KR20220084914A - Resin, resin composition and display device using the same - Google Patents

Abstract

In the resin composition according to an embodiment of the present invention, it is possible to adjust pattern flowability during thermosetting by using a polymer introduced with a flexible monomer, and by using this, it is possible to form a pattern shape suitable for use. The pattern formed in this way can provide a display panel having high luminous efficiency as well as reliable pixels while satisfying the minimum pattern size and the amount of outgas at an appropriate level.

Description

Resin, resin composition, and display device using the same {RESIN, RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME}

The present invention relates to a photosensitive resin composition and a display device capable of realizing a clearer image using the same.

A liquid crystal display device (LCD), an organic light emitting display device (OLED), etc. are widely used in flat panel displays. Among them, the organic light emitting display device in particular has advantages such as low power consumption, fast response speed, high color reproducibility, high luminance, and wide viewing angle.

In the case of the organic light emitting display device, a polarizing film is used to block the light reflected from the panel due to incident external light.

As a method for solving the above problem, a method of forming an inorganic film for blocking light on an upper substrate as well as a color filter and a black matrix has been proposed. However, the method has a limit in obtaining a desired level of anti-reflection effect, and does not specifically suggest a method for replacing the polarizing film.

Accordingly, the colored pattern is used as red, green, and blue color filters in the liquid crystal display device or as a pixel separator for separating pixels, and is used not only in liquid crystal displays but also in organic light emitting displays.

Carbon black and inorganic pigments as well as various types of organic pigments are used as a colorant in the composition for a coloring pattern, and a pigment dispersion in which these are dispersed is mixed with other compositions to form a pattern.

The coloring pattern is formed to distinguish the pixels through optical patterning in order to distinguish the pixels before depositing the common layer and the light emitting layer in the organic light emitting display.

At this time, the angle at which the formed pattern meets the substrate is called a taper angle. If the angle of the taper angle is high, a fault occurs between the layers deposited by the high taper angle after deposition of the common layer and the light emitting layer. Lighting may not be possible. Therefore, a pattern with a low taper angle is needed.

In addition, since the minimum pattern size of the conventional coloring pattern is not satisfactory and the amount of outgas is large, the lifespan of the display is reduced.

In order to solve the problems of the prior art, one embodiment of the present invention satisfies the minimum pattern size and the amount of outgas at an appropriate level, and adjusts the taper angle of the pixel discrimination layer pattern to be low even after deposition of the common layer and the light emitting layer. This is to provide a pixel with high reliability as well as luminous efficiency.

The present invention provides a resin comprising a repeating unit represented by the following formula (1).

Formula (1)

In addition, the present invention is (A) a resin comprising a repeating unit represented by the formula (1);

(B) reactive unsaturated compounds; and

(C) a photoinitiator; It provides a photosensitive resin composition comprising a.

The photosensitive resin composition preferably further comprises an alkali-soluble resin including a repeating unit represented by the following formula (2).

Formula (2)

Moreover, it is preferable that the said (B) reactive unsaturated compound contains the compound represented by following formula (3).

Formula (3)

In addition, the (C) photoinitiator preferably includes a compound represented by the following formula (4).

Formula (4)

In addition, the photosensitive resin composition may further include a colorant, and the colorant preferably includes at least one of an inorganic dye, an organic dye, an inorganic pigment, and an organic pigment.

In addition, as an embodiment of the present invention, there is provided a pattern or film formed of the photosensitive resin composition according to the present invention.

In addition, the display device according to the present invention includes a first electrode formed on a substrate, a pixel separator formed on the first electrode to partially expose the first electrode, and a second electrode provided to face the first electrode. As a display device including, it is preferable that the pixel separation unit is formed of the photosensitive resin composition.

In addition, the electronic device according to the present invention preferably includes the display device according to the present invention and a control unit for driving the display device.

In the resin composition according to an embodiment of the present invention, it is possible to adjust pattern flowability during thermosetting by using a polymer introduced with a flexible monomer, and by using this, it is possible to form a pattern shape suitable for use. The pattern formed in this way can provide a display panel having high luminous efficiency as well as reliable pixels while satisfying the minimum pattern size and the amount of outgas at an appropriate level.

1 schematically illustrates a display device according to an exemplary embodiment of the present invention.
2 is a diagram illustrating a measurement of a taper angle of a pixel separation unit formed according to an exemplary embodiment of the present invention.

Hereinafter, some embodiments of the present invention will be described in detail with reference to exemplary drawings. In adding reference numerals to components of each drawing, the same components may have the same reference numerals as much as possible even though they are indicated in different drawings.

In describing the present invention, if it is determined that a detailed description of a related known configuration or function may obscure the gist of the present invention, the detailed description may be omitted. When "includes", "having", "consisting of", etc. mentioned in this specification are used, other parts may be added unless "only" is used. When a component is expressed in the singular, it may include a case in which the plural is included unless otherwise explicitly stated.

In addition, in describing the components of the present invention, terms such as first, second, A, B, (a), (b), etc. may be used. These terms are only for distinguishing the elements from other elements, and the essence, order, order, or number of the elements are not limited by the terms.

In the description of the positional relationship of the components, when it is described that two or more components are "connected", "coupled" or "connected", two or more components are directly "connected", "coupled" or "connected" ", but it will be understood that two or more components and other components may be further "interposed" and "connected," "coupled," or "connected." Here, other components may be included in one or more of two or more components that are “connected”, “coupled” or “connected” to each other.

Further, when a component, such as a layer, membrane, region, plate, etc., is said to be “on” or “on” another component, this means not only when it is “directly above” another component, but also when another component is in between. It should be understood that cases may be included. Conversely, when it is said that an element is "on top of" another part, it should be understood to mean that there is no other part in the middle.

In the description of the temporal flow relationship related to the components, the operation method or the production method, for example, the temporal precedence relationship such as "after", "after", "after", "before", etc. Alternatively, when a flow precedence relationship is described, it may include a case where it is not continuous unless "immediately" or "directly" is used.

On the other hand, if numerical values or corresponding information for components are mentioned, even if there is no separate explicit description, the numerical values or corresponding information may be caused by various factors (eg process factors, internal or external shock, noise, etc.) It may be interpreted as including a possible error range.

Terms used in this specification and the appended claims are as follows, unless otherwise stated, without departing from the spirit of the present invention.

As used herein, the term "halo" or "halogen" includes fluorine (F), chlorine (Cl), bromine (Br), and iodine (I), unless otherwise specified.

The term "alkyl" or "alkyl group" as used in this application, unless otherwise specified, has 1 to 60 carbons linked by a single bond, straight chain alkyl group, branched chain alkyl group, cycloalkyl (alicyclic) group, alkyl-substituted means a radical of saturated aliphatic functional groups including cycloalkyl groups and cycloalkyl-substituted alkyl groups.

As used herein, the term “haloalkyl group” or “halogenalkyl group” refers to an alkyl group substituted with halogen unless otherwise specified.

The term "alkenyl" or "alkynyl" as used in this application, unless otherwise specified, has a double bond or a triple bond, respectively, includes a straight or branched chain group, and has 2 to 60 carbon atoms, but is limited thereto it is not going to be

As used herein, the term "cycloalkyl" refers to an alkyl forming a ring having 3 to 60 carbon atoms, unless otherwise specified, and is not limited thereto.

As used herein, the term “alkoxy group” or “alkyloxy group” refers to an alkyl group to which an oxygen radical is bonded, and has 1 to 60 carbon atoms unless otherwise specified, but is not limited thereto.

As used herein, the terms "alkenoxyl group", "alkenoxy group", "alkenyloxyl group", or "alkenyloxy group" refer to an alkenyl group to which an oxygen radical is attached, and unless otherwise specified, 2 to 60 has a carbon number of, but is not limited thereto.

The terms "aryl group" and "arylene group" used in the present application have 6 to 60 carbon atoms, respectively, unless otherwise specified, but are not limited thereto. In the present application, the aryl group or the arylene group includes a single ring type, a ring aggregate, a fused multiple ring-based compound, and the like. For example, the aryl group may include a phenyl group, a monovalent functional group of biphenyl, a monovalent functional group of naphthalene, a fluorenyl group, and a substituted fluorenyl group, and the arylene group may include a fluorenylene group, a substituted fluorenylene group. may include a group.

As used herein, the term "ring assemblies" refers to two or more ring systems (single or fused ring systems) directly connected to each other through a single bond or a double bond, and between such rings It means that the number of direct links is one less than the total number of ring systems in the compound. In a ring aggregate, the same or different ring systems may be directly linked to each other through single or double bonds.

Since the aryl group in the present application includes a ring aggregate, the aryl group includes biphenyl and terphenyl in which a single aromatic benzene ring is connected by a single bond. In addition, since the aryl group includes compounds in which an aromatic single ring and a fused aromatic ring system are connected by a single bond, for example, a compound in which a benzene ring, which is an aromatic single ring, and a fluorene, a fused aromatic ring system, are connected by a single bond are also included. do.

As used herein, the term "fused multiple ring system" refers to a fused ring type that shares at least two atoms, and includes a fused ring system of two or more hydrocarbons and at least one heteroatom. and a form in which at least one heterocyclic system is fused. The fused multiple ring system may be an aromatic ring, a heteroaromatic ring, an aliphatic ring, or a combination of these rings. For example, in the case of an aryl group, it may be a naphthalenyl group, a phenanthrenyl group, a fluorenyl group, etc., but is not limited thereto.

The term "spiro compound" as used in the present application has a 'spiro union', and the spiro linkage means a connection formed by sharing only one atom in two rings. At this time, the atoms shared by the two rings are called 'spiro atoms', and they are respectively 'monospiro-', 'dispiro-', 'trispiro-', depending on the number of spiro atoms in a compound. ' It's called a compound.

As used herein, the terms "fluorenyl group", "fluorenylene group", and "fluorentriyl group" are, unless otherwise specified, in the following structures, R, R', R" and R'" are all hydrogen. It refers to a monovalent, divalent or trivalent functional group, and “substituted fluorenyl group”, “substituted fluorenylene group” or “substituted fluorentriyl group” is a substituent R, R', R", R' "means that at least one of " is a substituent other than hydrogen, and includes cases in which R and R' are bonded to each other to form a spiro compound together with the carbon to which they are bonded. In the present specification, the fluorenyl group, the fluorenylene group, and the fluorentriyl group may all be referred to as fluorene groups regardless of valences such as monovalent, divalent, trivalent, and the like.

In addition, the R, R', R" and R'" are each independently an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, 2 to It may be a heterocyclic group having 30 carbon atoms, for example, the aryl group may be phenyl, biphenyl, naphthalene, anthracene or phenanthrene, and the heterocyclic group may be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuran, quinazoline or quinoxaline. For example, the substituted fluorenyl group and the fluorenylene group are monovalent to 9,9-dimethylfluorene, 9,9-diphenylfluorene and 9,9'-spirobi[9H-fluorene], respectively. It may be a functional group or a divalent functional group.

The term "heterocyclic group" used in this application includes not only aromatic rings such as "heteroaryl group" or "heteroarylene group" but also non-aromatic rings, and unless otherwise specified, each carbon number including at least one heteroatom It means a ring of 2 to 60, but is not limited thereto. As used herein, the term "heteroatom" refers to N, O, S, P or Si unless otherwise specified, and the heterocyclic group is a monocyclic group including a heteroatom, a ring aggregate, a fused multiple ring system, a spy means a compound or the like.

For example, the “heterocyclic group” may include a compound including a heteroatom group such as SO ₂ , P=O, etc., such as the following compounds instead of carbon forming a ring.

As used herein, the term "ring" includes monocyclic and polycyclic rings, and includes hydrocarbon rings as well as heterocycles including at least one heteroatom, and includes aromatic and non-aromatic rings.

As used herein, the term "polycyclic" includes ring assemblies such as biphenyl, terphenyl, etc., fused multiple ring systems and spiro compounds, and includes aromatic as well as non-aromatic, hydrocarbon Rings include, of course, heterocycles containing at least one heteroatom.

The term "aliphatic ring group" used in the present application refers to a cyclic hydrocarbon other than an aromatic hydrocarbon, and includes a monocyclic type, a ring aggregate, a fused multiple ring system, a spiro compound, etc., and unless otherwise specified, the number of carbon atoms It means a ring of 3 to 60, but is not limited thereto. For example, even when benzene, which is an aromatic ring, and cyclohexane, which is a non-aromatic ring, are fused, it corresponds to an aliphatic ring.

Also, when prefixes are named consecutively, it is meant that the substituents are listed in the order listed first. For example, an arylalkoxy group means an alkoxy group substituted with an aryl group, an alkoxycarbonyl group means a carbonyl group substituted with an alkoxy group, and an arylcarbonylalkenyl group means an alkenyl group substituted with an arylcarbonyl group, where The arylcarbonyl group is a carbonyl group substituted with an aryl group.

In addition, unless there is an explicit explanation, the term "substituted" in the term "substituted or unsubstituted" used in this application means deuterium, halogen, amino group, nitrile group, nitro group, C ₁ ~ C ₃₀ alkyl group, C ₁ ~ C ₃₀ Alkoxy group, C ₁ ~ C ₃₀ Alkylamine group, C ₁ ~ C ₃₀ Alkylthiophene group, C ₆ ~ C ₃₀ Arylthiophene group, C ₂ ~ C ₃₀ Alkenyl group, C ₂ ~ C ₃₀ alkynyl group, C ₃ ~ C ₃₀ cycloalkyl group, C ₆ ~ C ₃₀ aryl group, C ₆ ~ C ₃₀ aryl group substituted with deuterium, C ₈ ~ C ₃₀ arylalkenyl group, silane group, boron A group, a germanium group, and O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C ₂ ~ C ₂₀ It means substituted with one or more substituents selected from the group consisting of a heterocyclic group and is not limited to these substituents.

In the present application, the 'functional group name' corresponding to the aryl group, arylene group, heterocyclic group, etc. exemplified as examples of each symbol and its substituents may be described as 'the name of the functional group reflecting the valence', but it is described as 'the name of the parent compound' You may. For example, in the case of 'phenanthrene', which is a type of aryl group, the monovalent 'group' is 'phenanthryl (group)', and the divalent group is 'phenanthrylene (group)', etc. It can be described, but it can also be described as 'phenanthrene', which is the name of the parent compound, regardless of the valence.

Similarly, in the case of pyrimidine, regardless of the valence, it is described as 'pyrimidine', or if it is monovalent, it is pyrimidinyl (group), and if it is divalent, the 'group of the valence, such as pyrimidinylene (group), etc. It can also be written in the name of '. Therefore, in the present application, when the type of the substituent is described as the name of the parent compound, it may mean an n-valent 'group' formed by the detachment of a hydrogen atom bonding to a carbon atom and/or a hetero atom of the parent compound.

In addition, in the present specification, in describing the compound name or the substituent name, numbers or alphabets indicating positions may be omitted. For example, pyrido[4,3-d]pyrimidine to pyridopyrimidine, benzofuro[2,3-d]pyrimidine to benzofuropyrimidine, 9,9-dimethyl-9H-flu Orene can be described as dimethylfluorene and the like. Therefore, both benzo[g]quinoxaline and benzo[f]quinoxaline can be described as benzoquinoxaline.

In addition, unless there is an explicit explanation, the formula used in the present application is the same as the definition of the substituent by the exponent definition of the following formula.

Here, when a is an integer of 0, the substituent R ¹ means that it does not exist, that is, when a is 0, it means that all hydrogens are bonded to the carbons forming the benzene ring, and in this case, the display of hydrogen bonded to carbon It can be omitted and the chemical formula or compound can be described. In addition, when a is an integer of 1, one substituent R ¹ is bonded to any one carbon of the carbons forming the benzene ring, and when a is an integer of 2 or 3, it may be bonded as follows, for example, a is 4 to 6 Even if it is an integer of , it is bonded to the carbon of the benzene ring in a similar manner, and when a is an integer of 2 or more, R ¹ may be the same as or different from each other.

Unless otherwise specified in the present application, forming a ring means that adjacent groups combine with each other to form a single ring or fused multiple rings, and the single ring and the formed fused multiple rings are at least one hydrocarbon ring as well as a hydrocarbon ring. It includes heterocycles containing heteroatoms, and may include aromatic and non-aromatic rings.

In addition, unless otherwise specified in the present specification, when representing a condensed ring, the number in 'number-condensed ring' indicates the number of rings to be condensed. For example, a form in which three rings are condensed with each other, such as anthracene, phenanthrene, benzoquinazoline, etc., may be expressed as a 3-condensed ring.

Meanwhile, the term "bridged bicyclic compound" as used in the present application refers to a compound in which two rings share three or more atoms to form a ring, unless otherwise specified. In this case, the shared atom may include carbon or a hetero atom.

In the present application, the organic electric device may mean a component(s) between the anode and the cathode, or may refer to an organic light emitting diode including the anode and the cathode, and the component(s) positioned therebetween.

In addition, in some cases, a display device in the present application may mean an organic electric device, an organic light emitting diode, and a panel including the same, or an electronic device including a panel and a circuit. Here, for example, the electronic device includes a lighting device, a solar cell, a portable or mobile terminal (eg, a smart phone, tablet, PDA, electronic dictionary, PMP, etc.), a navigation terminal, a game machine, various TVs, various computer monitors, etc. All may be included, but not limited thereto, and may be any type of device as long as the component(s) are included.

Hereinafter, embodiments of the present invention will be described in detail. However, this is provided as an example, and the present invention is not limited thereto, and the present invention is only defined by the scope of the claims to be described later. Hereinafter, each component will be described in detail.

(1) Alkali-soluble resin

The photosensitive resin composition according to an embodiment of the present invention includes a resin including a repeating unit having a structure as shown in Formula (1) below.

Formula (1)

In the above formula (1),

1) * represents a part where the bond is connected as a repeating unit,

2) R ¹ and R ² are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

3) R ¹ and R ² are each capable of forming a ring with an adjacent group,

4) a and b are each independently an integer from 0 to 4,

5) X ¹ is a single bond, O, CO, SO ₂ , CR'R", SiR'R", Formula (A) or Formula (B).

Specific examples of the above-mentioned formulas (A) and (B) are as follows.

Formula (A)

Formula (B)

In the above formulas (A) and (B),

5-1) * indicates a binding position,

5-2) X ₃ is O, S, SO ₂ or NR',

5-3) R' is hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

5-4) R ³ to R ⁶ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

5-5) R ³ to R ⁶ are each capable of forming a ring with an adjacent group,

5-6) c~f are integers from 0 to 4 independently of each other.

6) X ² is the formula (G),

Specific examples of the above-mentioned formula (G) are as follows.

Formula (G)

6-1) * represents a binding position,

6-2) X ³ and X ⁴ are each independently O or S,

6-3) R ¹⁶ is a fluorenylene group, C ₁ to C ₃₀ alkylene; C ₃ ~ C ₃₀ Cycloalkylene; C ₆ ~ C ₃₀ Arylene; C ₂ ~ C ₃₀ A heterocyclic ring; or C ₁ to C ₃₀ alkoxyylene.

7) R' and R" are each independently hydrogen; deuterium; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom of C ₂ ~ C ₃₀ Heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; Fluorenyl group; Carbonyl group; Ether group; Or C ₁ ~ C ₂₀ Alkoxycarbonyl group,

8) R′ and R″ may each form a ring with an adjacent group.

Examples in which R' and R" combine with each other to form a ring are as follows.

9) A ¹ and A ² are each independently a formula (C) or a formula (D).

Specific examples of the above-mentioned formulas (C) and (D) are as follows.

Formula (C)

Formula (D)

In the above formulas (C) and (D),

9-1) * indicates a binding position,

9-2) R ⁷ to R ¹⁰ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

9-3) Y ¹ and Y ² are each independently Formula (E) or Formula (F).

Specific examples of the above-mentioned formulas (E) and (F) are as follows.

Formula (E)

Formula (F)

In the above formulas (E) and (F),

9-3-1) * indicates a binding position,

9-3-2) R ¹¹ to R ¹⁵ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

9-3-3) L ¹ ~ L ³ are each independently a single bond, a fluorenylene group, C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene, or C ₂ ~ C ₃₀ heterocycle, ,

9-3-4) g and h are each independently an integer of 0 to 3; However, g+h=3.

10) The ratio of Formula (C) to Formula (D) in the polymer chain of the resin including the repeating unit represented by Formula (1) satisfies 1:9 to 9:1,

11) t is an integer from 1 to 200,000.

