KR20230088248A - Varnish composition, method of producing varnish composition, and method of producing polyimide resin - Google Patents

Abstract

Provided are: a varnish composition capable of forming a polyimide resin having both less coloration and excellent mechanical characteristics; a method for producing the varnish composition; and a method for producing a polyimide resin using the varnish composition. A varnish composition contains a polyamic acid (A) and a solvent (S). The polyamic acid (A) includes a polymer of: an alicyclic tetracarboxylic acid dianhydride (A1-1) having a specific structure; a small amount of an alicyclic tetracarboxylic acid dianhydride (A1-2) other than the alicyclic tetracarboxylic acid dianhydride (A1-1); and an aromatic diamine compound (A2).

Description

Varnish composition, method for producing varnish composition, and method for producing polyimide resin

The present invention relates to a varnish composition, a method for producing the varnish composition, and a method for producing a polyimide resin using the varnish composition.

Since polyimide resin has properties such as excellent heat resistance, mechanical strength, insulation, and low dielectric constant, it is widely used as an insulating material or a protective material in various elements and electric/electronic parts such as electronic boards such as multilayer wiring boards. It is being used.

In general, a polyimide resin is formed by heat-treating a polyamic acid obtained by polymerizing a tetracarboxylic dianhydride component and a diamine component in a polar organic solvent. There is also such a background, and polyimide products for electronic materials are often supplied as a solution of a polyimide precursor such as polyamic acid. Specifically, when manufacturing electric/electronic parts, a solution of a polyimide precursor is supplied to a point where an insulating material or a protective material is formed by a method such as coating or injection, and then the solution of the polyimide precursor is heat-treated to make an insulating material. A protective material is formed.

Technological exploitation of such polyimide resins has been actively pursued, and various resin compositions containing polyamic acid and the like have been disclosed (for example, see Patent Literature 1 and the like).

Japanese Unexamined Patent Publication No. 2018-58918

A polyimide resin, particularly a polyimide film, may be required to have less coloration or excellent mechanical properties such as elongation at break, depending on the application. However, in the case of producing a polyimide resin using the resin composition described in Patent Document 1 or the like as a varnish composition, it is difficult to form a polyimide resin having both low coloration and excellent mechanical properties.

The present invention has been made in view of the above problems, and provides a varnish composition capable of forming a polyimide resin having both low coloring and excellent mechanical properties, a method for producing the varnish composition, and a polyimide using the varnish composition. It aims at providing the manufacturing method of resin.

The inventors of the present invention, in a varnish composition containing a polyamic acid (A) and a solvent (S), an alicyclic tetracarboxylic dianhydride (A1-1) of a specific structure and a small amount of alicyclic tetracarboxylic acid 2 That the above subject can be solved by using a polymer of an alicyclic tetracarboxylic dianhydride (A1-2) other than the anhydride (A1-1) and an aromatic diamine compound (A2) as the polyamic acid (A). found out and came to complete the present invention. More specifically, the present invention provides the following.

A first aspect of the present invention is

A polyamic acid (A) and a solvent (S) are included,

The polyamic acid (A) is a polymer of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2),

Tetracarboxylic dianhydride (A1) has the following formula (a2):

[Formula 1]

(In formula (a2), R ^a11 , R ^a12 , and R ^a13 are each independently one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more It is an integer less than or equal to 12.)

consisting only of alicyclic tetracarboxylic dianhydride (A1-1), which is a compound represented by, and other alicyclic tetracarboxylic dianhydride (A1-2) other than alicyclic tetracarboxylic dianhydride (A1-1) under,

It is a varnish composition whose ratio of the mass of another alicyclic tetracarboxylic dianhydride (A1-2) with respect to the number of moles of tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less.

A second aspect of the present invention is

Polyamic acid (A) is produced by polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) in a solvent (S), or

Polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) to produce a polyamic acid (A), and then mixing the isolated polyamic acid (A) with a solvent (S) As a method for producing a varnish composition,

Tetracarboxylic dianhydride (A1) has the following formula (a2):

[Formula 2]

(In formula (a2), R ^a11 , R ^a12 , and R ^a13 are each independently one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more It is an integer less than or equal to 12.)

consisting only of alicyclic tetracarboxylic dianhydride (A1-1), which is a compound represented by, and other alicyclic tetracarboxylic dianhydride (A1-2) other than alicyclic tetracarboxylic dianhydride (A1-1) under,

It is the manufacturing method of the varnish composition whose ratio of the mass of said other alicyclic tetracarboxylic dianhydride (A2-2) to the number of moles of tetracarboxylic dianhydride (A2) is 0.1 mol% or more and 6 mol% or less.

A third aspect of the present invention is

A molding step of molding the varnish composition according to the first aspect;

A method for producing a polyimide resin comprising an imidization step of imidizing a molded varnish composition by heating.

According to the present invention, a varnish composition capable of forming a polyimide resin having both low coloring and excellent mechanical properties, a method for producing the varnish composition, and a method for producing a polyimide resin using the varnish composition are provided. can

≪Varnish Composition≫

A varnish composition contains a polyamic acid (A) and a solvent (S). The varnish composition is used for forming a polyimide resin.

Essential or optional components of the varnish composition will be described below.

<Polyamic acid (A)>

A varnish composition contains a polyamic acid (A). The polyamic acid (A) is a precursor polymer of a polyimide resin produced when the varnish composition is cured.

The polyamic acid (A) is a polymer of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2). Tetracarboxylic dianhydride (A1) is alicyclic tetracarboxylic dianhydride (A1-1) and other alicyclic tetracarboxylic dianhydride other than alicyclic tetracarboxylic dianhydride (A1-1). It consists only of (A1-2). The ratio of the mass of the alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of the tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less.

By using such a polyamic acid (A), it is possible to form a polyimide resin having both low coloring and excellent mechanical properties using a varnish composition.

As mechanical properties, they are typically elongation at break, coefficient of thermal expansion (CTE), and the like.

Hereinafter, tetracarboxylic dianhydride (A1) used for manufacture of polyamic acid (A), an aromatic diamine compound (A2), and the manufacturing method of polyamic acid (A) are demonstrated below.

[Tetracarboxylic dianhydride (A1)]

Tetracarboxylic dianhydride (A1) is alicyclic tetracarboxylic dianhydride (A1-1) and other alicyclic tetracarboxylic dianhydride other than alicyclic tetracarboxylic dianhydride (A1-1). It consists only of (A1-2). The ratio of the mass of the alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of the tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less.

As for the ratio of the mass of alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of tetracarboxylic dianhydride (A1), 0.2 mol% or more and 5.5 mol% or less are preferable, and 0.5 mol% or more 5 mol % or less is more preferable.

(alicyclic tetracarboxylic dianhydride (A1-1))

Alicyclic tetracarboxylic dianhydride (A1-1) is a compound represented by the following formula (a2). When a compound represented by the following formula (a2) is used, it tends to be easy to obtain a polyimide resin having excellent transparency.

Further, from the viewpoint of easy purification of the raw material compound, a in the formula (a2) is preferably 5 or less, and more preferably 3 or less. In view of the excellent chemical stability of the raw material compound, a is preferably 1 or more, and more preferably 2 or more.

As for a in Formula (a2), 2 or 3 is especially preferable.

[Formula 3]

(In formula (a2), R ^a11 , R ^a12 , and R ^a13 are each independently one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more It is an integer less than or equal to 12.)

The alkyl group that can be selected as R ^a11 in formula (a2) is an alkyl group having 1 to 5 carbon atoms. As for the number of carbon atoms of an alkyl group, 1 or more and 4 or less are more preferable, and 1 or more and 3 or less are especially preferable.

When R ^a11 is an alkyl group, the alkyl group may be linear or branched.

As R ^a11 in formula (a2), it is more preferable that it is a hydrogen atom, a methyl group, an ethyl group, an n-propyl group, or an isopropyl group from the viewpoint of easy acquisition and purification of tetracarboxylic dianhydride represented by formula (a2) , a hydrogen atom or a methyl group is particularly preferred.

A plurality of R ^a11s in formula (a2) are preferably the same group from the viewpoint of easy purification of tetracarboxylic dianhydride represented by formula (a2).

a in Formula (a2) represents an integer of 0 or more and 12 or less. When the value of a is more than 12, it is difficult to purify tetracarboxylic dianhydride giving a tetravalent organic group represented by formula (a2).

From the viewpoint of easy purification of tetracarboxylic dianhydride represented by formula (a2), 5 is preferable and, as for the upper limit of a, 3 is more preferable.

From the viewpoint of the chemical stability of the tetracarboxylic dianhydride represented by the formula (a2), 1 is preferable and, as for the lower limit of a, 2 is more preferable.

As for a in Formula (a2), 2 or 3 is especially preferable.

The alkyl group having 1 to 5 carbon atoms that may be selected as R ^a12 and R ^a13 in formula (a2) is the same as the alkyl group having 1 to 5 carbon atoms that may be selected as R ^a11 .

R ^a12 and R ^a13 are preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, from the viewpoint of easy purification of the tetracarboxylic dianhydride represented by formula (a2), and a hydrogen atom or a methyl group is particularly preferred.

As tetracarboxylic dianhydride represented by Formula (a2), for example, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5' ',6,6''-tetracarboxylic dianhydride (aka "norbornane-2-spiro-2'-cyclopentanone-5'-spiro-2''-norbornane-5,5'' ,6,6'-tetracarboxylic dianhydride"), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-(methylnorbornane)-5,5 '',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-norbornane-5,5'',6 , 6''-tetracarboxylic dianhydride (aka "norbornane-2-spiro-2'-cyclohexanone-6'-spiro-2''-norbornane-5,5'',6, 6''-tetracarboxylic dianhydride"), methylnorbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-(methylnorbornane)-5,5'', 6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopropanone-α'-spiro-2''-norbornane-5,5'',6,6' '-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclobutanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracar boxylic acid dianhydride, norbornane-2-spiro-α-cycloheptanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride , Norbornane-2-spiro-α-cyclooctanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane -2-spiro-α-cyclononanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro -α-cyclodecanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclo Undecanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclododecanone-α '-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotridecanone-α'-spiro -2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclotetradecanone-α'-spiro-2' '-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentadecanone-α'-spiro-2''-nor Bornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-(methylcyclopentanone)-α'-spiro-2''-norbor I-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-(methylcyclohexanone)-α'-spiro-2''-norbornane -5,5'',6,6''-tetracarboxylic dianhydride, etc. are mentioned.

In addition, tetracarboxylic dianhydride represented by formula (a2) has the following formula (a2-1 from the point where the thermal properties, mechanical properties, optical properties, and electrical properties of the polyimide resin produced using the varnish composition are good. ):

[Formula 4]

(In formula (a2-1), R ^a11 , R ^a12 , R ^a13 , a have the same meaning as R ^a11 , R ^a12 , R ^a13 , a in formula (a2).)

A compound represented by (A2-1) and the following formula (a2-2):

[Formula 5]

(In formula (a2-2), R ^a11 , R ^a12 , R ^a13 , a have the same meaning as R ^a11 , R ^a12 , R ^a13 , a in formula (a2).)

A tetracarboxylic dianhydride containing at least one of the compounds (A2-2) represented by and having a total amount of the compound (A2-1) and the compound (A2-2) of 30 mol% or more is preferable.

The compound (A2-1) represented by the formula (a2-1) is a formula (a2 in which two norbornane groups are trans-configured and the carbonyl group of the cycloalkanone is the end steric configuration for each of the two norbornane groups. ) is an isomer of tetracarboxylic dianhydride represented by

The compound (A2-2) represented by the formula (a2-2) has the formula (a2-2) in which two norbornane groups are cis-disposed and the carbonyl group of the cycloalkanone is the end steric configuration for each of the two norbornane groups. ) is an isomer of tetracarboxylic dianhydride represented by

In addition, the method for producing tetracarboxylic dianhydride containing such an isomer in the above ratio is not particularly limited either, and a known method can be appropriately employed, for example, the method described in International Publication No. 2014/034760 etc. may be appropriately employed.

(alicyclic tetracarboxylic dianhydride (A1-2))

Alicyclic tetracarboxylic dianhydride (A1-2) is another alicyclic tetracarboxylic dianhydride other than alicyclic tetracarboxylic dianhydride (A1-1).

As a preferable example of alicyclic tetracarboxylic dianhydride (A1-2), the compound represented by the following formula (a1-1) is mentioned. As described above, the compound represented by the following formula (a1-1) does not correspond to alicyclic tetracarboxylic dianhydride (A1-1). Alicyclic tetracarboxylic dianhydride (A1-2) may be used individually by 1 type, and may be used in combination of 2 or more type.

[Formula 6]

(In the formula (a1-1), A ¹ is a tetravalent organic group having 4 or more and 50 or less carbon atoms that does not contain an aromatic group and includes an alicyclic ring. In the formula (a1-1), two carboxyl The acid anhydride group bonds to the alicyclic phase.)

In formula (a1-1), A ¹ is a tetravalent organic group having 4 or more and 50 or less carbon atoms that does not contain an aromatic group and includes an alicyclic ring. A ¹ in formula (a1-1) may have one or a plurality of substituents other than two carboxylic acid anhydride groups.

Preferable examples of the substituent include a fluorine atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a fluorinated alkyl group having 1 to 6 carbon atoms, and a fluorinated group having 1 to 6 carbon atoms. Alkoxy groups are preferred. Moreover, the compound represented by formula (a1-1) may contain a carboxy group and a carboxylic acid ester group other than an acid anhydride group.

When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

Alicyclic tetracarboxylic dianhydride (A1-2) is a compound that has two carboxylic acid anhydride groups bonded to an alicyclic phase and does not contain an aromatic group. Alicyclic tetracarboxylic dianhydride may have a linear or branched chain aliphatic group.

The alicyclic and chain aliphatic groups of the alicyclic tetracarboxylic dianhydride (A1-2) may contain a halogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom in addition to a carbon atom and a hydrogen atom. For example, an oxygen atom, a nitrogen atom, or a sulfur atom is a nitrogen-containing heterocyclic group, -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, - The group selected from CO-, -SO-, -SO ₂ -, -S-, and -SS- may be contained in an alicyclic or chain aliphatic group.

The alicyclic contained in the alicyclic tetracarboxylic dianhydride (A1-2) may be either monocyclic or polycyclic. As a polycyclic alicyclic structure, bridged alicyclic structures, such as bicyclo [2.2.1] heptane, etc. are mentioned, for example. For example, the bridged alicyclic structure may be condensed with other bridged alicyclic structures and/or non-bridged alicyclic structures, and the bridged alicyclic structure may have a spiro bond with other bridged alicyclic structures and/or non-bridged alicyclic structures. may be connected by By using an alicyclic tetracarboxylic dianhydride (A1-2), a polyimide resin excellent in transparency is obtained using a varnish composition.

Preferable specific examples of the alicyclic tetracarboxylic dianhydride (A1-2) include 1,2,4,5-cyclohexanetetracarboxylic dianhydride, bicyclo[2.2.2]octane-2,3, 5,6-tetracarboxylic dianhydride, bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 5-(2,5-dioxotetrahydro Furan-3-yl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-tetralin-1, 2-dicarboxylic acid dianhydride, tetrahydrofuran-2,3,4,5-tetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,3, 4-Cyclobutanetetracarboxylic dianhydride, 1,3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1,4-dimethyl-1,2,3,4-cyclo Butanetetracarboxylic dianhydride etc. are mentioned.

As alicyclic tetracarboxylic dianhydride (A1-2), the following formula (a2-1) or the following formula (a2-2):

[Formula 7]

(In formula (a2-1), R ^a21 , R ^a22 , R ^a23 , and R ^a24 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alky group having 2 to 5 carbon atoms) yl group, and R ^a21 or R ^a22 and R ^a23 or R ^a24 may be bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, or an ethene-1,2-diyl group. ,

In formula (a2-2), R ^a25 , R ^a26 , R ^a27 , R ^a28 , R ^a29 , R ^a30 , R ^a31 , and R ^a32 are each independently a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. , or an alkenyl group having 2 or more and 5 or less carbon atoms, and R ^a25 , or R ^a26 , R ^a27 , or R ^a28 are bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, ethene -1,2-diyl group may be formed, and R ^a29 or R ^a30 and R ^a31 or R ^a32 are bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, or an ethene-1 , You may form a 2-diyl group.)

The compound represented by is also preferable.

In the formula (a2-1), the alkyl groups or alkenyl groups as R ^a21 , R ^a22 , R ^a23 , and R ^a24 may be linear or branched.

Preferred examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, and n-pentyl groups.

Preferred examples of the alkenyl group include a vinyl group, an allyl group, a 3-butenyl group, and a 4-pentenyl group.

In the formula (a2-2), the alkyl groups or alkenyl groups as R ^a25 , R ^a26 , R ^a27 , R ^a28 , R ^a29 , R ^a30 , R ^a31 , and R ^a32 may be linear or branched. do.

Preferred examples of the alkyl group include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, and n-pentyl groups.

Preferred examples of the alkenyl group include a vinyl group, an allyl group, a 3-butenyl group, and a 4-pentenyl group.

Preferable examples of the compound represented by formula (a2-1) or formula (a2-2) include the following compounds.

[Formula 8]

[Aromatic diamine compound (A2)]

As an aromatic diamine compound (A2), the diamine compound which has an aromatic group conventionally used for manufacture of a polyimide resin can be used without particular limitation. Here, a diamine compound in which both amino groups are bonded to an aromatic group is referred to as an aromatic diamine compound (A2).

As the aromatic diamine compound (A2), a compound represented by the following formula (a3-1) can be typically used. An aromatic diamine compound (A2) may be used individually by 1 type, and may be used in combination of 2 or more type.

H ₂ NA ² -NH ₂ ... (a3-1)

(In formula (a3-1), A ² represents a divalent organic group containing an aromatic group. Both amino groups in formula (a3-1) bond to an aromatic group.)

In formula (a3-1), A ² is a divalent organic group containing an aromatic group. The organic group as A ² may have one or more substituents other than the two amino groups in the formula (a3-1).

Preferable examples of the substituent include a fluorine atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a fluorinated alkyl group having 1 to 6 carbon atoms, and a fluorinated group having 1 to 6 carbon atoms. An alkoxy group or a hydroxyl group is preferred.

When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

As for the lower limit of the number of carbon atoms of the organic group as A ² in formula (a3-1), 6 is preferable. As an upper limit, 50 is preferable and 30 is more preferable.

The organic group as A ² may be an aromatic group itself, and the contribution of two or more aromatic groups bonded through a bond containing an aliphatic hydrocarbon group, a halogenated aliphatic hydrocarbon group, or a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. do. As a bond containing a heteroatom such as an oxygen atom, a sulfur atom, and a nitrogen atom contained in A ² , -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -SS-, and the like, -O-, -CO-, -SO-, -SO ₂ -, -S -, and -SS- are preferred.

It is preferable that the aromatic ring bonded to the amino group in A ² is a benzene ring. When the ring bonded to the amino group in A ² is a condensed ring containing two or more rings, the ring bonded to the amino group in the condensed ring is preferably a benzene ring.

Moreover, the aromatic ring contained in A ² may be an aromatic heterocyclic ring.

When A ² is an organic group containing an aromatic ring, the aromatic diamine compound (A2) is at least one of compounds represented by the following formulas (21) to (24) from the viewpoint of heat resistance of a cured product formed using the varnish composition. desirable.

[Formula 9]

(In formulas (21) to (24), R ¹¹¹ is selected from the group consisting of a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group having 1 to 4 carbon atoms, and a halogenated alkyl group having 1 to 4 carbon atoms. In formula (24), Q is a 9,9'-fluorenylidene group or formula: -C ₆ H ₄ -, -CONH-C ₆ H ₄ -NHCO-, -NHCO-C ₆ H ₄ -CONH-, -OC ₆ H ₄ -CO-C ₆ H ₄ -O-, -OCO-C ₆ H ₄ -COO-, -OCO-C ₆ H ₄ -C ₆ H ₄ -COO-, - OCO-, -O-, -S-, -CO-, -CONH-, -SO ₂ -, -C(CF ₃ ) ₂ -, -C(CH ₃ ) ₂ -, -CH ₂ -, -OC ₆ H ₄ -C(CH ₃ ) ₂ -C ₆ H ₄ -O-, -OC ₆ H ₄ -C(CF ₃ ) ₂ -C ₆ H ₄ -O-, -OC ₆ H ₄ -SO ₂ -C ₆ H ₄ -O-, -C(CH ₃ ) ₂ -C ₆ H ₄ -C(CH ₃ ) ₂ -, -OC ₁₀ H ₆ -O-, -OC ₆ H ₄ -C ₆ H ₄ -O-, and -OC ₆ H ₄ -O-.

-C ₆ H ₄ - in the illustration of Q is a phenylene group, preferably a m-phenylene group and a p-phenylene group, more preferably a p-phenylene group. In addition, -C ₁₀ H ₆ - is a naphthalenediyl group, and is a naphthalene-1,2-diyl group, a naphthalene-1,4-diyl group, a naphthalene-2,3-diyl group, and a naphthalene-2,6-diyl group. , And a naphthalene-2,7-diyl group is preferable, and a naphthalene-1,4-diyl group and a naphthalene-2,6-diyl group are more preferable.)

As R ¹¹¹ in Formulas (21) to (24), a hydrogen atom, a hydroxyl group, a fluorine atom, a methyl group, an ethyl group, or a trifluoromethyl group is more preferable from the viewpoint of the heat resistance of the polyimide resin formed, and a hydrogen atom or a hydroxyl group , or a trifluoromethyl group is particularly preferred.

Q in Formula (24) is a 9,9'-fluorenylidene group, -OC ₆ H ₄ -O-, -C(CF ₃ ) ₂ -, -O- from the viewpoint of heat resistance of the polyimide resin formed. , -C(CH ₃ ) ₂ -, -CH ₂ -, or -OC ₆ H ₄ -C(CH ₃ ) ₂ -C ₆ H ₄ -O-, -CONH- is preferred, -CONH-, -OC ₆ H ₄ -O-, -C(CF ₃ ) ₂ - or -O- is more preferable, and -CONH- is particularly preferable.

As an aromatic diamine compound represented by a formula (a3-1), the compound shown below can be used preferably.

That is, as the aromatic diamine compound (A2), p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminobiphenyl, 4,4'-diamino-2, 2'-bis(trifluoromethyl)biphenyl, 3,3'-diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfide, 4,4 '-Diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminobenzanilide , 3,3'-diaminobenzanilide, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-aminophenoxy) ) Benzene, 4,4'-bis (4-aminophenoxy) biphenyl, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2 ,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 9,9-bis(4-aminophenyl )fluorene, 9,9-bis(4-amino-3-methylphenyl)fluorene, and 4,4'-[1,4-phenylenebis(1-methylethane-1,1-diyl)]dianiline etc. can be mentioned. Among these, p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminodiphenyl ether, and 4,4'-diaminobenz are preferred in price, availability, and the like. Anilides are preferred.

It is also preferable that the aromatic diamine compound (A2) is a compound represented by the following formula (25).

[Formula 10]

(In Formula (25), Ar ¹ and Ar ² are each independently an aromatic hydrocarbon group having 6 to 18 carbon atoms, and R ¹¹² is a hydrogen atom or a monovalent organic group.)

Specific examples of the aromatic diamine compound (A2) represented by Formula (25) include 2,4-bis(4-aminoanilino)-1,3,5-triazine and 2,4-bis(4-aminoanyl). Lino) -6-methyl-1,3,5-triazine, 2,4-bis (4-aminoanilino) -6-ethyl-1,3,5-triazine, 2,4-bis (4- Aminoanilino) -6-phenyl-1,3,5-triazine, 2,4-bis (4-aminoanilino) -6-amino-1,3,5-triazine, 2,4-bis ( 4-aminoanilino) -6-methylamino-1,3,5-triazine, 2,4-bis (4-aminoanilino) -6-dimethylamino-1,3,5-triazine, 2, 4-bis(4-aminoanilino)-6-ethylamino-1,3,5-triazine, 2,4-bis(4-aminoanilino)-6-diethylamino-1,3,5- Triazine, 2,4-bis(4-aminoanilino)-6-anilino-1,3,5-triazine, and 2,4-bis(4-aminoanilino)-6-diphenylamino- 1,3,5-triazine etc. are mentioned.

Among these, 2,4-bis(4-aminoanilino)-6-amino-1,3,5-triazine, 2,4-bis(4-aminoanilino)-6-methylamino-1, 3,5-triazine, 2,4-bis(4-aminoanilino)-6-ethylamino-1,3,5-triazine, and 2,4-bis(4-aminoanilino)-6- Anilino-1,3,5-triazine is preferred, and 2,4-bis(4-aminoanilino)-6-anilino-1,3,5-triazine is more preferred.

[Method for producing polyamic acid (A)]

The polyamic acid (A) is obtained by, for example, polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) in an organic solvent.

The amount of tetracarboxylic dianhydride (A1) and aromatic diamine compound (A2) used when synthesizing the polyamic acid (A) is not particularly limited. It is preferable to use 0.50 mol or more and 1.50 mol or less of an aromatic diamine compound (A2), more preferably 0.60 mol or more and 1.30 mol or less, and 0.70 mol or more 1.20 mol or more with respect to 1 mol of tetracarboxylic dianhydride (A1). Particularly preferred is the use of sub-moles.

What is necessary is just to set the weight average molecular weight of the polyamic acid (A) obtained suitably according to the use. The weight average molecular weight is, for example, 5000 or more, preferably 7500 or more, and more preferably 10000 or more. On the other hand, the weight average molecular weight of the obtained polyamic acid (A) is, for example, 100000 or less, preferably 80000 or less, and more preferably 75000 or less.

This weight average molecular weight should just adjust reaction conditions, such as the compounding quantity of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2), a solvent, and reaction temperature, and what is necessary is just to set it as the value mentioned above.

Reaction of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) is normally performed in an organic solvent. The organic solvent used for reaction of tetracarboxylic dianhydride (A1) and a diamine compound (A2) can dissolve tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2), and tetracarboxylic acid It will not specifically limit, if it is an organic solvent which does not react with dianhydride (A1) and an aromatic diamine compound (A2). An organic solvent can be used individually or in mixture of 2 or more types.

As an example of the organic solvent used for reaction of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2), N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-di nitrogen-containing polar solvents such as ethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, and N,N,N',N'-tetramethylurea; dimethyl sulfoxide; acetonitrile; and ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dioxane, and tetrahydrofuran.

Among these organic solvents, from the solubility of the resulting polyamic acid (A), N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylform Nitrogen-containing polar solvents such as amides, N,N-diethylformamide, N-methylcaprolactam, and N,N,N',N'-tetramethylurea are preferred.

The temperature at the time of making tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) react is not specifically limited as long as reaction advances favorably. Typically, the reaction temperature between the tetracarboxylic dianhydride (A1) and the aromatic diamine compound (A2) is preferably -5°C or more and 150°C or less, more preferably 0°C or more and 120°C or less, and is 0°C Above 70 degreeC or less is especially preferable. The time for making the tetracarboxylic dianhydride (A1) and the aromatic diamine compound (A2) react varies depending on the reaction temperature, but is typically preferably 1 hour or more and 50 hours or less, and 2 hours or more and 40 hours or less. The following is more preferable, and 5 hours or more and 30 hours or less are especially preferable.

A solution containing the polyamic acid (A) is obtained by the method described above.

