KR20220109471A - 광원용 제어 시스템 - Google Patents
광원용 제어 시스템 Download PDFInfo
- Publication number
- KR20220109471A KR20220109471A KR1020227024335A KR20227024335A KR20220109471A KR 20220109471 A KR20220109471 A KR 20220109471A KR 1020227024335 A KR1020227024335 A KR 1020227024335A KR 20227024335 A KR20227024335 A KR 20227024335A KR 20220109471 A KR20220109471 A KR 20220109471A
- Authority
- KR
- South Korea
- Prior art keywords
- period
- light
- time
- control system
- excitation signal
- Prior art date
Links
- 230000005284 excitation Effects 0.000 claims abstract description 147
- 238000000034 method Methods 0.000 claims description 140
- 230000006978 adaptation Effects 0.000 claims description 52
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 claims description 5
- 230000003044 adaptive effect Effects 0.000 claims description 5
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 claims description 5
- 230000004044 response Effects 0.000 claims description 4
- HGCGQDMQKGRJNO-UHFFFAOYSA-N xenon monochloride Chemical compound [Xe]Cl HGCGQDMQKGRJNO-UHFFFAOYSA-N 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 description 64
- 230000008569 process Effects 0.000 description 51
- 230000007246 mechanism Effects 0.000 description 33
- 239000007789 gas Substances 0.000 description 26
- 230000006870 function Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 238000000206 photolithography Methods 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 11
- 238000013459 approach Methods 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 9
- 230000009467 reduction Effects 0.000 description 9
- 239000012530 fluid Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 238000004891 communication Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000004590 computer program Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 241001518384 Ichthyococcus ovatus Species 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- -1 fluorine or chlorine Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000013442 quality metrics Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062984433P | 2020-03-03 | 2020-03-03 | |
| US62/984,433 | 2020-03-03 | ||
| PCT/US2021/016256 WO2021178091A1 (en) | 2020-03-03 | 2021-02-02 | Control system for a light source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20220109471A true KR20220109471A (ko) | 2022-08-04 |
| KR102707954B1 KR102707954B1 (ko) | 2024-09-19 |
Family
ID=75426663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227024335A KR102707954B1 (ko) | 2020-03-03 | 2021-02-02 | 광원용 제어 시스템 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7430799B2 (zh) |
| KR (1) | KR102707954B1 (zh) |
| CN (1) | CN115210970A (zh) |
| TW (1) | TWI804817B (zh) |
| WO (1) | WO2021178091A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024035528A1 (en) * | 2022-08-11 | 2024-02-15 | Cymer, Llc | Apparatus for and method of controlling cold start conditioning in a light source |
| WO2024134435A1 (en) * | 2022-12-21 | 2024-06-27 | Cymer, Llc | Cold start conditioning in a light source |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003511865A (ja) * | 1999-10-14 | 2003-03-25 | ランブダ フィジク アクチェンゲゼルシャフト | エキシマ又は分子フッ素レーザのエネルギー制御 |
| KR20110086020A (ko) * | 2008-10-21 | 2011-07-27 | 사이머 인코포레이티드 | 2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치 |
| JP2014078765A (ja) * | 2007-09-11 | 2014-05-01 | Cymer Inc | 紫外線レーザ光源パルスエネルギ制御システム |
| KR20170017883A (ko) * | 2014-06-09 | 2017-02-15 | 기가포톤 가부시키가이샤 | 레이저 시스템 |
| KR20190129997A (ko) * | 2017-04-24 | 2019-11-20 | 사이머 엘엘씨 | 반복률 기반의 이득 추정기를 이용하는 개선된 레이저 광 에너지 및 선량 제어 방법 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6211285A (ja) * | 1985-07-09 | 1987-01-20 | Toshiba Corp | レ−ザ装置 |
| US6727731B1 (en) * | 1999-03-12 | 2004-04-27 | Lambda Physik Ag | Energy control for an excimer or molecular fluorine laser |
| US7830934B2 (en) * | 2001-08-29 | 2010-11-09 | Cymer, Inc. | Multi-chamber gas discharge laser bandwidth control through discharge timing |
| US6993052B2 (en) * | 2002-05-22 | 2006-01-31 | Lambda Physik Ag | System and method for delay compensation for a pulsed laser |
| SG115575A1 (en) * | 2002-10-18 | 2005-10-28 | Asml Netherlands Bv | Lithographic projection apparatus comprising a secondary electron removal unit |
| JP5202315B2 (ja) | 2005-08-09 | 2013-06-05 | サイマー インコーポレイテッド | 放電タイミングによる多室ガス放電レーザの帯域幅制御 |
| WO2012176083A2 (en) * | 2011-06-20 | 2012-12-27 | Koninklijke Philips Electronics N.V. | Active cooling device with electro-statically moving electrode and method of active cooling with electro-statically moving electrode |
-
2021
- 2021-02-02 CN CN202180018978.9A patent/CN115210970A/zh active Pending
- 2021-02-02 KR KR1020227024335A patent/KR102707954B1/ko active IP Right Grant
- 2021-02-02 JP JP2022538190A patent/JP7430799B2/ja active Active
- 2021-02-02 WO PCT/US2021/016256 patent/WO2021178091A1/en active Application Filing
- 2021-02-20 TW TW110105900A patent/TWI804817B/zh active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003511865A (ja) * | 1999-10-14 | 2003-03-25 | ランブダ フィジク アクチェンゲゼルシャフト | エキシマ又は分子フッ素レーザのエネルギー制御 |
| JP2014078765A (ja) * | 2007-09-11 | 2014-05-01 | Cymer Inc | 紫外線レーザ光源パルスエネルギ制御システム |
| KR20110086020A (ko) * | 2008-10-21 | 2011-07-27 | 사이머 인코포레이티드 | 2 챔버 가스 방전 레이저의 레이저 제어 방법 및 장치 |
| KR20170017883A (ko) * | 2014-06-09 | 2017-02-15 | 기가포톤 가부시키가이샤 | 레이저 시스템 |
| KR20190129997A (ko) * | 2017-04-24 | 2019-11-20 | 사이머 엘엘씨 | 반복률 기반의 이득 추정기를 이용하는 개선된 레이저 광 에너지 및 선량 제어 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021178091A1 (en) | 2021-09-10 |
| TW202138933A (zh) | 2021-10-16 |
| CN115210970A (zh) | 2022-10-18 |
| JP2023515743A (ja) | 2023-04-14 |
| TWI804817B (zh) | 2023-06-11 |
| JP7430799B2 (ja) | 2024-02-13 |
| KR102707954B1 (ko) | 2024-09-19 |
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| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant |