KR20230134964A - Window and display device including the same - Google Patents

Abstract

A window according to an embodiment of the present invention includes a base layer, a first layer disposed on the base layer, a second layer disposed on the first layer, and a third layer disposed on the second layer. And the second layer is silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), It contains at least one of ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO), and at a wavelength of 550 nm, the refractive index of the second layer is 1.3 or more and 1.6 or less. Accordingly, the window of one embodiment can have improved wear resistance properties and mechanical strength while having a low surface reflectance.

Description

Windows and display devices including the same {WINDOW AND DISPLAY DEVICE INCLUDING THE SAME}

The present invention relates to a window and a display device including the same, and more specifically, to a window with low reflectance and excellent mechanical properties and a display device including the same.

Display devices are used in various multimedia devices such as televisions, mobile phones, tablet computers, game consoles, etc. to provide image information to users. Recently, various types of flexible display devices capable of folding or bending have been developed. Flexible display devices can have various shapes, such as being folded, rolled, or bent, making them easy to carry.

A flexible display device may include a foldable or bendable display panel and a window. However, the window of the flexible display device has a problem in that it is easily deformed by folding or bending operations or easily damaged by external impact.

One object of the present invention is to provide a window with low reflectivity and excellent mechanical strength.

One object of the present invention is to provide a display device that maintains low reflectance while improving display efficiency.

A window according to an embodiment of the present invention includes a base layer, a first layer disposed on the base layer, a second layer disposed on the first layer, and a third layer disposed on the second layer. And the second layer is silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), It contains at least one of ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO), and at a wavelength of 550 nm, the refractive index of the second layer is 1.3 or more and 1.6 or less.

The second layer may include at least one of silica (SiO ₂ ), magnesium oxide (MgO), and aluminum oxide (Al ₂ O ₃ ).

The second layer may be placed directly on the first layer, and the third layer may be placed directly on the second layer.

The first layer may include at least one of magnesium fluoride (MgF ₂ ) and magnesium oxide (MgO).

The first layer may further include yttrium oxyfluoride (YOF).

The first layer may include a solid solution in which the magnesium oxide, magnesium fluoride, and yttrium oxyfluoride are mixed.

At a wavelength of 550 nm, the reflectance at the top surface of the third layer may be 6.5% or less.

The third layer may include a fluorine-containing polymer.

At a 550nm wavelength, the refractive index of the first layer may be 1.3 or more and 1.5 or less, and at a 550nm wavelength, the refractive index of the third layer may be 1.3 or more and 1.5 or less.

The base layer may include a glass substrate or a polymer film.

The first layer may have a thickness of 50 nm to 130 nm, the second layer may have a thickness of 5 nm to 25 nm, and the third layer may have a thickness of 5 nm to 30 nm.

The window according to an embodiment of the present invention is disposed between the base layer and the first layer and may further include a fourth layer containing magnesium oxide.

The window according to an embodiment of the present invention is disposed between the base layer and the first layer and may further include a fifth layer having a refractive index of 1.7 or more and 3.0 or less at a wavelength of 550 nm.

The fifth layer is zinc oxide (ZrO ₂ ), hafnium oxide (HfO ₂ ), tantalum oxide (Ta ₂ O ₅ ), niobium oxide (Nb ₂ O ₅ ), titanium oxide (TiO ₂ ), and ytterbium oxide (Y). ₂ O ₃ ), silicon nitride (Si ₃ N ₄ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and aluminum nitride (AlN).

The window according to an embodiment of the present invention is disposed below the base layer and may further include a sixth layer having a refractive index of 1.3 or more and 1.5 or less at a wavelength of 550 nm.

The sixth layer may include at least one of magnesium oxide, magnesium fluoride, and yttrium oxyfluoride.

A window according to an embodiment of the present invention includes a base layer, a first layer disposed on the base layer, a second layer disposed on the first layer, and a third layer disposed on the second layer. The first layer includes a first material, the second layer includes a second material, and the first material and the second material are each independently silica, fused silica, fluorine-doped fused silica, It includes at least one of magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), ytterbium fluoride (YbF ₃ ), and magnesium oxide (MgO).

A display device according to an embodiment of the present invention includes a display module and a window disposed on the display module. The window includes a base layer, a first layer disposed on the base layer, a second layer disposed on the first layer, and a third layer disposed on the second layer, the second layer Silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), ytterbium fluoride (YbF ₃ ). , and magnesium oxide (MgO), and at a wavelength of 550 nm, the refractive index of the second layer is 1.3 or more and 1.6 or less.

The display module includes a substrate, a circuit layer disposed on the substrate, a light-emitting device layer disposed on the circuit layer, an encapsulation layer disposed on the light-emitting device layer, and an anti-reflection layer disposed on the encapsulation layer. , the anti-reflection layer may include a split layer in which a plurality of split openings are defined, each overlapping a plurality of light emitting elements, and a plurality of color filters disposed to respectively correspond to the plurality of split openings.

The first layer may be spaced apart from the display module with the base layer interposed therebetween.

The top surface of the third layer may define the outermost surface of the window.

The sum of the thicknesses of the first layer, the second layer, and the third layer may be 150 nm or less.

According to one embodiment of the present invention, the window includes a first layer and a second layer having a low refractive index, and each of the first layer and the second layer includes a material having a low refractive index in the structure and excellent mutual adhesion. Thus, wear resistance properties and mechanical strength can be improved. Accordingly, the durability of a display device including a window can be improved.

Figure 1A is a combined perspective view of a display device according to an embodiment of the present invention.
Figure 1B is an exploded perspective view of a display device according to an embodiment of the present invention.
Figure 2 is a cross-sectional view of a display device according to an embodiment of the present invention.
Figure 3 is a cross-sectional view showing a portion of a display module according to an embodiment of the present invention.
4A to 4D are cross-sectional views of a window according to an embodiment of the present invention.

In this specification, when a component (or region, layer, portion, etc.) is referred to as being “on,” “connected to,” or “coupled to” another component, it is directly placed/on the other component. This means that they can be connected/combined or a third component can be placed between them.

Like reference numerals refer to like elements. Additionally, in the drawings, the thickness, proportions, and dimensions of components are exaggerated for effective explanation of technical content. “And/or” includes all combinations of one or more that can be defined by the associated components.

Terms such as first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The above terms are used only for the purpose of distinguishing one component from another. For example, a first component may be named a second component, and similarly, the second component may also be named a first component without departing from the scope of the present invention. Singular expressions include plural expressions unless the context clearly dictates otherwise.

Additionally, terms such as “below,” “on the lower side,” “above,” and “on the upper side” are used to describe the relationship between components shown in the drawings. The above terms are relative concepts and are explained based on the direction indicated in the drawings.

Terms such as “include” or “have” are intended to designate the presence of features, numbers, steps, operations, components, parts, or combinations thereof described in the specification, but do not include one or more other features, numbers, or steps. , it should be understood that this does not exclude in advance the possibility of the presence or addition of operations, components, parts, or combinations thereof.

In this specification, “directly disposed” may mean that there is no additional layer, film, region, plate, etc. between one part of the layer, film, region, plate, etc. and another part. For example, “directly placed” may mean placed without using an additional member, such as an adhesive member, between two layers or two members.

Unless otherwise defined, all terms (including technical terms and scientific terms) used in this specification have the same meaning as commonly understood by a person skilled in the art to which the present invention pertains. Additionally, terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with the meaning they have in the context of the relevant technology, and unless explicitly defined herein, should not be interpreted as having an overly idealistic or overly formal meaning. It shouldn't be.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

Figure 1A is a combined perspective view of a display device according to an embodiment of the present invention. Figure 1B is an exploded perspective view of a display device according to an embodiment of the present invention.

Referring to FIG. 1A, the display device DD may be a device that is activated according to an electrical signal. The display device (DD) can display an image (IM) and detect external input. The display device DD may include various embodiments. For example, the display device DD may include a tablet, laptop, computer, smart television, etc. In this embodiment, the display device DD is exemplarily shown as a smart phone.