The solution containing the polyamic acid (A) obtained by performing it above can be used as a varnish composition as it is, or it can also be used for preparation of a varnish composition. A solution containing the polyamic acid (A) obtained in the above manner was prepared by distilling at least one of the solvent from the solution of the polyamic acid (A) under reduced pressure at a low temperature to the extent that conversion of the polyamic acid (A) to the polyimide resin did not occur. A paste or solid of the polyamic acid (A) obtained by partially removing it can also be used for preparation of a varnish composition.

The content of the polyamic acid (A) in the varnish composition is appropriately determined considering the coating properties of the varnish composition and the solubility of the polyamic acid (A) in the solvent (S). Typically, the content of the polyamic acid (A) in the varnish composition is preferably 5% by mass or more and 45% by mass or less, more preferably 7% by mass or more and 40% by mass or less, with respect to the mass of the varnish composition, 10 mass % or more and 30 mass % or less are more preferable.

<Solvent (S)>

The varnish composition contains a solvent (S). The varnish composition may be a solid-containing paste or a solution, but is preferably a solution. A solvent (S) can be used individually or in mixture of 2 or more types.

The type of solvent (S) is not particularly limited as long as the object of the present invention is not impaired, and water, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, Propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, and diethylene glycol mono glycol monoethers such as phenyl ether; Ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene glycol diethers such as glycol dipropyl ether; Ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monophenyl ether acetate, diethylene glycol monomethyl ether acetate, and diethylene glycol monoethyl ether glycol monoacetates such as acetate; Diethylene glycol monopropyl ether acetate, diethylene glycol monobutyl ether acetate, diethylene glycol monophenyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 2-methoxybutyl Acetate, 3-methoxybutylacetate, 4-methoxybutylacetate, 2-methyl-3-methoxybutylacetate, 3-methyl-3-methoxybutylacetate, 3-ethyl-3-methoxybutylacetate, 2 -Ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2-methyl-3-methoxypentyl monoether monoacetates of diols such as acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate, and 4-methyl-4-methoxypentyl acetate; ketones such as acetone, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone, ethyl isobutyl ketone, and cyclohexanone; Methyl propionate, ethyl propionate, propyl propionate, isopropyl propionate, 2-hydroxymethyl propionate, 2-hydroxyethyl propionate, 2-hydroxy-2-methyl, methyl-3-methoxypropionate, ethyl-3- Methoxypropionate, ethyl-3-ethoxypropionate, ethyl-3-propoxypropionate, propyl-3-methoxypropionate, isopropyl-3-methoxypropionate, ethoxyacetic acid Ethyl, ethyl oxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isoamyl acetate, methyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate esters such as methyl pyruvate, ethyl pyruvate, propyl pyruvate, butyl pyruvate, methyl acetoacetate, ethyl acetoacetate, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, and γ-butyrolactone; ethers such as diethyl ether, dipropyl ether, dibutyl ether, dihexyl ether, benzyl methyl ether, benzyl ethyl ether, and tetrahydrofuran; Aromatics, such as benzene, toluene, xylene, ethylbenzene, cresol, and chlorobenzene; aliphatic alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, n-hexanol, and cyclohexanol; glycols such as polyethylene glycol, ethylene glycol, diethylene glycol, propylene glycol, and dipropylene glycol; glycerin; etc. can be mentioned.

Moreover, the solvent used for reaction of tetracarboxylic dianhydride (A1) and aromatic diamine compound (A2) mentioned above can also be used suitably as a solvent (S).

The solvent (S) may contain a nitrogen-containing compound represented by the following formula (S1).

[Formula 11]

(In formula (S1), R ^S1 and R ^S2 are each independently an alkyl group having 1 to 3 carbon atoms, and R ^S3 is a hydrogen atom, or the following formula (S1-1) or the following formula (S1-2 ):

[Formula 12]

is a group represented by , R ^S4 is a hydrogen atom or a hydroxyl group, R ^S5 and R ^S6 are each independently a hydrogen atom and an alkyl group having 1 to 3 carbon atoms, and R ^S7 and R ^S8 are each independently When it is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms and R ^S3 is a group represented by formula (S1-1), R ^S2 and R ^S3 may be bonded to each other to form a ring.)

Among the nitrogen-containing compounds represented by the formula (S1), specific examples in the case where R ^S3 is a hydrogen atom or a group represented by the formula (S1-1) include N,N-dimethylformamide and N,N-dimethylacetamide. , N,N,2-trimethylpropionamide, N-ethyl, N,2-dimethylpropionamide, N,N-diethyl-2-methylpropionamide, N,N,2-trimethyl-2-hydroxypropionamide , N-ethyl-N,2-dimethyl-2-hydroxypropionamide, and N,N-diethyl-2-hydroxy-2-methylpropionamide.

Among the nitrogen-containing compounds represented by formula (S1), specific examples in the case where R ^S3 is a group represented by formula (S1-1) and R ^S2 and R ^S3 are bonded to each other to form a ring include N-methyl -2-pyrrolidone, N-ethyl-2-pyrrolidone, etc. are mentioned.

Among the nitrogen-containing compounds represented by the formula (S1), specific examples in the case where R ^S3 is a group represented by the formula (S1-2) include N,N,N',N'-tetramethylurea, N,N,N',N'-tetraethylurea etc. are mentioned.

Among the above examples of the nitrogen-containing compound represented by formula (S1), particularly preferred compounds include N,N-dimethylformamide, N,N-dimethylacetamide, N,N,2-trimethylpropionamide, and N, and N,N',N'-tetramethylurea. Among these, N,N,2-trimethylpropionamide and N,N,N',N'-tetramethylurea are preferable. The boiling point of N,N,2-trimethylpropionamide under atmospheric pressure is 175°C, and the boiling point of N,N,N',N'-tetramethylurea under atmospheric pressure is 177°C. Thus, N,N,2-trimethylpropionamide and N,N,N',N'-tetramethylurea have relatively low boiling points.

Therefore, if a varnish composition containing a solvent (S) containing at least one selected from N,N,2-trimethylpropionamide and N,N,N',N'-tetramethylurea is used, polyi When forming the mid resin, it is difficult for the solvent (S) to remain in the polyimide resin produced by heating, and it is difficult to cause a decrease in the mechanical properties of the polyimide resin obtained.

In addition, N,N,2-trimethylpropionamide and N,N,N',N'-tetramethylurea are SVHC (Substance of Concern for Harmfulness) under the REACH regulation in the EU (European Union). It is also useful in that it is a low-hazard substance so that it is not designated as a Very High Concern.

The content of the solvent (S) in the varnish composition is not particularly limited as long as the object of the present invention is not impaired. The content of the solvent (S) in the varnish composition is appropriately adjusted according to the solid content in the varnish composition. The solid content in the varnish composition is, for example, in the range of 5 mass% or more and 99.9 mass% or less, preferably 5 mass% or more and 70 mass% or less, and more preferably 10 mass% or more and 60 mass% or less.

<thermal base generator (B)>

Even if the varnish composition contains a thermal base generator (B) that generates a basic nitrogen-containing heterocyclic compound by heating for the purpose of favorably advancing the production of a polyamide resin from the polyamic acid (A) by firing. do.

The basic nitrogen-containing heterocyclic compound generated by the thermal base generator (B) may be an aliphatic cyclic compound or an aromatic compound. When the basic nitrogen-containing heterocyclic compound is a condensed compound of two or more monocycles, the two or more monocycles may consist of only aliphatic rings, only aromatic rings, or a combination of aliphatic rings and aromatic rings.

Examples of the basic nitrogen-containing heterocyclic compound generated by the thermobase generator (B) include pyrrolidine, pyrazolidine, imidazolidine, triazolidine, tetrazolidine, pyrroline, pyrazoline, and imidazoline. , nitrogen-containing five-membered ring compounds such as triazolines, tetrazolines, pyrroles, pyrazoles, imidazoles, triazoles, and tetrazoles; nitrogen-containing 6-membered rings such as piperidine, piperazine, triazinane, pyridine, pyridazine, pyrimidine, and pyrazine; compounds in which these compounds are substituted with one or more substituents; Compounds in which these compounds are condensed with cyclopentane, cyclohexane, benzene or the like are exemplified.

When the basic nitrogen-containing heterocyclic compound has a substituent on the nitrogen-containing heterocyclic ring, examples of the substituent include the same groups as R ¹ , R ² , and R ³ in formula (B1) described later.

Since the effect of accelerating the production of the polyimide resin from the polyamic acid (A) is good, the basic nitrogen-containing heterocyclic compound generated by the thermal base generator component (B) is the following formula (B1):

[Formula 13]

(In formula (B1), R ¹ , R ² , and R ³ are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonato group, a phosphino group, and a phosphino group. It is a phenyl group, a phosphonato group, or an organic group.)

The imidazole compound represented by is preferable.

Examples of the organic group for R ¹ , R ² and R ³ include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group and an aralkyl group. This organic group may include a bond other than a hydrocarbon group such as a hetero atom or a substituent in the organic group. Moreover, any of linear form, branched chain form, and cyclic form may be sufficient as this organic group. This organic group is usually monovalent, but can be a divalent or higher valent organic group in the case of forming a cyclic structure or the like.

