in the first step, the amount of gas to be filled in the second step, and the amount of gas introduced into the degassing membrane.

In addition, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, between the second step and the third step, gas into the one or more treatment water tanks is blocked, and the degassing membrane is It is characterized by further performing the step of supplying gas to.

In addition, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, there are two or more treatment water tanks, and the gas supply into the remaining treatment water tanks except for one of the treatment water tanks is blocked. Meanwhile, a fourth step of supplying gas to the degassing membrane and comparing the amount of gas supplied in the first step, the amount of gas to be filled in the second step, and the amount of gas introduced into the degassing membrane is further performed.

Additionally, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, the fourth step is characterized in that it is repeatedly performed for all treatment water tanks.

Additionally, in the gas leak detection method of a water treatment device equipped with a gas leak detection function according to the present invention, the gas supplied to the one or more treatment water tanks and the degassing membrane is supplied at the same pressure.

According to the water treatment device equipped with a gas leak detection function and the gas leak detection method of the present invention, it is possible to determine whether there is a nitrogen gas leak from the amount of gas supplied from the nitrogen gas storage tank and the change in the water level of the treatment tank, thereby increasing the reliability of the ultrapure water production process. There is an advantage of being able to increase .

In addition, according to the water treatment device equipped with a gas leak detection function and the gas leak detection method of the present invention, the presence of nitrogen gas leaks can be detected without a nitrogen gas detection device, which has the advantage of reducing operating costs.

In addition, according to the water treatment device equipped with a gas leak detection function and the gas leak detection method of the present invention, leakage of nitrogen gas can be detected without a nitrogen gas detection device, which has the advantage of minimizing the manpower required for maintenance.

1 is a conceptual diagram of a water treatment device equipped with a gas leak detection function according to the present invention.
Figure 2 is a diagram for explaining the position where nitrogen gas is supplied in the water treatment device equipped with a gas leak detection function according to the present invention.
Figure 3 is a cross-sectional view illustrating the flow of nitrogen gas according to water level fluctuation in a water treatment device equipped with a gas leak detection function according to the present invention.
Figure 4 is a flowchart for explaining a first embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.
Figure 5 is a flowchart for explaining a second embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.
Figure 6 is a flowchart for explaining a third embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.
Figure 7 is a flowchart for explaining a fourth embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.

In this application, terms such as “comprise,” “have,” or “equipped with” are intended to designate the presence of features, numbers, steps, components, parts, or combinations thereof described in the specification, and are not intended to indicate the presence of one or more other features, numbers, steps, components, parts, or combinations thereof. It should be understood that this does not exclude in advance the possibility of the presence or addition of features, numbers, steps, operations, components, parts, or combinations thereof.

When a component is said to be "connected" or "connected" to another component, it is understood that it may be directly connected to or connected to the other component, but that other components may exist in between. It should be. On the other hand, when it is mentioned that a component is “directly connected” or “directly connected” to another component, it should be understood that there are no other components in between. Other expressions that describe the relationship between components, such as "between" and "immediately between" or "neighboring" and "directly adjacent to" should be interpreted similarly.

Hereinafter, a water treatment device equipped with a gas leak detection function and a gas leak detection method according to the present invention will be described with reference to the attached drawings. The same reference numerals are used for the same components in the drawings, and duplicate descriptions for the same components are omitted.

1 is a conceptual diagram of a water treatment device equipped with a gas leak detection function according to the present invention. When described with reference to FIG. 1, the water treatment device equipped with a gas leak detection function according to the present invention includes a raw water storage tank 100, a pretreatment unit 200, a primary treatment unit 300, a secondary treatment unit 400, It consists of a tertiary processing unit 500, a fourth processing unit 600, a plurality of pumps (P), and a control unit (not shown).

The raw water storage tank 100 is a place where raw water to be supplied to the pretreatment unit 200 is temporarily stored. The type of raw water is not particularly limited, but may be industrial water.

In industrial environments where various products are produced, water is often required, and in particular, so-called ultrapure water containing almost no foreign substances is used during semiconductor manufacturing. Therefore, product defects can be prevented only when various foreign substances contained in raw water, such as particulate matter, ionic substances, and dissolved gases, are completely removed.

The foreign matter removal unit for removing the above-mentioned foreign substances includes a preprocessing unit 200, a first processing unit 300, a secondary processing unit 400, a tertiary processing unit 500, and a fourth processing unit 600. It can be configured to include.

First, the pretreatment unit 200 consists of a first pre-filter 210, a plurality of first filtration membranes 220, a first treatment tank 230, a first pump (P1), and a second pump (P2). The first pre-filter 210, which receives raw water from the raw water storage tank 100 by the first pump (P1), removes relatively large particulate matter and further minimizes fouling of the first filtration membrane 220 located at the rear. It is for. Some foreign substances not removed in the first pre-filter 210 are removed in the process of passing through the first filtration membrane 220, and the first treated water with a greatly reduced foreign matter content compared to the raw water is placed in the first treatment water tank 230. It is stored temporarily.

Here, the first pre-filter 210 and the first filtration membrane 220 may be an ultrafiltration membrane or a microfiltration membrane, but the pore size of the first pre-filter 210 is relatively larger than that of the first filtration membrane 220.

Meanwhile, the second pump (P2) located between the first treatment tank 230 and the first filtration membrane 220 is for cleaning the first filtration membrane 220.

The first processing unit 300 is located behind the pre-processing unit 200 and removes foreign substances that were not removed in the pre-processing unit 200. This first treatment unit 300 includes a heat exchanger 310, a second pre-filter 320, a sterilizer 330, a second filtration membrane 340, a second treatment tank 350, a third pump (P3), and a fourth pump (P4).

The heat exchanger 310 functions to adjust the water in the first treatment tank 230 transported by the third pump P3 to a constant temperature, for example, 25°C.

The water that has passed through the heat exchanger 310 is supplied to the second pre-filter 320 to remove remaining foreign substances and further minimize fouling of the second filtration membrane 340 located at the rear.

The sterilizer 330 located behind the second pre-filter 320 performs the function of killing bacteria or microorganisms that can grow in water. For example, it may be a UV (Ultraviolet) sterilizer that mainly emits a wavelength of 254 nm, and thus can suppress bio fouling by microorganisms during the filtration process by the second filtration membrane 340 located at the rear. .

The water in which bacteria, etc. have been killed by the first sterilizer 330 is supplied to the second filtration membrane 340 by the fourth pump (P4), and various remaining ionic components and organic substances are additionally removed, leaving the water in a cleaner state. 2 It is temporarily stored in the treatment tank 350.

Here, the second filtration membrane 340 is preferably a reverse osmosis membrane (RO) that can remove even ionic components. Although the drawing shows two second filtration membranes 340 connected in series, this is only an example and one or three or more second filtration membranes 340 may be connected in series.

Meanwhile, it is better to supply nitrogen gas to the second treatment tank 350, which will be described later.

Next, the secondary processing unit 400 will be described. The secondary processing unit 400 is located behind the primary processing unit 300 and removes foreign substances that could not be removed in the primary processing unit 300. This secondary treatment unit 400 includes a first degassing membrane 410, a first desalination device 420, a third treatment water tank 430, a fifth pump (P5), a sixth pump (P6), and a seventh It consists of a pump (P7).

The first degassing membrane 410, which receives water from the second treatment tank 350 by the fifth pump P5, removes dissolved gases remaining in the water, such as oxygen (O ₂ ) or carbon dioxide (CO ₂ ). It is a device for removing . This first degassing membrane 410 is made of a hydrophobic material and is a hollow fiber type with many pores formed on the surface. When the water from the second treatment tank 350 flows to the outside while depressurizing the internal space, the gas components dissolved in the water are discharged. This is the principle of separating gas components from the water by moving only the gases into the internal space.

Meanwhile, when the pressure inside the hollow fiber membrane strand is reduced, nitrogen gas is flowed together to prevent the outer shape from shrinking. Since this first degassing membrane corresponds to a known technology, detailed description will be omitted.

The first desalination device 420 located behind the first degassing membrane 410 is a device for removing ionic substances or ionizable substances contained in water. For example, the first desalination device 420 may be an electric desalination device, and since the configuration and principle of this electric desalination device corresponds to known technology, detailed description will be omitted. Of course, it is obvious that the electric desalination device can be replaced with an ion exchange resin capable of removing ion components.

The clean water with the content of ionic substances further reduced is temporarily stored in the third treatment tank 430, and it is preferred that nitrogen gas is supplied to the third treatment tank 430 as in the second treatment tank 350. This will be described later.

Meanwhile, the drawing shows that the first desalination device 420 consists of two units connected in series, and a seventh pump (P7) is provided between them. However, there may be three or more first desalination devices 420. .

We will continue to describe the third processing unit 500. The tertiary treatment unit 500 is located behind the secondary treatment unit 400 and decomposes organic matter including foreign substances that were not removed in the secondary treatment unit 400, more specifically, remaining ionic components, bacteria, etc. promotes This third treatment unit 500 includes a first organic matter oxidation device 510, a first ion exchange resin tower 520, a second degassing membrane 530, a fourth treatment water tank 540, and an eighth pump (P8). , and a ninth pump (P9).

The water in the third treatment tank 430 is passed through the first organic matter oxidation device 510 in the process of being transported by the eighth pump (P8), and is irradiated with a wavelength of 185 nm to enable decomposition of microorganisms such as bacteria and organic matter. It may be a UV (Ultraviolet) oxidation device that emits light.

The first ion exchange resin tower 520 is located behind the first organic matter oxidation device 510 to remove trace amounts of ionic components. Specifically, the ion exchange resin tower is filled with a cation resin and an anion resin at the same time, thereby removing a very small amount of remaining cation and anion components at the same time.

The second degassing membrane 530 located behind the first ion exchange resin tower 520 is for removing gas components that may remain in the water, and is the same as the first degassing membrane 410 described above, so the overlapping description is not necessary. Decided to omit it.

Meanwhile, the fourth treatment water tank 540 is a place where water from which gas components have been removed by the second degassing membrane 530 is temporarily stored. Like the third treatment water tank 430, the fourth treatment water tank 540 It is also good to supply nitrogen gas, but this will be described later.

Next, the fourth processing unit 600 will be described. The fourth treatment unit 600 is located behind the third treatment unit 500 and includes a cooler 610, a second organic matter oxidation device 620, a third ion exchange resin tower 630, and a fourth ion exchange resin tower. 640, a third degassing membrane 650, a third filtration membrane 660, a 10th pump (P10), an 11th pump (P11), and a 12th pump (P12).

The cooler 610, which receives water from the fourth treatment tank 540 by the tenth pump P10, is used to adjust the temperature of the water to, for example, 25°C.

The second organic oxidation device 620 is located behind the cooler 610, and is the same as the first organic oxidation device 510 described above, so duplicate description will be omitted.

A third ion exchange resin tower 630 and a fourth ion exchange resin tower 640 are located sequentially behind the second organic matter oxidation device 620 to remove remaining ion components. Here, one of the third ion exchange resin tower 630 and the fourth ion exchange resin tower 640 is filled with a cation resin, and the other is filled with an anion exchange resin.

The third degassing membrane 650 located behind the fourth ion exchange resin tower 640 is used to remove gas components that may remain in the water, such as carbon dioxide (CO ₂ ) or oxygen (O ₂ ), as described above. Since it is the same as the first degassing membrane 410 or the second degassing membrane 530, repeated description will be omitted.

Lastly, a third filtration membrane 660 is located behind the third degassing membrane 650. The third filtration membrane 660 is used to ensure high purity water by removing particles that have not yet been removed or generated during the above-mentioned treatment process. For example, it may be an ultrafiltration membrane with a molecular weight cutoff (MWCO) in the range of approximately 2,000 to 10,000. .

Figure 2 is a diagram for explaining the position where nitrogen gas is supplied in the water treatment device equipped with a gas leak detection function according to the present invention, and Figure 3 is a diagram illustrating the water level in the water treatment device equipped with a gas leak detection function according to the present invention. This is a cross-sectional view to explain the flow of nitrogen gas according to fluctuations.

As shown in Figures 2 and 3, the nitrogen gas supplied from the gas storage tank includes the second treatment tank 350, the third treatment tank 430, and the fourth treatment tank 540 at the same pressure. It is supplied to the first degassing membrane 410, the second degassing membrane 530, and the third degassing membrane 650.

Of course, in order to supply nitrogen gas from the gas storage tank to multiple treatment tanks and degassing membranes connected in parallel, the main transfer pipe is maintained at high pressure, but is supplied equally at a predetermined pressure near each treatment tank and degassing membrane. A regulator (R) for pressure control is mounted on the branch pipe.