The display device DD may display the image IM in the third direction DR3 on the display surface FS parallel to each of the first and second directions DR1 and DR2. The display surface FS on which the image IM is displayed may correspond to the front surface of the display device DD and the front surface FS of the window WM. Hereinafter, the display surface and front surface of the display device DD and the front surface of the window WM will use the same reference numerals. Images (IM) may include static images as well as dynamic images. In FIG. 1A, a clock and a plurality of icons are shown as an example of an image (IM).

In this embodiment, the front (or front) and rear (or lower) surfaces of each member are defined based on the direction in which the image IM is displayed. The front and back surfaces are opposed to each other in the third direction DR3, and the normal directions of each of the front and back surfaces may be parallel to the third direction DR3. The separation distance between the front and back surfaces in the third direction DR3 may correspond to the thickness of the display panel 100 in the third direction DR3. Meanwhile, the direction indicated by the first to third directions DR1, DR3, and DR3 is a relative concept and can be converted to another direction. Hereinafter, the first to third directions refer to the same reference numerals as the directions indicated by the first to third directions DR1, DR2, and DR3, respectively. Additionally, in this specification, “on a plane” may mean when viewed from the third direction DR3.

The display device DD according to an embodiment of the present invention can detect a user's input applied from the outside. The user's input includes various types of external inputs, such as parts of the user's body, light, heat, or pressure. The user's input may be provided in various forms, and the display device (DD) may detect the user's input applied to the side or back of the display device (DD) depending on the structure of the display device (DD). It is not limited to the examples.

As shown in FIGS. 1A and 1B, the display device DD includes a window WM, a display module DM, and an external case HU. In this embodiment, the window WM and the external case HU are combined to form the exterior of the display device DD. In this embodiment, the external case HU, display module DM, and window WM may be sequentially stacked along the third direction DR3.

The window WM may include an optically transparent material. The window WM may include an insulating panel. For example, the window WM may be made of glass, plastic, or a combination thereof.

As described above, the front surface (FS) of the window (WM) defines the front surface of the display device (DD). The transmission area (TA) may be an optically transparent area. For example, the transmission area (TA) may be an area with a visible light transmittance of about 90% or more.

The bezel area (BZA) may be an area with relatively low light transmittance compared to the transmission area (TA). The bezel area (BZA) defines the shape of the transmission area (TA). The bezel area BZA is adjacent to the transmissive area TA and may surround the transmissive area TA.

The bezel area (BZA) may have a predetermined color. The bezel area (BZA) covers the surrounding area (NAA) of the display module (DM) and can block the surrounding area (NAA) from being viewed from the outside. Meanwhile, this is shown as an example, and in the window WM according to an embodiment of the present invention, the bezel area BZA may be omitted.

The display module (DM) can display an image (IM) and detect external input. The image (IM) may be displayed on the front (IS) of the display module (DM). The front surface (IS) of the display module (DM) includes an active area (AA) and a peripheral area (NAA). The active area (AA) may be an area that is activated according to electrical signals.

In this embodiment, the active area (AA) is an area where the image (IM) is displayed and may also be an area where an external input is detected. The transmission area (TA) overlaps at least the active area (AA). For example, the transmission area TA overlaps the entire surface or at least part of the active area AA. Accordingly, the user can view the image IM or provide an external input through the transmission area TA. However, this is shown as an example, and the area where the image IM is displayed and the area where external input is detected may be separated within the active area AA, and are not limited to any one embodiment.

The peripheral area (NAA) may be an area covered by the bezel area (BZA). The peripheral area (NAA) is adjacent to the active area (AA). The surrounding area (NAA) may surround the active area (AA). A driving circuit or driving wiring for driving the active area (AA) may be disposed in the peripheral area (NAA).

The display module (DM) may include a display panel and a sensor layer. The image (IM) may be substantially displayed on the display panel, and the external input may be substantially sensed by the sensor layer. The display module (DM) includes both a display panel and a sensor layer, so it can display an image (IM) and detect external input at the same time. A detailed description of this will be provided later.

The display device DD in one embodiment may further include a driving circuit. The driving circuit may include a flexible circuit board and a main circuit board. The flexible circuit board may be electrically connected to the display module (DM). The flexible circuit board can connect the display module (DM) and the main circuit board. However, this is shown as an example, and the flexible circuit board according to the present invention may not be connected to the main circuit board, and the flexible circuit board may be a rigid board.

The flexible circuit board may be connected to pads of the display module DM disposed in the peripheral area NAA. The flexible circuit board can provide the display module (DM) with electrical signals for driving the display module (DM). The electrical signal may be generated from a flexible circuit board or from a main circuit board. The main circuit board may include various driving circuits for driving the display module (DM) or a connector for power supply. The main circuit board may be connected to the display module (DM) through a flexible circuit board.

Meanwhile, although FIG. 1B exemplarily shows the display module DM in an unfolded state, at least a portion of the display module DM may be bent. In this embodiment, a portion of the display module DM may be bent toward the back of the display module DM, and the portion bent toward the rear may be a portion to which the main circuit board is connected. Accordingly, the main circuit board can be assembled in an overlapping state on the back of the display module DM.

The outer case (HU) is combined with the window (WM) to define the appearance of the display device (DD). The outer case (HU) provides a predetermined internal space. The display module (DM) can be accommodated in the internal space.

The outer case (HU) may include a material with relatively high rigidity. For example, the outer case HU may include a plurality of frames and/or plates made of glass, plastic, or metal, or a combination thereof. The external case (HU) can stably protect the components of the display device (DD) accommodated in the internal space from external shock.

Figure 2 is a cross-sectional view of a display device according to an embodiment of the present invention.

Referring to FIG. 2, the display device DD may include a display module DM and a window WM. The display module (DM) and the window (WM) may be combined with an adhesive layer (AD). In the display device DD of one embodiment, the display module DM may include a display panel 100, a sensor layer 200, and an anti-reflection layer 300. Among the plurality of layers in the display module (DM), the anti-reflection layer 300 may be coupled to the window WM through the adhesive layer AD.

The display panel 100 may be configured to substantially generate images. The display panel 100 may be an emissive display panel. For example, the display panel 100 may be an organic light emitting display panel, an inorganic light emitting display panel, a micro LED display panel, or a nano LED display panel. The display panel 100 may also be referred to as a display layer.

The display panel 100 may include a base substrate 110, a circuit layer 120, a light emitting device layer 130, and an encapsulation layer 140.

The base substrate 110 may be a member that provides a base surface on which the circuit layer 120 is disposed. The base substrate 110 may be a rigid substrate or a flexible substrate capable of bending, folding, rolling, etc. The base substrate 110 may be a glass substrate, a metal substrate, or a polymer substrate. However, the embodiment of the present invention is not limited to this, and the base substrate 110 may be an inorganic layer, an organic layer, or a composite material layer.

The base substrate 110 may have a multi-layer structure. For example, the base substrate 110 may include a first synthetic resin layer, a multi-layer or single-layer inorganic layer, and a second synthetic resin layer disposed on the multi-layer or single-layer inorganic layer. Each of the first and second synthetic resin layers may include polyimide-based resin, but is not particularly limited.

The circuit layer 120 may be disposed on the base substrate 110. The circuit layer 120 may include an insulating layer, a semiconductor pattern, a conductive pattern, and a signal line.

The light emitting device layer 130 may be disposed on the circuit layer 120. The light emitting device layer 130 may include a light emitting device. For example, the light emitting device may include an organic light emitting material, an inorganic light emitting material, an organic-inorganic light emitting material, a quantum dot, a quantum rod, a micro LED, or a nano LED.

The encapsulation layer 140 may be disposed on the light emitting device layer 130. The encapsulation layer 140 can protect the light emitting device layer 130 from foreign substances such as moisture, oxygen, and dust particles. The encapsulation layer 140 may include at least one inorganic layer. The encapsulation layer 140 may include a stacked structure of an inorganic layer/organic layer/inorganic layer.