R ¹ and R ² may be bonded to form a cyclic structure, and may further contain a heteroatom bond. As a cyclic structure, a heterocycloalkyl group, a heteroaryl group, etc. are mentioned, and a condensed ring may be sufficient.

Bonds included in the organic groups of R ¹ , R ² , and R ³ are not particularly limited as long as the effects of the present invention are not impaired. The organic group may contain a bond containing a hetero atom such as an oxygen atom, a nitrogen atom, or a silicon atom. Specific examples of the bond containing a hetero atom include an ether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond (-N=C(-R)-, -C( =NR)-: R represents a hydrogen atom or an organic group), a carbonate bond, a sulfonyl bond, an azo bond, and the like.

As the bond containing the hetero atom that the organic group of R ¹ , R ² , and R ³ may have, from the viewpoint of the heat resistance of the imidazole compound, ether bond, carbonyl bond, thiocarbonyl bond, ester bond, amide bond , a urethane bond, an imino bond (-N=C(-R)-, -C(=NR)-: R represents a hydrogen atom or a monovalent organic group), a carbonate bond, and a sulfonyl bond are preferable.

When the organic group of R ¹ , R ² , and R ³ is a substituent other than a hydrocarbon group, R ¹ , R ² , and R ³ are not particularly limited as long as the effect of the present invention is not impaired. Specific examples of R ¹ , R ² , and R ³ are, as described above, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonato group, a phosphino group, a phosphinyl group, and a phosphino group. It is a ponato machine. The hydrogen atom contained in the said substituent may be substituted by the hydrocarbon group. Further, the hydrocarbon group included in the substituent may be linear, branched, or cyclic.

As R ¹ , R ² , and R ³ , a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and a halogen atom preferred, and a hydrogen atom is more preferred.

The thermal base generator (B) is not particularly limited as long as it is a compound capable of generating a basic nitrogen-containing heterocyclic compound by heating. Regarding compounds (thermal base generators) that generate amines by the action of heat conventionally formulated in various compositions, the skeleton derived from the amine generated during heating is derived from a desired basic nitrogen-containing heterocyclic compound. By substituting with a skeleton, a compound used as a thermal base generator (B) is obtained.

As a preferable heat base generator (B), the following formula (B2):

[Formula 14]

(In formula (B2), R ¹ , R ² , and R ³ are the same as those in formula (B1), and R ^b1 and R ^b2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, or a silyl group , A silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, or an organic group, R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, and a phosphinyl group. , represents a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, and R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 even if two or more of them bond to form a cyclic structure. and may contain a bond of a heteroatom.)

The compound represented by is mentioned.

R ¹ , R ² , and R ³ in the formula (B2) are as described for the formula (B1).

In formula (B2), ^Rb1 and ^Rb2 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, and a phosphino group. group, a phosphinyl group, a phosphono group, a phosphonato group, or an organic group.

Examples of the organic group for ^Rb1 and ^Rb2 include groups exemplified for R ¹ , R ² and R ³ . As in the case of R ¹ , R ² and R ³ , this organic group may contain a hetero atom in the organic group. Moreover, any of linear form, branched chain form, and cyclic form may be sufficient as this organic group.

Among the above, R ^b1 and R ^b2 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, a cycloalkenyl group having 4 to 13 carbon atoms, and carbon. An aryloxyalkyl group having 7 to 16 atoms, an aralkyl group having 7 to 20 carbon atoms, an alkyl group having 2 to 11 carbon atoms having a cyano group, an alkyl group having 1 to 10 carbon atoms having a hydroxyl group, carbon An alkoxy group of 1 to 10 atoms, an amide group of 2 to 11 carbon atoms, an acyl group of 1 to 10 carbon atoms, an ester group of 2 to 11 carbon atoms (-COOR, -OCOR: R represents a hydrocarbon group), an aryl group having 6 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an electron donating group and/or an electron withdrawing group substituted with an aryl group having 6 to 20 carbon atoms, an electron donating group and/or an electron withdrawing group A substituted benzyl group or a cyano group is preferred. More preferably, both ^Rb1 and ^Rb2 are hydrogen atoms, or ^Rb1 is a methyl group, and ^Rb2 is a hydrogen atom.

In formula (B2), R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, or a nitro group. group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group.

Examples of the organic group for R ^b3 , R ^b4 , R ^b5 , R ^b6 and R ^b7 include the groups exemplified for R ¹ , R ² and R ³ . As in the case of R ¹ , R ² and R ³ , this organic group may contain a bond other than a hydrocarbon group such as a hetero atom or a substituent in the organic group. Moreover, any of linear form, branched chain form, and cyclic form may be sufficient as this organic group.

Regarding R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 , two or more of them may be bonded to form a cyclic structure. R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 may each contain a bond containing a hetero atom. As a cyclic structure, a heterocycloalkyl group, a heteroaryl group, etc. are mentioned, and a condensed ring may be sufficient. For example, R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 are benzene rings to which two or more of them are bonded, and R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 are bonded. You may form a condensed ring of naphthalene, anthracene, phenanthrene, indene, etc. by sharing an atom of . When a condensed ring is formed, the absorption wavelength is preferably increased to a longer wavelength.

Among the above, R ^b3 , R ^b4 , R ^b5 , R ^b6 , and R ^b7 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, and a carbon atom number A cycloalkenyl group having 4 to 13 carbon atoms, an aryloxyalkyl group having 7 to 16 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, an alkyl group having 2 to 11 carbon atoms and a cyano group, and carbon having a hydroxyl group. Alkyl group with 1 to 10 atoms, alkoxy group with 1 to 10 carbon atoms, amide group with 2 to 11 carbon atoms, acyl group with 1 to 10 carbon atoms, 2 to 11 carbon atoms Benzyl substituted with an ester group, an aryl group having 6 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an electron donating group and/or an electron withdrawing group substituted with an electron donating group and/or an electron withdrawing group groups, cyano groups, and nitro groups are preferred.

Among the compounds represented by the formula (B2), the following formula (B3):

[Formula 15]

(In formula (B3), R ¹ , R ² , and R ³ have the same meaning as in formulas (B1) and (B2). R ^b1 to R ^b6 have the same meaning as in formula (B2). R ^b8 is Represents a hydrogen atom or an organic group R ^b3 and R ^b4 do not become a hydroxyl group R ^b3 , R ^b4 , R ^b5 , and R ^b6 may combine two or more of them to form a cyclic structure, or It may contain atomic bonds.)

The compound represented by is preferable.

Since the compound represented by formula (B3) has a substituent -OR ^b8 , it is excellent in solubility to the solvent (S).

In Formula (B3), R ^b8 is a hydrogen atom or an organic group. When R ^b8 is an organic group, examples of the organic group include groups exemplified for R ¹ , R ² and R ³ . This organic group may contain a hetero atom in the organic group. Moreover, any of linear form, branched chain form, and cyclic form may be sufficient as this organic group. As R ^b8 , a hydrogen atom or an alkyl group having 1 to 12 carbon atoms is preferable, and a methyl group is more preferable.

Among the compounds represented by the formula (B1), specific examples of particularly preferable compounds as the heat base generator (B) are shown below.

[Formula 16]

Moreover, the imidazole compound represented by the following formula (B4) is also preferable as the heat base generator (B).

[Formula 17]

(In formula (B4), R ¹ , R ² , and R ³ are the same as those in formula (B1), R ^b9 represents a hydrogen atom or a monovalent organic group, and R ^b10 may have a substituent represents an aromatic group, and R ^b9 may be bonded to the other R ^b9 or R ^b10 to form a cyclic structure.)

In Formula (B4), R ^b9 is a hydrogen atom or a monovalent organic group. It does not specifically limit as a monovalent organic group, For example, the alkyl group which may have a substituent, the aromatic group which may have a substituent, etc. may be sufficient. When R ^b9 is an alkyl group, the alkyl group may have an ester bond or the like in the chain.

As an alkyl group, you may be the same as ^Rb11 etc. in Formula (B4a) mentioned later, for example. The number of carbon atoms in the alkyl group is preferably 1 or more and 40 or less, more preferably 1 or more and 30 or less, particularly preferably 1 or more and 20 or less, and most preferably 1 or more and 10 or less.

As a substituent which the said alkyl group may have, you may be the same as the substituent which the alkylene group which is ^Rb11 in Formula (B4a) mentioned later may have, for example.

As an aromatic group which may have a substituent, it is the same as ^Rb10 in Formula (B4a) mentioned later, An aryl group is preferable, and a phenyl group is more preferable. The aromatic group which may have a substituent as ^Rb9 may be the same as or different from ^Rb10 .

In formula (B4), one ^Rb9 is preferably a hydrogen atom, and more preferably one ^Rb9 is a hydrogen atom and the other ^Rb9 is an alkyl group which may have a substituent or an aromatic group which may have a substituent.

In formula (B4), ^Rb9 may be bonded to the other ^Rb9 or ^Rb10 to form a cyclic structure. For example, when at least one ^Rb9 is an alkyl group which may have a substituent, ^Rb9 may be bonded to the other ^Rb9 or ^Rb10 to form a cyclic structure.

The imidazole compound represented by the formula (B4) may be a compound represented by the following formula (B4a).

[Formula 18]

(In formula (B4a), R ¹ , R ² , and R ³ are the same as those in formula (B1), R ^b11 is a hydrogen atom or an alkyl group, R ^b10 is an aromatic group which may have a substituent, R ^b12 is an alkylene group which may have a substituent, and R ^b12 may bond with R ^b10 to form a cyclic structure.)

In formula (B4a), R ^b11 is a hydrogen atom or an alkyl group. When R ^b11 is an alkyl group, the alkyl group may be a straight-chain alkyl group or a branched-chain alkyl group. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more and 20 or less, preferably 1 or more and 10 or less, and more preferably 1 or more and 5 or less.

Specific examples of the alkyl group preferable as R ^b11 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isophene ethyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethyl-n-hexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group , n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecyl group, and n-icosyl group. can

In formula (B4a), R ^b10 is an aromatic group which may have a substituent. The aromatic group which may have a substituent may be an aromatic hydrocarbon group which may have a substituent, or an aromatic heterocyclic group which may have a substituent.

The type of aromatic hydrocarbon group is not particularly limited as long as the object of the present invention is not impaired. The aromatic hydrocarbon group may be a monocyclic aromatic group, may be a group formed by condensation of two or more aromatic hydrocarbon groups, or a group formed by bonding two or more aromatic hydrocarbon groups through a single bond. As an aromatic hydrocarbon group, a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group, and a phenanthrenyl group are preferable.

The type of aromatic heterocyclic group is not particularly limited as long as the object of the present invention is not impaired. The aromatic heterocyclic group may be a monocyclic group or a polycyclic group. Examples of the aromatic heterocyclic group include a pyridyl group, a furyl group, a thienyl group, an imidazolyl group, a pyrazolyl group, an oxazolyl group, a thiazolyl group, an isoxazolyl group, an isothiazolyl group, a benzooxazolyl group, and a benzothiazolyl group. group, and a benzoimidazolyl group are preferred.

Examples of substituents that the phenyl group, the polycyclic aromatic hydrocarbon group, or the aromatic heterocyclic group may have include a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, and a phosphino group. group, phosphinyl group, phosphono group, phosphonato group, amino group, ammonio group, and organic group. When a phenyl group, a polycyclic aromatic hydrocarbon group, or an aromatic heterocyclic group has a plurality of substituents, the plurality of substituents may be the same or different.

When the substituent of the aromatic group is an organic group, examples of the organic group include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. This organic group may contain a bond other than a hydrocarbon group such as a hetero atom or a substituent in the organic group. Further, this organic group may be linear, branched, cyclic, or a combination of these structures. This organic group is usually monovalent, but can be a divalent or higher valent organic group in the case of forming a cyclic structure or the like.

When the aromatic group has substituents on adjacent carbon atoms, two substituents bonded on adjacent carbon atoms may be bonded to form a cyclic structure. Examples of the cyclic structure include an aliphatic hydrocarbon ring and an aliphatic ring containing a hetero atom.

When the substituent of an aromatic group is an organic group, the bond contained in the organic group is not particularly limited as long as the effects of the present invention are not impaired, and the organic group includes a bond containing a hetero atom such as an oxygen atom, a nitrogen atom, or a silicon atom. may contain Specific examples of the bond containing a hetero atom include an ether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond (-N=C(-R)-, -C( =NR)-: R represents a hydrogen atom or an organic group), a carbonate bond, a sulfonyl bond, an azo bond, and the like.

As the bond containing the hetero atom that the organic group may have, from the viewpoint of the heat resistance of the imidazole compound represented by formula (B4) or formula (B4a), ether bond, carbonyl bond, thiocarbonyl bond, ester bond, amide Bond, amino bond (-NR-: R represents a hydrogen atom or a monovalent organic group), urethane bond, imino bond (-N=C(-R)-, -C(=NR)-: R represents a hydrogen atom or a monovalent organic group), a carbonate bond and a sulfonyl bond are preferable.

When the organic group is a substituent other than a hydrocarbon group, the type of substituent other than a hydrocarbon group is not particularly limited as long as the object of the present invention is not impaired. Specific examples of substituents other than hydrocarbon groups include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group, an isocyanato group, a thiocyanato group, and an isothiocyanato group. , Silyl group, silanol group, alkoxy group, alkoxycarbonyl group, amino group, monoalkylamino group, dialkyl aluminum group, monoarylamino group, diarylamino group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxylate group, an acyl group, an acyloxy group, a sulfino group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphonato group, an alkyl ether group, an alkenyl ether group, an aryl ether group, and the like. The hydrogen atom contained in the said substituent may be substituted by the hydrocarbon group. Further, the hydrocarbon group included in the substituent may be linear, branched, or cyclic.

Examples of the substituent of the phenyl group, the polycyclic aromatic hydrocarbon group, or the aromatic heterocyclic group include an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, An aryloxy group having 1 to 12 carbon atoms, an arylamino group having 1 to 12 carbon atoms, and a halogen atom are preferable.

As R ^b10 , the imidazole compound represented by formula (B4) or formula (B4a) can be synthesized inexpensively and easily, and the imidazole compound has good solubility in water and organic solvents, and each has a substituent. A phenyl group, a furyl group, and a thienyl group, which may also be used, are preferable.

In formula (B4a), R ^b12 is an alkylene group which may have a substituent. Substituents that the alkylene group may have are not particularly limited as long as the object of the present invention is not impaired. As a specific example of the substituent which an alkylene group may have, a hydroxyl group, an alkoxy group, an amino group, a cyano group, a halogen atom, etc. are mentioned. The alkylene group may be a straight-chain alkylene group or a branched-chain alkylene group, and a straight-chain alkylene group is preferable. The number of carbon atoms in the alkylene group is not particularly limited, and is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 5 or less. In addition, the number of carbon atoms in the alkylene group does not include carbon atoms of substituents bonded to the alkylene group.

The alkoxy group as a substituent bonded to the alkylene group may be a straight-chain alkoxy group or a branched-chain alkoxy group. The number of carbon atoms in the alkoxy group as a substituent is not particularly limited, and is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 3 or less.

The amino group as a substituent bonded to the alkylene group may be a monoalkylamino group or a dialkylamino group. The alkyl group contained in the monoalkylamino group or dialkylamino group may be a straight-chain alkyl group or a branched-chain alkyl group. The number of carbon atoms in the alkyl group contained in the monoalkylamino group or dialkylamino group is not particularly limited, and is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 3 or less.

Specific examples of the alkylene group preferred as R ^b12 include methylene group, ethane-1,2-diyl group, n-propane-1,3-diyl group, n-propane-2,2-diyl group, n-butane- 1,4-diyl group, n-pentane-1,5-diyl group, n-hexane-1,6-diyl group, n-heptane-1,7-diyl group, n-octane-1,8-diyl group , n-nonane-1,9-diyl group, n-decane-1,10-diyl group, n-undecane-1,11-diyl group, n-dodecane-1,12-diyl group, n-tree Decane-1,13-diyl group, n-tetradecane-1,14-diyl group, n-pentadecane-1,15-diyl group, n-hexadecane-1,16-diyl group, n-heptadecane- 1,17-diyl group, n-octadecane-1,18-diyl group, n-nonadecane-1,19-diyl group, and n-icosan-1,20-diyl group.

Among the imidazole compounds represented by the formula (B4), a compound represented by the following formula (B4-1a) is preferable from the viewpoint of being inexpensive and easily synthesizable.

[Formula 19]

(In formula (B4-1a), R ¹ , R ² , and R ³ are the same as those in formula (B1), R ^b9 is the same as in formula (B4), R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 are, each independently, a hydrogen atom, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, A phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, wherein at least two of R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 may be bonded to form a cyclic structure. .R ^b9 may combine with R ^b15 to form a cyclic structure.)

In the formula (B4-1a), all of R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 may be hydrogen atoms. Further, from the viewpoint of the solubility of the compound represented by formula (B4-1) in the solvent (S), it is preferable that at least one of ^Rb13 , ^Rb14 , ^Rb15 , ^Rb16 , and ^Rb17 is a group other than a hydrogen atom. .

R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 are the same as those in formula (B4-1) described later. In formula (B4-1a), R ^b9 may be bonded to R ^b15 to form a cyclic structure. For example, when R ^b9 is an alkyl group which may have a substituent, R ^b9 may bond with R ^b15 to form a cyclic structure.

Among the imidazole compounds represented by the formula (B4a) or formula (B4-1a), those represented by the following formula (B4-1) are inexpensive, easily synthesizable, and have excellent solubility in water and organic solvents. A compound is preferable, and a compound represented by formula (B4-1) wherein R ^b12 is a methylene group is more preferable.

[Formula 20]

(In formula (B4-1), R ¹ , R ² and R ³ are the same as those in formula (B1), R ^b11 and R ^b12 are the same as those in formula (B4a), , R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 are, each independently, a hydrogen atom, a halogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonyl group A phonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group. At least two of R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 combine A cyclic structure may be formed. R ^b12 may combine with R ^b15 to form a cyclic structure.)

In formula (B4-1), all of R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 may be hydrogen atoms. Further, from the viewpoint of the solubility of the compound represented by formula (B4-1) in the solvent (S), it is preferable that at least one of ^Rb13 , ^Rb14 , ^Rb15 , ^Rb16 , and ^Rb17 is a group other than a hydrogen atom. .