Each treatment tank is equipped with a water level sensor, valve, and pressure gauge, and the degassing membrane is equipped with a flow meter and pressure gauge. To be described in detail with reference to FIG. 3, the second treatment water tank 350 is provided with a first water level sensor 351 to check changes in the water level of the treated water and a second pressure gauge (G2) to check the internal pressure. Meanwhile, a first valve 352 is installed at the top. Of course, in the case of the third treatment tank 430, a second water level sensor 431, a third pressure gauge (G3), and a second valve 432 are installed, and although the fourth treatment tank is not shown, these second treatment tanks Like the water tank 350 and the third treatment water tank 430, a water level sensor, pressure gauge, and valve are provided.

The reason for supplying nitrogen gas to each treatment tank is to block contact with external air. That is, when treated water comes in contact with air, gaseous components such as oxygen and carbon dioxide contained in the air dissolve into the water. To prevent this, non-reactive nitrogen gas is supplied to the treatment tank.

Meanwhile, water that has passed through the second filtration membrane 340 flows into the treatment tank, for example, the second treatment tank 350, and flows out toward the first degassing membrane 410. At this time, because there is a deviation in the inflow and outflow amounts, the water level in the second treatment tank 350 changes, and therefore the amount of nitrogen gas flowing into the second treatment tank 350 also varies.

That is, when the water flowing out of the second treatment tank 350 is more than the water flowing in, the water level falls and the empty space increases, so the amount of nitrogen gas flowing in increases. However, if the inflow of water is more than the outflow of water, the space is reduced due to an increase in the water level, so nitrogen gas does not flow into the second treatment water tank 350. At this time, because the second treatment water tank 350 is damaged or water does not flow smoothly due to compression of the nitrogen gas filled in the space above the water, a portion of the nitrogen gas filled through the first valve 352 is discharged to the outside.

Here, the first valve 352 is preferably a breather valve that is opened when the pressure of the second treatment tank 350 is above a predetermined range and closed when the pressure is below a predetermined range.

Meanwhile, water from the second treatment water tank 350 is continuously supplied to the first degassing membrane 410, and nitrogen gas is supplied for the purpose of removing dissolved gases such as oxygen (O ₂ ) and carbon dioxide (CO ₂ ) in the water. is always injected. Therefore, it is preferable that a flow meter (F) for measuring the inflow amount of nitrogen gas is installed at the inlet side of the first degassing membrane 410, and it is more preferable that a flow meter is also installed on the outlet side.

Of course, it is obvious that a first pressure gauge (G1) and a flow meter (F) must be provided on the outlet side of the gas storage tank.

The control unit (not shown) is used to detect leakage of nitrogen gas supplied from the gas storage tank. Specifically, the control unit includes a calculation unit that determines whether nitrogen gas leaks during the supply process based on the material balance of the total amount of nitrogen gas transferred from the gas storage tank, the amount of gas supplied into each treatment tank, and the amount of gas supplied to each degassing membrane; When it is determined that gas has leaked, it may be configured to include a notification unit that transmits the relevant information to the worker, and their specific functions will be described later.

Figure 4 is a flowchart for explaining a first embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention. Referring to FIG. 4, the nitrogen gas leak detection method according to the present invention includes a first step of measuring the amount supplied from the nitrogen gas storage tank, and the amount of gas to be filled in two or more treatment tanks connected in parallel with the nitrogen gas storage tank. The second step of calculating, and the supply amount in the first step and the total amount of nitrogen gas in the second step ( ) may include a third step of comparing. here, means the amount of gas to be filled in each treatment tank.

Specifically, in the first step, the total amount of gas supplied from the flow meter (F) mounted on the outlet side of the nitrogen gas storage tank ( ) is calculated.

In the second step, the volume corresponding to the empty space is calculated from the water level sensor installed in each treatment tank. For example, if there are three treatment tanks, the amount of gas to be filled in each treatment tank ( , , ) is calculated.

Here, when the water level in the treatment tank rises, nitrogen gas is not supplied, and rather, the valve is opened so that the treatment tank is not compressed beyond the supply pressure of the nitrogen gas.

And in the third stage, the total supply of nitrogen gas storage tank ( ), and the amount of all gases to be filled in each treatment tank ( ) compare.