The sensor layer 200 may be disposed on the display panel 100. The sensor layer 200 can detect external input applied from outside. The external input may be a user's input. The user's input may include various types of external inputs, such as parts of the user's body, light, heat, pen, or pressure.

The sensor layer 200 may be formed on the display panel 100 through a continuous process. In this case, the sensor layer 200 may be placed directly on the display panel 100. Here, “directly disposed” may mean that a third component is not disposed between the sensor layer 200 and the display panel 100. That is, a separate adhesive member may not be disposed between the sensor layer 200 and the display panel 100.

The anti-reflection layer 300 may be placed directly on the sensor layer 200. The anti-reflection layer 300 may reduce the reflectance of external light incident from the outside of the display device DD. The anti-reflection layer 300 may be formed on the sensor layer 200 through a continuous process. The anti-reflection layer 300 may include color filters. The color filters may have a predetermined arrangement. For example, the color filters may be arranged taking into account the emission colors of pixels included in the display panel 100. Additionally, the anti-reflection layer 300 may further include a black matrix adjacent to the color filters. A detailed description of the anti-reflection layer 300 will be described later.

In one embodiment of the present invention, the sensor layer 200 may be omitted. In this case, the anti-reflection layer 300 may be placed directly on the display panel 100. In one embodiment of the present invention, the positions of the sensor layer 200 and the anti-reflection layer 300 may be changed.

Although not shown, in one embodiment of the present invention, the display device DD may further include an optical layer disposed on the anti-reflection layer 300. For example, the optical layer may be formed on the anti-reflection layer 300 through a continuous process. The optical layer can improve the front brightness of the display device DD by controlling the direction of light incident from the display panel 100. For example, the optical layer may include an organic insulating layer in which openings are defined corresponding to the light-emitting areas of the pixels included in the display panel 100, and a high refractive index layer that covers the organic insulating layer and fills the openings. You can. The high refractive index layer may have a higher refractive index than the organic insulating layer.

The window WM may provide a front surface of the display device DD. The window WM may include a glass film or a synthetic resin film as a base film. The window WM may further include functional layers such as an anti-reflection layer or an anti-fingerprint layer. The functional layers included in the window WM are explained in more detail in the description of FIGS. 4A and 4B. Although not shown, the window WM may further include a bezel pattern that overlaps the aforementioned bezel area (BZA, see FIG. 1B).

Figure 3 is a cross-sectional view showing a portion of a display module according to an embodiment of the present invention. FIG. 3 shows a partial cross-section of one light emitting element (LD) and a pixel circuit (PC) included in the display module (DM).

The display panel 100 included in the display module DM of one embodiment may include a base substrate 110. The base substrate 110 may be a member that provides a base surface on which the circuit layer 120 is disposed. The base substrate 110 may be a glass substrate, a metal substrate, or a plastic substrate. However, the embodiment is not limited to this, and the base layer BS may be an inorganic layer, an organic layer, or a composite material layer.

The buffer layer 10br may be disposed on the base substrate 110. The buffer layer 10br can prevent metal atoms or impurities from diffusing from the base substrate 110 into the upper first semiconductor pattern SP1. The first semiconductor pattern SP1 includes the active area AC1 of the silicon transistor (S-TFT). The buffer layer 10br can control the rate of heat provision during the crystallization process to form the first semiconductor pattern SP1, so that the first semiconductor pattern SP1 is formed uniformly.

The first semiconductor pattern SP1 may be disposed on the buffer layer 10br. The first semiconductor pattern SP1 may include a silicon semiconductor. For example, silicon semiconductors may include amorphous silicon, polycrystalline silicon, etc. For example, the first semiconductor pattern SP1 may include low-temperature polysilicon.

FIG. 3 only shows a portion of the first semiconductor pattern SP1 disposed on the buffer layer 10br, and the first semiconductor pattern SP1 may be further disposed in other areas. The first semiconductor pattern SP1 may be arranged in a specific rule across the pixels. The first semiconductor pattern SP1 may have different electrical properties depending on whether it is doped or not. The first semiconductor pattern SP1 may include a first region with high conductivity and a second region with low conductivity. The first region may be doped with an N-type dopant or a P-type dopant. A P-type transistor may include a doped region doped with a P-type dopant, and an N-type transistor may include a doped region doped with an N-type dopant. The second region may be a non-doped region or a region doped at a lower concentration than the first region.

The conductivity of the first region is greater than that of the second region, and the first region may substantially serve as an electrode or a signal line. The second area may substantially correspond to the active area (or channel) of the transistor. In other words, a portion of the first semiconductor pattern SP1 may be the active area of the transistor, another portion may be the source or drain of the transistor, and another portion may be a connection electrode or a connection signal line.

The source region (SE1, or source), the active region (AC1, or channel), and the drain region (DE1, or drain) of the silicon transistor (S-TFT) may be formed from the first semiconductor pattern (SP1). The source region SE1 and the drain region DE1 may extend in opposite directions from the active region AC1 in a cross-section.

Meanwhile, although not shown, a back metal layer may be disposed below the silicon transistor (S-TFT) and the bottom of the oxide transistor (O-TFT), respectively. The rear metal layer may be disposed to overlap the pixel circuit (PC) and may block external light from reaching the pixel circuit (PC). The rear metal layer may be disposed between the base substrate 110 and the buffer layer 10br. Alternatively, the rear metal layer may be disposed between the second insulating layer 20 and the third insulating layer 30. The back metal layer may include a reflective metal. For example, the back metal layer may be silver (Ag), an alloy containing silver (Ag), molybdenum (Mo), an alloy containing molybdenum, aluminum (Al), an alloy containing aluminum, aluminum nitride ( AlN), tungsten (W), tungsten nitride (WN), copper (Cu), and p+ doped amorphous silicon. The rear metal layer may be connected to electrodes or wiring and may receive a constant voltage or signal from them. According to one embodiment of the present invention, the rear metal layer may be a floating electrode that is isolated from other electrodes or wiring. In one embodiment of the present invention, an inorganic barrier layer may be further disposed between the base substrate 110 and the buffer layer 10br.

The first insulating layer 10 may be disposed on the buffer layer 10br. The first insulating layer 10 commonly overlaps a plurality of pixels and may cover the first semiconductor pattern SP1. The first insulating layer 10 may be an inorganic layer and/or an organic layer, and may have a single-layer or multi-layer structure. The first insulating layer 10 may include at least one of aluminum oxide, titanium oxide, silicon oxide, silicon nitride, silicon oxynitride, zirconium oxide, and hafnium oxide. In this embodiment, the first insulating layer 10 may be a single layer of silicon oxide. The insulating layer of the first insulating layer 10 as well as the circuit layer 120 described later may be an inorganic layer and/or an organic layer, and may have a single-layer or multi-layer structure. The inorganic layer may include at least one of the above-mentioned materials, but is not limited thereto.

The gate (GT1) of the silicon transistor (S-TFT) is disposed on the first insulating layer (10). The gate GT1 may be part of a metal pattern. The gate (GT1) overlaps the active area (AC1). In the process of doping the first semiconductor pattern SP1, the gate GT1 may function as a mask. The gate (GT1) is titanium (Ti), silver (Ag), an alloy containing silver, molybdenum (Mo), an alloy containing molybdenum, aluminum (Al), an alloy containing aluminum, and aluminum nitride ( It may include AlN), tungsten (W), tungsten nitride (WN), copper (Cu), indium tin oxide (ITO), indium zinc oxide (IZO), etc., but is not particularly limited thereto.

The second insulating layer 20 is disposed on the first insulating layer 10 and may cover the gate GT1. The third insulating layer 30 may be disposed on the second insulating layer 20. The second electrode CE20 of the storage capacitor Cst may be disposed between the second insulating layer 20 and the third insulating layer 30. Additionally, the first electrode CE10 of the storage capacitor Cst may be disposed between the first insulating layer 10 and the second insulating layer 20.