When R ^b13 , R ^b14 , R ^b15 , R ^b16 , and R ^b17 are organic groups, the organic group is the same as the organic group which R ^b10 in Formula (B4a) has as a substituent. R ^b13 , R ^b14 , R ^b15 , and R ^b16 are preferably hydrogen atoms in view of the solubility of the imidazole compound in the solvent (S).

Especially, it is preferable that at least one of ^Rb13 , ^Rb14 , ^Rb15 , ^Rb16 , and ^Rb17 is a substituent shown below, and it is particularly preferable that ^Rb17 is a substituent shown below. When R ^b17 is a substituent shown below, R ^b13 , R ^b14 , R ^b15 , and R ^b16 are preferably hydrogen atoms.

-OR ^b18

(R ^b18 is a hydrogen atom or an organic group.)

When R ^b18 is an organic group, the organic group is the same as the organic group which R ^b10 in the formula (B4a) has as a substituent. As R ^b18 , an alkyl group is preferable, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 3 carbon atoms, and most preferably a methyl group.

Among the compounds represented by the formula (B4-1), compounds represented by the following formula (B4-1-1) are preferred.

[Formula 21]

(In formula (B4-1-1), R ¹ , R ² , and R ³ are the same as those in formula (B1), R ^b11 is the same as formula (B4a), R ^b19 , R ^b20 , R ^b21 , R ^b22 , and R ^b23 are, each independently, a hydrogen atom, a hydroxyl group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, and a phosphino group. A phenyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, provided that at least one of ^Rb19 , ^Rb20 , ^Rb21 , ^Rb22 , and ^Rb23 is a group other than a hydrogen atom. )

Among the ^compounds represented by formula (B4-1-1), it is preferable that at least one of R ^b19 , R ^b20 , R ^b21 , R ^b22 , and R ^b23 is a group represented by -OR b18 described above, and R ^b23 is -OR The group represented by ^b18 is particularly preferred. When R ^b23 is a group represented by -OR ^b18 , R ^b19 , R ^b20 , R ^b21 , and R ^b22 are preferably hydrogen atoms.

The following compounds are mentioned as a preferable specific example of the imidazole compound represented by Formula (B4) or Formula (B4a).

[Formula 22]

The content of the thermal base generator (B) in the varnish composition is preferably 1 part by mass or more and 20 parts by mass or less, and more preferably 2 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the total solid content. By using the thermal base generator (B) in an amount within this range, production of polyamide resin from the polyamic acid (A) can be effectively achieved without excessive volatilization or sublimation of thermal decomposition products of the thermal base generator (B). can promote

＜Other ingredients＞

The varnish composition may contain various additives as needed. Examples of additives include colorants, dispersants, sensitizers, adhesion accelerators, antioxidants, ultraviolet absorbers, aggregation inhibitors, antifoaming agents, and surfactants. Moreover, the varnish composition may contain various fillers or reinforcing materials as needed.

The usage amount of various additives is not particularly limited as long as the object of the present invention is not impaired. What is necessary is just to adjust suitably within the range of 0.001 mass % or more and 60 mass % or less with respect to the mass of the solid content of a varnish composition, Preferably it is 0.05 mass % or more and 5 mass % or less.

The amount of the filler or reinforcing material used is not particularly limited as long as the object of the present invention is not impaired. The amount of filler or reinforcing material used is typically preferably 1 mass% or more and 300 mass% or less, more preferably 5 mass% or more and 200 mass% or less, and 10 mass% or more with respect to the mass of the polyamic acid (A). 100 mass % or less is more preferable.

As described above, according to the varnish composition described above, it is possible to form a polyimide resin excellent in mechanical properties such as little coloration, elongation at break, and low thermal expansion.

<<Method for Producing Varnish Composition>>

As a preferred method for producing the varnish composition,

Polyamic acid (A) is produced by polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) in a solvent (S), or

A method comprising polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) to produce a polyamic acid (A), and then mixing the isolated polyamic acid (A) with a solvent (S) can be heard

As described above, tetracarboxylic dianhydride (A1) consists only of alicyclic tetracarboxylic dianhydride (A1-1) and alicyclic tetracarboxylic dianhydride (A1-2).

The ratio of the mass of alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less.

The method of polymerizing the tetracarboxylic dianhydride (A1) and the aromatic diamine compound (A2) is as described above.

In the case of isolating the polyamic acid from a polymerization reaction solution containing the polyamic acid (A) when preparing the varnish composition, the isolated polyamic acid (A) is accompanied by an organic solvent used for polymerization or an unreacted monomer. it may be

≪Method for producing polyimide resin≫

A molding step of molding the varnish composition described above;

The polyimide resin can be produced by a method including an imidation step of imidizing the molded varnish composition by heating.

When molding the varnish composition, the shape of the molded varnish composition is not particularly limited. A method for molding the varnish composition is not particularly limited. For example, a method of injecting the varnish composition into a mold having a desired shape, a method of filling the varnish composition into a mold using a squeegee or the like, and a method of applying the varnish composition onto a substrate may be mentioned.

Among these methods, a method in which a varnish composition is applied onto a substrate is preferred because of the high demand for the polyimide resin film and the easy removal of the solvent (S) from the varnish composition during production of the polyimide resin.

After application of the varnish composition, the coated film is dried to form a dry film in a heated and/or vacuum or reduced pressure environment.

The temperature at which the varnish composition or the varnish composition after the drying step is heated is not particularly limited as long as it is a temperature at which a polyimide resin having desired performance is obtained. The temperature at which the polyamic acid is heated is preferably 120°C or higher and 450°C or lower, and more preferably 150°C or higher and 435°C or lower. By heating the varnish composition at a temperature within such a range, the polyimide resin can be produced while removing the solvent (S) while suppressing thermal deterioration and thermal decomposition of the polyimide resin to be produced.

In addition, since it is easy to form a polyimide resin having a high glass transition temperature, good elongation at break, low coefficient of thermal expansion, and little coloring, polyamic acid is applied at a temperature of 70 ° C. or more and 120 ° C. or less for about 10 minutes to 2 hours. It is also preferable to produce a polyimide resin by heating at 150° C. or more and 435° C. or less for about 5 minutes to 2 hours while raising the temperature stepwise.

According to the method for producing a polyimide resin described above, it is possible to produce a polyimide resin that is less colored and has excellent mechanical properties such as elongation at break and low thermal expansion.

Example

Hereinafter, the present invention will be described in detail by examples, but the scope of the present invention is not limited to these examples.

In Examples and Comparative Examples, compound 1-1 of the following formula was used as alicyclic tetracarboxylic dianhydride (A1-1).

[Formula 23]

As the alicyclic tetracarboxylic dianhydride (A1-2), the following compounds 1-2a, 1-2b and 1-2c were used.

[Formula 24]

In Examples and Comparative Examples, a compound of the following formula was used as the heat base generator (B).

[Formula 25]

[Examples 1 to 9 and Comparative Examples 1 to 4]

A 30 mL three-necked flask was heated with a heat gun and sufficiently dried. Next, the atmosphere in the three-necked flask was replaced with nitrogen, and the inside of the three-necked flask was made a nitrogen atmosphere. In a three-necked flask, after adding 0.2045 g (0.90 mmol: manufactured by Nippon Junryo Chemical Co., Ltd.: DABAN) of 4,4'-diaminobenzanilide as an aromatic diamine compound (A2), N,N,N',N'- Tetramethylurea (TMU) was added. The contents of the three-necked flask were stirred to obtain a slurry in which aromatic diamine (DABAN) was dispersed in TMU.

The quantity of TMU was the same mass as the total of the mass of the tetracarboxylic dianhydride (A1) and the mass of the aromatic diamine compound (A2).

Next, 0.90 mmol of tetracarboxylic dianhydride (A1) in the kind and amount shown in Table 1 was added into a three-necked flask. Thereafter, the contents of the flask were stirred for 12 hours at room temperature (25°C) under a nitrogen atmosphere to obtain a reaction solution. With respect to the reaction liquid containing the polyamic acid obtained in this way, the thermal base generator in an amount of 10% by mass with respect to the total mass of the tetracarboxylic dianhydride (A1) and the mass of the aromatic diamine compound (A2) (B) was added.

Next, the reaction liquid containing the polyamic acid (A) was diluted with TMU so that the concentration of the polyamic acid (A) would be 18% by mass, and varnish compositions of each example and each comparative example were obtained.

Using the varnish compositions of each Example and Comparative Example obtained as described above, a polyimide resin film was formed by the following method, and the formed polyimide resin film had yellowness (YI) and light transmittance. , coefficient of thermal expansion (CTE), and elongation at break were evaluated. These evaluation results are shown in Table 1.

<Formation method of polyimide resin film>

On a glass substrate (length: 100 mm, width 100 mm, thickness 1.3 mm), the varnish composition obtained as described above was spin-coated so that the thickness of the coating film after heat curing was set to 13 μm to form a coating film. Next, the glass substrate provided with the coating film was vacuum-dried under conditions of a temperature of 50°C and a pressure of 13 Pa to remove the solvent in the coating film.

After removal of the solvent, the glass substrate provided with the coating film was put into an inert oven through which nitrogen was flowing at a flow rate of 3 L/min. In an inert oven, after making it stand still on 80 degreeC temperature conditions for 0.5 hour in a nitrogen atmosphere, it was made to stand still on 300 degreeC temperature conditions for 0.5 hour, and also 435 degreeC temperature conditions (final heating temperature) for 10 The coating film was cured by heating for a minute, and polyimide coated glass coated with a thin film made of polyimide (polyimide film) was obtained.