For example, the total amount of supply from the nitrogen gas storage tank during a set period such as a few seconds to several minutes ( ), and the amount of gas obtained by calculating the cumulative value of the space of each treatment tank during the same period ( ) is compared. These values are in a similar range, i.e. If this applies, it can be predicted that the treatment tank, including the pipe between the nitrogen gas storage tank and each treatment tank, is in a normal state with airtightness maintained. but If this applies, it can be expected that cracks will occur in the main pipe, branch pipe, or connection area, requiring repair. The above-described steps are performed in a separately provided control unit. In other words, the measured values of the flow meter (F) and water level sensor are transmitted to the control unit, and the control unit determines the total supply amount ( ) and all gas amounts to be filled ( ) and performs a function to compare them.

Meanwhile, even in the same space, the volume of nitrogen gas to be filled may change depending on temperature and pressure, but nitrogen gas with a certain range of pressure is always supplied to the treatment tank, and ultrapure water manufacturing facilities for semiconductor manufacturing are maintained at a constant temperature. Considering that it is common to drive indoors, this applies to cases where there is no actual temperature change. Therefore, it is obvious that temperature correction must be performed when the supplied nitrogen gas and the temperature inside the treatment tank are different.

As such, according to the first embodiment of the present invention, nitrogen gas leakage can be detected without installing a separate flow meter in each treatment tank, thereby reducing operating costs and further minimizing work manpower.

Figure 5 is a flowchart for explaining a second embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.

In the second embodiment, the amount of gas introduced into the degassing membrane in the second step is measured, and in the third step, the total supply amount in the first step ( ) and all gas amounts to be filled in the treatment tank in the second stage ( ) and the amount of gas introduced into the degassing membrane are the same as the first embodiment, so only the different configurations will be described.

Specifically, in the second step, the total amount of gas supplied to the degassing membrane from the flow meter (F) located near the inlet of each degassing membrane ( ) is calculated. here means the amount of gas supplied to each degassing membrane.

And in the third stage, the total supply of nitrogen gas storage tank ( ), and the total amount of all gases to be filled in each treatment tank and the gas introduced into the degassing membrane ( ) compare. Results of comparison If it satisfies, it is in a normal state, and conversely, If this happens, it can be expected that cracks will occur in the main pipe, branch pipe, or connection area, requiring repair.

Figure 6 is a flowchart for explaining a third embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.

In the third embodiment, the rest is the same as the second embodiment except that a step of determining whether the amount of gas supplied to the degassing membrane is normal between the second and third steps is added, so only the different configurations will be described. I decided to do it.

Specifically, between the second and third steps, the gas supplied to each treatment tank is blocked, and nitrogen gas is supplied only to the degassing membrane, so that the total amount of gas supplied to the degassing membrane ( ) is calculated.

And the total supply amount of nitrogen gas storage tank ( ) and the amount of gas supplied to each degassing membrane ( ) compare. Results of comparison If it satisfies, it can be judged to be in a normal state, and conversely, If this happens, it can be expected that cracks will occur in the main pipe, branch pipe, or connection area, requiring repair.

Figure 7 is a flowchart for explaining a fourth embodiment of a gas leak detection method in a water treatment device equipped with a gas leak detection function according to the present invention.

In the fourth embodiment, when it can be expected that repair will be necessary due to cracks occurring in the main pipe, branch pipe, or connection area, that is, This is to determine where the problem occurred in the vicinity of the treatment tank.

If there are multiple treatment tanks, except for one, the gas supplied to the remaining treatment tanks is blocked, while nitrogen gas is normally supplied to the degassing membrane. Determine whether it is satisfied. In addition, by repeatedly preparing for each treatment tank in the same manner, the location corresponding to the abnormal state can be identified.

Of course, except for the above configurations, the remaining first to third steps are the same as the third embodiment of FIG. 6, so duplicate descriptions will be omitted.

As above, specific parts of the present invention have been described in detail, and those skilled in the art will understand that these specific descriptions are merely preferred embodiments and do not limit the scope of the present invention, and do not limit the scope of the present invention. It is obvious to those skilled in the art that various changes and modifications are possible within the scope and technical idea, and it is natural that such changes and modifications fall within the scope of the appended patent claims.