The second semiconductor pattern SP2 may be disposed on the third insulating layer 30 . The second semiconductor pattern SP2 may include the active area AC2 of an oxide transistor (O-TFT), which will be described later. The second semiconductor pattern SP2 may include an oxide semiconductor. The second semiconductor pattern (SP2) is a transparent conductive oxide (Indium tin oxide (ITO), Indium zinc oxide (IZO), Indium gallium zinc oxide (IGZO), Zinc oxide (ZnO), or Indium oxide (In ₂ O ₃ ). may include transparent conductive oxide (TCO).

The oxide semiconductor may include a plurality of regions divided depending on whether or not the transparent conductive oxide has been reduced. A region in which the transparent conductive oxide is reduced (hereinafter referred to as a reduced region) has greater conductivity than a region in which the transparent conductive oxide is not reduced (hereinafter referred to as a non-reduced region). The reduction region essentially functions as the source/drain or signal line of the transistor. The non-reducing region substantially corresponds to the semiconductor region (or active region or channel) of the transistor. In other words, a portion of the second semiconductor pattern SP2 may be a semiconductor region of the transistor, another portion may be a source/drain region of the transistor, and another portion may be a signal transmission region.

The source region (SE2, or source), the active region (AC2, or channel), and the drain region (DE2, or drain) of the oxide transistor (O-TFT) may be formed from the second semiconductor pattern (SP2). The source region SE2 and the drain region DE2 may extend in opposite directions from the active region AC2 in a cross-section.

The fourth insulating layer 40 may be disposed on the third insulating layer 30. The fourth insulating layer 40 commonly overlaps a plurality of pixels and may cover the second semiconductor pattern SP2. Although not shown, the fourth insulating layer 40 overlaps the gate (GT2) of the oxide transistor (O-TFT) and exposes the source region (SE2) and drain region (DE2) of the oxide transistor (O-TFT). It may also be provided in the form of an insulating pattern.

The gate (GT2) of the oxide transistor (O-TFT) is disposed on the fourth insulating layer 40. The gate (GT2) of the oxide transistor (O-TFT) may be part of a metal pattern. The gate (GT2) of the oxide transistor (O-TFT) overlaps the active area (AC2).

The fifth insulating layer 50 is disposed on the fourth insulating layer 40 and may cover the gate GT2. The first connection electrode CNE1 may be disposed on the fifth insulating layer 50 . The first connection electrode (CNE1) is connected to the drain region (DE1) of the silicon transistor (S-TFT) through a contact hole penetrating the first to fifth insulating layers (10, 20, 30, 40, and 50). You can.

The sixth insulating layer 60 may be disposed on the fifth insulating layer 50. The second connection electrode CNE2 may be disposed on the sixth insulating layer 60 . The second connection electrode (CNE2) may be connected to the first connection electrode (CNE1) through a contact hole penetrating the sixth insulating layer 60. The seventh insulating layer 70 is disposed on the sixth insulating layer 60 and may cover the second connection electrode CNE2. The eighth insulating layer 80 may be disposed on the seventh insulating layer 70.

Each of the sixth insulating layer 60, the seventh insulating layer 70, and the eighth insulating layer 80 may be an organic layer. For example, the sixth insulating layer 60, the seventh insulating layer 70, and the eighth insulating layer 80 are each made of Benzocyclobutene (BCB), polyimide, Hexamethyldisiloxane (HMDSO), and Polymethylmethacrylate (PMMA). B, general purpose polymers such as polystyrene (PS), polymer derivatives with phenolic groups, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and It may include blends thereof, etc.

The light emitting device (LD) may include a first electrode (AE, or pixel electrode), a light emitting layer (EML), and a second electrode (CE, or common electrode). Each of the light emitting layer (EML) and the second electrode (CE) may be commonly formed in a plurality of pixels.

The first electrode AE of the light emitting device LD may be disposed on the eighth insulating layer 80 . The first electrode (AE) of the light emitting device (LD) may be a (semi-)transmissive electrode or a reflective electrode. According to one embodiment of the present invention, each of the first electrodes (AE) of the light emitting device (LD) has a reflective layer formed of Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or a compound thereof. It may include a transparent or translucent electrode layer formed on the reflective layer. The transparent or translucent electrode layer is made of indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), zinc oxide (ZnO) or indium oxide (In ₂ O ₃ ), and aluminum-doped zinc oxide (AZO). ) may be provided with at least one selected from the group containing. For example, the first electrode (AE) of the light emitting device (LD) may include a stacked structure of ITO/Ag/ITO.

The pixel defining layer (PDL) may be disposed on the eighth insulating layer 80 . The pixel defining layer (PDL) contains the same material and may be formed through the same process. The pixel defining layer (PDL) may have the property of absorbing light. For example, the pixel defining layer (PDL) may have a black color. The pixel defining layer (PDL) may include a black coloring agent. Black ingredients may include black dye and black pigment. The black component may include metals such as carbon black and chromium, or oxides thereof. The pixel defining layer (PDL) may correspond to a light blocking pattern with light blocking characteristics.

The pixel defining layer (PDL) may cover a portion of the first electrode (AE) of the light emitting device (LD). For example, an opening (PDL-OP) that exposes a portion of the first electrode (AE) of the light emitting device (LD) may be defined in the pixel defining layer (PDL). The pixel defining layer (PDL) can increase the distance between the edge of the first electrode (AE) and the second electrode (CE) of the light emitting device (LD). Accordingly, the pixel defining layer (PDL) may serve to prevent arcs from occurring at the edges of the first electrodes (AE).

Although not shown, a hole control layer may be disposed between the first electrode (AE) and the light emitting layer (EML). The hole control layer may include a hole transport layer and may further include a hole injection layer. An electronic control layer may be disposed between the light emitting layers (EML) and the second electrode (CE). The electronic control layer includes an electron transport layer and may further include an electron injection layer. The hole control layer and the electronic control layer may be commonly formed in a plurality of pixels using an open mask.

The encapsulation layer 140 may be disposed on the light emitting device layer 130. The encapsulation layer 140 may include an inorganic layer 141, an organic layer 142, and an inorganic layer 143 sequentially stacked, but the layers constituting the encapsulation layer 140 are not limited thereto.

The inorganic layers 141 and 143 may protect the light emitting device layer 130 from moisture and oxygen, and the organic layer 142 may protect the light emitting device layer 130 from foreign substances such as dust particles. The inorganic layers 141 and 143 may include a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer. The organic layer 142 may include an acrylic-based organic layer, but is not limited thereto.

The sensor layer 200 may be disposed on the display panel 100. The sensor layer 200 may be referred to as a sensor, an input sensing layer, or an input sensing panel. The sensor layer 200 may include a base layer 210, a first conductive layer 220, a sensing insulating layer 230, and a second conductive layer 240.

The base layer 210 may be disposed directly on the display panel 100 . The base layer 210 may be an inorganic layer containing at least one of silicon nitride, silicon oxynitride, and silicon oxide. Alternatively, the base layer 210 may be an organic layer containing epoxy resin, acrylic resin, or imide-based resin. The base layer 210 may have a single-layer structure or a multi-layer structure stacked along the third direction DR3.

Each of the first conductive layer 220 and the second conductive layer 240 may have a single-layer structure or a multi-layer structure stacked along the third direction DR3. The first conductive layer 220 and the second conductive layer 240 may include conductive lines defining mesh-shaped sensing electrodes. The conductive lines may non-overlap the opening (PDL-OP) and overlap the pixel defining layer (PDL).

The single-layer conductive layer may include a metal layer or a transparent conductive layer. The metal layer may include molybdenum, silver, titanium, copper, aluminum, or alloys thereof. The transparent conductive layer is made of a material such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), or indium zinc tin oxide (IZTO). It may contain a transparent conductive oxide. In addition, the transparent conductive layer may include conductive polymers such as PEDOT, metal nanowires, graphene, etc.

The multi-layered conductive layer may include metal layers. The metal layers may have, for example, a three-layer structure of titanium/aluminum/titanium. The multi-layered conductive layer may include at least one metal layer and at least one transparent conductive layer.