The obtained polyimide coated glass was immersed in hot water at 90°C, and the polyimide film was peeled from the glass substrate to obtain a polyimide film (a film having a size of 100 mm in length, 100 mm in width, and 13 µm in thickness).

<Yellowness (YI), light transmittance>

The values of light transmittance (unit: %) and yellowness (YI) of the polyimide films of each Example and Comparative Example were measured using a trade name "Haze Meter NDH-5000" manufactured by Nippon Denshoku Industries Co., Ltd. as a measuring device. , obtained by performing measurements based on JIS K7361-1 (issued in 1997). The light transmittance is a value at a light wavelength of 380 nm to 780 nm.

About yellowness, the evaluation result was judged according to the following criteria.

○: YI value is less than 5.0.

x: YI value is 5.0 or more.

＜Coefficient of Thermal Expansion (CTE)＞

From the polyimide films of each Example and Comparative Example, a film for measurement having a length of 20 mm and a width of 5 mm was formed.

Next, using a thermomechanical analyzer (trade name “TMA-60” manufactured by Shimadzu Corporation) as a measuring device, the obtained film for measurement was heated from 30° C. to 200° C. under conditions of a heating rate of 10° C./min in a nitrogen atmosphere. After the temperature was raised to 30 ° C., the temperature was raised to 30 ° C., and the change in length of the sample at 100 ° C. to 400 ° C. was measured when the temperature was raised from 30 ° C. to 500 ° C. It measured by finding the average value of the change in length per 1 degreeC in degreeC - 400 degreeC. In addition, the tensile mode was 49 mN.

<Breaking Elongation>

For the polyimide films of each Example and Comparative Example, an SD type lever-type sample cutter (Cutter (model SDL-200) manufactured by Dumbbell Co., Ltd.), trade name "Super Dumbbell Cutter (Type: SDMK-1000-)" manufactured by Dumbbell Co., Ltd. D, conforming to the A22 standard of JIS K7139 (issued in 2009)”, the size of the polyimide film is: overall length: 75 mm, distance between tabs: 57 mm, length of parallel part: 30 mm, radius of shoulder part : 30 mm, width of end: 10 mm, width of central parallel part: 5 mm, thickness: 13 μm, dumbbell-shaped test piece (JIS K7139 type A22 (scale test piece) except that the thickness is 13 μm) A test piece conforming to the standard of) was prepared as a measurement sample.

Then, using a tensilon universal testing machine (model number "UCT-10T" manufactured by A&D Co., Ltd.), the measurement sample was measured with a grip section width of 57 mm and a grip section width of 10 mm (full width of the end portion). ), and then subjected to a tensile test in which the measurement sample was tensioned under the conditions of a load full scale: 0.05 kN and a test speed: 1 to 300 mm/min, and the value of elongation at break was determined.

The above test is a test based on JIS K7162 (issued in 1994).

In addition, the value of elongation at break (%) is the length of the parallel portion of the test piece (= length of the parallel portion: 30 mm) taken as L0, and the length of the parallel portion of the test piece until fracture (the length of the parallel portion of the test piece when it breaks) : 30 mm + α) as L, the following formula:

[Elongation at break (%)] = {(L - L0)/L0} x 100

was obtained by calculating

Regarding the elongation at break, the evaluation results were judged according to the following criteria.

(double-circle): Elongation at break is 12.5% or more.

○: The elongation at break is 10.0% or more and less than 12.5%.

x: Elongation at break is less than 10.0%.

According to Table 1, tetracarboxylic dianhydride (A) composed of alicyclic tetracarboxylic dianhydride (A1-1) and alicyclic tetracarboxylic dianhydride (A1-2), and an aromatic diamine compound ( As the polymer of A2), the ratio of the mass of alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less of a polyamic acid ( It was found that the use of the varnish composition of Example containing A) made it possible to form a polyimide resin having both low coloration and excellent mechanical properties.

On the other hand, according to the comparative example, it is prepared using only alicyclic tetracarboxylic dianhydride (A1-1) as a polyamic acid (A), or alicyclic tetracarb with respect to the number of moles of tetracarboxylic dianhydride (A1). When a varnish composition containing a polyamic acid (A) in which the mass ratio of boxylic dianhydride (A1-2) is more than 6 mol% is used, it is difficult to achieve both low coloring and excellent mechanical properties. can

Claims (7)

A polyamic acid (A) and a solvent (S) are included,
The polyamic acid (A) is a polymer of tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2),
The tetracarboxylic dianhydride (A1) has the following formula (a2):

(In formula (a2), R ^a11 , R ^a12 , and R ^a13 are each independently one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more It is an integer less than or equal to 12.)
Only the alicyclic tetracarboxylic dianhydride (A1-1) which is a compound represented by and other alicyclic tetracarboxylic dianhydride (A1-2) other than the alicyclic tetracarboxylic dianhydride (A1-1) done,
The varnish composition in which the ratio of the mass of the other alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of the tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less. According to claim 1,
Said other alicyclic tetracarboxylic dianhydride (A1-2) is the following formula (a2-1) or the following formula (a2-2):

(In formula (a2-1), R ^a21 , R ^a22 , R ^a23 , and R ^a24 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or an alky group having 2 to 5 carbon atoms) yl group, and R ^a21 or R ^a22 and R ^a23 or R ^a24 may be bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, or an ethene-1,2-diyl group. ,
In formula (a2-2), R ^a25 , R ^a26 , R ^a27 , R ^a28 , R ^a29 , R ^a30 , R ^a31 , and R ^a32 are each independently a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. , or an alkenyl group having 2 or more and 5 or less carbon atoms, and R ^a25 , or R ^a26 , R ^a27 , or R ^a28 are bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, ethene -1,2-diyl group may be formed, and R ^a29 or R ^a30 and R ^a31 or R ^a32 are bonded to each other to form a methylene group, an ethylene group, a propane-2,2-diyl group, or an ethene-1 , You may form a 2-diyl group.)
A varnish composition, which is a compound represented by According to claim 1 or 2,
The aromatic diamine compound (A2) is represented by the following formulas (21) to (24):

(In formulas (21) to (24), R ¹¹¹ is selected from the group consisting of a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group having 1 to 4 carbon atoms, and a halogenated alkyl group having 1 to 4 carbon atoms. represents 1 species,
In formula (24), Q is a 9,9'-fluorenylidene group, or formula: -C ₆ H ₄ -, -CONH-C ₆ H ₄ -NHCO-, -NHCO-C ₆ H ₄ -CONH- , -OC ₆ H ₄ -CO-C ₆ H ₄ -O-, -OCO-C ₆ H ₄ -COO-, -OCO-C ₆ H ₄ -C ₆ H ₄ -COO-, -OCO-, -O -, -S-, -CO-, -CONH-, -SO ₂ -, -C(CF ₃ ) ₂ -, -C(CH ₃ ) ₂ -, -CH ₂ -, -OC ₆ H ₄ -C( CH ₃ ) ₂ -C ₆ H ₄ -O-, -OC ₆ H ₄ -C(CF ₃ ) ₂ -C ₆ H ₄ -O-, -OC ₆ H ₄ -SO ₂ -C ₆ H ₄ -O- , -C(CH ₃ ) ₂ -C ₆ H ₄ -C(CH ₃ ) ₂ -, -OC ₁₀ H ₆ -O-, -OC ₆ H ₄ -C ₆ H ₄ -O-, and -OC ₆ H ₄ represents one selected from the group consisting of groups represented by -O-, -C ₆ H ₄ - is a phenylene group, and -C ₁₀ H ₆ - is a naphthalenediyl group.)
The varnish composition which is at least one kind selected from the compound represented by. According to claim 3,
The varnish composition in which the said aromatic diamine compound (A2) contains the compound represented by said Formula (24). According to claim 4,
The varnish composition wherein the aromatic diamine compound (A2) is a compound represented by the formula (24), wherein the Q is -CONH-. Polyamic acid (A) is produced by polymerizing tetracarboxylic dianhydride (A1) and an aromatic diamine compound (A2) in a solvent (S), or
After polymerizing tetracarboxylic dianhydride (A1) and the aromatic diamine compound (A2) to produce the polyamic acid (A), mixing the isolated polyamic acid (A) with the solvent (S) As a method for producing a varnish composition comprising,
The tetracarboxylic dianhydride (A1) has the following formula (a2):

(In formula (a2), R ^a11 , R ^a12 , and R ^a13 are each independently one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine atom, and a is 0 or more It is an integer less than or equal to 12.)
Only the alicyclic tetracarboxylic dianhydride (A1-1) which is a compound represented by and other alicyclic tetracarboxylic dianhydride (A1-2) other than the alicyclic tetracarboxylic dianhydride (A1-1) done,
The method for producing a varnish composition wherein the ratio of the mass of the other alicyclic tetracarboxylic dianhydride (A1-2) to the number of moles of the tetracarboxylic dianhydride (A1) is 0.1 mol% or more and 6 mol% or less. A molding step of molding the varnish composition according to any one of claims 1 to 3;
A method for producing a polyimide resin comprising an imidization step of heating the molded varnish composition to imidize it.