100: Raw water storage tank
200: Preprocessing unit
210: first pre-filter 220: first filtration membrane
230: First treatment tank
300: Primary processing unit
310: heat exchanger 320: second prefilter
330: Sterilizer 340: Second filtration membrane
350: Second treatment tank
351: first water level sensor 352: first valve
400: Secondary processing unit
410: first degassing membrane 420: first desalting device
430: Third treatment tank
431: second water level sensor 432: second valve
500: Tertiary processing unit
510: First organic oxidation device 520: First ion exchange resin tower
530: Second degassing membrane 540: Fourth treatment tank
600: 4th processing unit
610: Cooler 620: Second organic oxidation device
630: Third ion exchange resin tower 640: Fourth ion exchange resin tower
650: third degassing membrane 660: third filtration membrane
P1: first pump P2: second pump
P3: Third pump P4: Fourth pump
P5: 5th pump P6: 6th pump
P7: 7th pump P8: 8th pump
P9: 9th pump P10: 10th pump
P11: 11th pump P12: 12th pump
G1: First pressure gauge G2: Second pressure gauge
G3: Third pressure gauge G4: Fourth pressure gauge
F: Flowmeter R: Regulator

Claims (13)

raw water storage tank;
a foreign matter removal unit that removes foreign substances contained in the water of the raw water storage tank;
A gas storage tank storing gas at a predetermined pressure;
One or more sealed treatment tanks positioned in parallel and receiving water from which foreign substances have been removed and gas from the gas storage tank; and
A control unit that calculates and compares the amount of gas supplied to the treatment tank and the amount of gas to be filled in the one or more treatment tanks;
A water treatment device with a gas leak detection function, characterized in that the treatment tank is equipped with a water level sensor for sensing the water level, a pressure sensor for measuring the pressure inside the treatment tank, and an open/close valve.
According to paragraph 1,
A water purification device with a gas leak detection function, wherein the opening/closing valve is opened when the pressure of the treatment tank is above a predetermined pressure and closed when the pressure of the treatment tank is below a predetermined pressure.
According to paragraph 2,
A water treatment device with a gas leak detection function, wherein the water level of the treatment tank fluctuates.
According to paragraph 1,
The foreign matter removal unit includes a degassing membrane for removing gas contained in the liquid, the degassing membrane receives gas from the gas storage tank, and the degassing membrane is positioned in parallel with the treatment tank. A gas leak detection function. Equipped with a water treatment device.
According to paragraph 4,
A water treatment device with a gas leak detection function, characterized in that the degassing membrane is equipped with a flow meter.
According to paragraph 4,
A water treatment device with a gas leak detection function, wherein the gas is nitrogen.
A gas leak detection method of a water treatment device equipped with a gas leak detection function according to any one of claims 1 to 6, comprising:
A first step of measuring the supply amount from the gas storage tank;
A second step of calculating the amount of gas to be filled in the one or more treatment tanks connected in parallel with the gas storage tank; and
It includes a third step of comparing the amount of gas supplied in the first step with the amount of gas to be filled in the second step,
A method of detecting a gas leak in a water treatment device equipped with a gas leak detection function, wherein the gas is nitrogen.
In clause 7,
A gas leak detection method in a water treatment device equipped with a gas leak detection function, wherein the amount of gas to be filled in the second step varies depending on the water level of the one or more treatment water tanks.
In clause 7,
In the second step, the amount of gas flowing into the degassing membrane connected in parallel with the one or more treatment tanks is measured,
In the third step, the supply amount in the first step is compared with the amount of gas to be filled in the second step and the amount of gas introduced into the degassing membrane. Equipped with a gas leak detection function, comprising a. Methods for detecting gas leaks in water treatment equipment.
According to clause 9,
Between the second step and the third step, the step of blocking gas into the one or more treatment water tanks and supplying gas to the degassing membrane is further performed. Equipped with a gas leak detection function. Methods for detecting gas leaks in water treatment equipment.
According to clause 10,
There are two or more treatment tanks, and the gas supply to the inside of the remaining treatment tanks except for one of the treatment tanks is blocked, while gas is supplied to the degassing membrane, and the supply amount in the first step and the first step are supplied. A gas leak detection method of a water treatment device equipped with a gas leak detection function, characterized in that a fourth step is further performed to compare the amount of gas to be filled in step 2 and the amount of gas introduced into the degassing membrane.
According to clause 11,
The fourth step is a gas leak detection method of a water treatment device equipped with a gas leak detection function, characterized in that the fourth step is repeatedly performed for all treatment water tanks.
According to clause 8,
A gas leak detection method in a water treatment device equipped with a gas leak detection function, wherein the gas supplied to the one or more treatment water tanks and the degassing membrane is supplied at the same pressure.

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