The sensing insulating layer 230 may be disposed between the first conductive layer 220 and the second conductive layer 240. The sensing insulating layer 230 may include an inorganic layer. The inorganic film may include at least one of aluminum oxide, titanium oxide, silicon oxide, silicon nitride, silicon oxynitride, zirconium oxide, and hafnium oxide.

Alternatively, the sensing insulating layer 230 may include an organic layer. The organic film is made of at least one of acrylic resin, methacrylic resin, polyisoprene, vinyl resin, epoxy resin, urethane resin, cellulose resin, siloxane resin, polyimide resin, polyamide resin, and perylene resin. It can be included.

The anti-reflection layer 300 may be disposed on the sensor layer 200. The anti-reflection layer 300 may include a split layer 310, a plurality of color filters 320, and a planarization layer 330.

The anti-reflection layer 300 can reduce external light reflectance. The anti-reflection layer 300 includes a plurality of color filters 320, and the plurality of color filters 320 may have a predetermined arrangement. The arrangement of the plurality of color filters 320 may be determined by considering the emission colors of the pixels included in the display panel 100. Meanwhile, in the display module (DM) of one embodiment, the anti-reflection layer 300 does not include a phase retarder and a polarizer, and the reflectance of the display module (DM) is adjusted through a plurality of color filters 320. It could be lowering it. In the display module (DM) of one embodiment, the anti-reflection layer 300 may not include a polarizing film or a polarizing layer.

The material constituting the split layer 310 is not particularly limited as long as it is a material that absorbs light. The split layer 310 is a black-colored layer. In one embodiment, the split layer 310 may include a black coloring agent. Black ingredients may include black dye and black pigment. The black component may include metals such as carbon black and chromium, or oxides thereof.

The split layer 310 may cover the second conductive layer 240 of the sensor layer 200. The split layer 310 can prevent reflection of external light by the second conductive layer 240. The split layer 310 may overlap a portion of the pixel defining layer (PDL).

A split opening 310-OP2 may be defined in the split layer 310. The split opening 310-OP2 may overlap the first electrode AE of the light emitting device LD. One of the plurality of color filters 320 may overlap the first electrode AE of the light emitting device LD. One of the plurality of color filters 320 may cover the split opening 310-OP2. Each of the plurality of color filters 320 may contact the split layer 310 .

The planarization layer 330 may cover the split layer 310 and the color filter 320. The planarization layer 330 may include an organic material and provide a flat surface on the top of the planarization layer 330. In one embodiment of the present invention, the planarization layer 330 may be omitted.

4A to 4D are cross-sectional views of a window according to an embodiment of the present invention.

Referring to FIG. 4A, the window WM of one embodiment of the present invention includes a base layer (BL), a first layer (LRL), a second layer (ML), and a third layer (FL). In the window WM of one embodiment, the base layer BL, the first layer LRL, the second layer ML, and the third layer FL may be sequentially stacked.

The base layer BL may include a transparent material. In one embodiment, the base layer BL may include glass, tempered glass, or a polymer film. In one embodiment, the base layer BL may be a chemically strengthened glass substrate. When the base layer (BL) is a chemically strengthened glass substrate, mechanical strength can be increased while being thin, and it can be used as a window for a foldable display device. When the base layer (BL) includes a polymer film, the base layer (BL) may include a polyimide (Pl) film or a polyethylene terephthalate (PET) film. The base layer BL of the window WM may have a multi-layer structure or a single-layer structure. For example, the base layer BL may have a structure in which a plurality of polymer films are bonded together through an adhesive member, or it may have a structure in which a glass substrate and a polymer film are bonded together with an adhesive. The base layer BL may be made of a soft material.

The thickness d1 of the base layer BL may be, for example, 20 μm or more and 60 μm or less. Preferably, the thickness d1 of the base layer BL may be 20 μm or more and 40 μm or less. 4A and 4B exemplarily show that the base layer (BL) has a rectangular shape, but it is not limited thereto, and the base layer (BL) according to one embodiment has an edge portion of the upper surface of the base layer (BL) that is curved. It can have a rounded shape. More specifically, the base layer BL may have a shape in which the edge portion of the upper surface overlapping the bezel area BZA (FIG. 1B) is rounded by a curved surface.

The first layer LRL is a layer with a lower refractive index than the base layer BL, and may be a layer for lowering the surface reflectance of the window WM. The first layer (LRL) may be disposed on the base layer (BL). It may be a layer directly disposed on the base layer (BL). Meanwhile, the first layer LRL is disposed on the base layer BL, and the lower surface of the base layer BL may be adjacent to the display module DM (see FIG. 2). That is, the first layer LRL may be spaced apart from the display module DM with the base layer BL interposed therebetween.

The first layer (LRL) may include a material that has a low refractive index and excellent adhesion to the base layer (BL). The first layer LRL may include a first material, and the first material may include a material with a lower refractive index than the material included in the base layer BL. The first material included in the first layer (LRL) is, for example, silica, fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), fluoride. It may include at least one of yttrium (YF ₃ ), ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO). For example, the first layer LRL may include at least one of magnesium fluoride (MgF ₂ ) and magnesium oxide (MgO) as the first material.

In one embodiment, the first layer (LRL) may include magnesium oxide (MgO). In addition to magnesium oxide, the first layer (LRL) may further include magnesium fluoride (MgF ₂ ) and yttrium oxyfluoride (YOF). The first layer (LRL) may include a solid solution containing magnesium oxide in its structure. For example, the first layer (LRL) may include a solid solution of magnesium oxide, magnesium fluoride, and yttrium oxyfluoride. Alternatively, the first layer (LRL) may include magnesium fluoride (MgF ₂ ). The first layer (LRL) may be a single layer composed of magnesium fluoride (MgF ₂ ).

The thickness d2 of the first layer LRL may be, for example, 50 nm or more and 130 nm or less. When the thickness d2 of the first layer LRL is less than 50 nm, the surface reflectance of the window WM may not be sufficiently reduced. If the thickness d2 of the first layer LRL exceeds 130 nm, the mechanical strength of the window WM may decrease and durability may decrease, and the total thickness of the window WM may increase, reducing the total thickness of the display device. It may increase excessively.

At a wavelength of 550 nm, the refractive index of the first layer (LRL) may be 1.3 or more and 1.5 or less. In the window WM of one embodiment, the refractive index of the first layer LRL at a wavelength of 550 nm may be 1.38 or more and 1.40 or less. As the refractive index of the first layer (LRL) satisfies the above range at a wavelength of 550 nm, the surface reflectance of the window (WM) may be reduced.

The first layer (LRL) may be formed through an ion-assisted deposition process. The first layer (LRL) may be formed using magnesium oxide, magnesium fluoride, and yttrium oxyfluoride, as described above. In the process of forming the first layer (LRL), magnesium oxide, magnesium fluoride, and yttrium oxyfluoride are each deposited on the surface of the base layer (BL) in particle form, while ionized argon (Ar) gas or oxygen is used during the deposition process. (O ₂ ) gas is provided together, so that the adhesion of the deposited film to the surface of the base layer BL can be improved. Alternatively, the first layer (LRL) is formed of a single material of magnesium fluoride, and magnesium fluoride is deposited on the surface of the base layer (BL) in the form of particles, while ionized argon (Ar) gas or oxygen (O _{2 )} is used during the deposition process. ) Gas is provided together, so that the adhesion of the deposited film to the surface of the base layer BL can be improved.

The first layer (LRL) may have a single-layer structure formed of a single material. As described above, the first layer (LRL) may be a single layer formed of a solid solution of magnesium oxide, magnesium fluoride, and yttrium oxyfluoride, or may be a single layer formed of magnesium fluoride. That is, the first layer LRL may not include a plurality of layers.

The second layer (ML) is disposed on the first layer (LRL) and may be a layer to improve the adhesion between the first layer (LRL) and the third layer (FL). The second layer (ML) has excellent adhesion to each of the first layer (LRL) and the third layer (FL), and is an adhesive that improves the interlayer adhesion between the first layer (LRL) and the third layer (FL). It may be an adhesion promoter. The second layer (ML) may be placed directly on the first layer (LRL).

The second layer (ML) has low refractive index characteristics, excellent mechanical strength, and may contain a material to improve adhesion. The second layer ML may include a second material, and the second material may include a material with a lower refractive index than the material included in the base layer BL. The second material included in the second layer (ML) is, for example, silica, fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), fluoride. It may include at least one of yttrium (YF ₃ ), ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO). For example, the second material may include at least one of silica (SiO ₂ ), magnesium oxide (MgO), and aluminum oxide (Al ₂ O ₃ ).

In one embodiment, the second layer (ML) may include magnesium oxide (MgO). The second layer ML may further include silicon dioxide (SiO ₂ ) in addition to magnesium oxide. The second layer (ML) may include a solid solution containing magnesium oxide in its structure. For example, the second layer ML may include a solid solution mixed with magnesium oxide and silicon dioxide. As the second layer (ML) contains a solid solution containing magnesium oxide, adhesion with the first layer (LRL) also containing magnesium oxide may be improved. The second layer ML may be formed through the same ion-assisted deposition process as the first layer LRL.

Alternatively, the second layer ML may include a solid solution containing aluminum oxide and silicon dioxide. For example, the second layer ML may include a solid solution in which aluminum oxide and silicon dioxide are mixed. For example, the second material included in the second layer ML may have a solid solution structure containing Si ₉ Al ₂ O ₁₀ .

The thickness d3 of the second layer ML may be, for example, 5 nm or more and 25 nm or less. If the thickness d3 of the second layer ML is less than 5 nm, the effect of improving adhesion between the first layer LRL and the third layer FL may not be realized, and the mechanical strength of the window WM may be reduced. there is. If the thickness d3 of the second layer ML exceeds 25 nm, the reflectance of the window WM may increase, and the total thickness of the window WM may increase, resulting in an excessive increase in the overall thickness of the display device. there is.

At a wavelength of 550 nm, the refractive index of the second layer (ML) may be 1.3 or more and 1.6 or less. In the window WM of one embodiment, the refractive index of the second layer ML at a wavelength of 550 nm may be 1.45 or more and 1.50 or less. As the refractive index of the second layer ML satisfies the above range at a wavelength of 550 nm, the surface reflectance of the window WM may be reduced.

The second layer ML may have a single-layer structure formed of a single material. As described above, the second layer ML may be a single layer formed from a solid solution mixed with magnesium oxide and silicon dioxide, or may be a single layer formed from a solid solution mixed with aluminum oxide and silicon dioxide. That is, the second layer ML may not include a plurality of layers.

The third layer FL is disposed on the second layer ML and may be a layer that improves the slip properties and scratch resistance of the surface of the window WM. In one embodiment, the third layer (FL) may be an anti-fingerprint layer that has excellent anti-fingerprint properties and suppresses surface abrasion. The third layer (FL) may be placed directly on the second layer (ML). The third layer FL is disposed on the top layer of the window WM, and the top surface of the third layer FL may define the top surface of the window WM.

The third layer (FL) may include a material that has excellent scratch resistance and slip properties and has low refractive index characteristics. In one embodiment, the third layer (FL) may include a fluorine-containing polymer. The third layer (FL) may include, for example, a perfluoropolyether (PFPE) compound. The third layer (FL) may include perfluoropolyether silane, perfluoroalkyl ether alkoxysilane, or perfluoroalkyl ether copolymer. As the third layer (FL) includes a perfluoropolyether compound, the fingerprint resistance and scratch resistance of the third layer (FL) may be improved.

The thickness d4 of the third layer FL may be, for example, 5 nm or more and 30 nm or less. When the thickness d4 of the third layer FL is less than 5 nm, the anti-fingerprint and scratch resistance of the window WM may be reduced. If the thickness d4 of the third layer FL exceeds 30 nm, the reflectance of the window WM may increase, and the total thickness of the window WM may increase, resulting in an excessive increase in the overall thickness of the display device. there is.

At a wavelength of 550 nm, the refractive index of the third layer (FL) may be 1.3 or more and 1.5 or less. In the window WM of one embodiment, the refractive index of the third layer FL at a wavelength of 550 nm may be 1.30 or more and 1.35 or less. As the refractive index of the third layer FL satisfies the above range at a wavelength of 550 nm, the surface reflectance of the window WM may be reduced.

Meanwhile, the total thickness (d2+d3+d4) of the first layer (LRL), second layer (ML), and third layer (FL) disposed on the base layer (BL) may be 150 nm or less. In the window WM of one embodiment, the total thickness of the first layer (LRL), the second layer (ML), and the third layer (FL) disposed on the base layer (BL) of the window (WM) is 150 nm or less. By forming a window WM that has low-reflection characteristics and excellent wear resistance characteristics and hardness, it may be possible to implement the window WM.

In the window WM of one embodiment, the reflectance of the surface of the window WM at a wavelength of 550 nm may be 6.5% or less. In one embodiment of the window WM, the third layer FL is disposed on the uppermost layer, and the reflectance at the top of the third layer FL at a wavelength of 550 nm may be 6.5% or less. At a wavelength of 550 nm, the reflectance on the top surface of the third layer (FL) may be 5.5% or more and 6.0% or less. Meanwhile, in this specification, the “reflectance” of the window WM is defined as the ratio of light reflected to the outside among light incident from the outside toward the inside of the window WM. Light reflected externally includes both regular reflection light, which is incident and then reflected at the same angle, and diffuse reflection light, which is scattered and reflected in various directions. That is, in this specification, reflectance is defined as SCI (Specular Component included) reflectance.

Referring to FIG. 4B, the window WM-1 of one embodiment may further include a fourth layer SML disposed between the base layer BL and the first layer LRL.

The fourth layer (SML) is disposed on the base layer (BL) and may be a layer to improve the adhesion between the base layer (BL) and the first layer (LRL). The fourth layer (SML) has excellent adhesion to each of the base layer (BL) and the first layer (LRL), and is an adhesion promotion layer that improves the interlayer adhesion between the base layer (BL) and the first layer (LRL). (Adhesion promoter). The fourth layer (SML) may be placed directly on the base layer (BL). The fourth layer (SML) may contact the base layer (BL) and the first layer (LRL).

The fourth layer (SML) has low refractive index characteristics, excellent mechanical strength, and may contain a material to improve adhesion. In one embodiment, the fourth layer (SML) may include magnesium oxide (MgO). The fourth layer (SML) may further include silicon dioxide (SiO ₂ ) in addition to magnesium oxide. The fourth layer (SML) may include a solid solution containing magnesium oxide in its structure. For example, the fourth layer (SML) may include a solid solution mixed with magnesium oxide and silicon dioxide. As the fourth layer (SML) contains a solid solution containing magnesium oxide, adhesion with the first layer (LRL) also containing magnesium oxide may be improved. The fourth layer (SML) may be formed through the same ion-assisted deposition process as the first layer (LRL).

The thickness of the fourth layer (SML) may be, for example, 5 nm or more and 25 nm or less. If the thickness of the fourth layer (SML) is less than 5 nm, the effect of improving adhesion between the base layer (BL) and the first layer (LRL) may not be realized. If the thickness of the fourth layer (SML) exceeds 25 nm, the reflectance of the window (WM-1) may increase, and the total thickness of the window (WM-1) may increase, resulting in an excessive increase in the overall thickness of the display device. You can.

At a wavelength of 550 nm, the refractive index of the fourth layer (SML) may be 1.3 or more and 1.6 or less. In the window WM-1 of one embodiment, the refractive index of the fourth layer SML at a wavelength of 550 nm may be 1.45 or more and 1.50 or less. As the refractive index of the fourth layer (SML) satisfies the above range at a wavelength of 550 nm, the surface reflectance of the window (WM-1) may be reduced.

1B, 3, 4A, and 4B together, as in the display device DD of one embodiment, the anti-reflection layer 300 included in the display module DM includes a plurality of color filters 320. In this case, display efficiency may be improved compared to the case of including a polarizing layer, but reflectance may increase. In the display device DD according to an embodiment of the present invention, the window WM includes a first layer (LRL), a second layer (ML), and a third layer (FL) including a material having a low refractive index. Accordingly, the surface reflectance of the window WM may be lowered. Accordingly, even if the anti-reflection layer 300 of the display module DM includes a plurality of color filters 320, the reflectance of the entire display device DD can be maintained low.

In the window WM according to an embodiment of the present invention, the first layer (LRL), the second layer (ML), and the third layer (FL) each include a low-refractive material, while the second layer (ML) It contains magnesium oxide (MgO). Since the second layer (ML) contains a solid solution containing magnesium oxide, the adhesion with the first layer (LRL) also containing magnesium oxide can be improved, and thus the wear resistance characteristics of the window (WM) can be improved. It can be improved. The window WM of one embodiment secures low refractive properties and includes a first layer (LRL) and a second layer (ML) structure provided as a single layer, and the first layer (LRL) and the second layer ( ML) Each contains a solid solution containing magnesium oxide in its structure, so that wear resistance properties and mechanical strength can be improved. Accordingly, the durability of the display device DD including the window WM may be improved.

Referring to FIG. 4C, the window WM-2 of one embodiment may further include a fifth layer (HRL) disposed between the base layer (BL) and the first layer (LRL). The fifth layer (HRL) may be a layer with a high refractive index. In the window WM-2 of one embodiment, the refractive index of the fifth layer HRL at a wavelength of 550 nm may be 1.7 or more and 3.0 or less. The refractive index of the fifth layer (HRL) at a wavelength of 550 nm may be 2.0 or more and 2.5 or less. The refractive index of the fifth layer (HRL) at a wavelength of 550 nm may be about 2.33.

The fifth layer (HRL) is disposed on the base layer (BL) and has high refractive properties, which can further reduce the surface reflectance of the window (WM-2). The window WM-2 of one embodiment includes a first layer (LRL), a second layer (ML), and a third layer (FL) having low refractive properties sequentially on a fifth layer (HRL) having high refractive properties. By having a laminated structure, the surface reflectance of the window (WM-2) is reduced, while the fifth layer (HRL) has excellent adhesion to each of the base layer (BL) and the first layer (LRL), The interlayer adhesion between the (BL) and the first layer (LRL) can be maintained high. The fifth layer (HRL) may be placed directly on the base layer (BL). The fifth layer (HRL) may contact the base layer (BL) and the first layer (LRL).

The fifth layer (HRL) has high refractive index characteristics, excellent mechanical strength, and may contain a material to improve adhesion. In one embodiment, the fifth layer (HRL) is zinc oxide (ZrO ₂ ), hafnium oxide (HfO ₂ ), tantalum oxide (Ta ₂ O ₅ ), niobium oxide (Nb ₂ O ₅ ), titanium oxide (TiO ₂ ), ytterbium oxide (Y ₂ O ₃ ), silicon nitride (Si ₃ N ₄ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and aluminum nitride (AlN). For example, the fifth layer (HRL) may include niobium oxide (Nb ₂ O ₅ ). As the fifth layer (HRL) contains niobium oxide (Nb ₂ O ₅ ), etc., the fifth layer (HRL) has a high refractive index in the above-mentioned range, while the base layer (HRL) in contact with the fifth layer (HRL) It can have excellent adhesion to each of the BL) and first layer (LRL). The fifth layer (HRL) may be formed through the same ion-assisted deposition process as the first layer (LRL). In the process of forming the fifth layer (HRL), zinc oxide (ZrO ₂ ), hafnium oxide (HfO ₂ ), tantalum oxide (Ta ₂ O ₅ ), niobium oxide (Nb ₂ O ₅ ), and titanium oxide (TiO ₂ ), ytterbium oxide (Y ₂ O ₃ ), silicon nitride (Si ₃ N ₄ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and aluminum nitride (AlN) in the form of particles as a base layer. While it is deposited on the surface of the base layer (BL), ionized oxygen (O ₂ ) gas is also provided during the deposition process, so that the adhesion of the deposited film to the surface of the base layer (BL) can be improved.

The thickness d5 of the fifth layer (HRL) may be, for example, 5 nm or more and 25 nm or less. For example, the thickness d5 of the fifth layer HRL may be about 10 nm. If the thickness (d5) of the fifth layer (HRL) is less than 5 nm, the reflectance of the window (WM-2) may increase, and the effect of improving adhesion between the base layer (BL) and the first layer (LRL) may not be realized. It may not be possible. If the thickness d5 of the fifth layer HRL exceeds 25 nm, the total thickness of the window WM-2 may increase, thereby excessively increasing the overall thickness of the display device.

In the window WM-2 of one embodiment, the reflectance of the surface of the window WM-2 at a wavelength of 550 nm may be 5.0% or less. In one embodiment of the window WM-2, the third layer FL is disposed on the uppermost layer, and the reflectance at the top of the third layer FL may be 5.0% or less at a wavelength of 550 nm. At a wavelength of 550 nm, the reflectance on the top surface of the third layer (FL) may be 4.0% or more and 4.5% or less. The window WM-2 according to an embodiment of the present invention further includes a fifth layer (HRL) provided between the first layer (LRL) and the base layer (BL), thereby eliminating the fifth layer (HRL). The first layer (LRL) may have a lower surface reflectance compared to the case where the first layer (LRL) is directly disposed on the base layer (BL). More specifically, in the window WM-2 according to one embodiment, a fifth layer (HRL) having high refractive characteristics is provided between the base layer (BL) and the first layer (LRL), and the high refractive index layer is provided on the base layer. and low refractive layers may be arranged sequentially, and through this, a structure that further reduces the surface reflectance of the window (WM-2) can be implemented. Meanwhile, in the fifth layer (HRL) included in the window (WM-2), a material such as niobium oxide (Nb ₂ O ₅ ) is deposited on the upper surface of the base layer (BL) through an ion-assisted deposition process, so the base layer (BL) ) has high adhesion to the window, and can have wear resistance properties equivalent to those of a window in which the fifth layer (HRL) is omitted. Accordingly, the display device including the window WM-2 can have excellent low-reflection characteristics without deteriorating durability.

Referring to FIG. 4D, the window WM-3 of one embodiment may further include a sixth layer CLRL disposed below the base layer BL. The sixth layer (CLRL) may be a layer with a low refractive index. In the window WM-3 of one embodiment, the refractive index of the sixth layer CLRL at a wavelength of 550 nm may be 1.3 or more and 1.5 or less. At a wavelength of 550 nm, the sixth layer (CLRL) may be 1.38 or more and 1.40 or less.

The sixth layer (CLRL) is disposed below the base layer (BL) and has low refractive characteristics, which can further reduce the surface reflectance of the window (WM-3). In addition, the window (WM-3) of one embodiment further includes a sixth layer (CLRL) disposed below the base layer (BL), thereby providing excellent reflective color compared to a window that does not include the sixth layer (CLRL). You can have it. Meanwhile, the sixth layer (CLRL) is disposed below the base layer (BL) and may be spaced apart from the first layer (LRL) with the base layer (BL) interposed therebetween. That is, when the window WM-3 of one embodiment is applied to the display device DD (see FIG. 2), the sixth layer CLRL is the base layer BL, the first layer LRL, and the second layer ( It may be a layer disposed adjacent to the display module (DM, see FIG. 2) compared to the ML) and the third layer (FL). The sixth layer (CLRL) may be placed directly under the base layer (BL). The sixth layer (CLRL) may be in contact with the lower surface of the base layer (BL).

The sixth layer (CLRL) may include a material that has a low refractive index and excellent adhesion to the base layer (BL). The sixth layer (CLRL) may include a first material like the first layer (LRL), and the first material may include a material with a lower refractive index than the material included in the base layer (BL), as described above. You can. The first material included in the sixth layer (CLRL) is, for example, silica, fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), fluoride. It may include at least one of yttrium (YF ₃ ), ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO). For example, the sixth layer (CLRL) may include at least one of magnesium fluoride (MgF ₂ ) and magnesium oxide (MgO) as the first material.

In one embodiment, the sixth layer (CLRL) may include magnesium oxide (MgO). The sixth layer (CLRL) may further include magnesium fluoride (MgF ₂ ) and yttrium oxyfluoride (YOF) in addition to magnesium oxide. The sixth layer (CLRL) may include a solid solution containing magnesium oxide in its structure. For example, the sixth layer (CLRL) may include a solid solution of magnesium oxide, magnesium fluoride, and yttrium oxyfluoride. Alternatively, the sixth layer (CLRL) may include magnesium fluoride (MgF ₂ ). The sixth layer (CLRL) may be a single layer composed of magnesium fluoride (MgF ₂ ).

Meanwhile, the sixth layer (CLRL) may include the same material as the first layer (LRL), or may include a different material. For example, each of the first layer (LRL) and the sixth layer (CLRL) may include magnesium fluoride. Each of the first layer (LRL) and the sixth layer (CLRL) may include a solid solution in which magnesium oxide, magnesium fluoride, and yttrium oxyfluoride are mixed. Alternatively, one of the first layer (LRL) and the sixth layer (CLRL) may include magnesium fluoride, and the other may include a solid solution in which magnesium oxide, magnesium fluoride, and yttrium oxyfluoride are mixed.

The sixth layer (CLRL) may be formed through the same ion-assisted deposition process as the first layer (LRL). In the process of forming the sixth layer (CLRL), at least one of materials such as magnesium oxide, magnesium fluoride, and yttrium oxyfluoride is deposited on the surface of the base layer BL in the form of particles, while ionized argon (argon) during the deposition process is deposited on the surface of the base layer BL. Ar) gas or oxygen (O ₂ ) gas is provided together, so that the adhesion of the deposited film to the surface of the base layer (BL) can be improved.

The thickness d6 of the sixth layer CLRL may be, for example, 50 nm or more and 130 nm or less. When the thickness d6 of the sixth layer CLRL is less than 50 nm, the surface reflectance of the window WM-3 may not be sufficiently reduced. If the thickness (d6) of the sixth layer (CLRL) exceeds 130 nm, the mechanical strength of the window (WM-3) may decrease, which may reduce durability, and the total thickness of the window (WM-3) may increase, causing the display device to be damaged. The overall thickness may be excessively increased.

In the window WM-3 of one embodiment, the reflectance of the surface of the window WM-3 at a wavelength of 550 nm may be 5.0% or less. In one embodiment of the window WM-3, the third layer FL is disposed on the uppermost layer, and the reflectance at the top of the third layer FL may be 5.0% or less at a wavelength of 550 nm. At a wavelength of 550 nm, the reflectance on the top surface of the third layer (FL) may be 4.0% or more and 4.5% or less. The window WM-3 according to an embodiment of the present invention further includes a sixth layer CLRL provided below the base layer BL, so there is no separate layer disposed below the base layer BL. It may have a lower surface reflectance than in this case. More specifically, the window WM-3 according to one embodiment may have a structure in which a first layer (LRL) and a sixth layer (CLRL) having low refractive characteristics are provided on both sides of the base layer (BL). Through this, it is possible to implement a structure that further reduces the surface reflectance of the window (WM-3). Accordingly, the display device including the window WM-3 may have excellent low-reflection characteristics.

Although the present invention has been described above with reference to preferred embodiments, those skilled in the art or have ordinary knowledge in the relevant technical field will understand that it does not deviate from the spirit and technical scope of the present invention as set forth in the claims to be described later. It will be understood that various modifications and changes can be made to the present invention within the scope. Therefore, the technical scope of the present invention should not be limited to what is described in the detailed description of the specification, but should be defined by the claims.

DD: display device WM: window
BL: base layer LRL: first layer
ML: 2nd layer FL: 3rd layer

Claims (20)

base layer;
a first layer disposed on the base layer;
a second layer disposed on the first layer; and
Comprising a third layer disposed on the second layer,
The second layer is silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), and yttrium fluoride. Contains at least one of bium (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO),
A window wherein, at a wavelength of 550 nm, the refractive index of the second layer is greater than or equal to 1.3 and less than or equal to 1.6. According to paragraph 1,
The second layer is a window including at least one of silica (SiO ₂ ), magnesium oxide (MgO), and aluminum oxide (Al ₂ O ₃ ). According to paragraph 1,
the second layer is disposed directly on the first layer,
The third layer is a window disposed directly on the second layer. According to paragraph 1,
The first layer is a window including at least one of magnesium fluoride (MgF ₂ ) and magnesium oxide (MgO). According to paragraph 4,
The window wherein the first layer further includes yttrium oxyfluoride (YOF). According to clause 5,
The first layer is a window containing a solid solution of the magnesium oxide, the magnesium fluoride, and the yttrium oxyfluoride. According to paragraph 1,
A window wherein, at a wavelength of 550 nm, the reflectance at the top of the third layer is less than or equal to 6.5%. According to paragraph 1,
The third layer is a window containing a fluorine-containing polymer. According to paragraph 1,
At a wavelength of 550 nm, the refractive index of the first layer is 1.3 or more and 1.5 or less,
A window wherein the third layer has a refractive index of 1.3 or more and 1.5 or less at a wavelength of 550 nm. According to paragraph 1,
The base layer is a window including a glass substrate or a polymer film. According to paragraph 1,
The thickness of the first layer is 50 nm or more and 130 nm or less,
The thickness of the second layer is 5 nm or more and 25 nm or less,
A window wherein the third layer has a thickness of 5 nm or more and 30 nm or less. According to paragraph 1,
A window disposed between the base layer and the first layer, further comprising a fourth layer containing magnesium oxide. According to paragraph 1,
A window disposed between the base layer and the first layer, further comprising a fifth layer having a refractive index of 1.7 or more and 3.0 or less at a wavelength of 550 nm. According to clause 13,
The fifth layer is zinc oxide (ZrO ₂ ), hafnium oxide (HfO ₂ ), tantalum oxide (Ta ₂ O ₅ ), niobium oxide (Nb ₂ O ₅ ), titanium oxide (TiO ₂ ), and ytterbium oxide (Y). ₂ O ₃ ), silicon nitride (Si ₃ N ₄ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and aluminum nitride (AlN). According to paragraph 1,
A window disposed below the base layer and further comprising a sixth layer having a refractive index of 1.3 or more and 1.5 or less at a wavelength of 550 nm. According to clause 15,
The sixth layer is a window comprising at least one of magnesium oxide, magnesium fluoride, and yttrium oxyfluoride. base layer;
a first layer disposed on the base layer;
a second layer disposed on the first layer; and
Comprising a third layer disposed on the second layer,
The first layer includes a first material, the second layer includes a second material,
The first material and the second material are each independently selected from silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), and fluoride. A window containing at least one of yttrium (YF ₃ ), ytterbium fluoride (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO). display module; and
Includes a window disposed on the display module,
The window is
base layer;
a first layer disposed on the base layer;
a second layer disposed on the first layer; and
Comprising a third layer disposed on the second layer,
The second layer is silica (SiO ₂ ), fused silica, fluorine-doped fused silica, magnesium fluoride (MgF ₂ ), calcium fluoride (CaF ₂ ), aluminum fluoride (AlF ₃ ), yttrium fluoride (YF ₃ ), and yttrium fluoride. Contains at least one of bium (YbF ₃ ), aluminum oxide (Al ₂ O ₃ ), and magnesium oxide (MgO),
A display device wherein the second layer has a refractive index of 1.3 or more and 1.6 or less at a wavelength of 550 nm. According to clause 18,
The display module is
base substrate;
a circuit layer disposed on the base substrate;
A light emitting device layer disposed on the circuit layer;
an encapsulation layer disposed on the light emitting device layer; and
Comprising an anti-reflection layer disposed on the encapsulation layer,
The anti-reflection layer is a display device including a split layer defined with a plurality of split openings that each overlap a plurality of light emitting elements, and a plurality of color filters disposed to correspond to the plurality of split openings. According to clause 18,
The first layer is spaced apart from the display module with the base layer interposed therebetween.

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