12) The R ¹ to R ¹⁶ , R′, R″, X ¹ to X ² and L ¹ to L ³ and the rings formed by bonding adjacent groups are each deuterium; halogen; C ₁ to C ₃₀ alkyl group Or C ₆ ~ C ₃₀ A silane group unsubstituted or substituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C ₁ ~ C ₃₀ alkylthio group; C ₁ ~ C ₃₀ Alkoxy group; C ₆ ~ C ₃₀ Arylalkoxy group; C ₁ ~ C ₃₀ Alkyl group; C ₂ ~ C ₃₀ Alkenyl group; C ₂ ~ C ₃₀ Alkynyl group; C ₆ ~ C ₃₀ Aryl group; Deuterium Substituted C ₆ ~ C ₃₀ Aryl group; Fluorenyl group; C ₂ ~ C ₃₀ Heterocyclic group comprising at least one heteroatom selected from the group consisting of O, N, S, Si and P; C ₃ ~ may be further substituted with one or more substituents selected from the group consisting of C ₃₀ aliphatic ring group; C ₇ ~ C ₃₀ arylalkyl group; C ₈ ~ C ₃₀ arylalkenyl group; and combinations thereof. can be formed

When R ¹ to R ¹⁵ , R′, R″ and X ¹ to X ² are an aryl group, preferably a C ₆ to C ₃₀ aryl group, more preferably a C ₆ to C ₁₈ aryl group, such as phenyl , biphenyl, naphthyl, terphenyl, and the like.

Wherein R ¹ ~R ¹⁵ , R', R", X ¹ ~X ² , R ¹⁶ and L ¹ ~ L ³ When a heterocyclic group, Preferably a C ₂ ~ C ₃₀ heterocyclic group, more preferably a C ₂ ~ C ₁₈ heterocyclic group, such as dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, etc. .

Wherein R ¹ to R ¹⁵ , R′, R″ and X ¹ to X ² are fluorenyl groups, preferably 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-flu orenyl group, 9,9'-spirobifluorene, and the like.

When R ¹⁶ and L ¹ to L ³ are an arylene group, preferably a C ₆ to C ₃₀ arylene group, more preferably a C ₆ to C ₁₈ arylene group, such as phenyl, biphenyl, naphthyl, ter phenyl and the like.

When the R ¹ to R ¹⁵ , R′ and R″ are an alkyl group, it may be preferably a C ₁ to C ₁₀ alkyl group, for example, methyl, t-butyl, or the like.

When R ¹ to R ¹⁵ , R′ and R″ are alkoxyl groups, preferably a C ₁ to C ₂₀ alkoxyl group, more preferably a C ₁ to C ₁₀ alkoxyl group, such as methoxy, t-part Toxic, etc. may be used.

The R ¹ to R ¹⁵ , R′, R″, X ¹ to X ² and L ¹ A ring formed by bonding to each other is a C ₆ to C ₆₀ aromatic ring group; fluorenyl group; O, N, A C ₂ ~ C ₆₀ heterocyclic group comprising at least one heteroatom of S, Si and P; or a C ₃ ~ C ₆₀ aliphatic ring group, for example, adjacent groups are bonded to each other to form an aromatic ring In this case, preferably a C ₆ ~ C ₂₀ aromatic ring, more preferably a C ₆ ~ C ₁₄ aromatic ring, such as benzene, naphthalene, phenanthrene, etc. may be formed.

The ratio of Formula (E) to Formula (F) in the polymer chain of the resin including the repeating unit represented by Formula (1) is preferably 2:0 to 1:1, most preferably 1.5:0.5 to be. When the ratio of the formula (F) is higher than the ratio of the formula (E), a residue may be generated due to the too high adhesion, the amount of outgas generated may also be significantly increased, and the ratio of the formula (E) to the formula (F) is 1.5 When it is :0.5, the resolution of the pattern is the best and the amount of outgas can be satisfied.

The repeating unit of Formula (1) is preferably included in an amount of 30% or less of the total number of repeating units of the alkali-soluble resin. When the repeating unit of Formula (1) is included in the alkali-soluble resin in the same proportion as above, it has a suitable degree of curing and fluidity in a post-baking process, and a taper angle suitable for an organic light emitting device can be formed.

Among the total repeating units of the alkali-soluble resin, the repeating unit excluding the repeating unit of the formula (1) preferably includes the repeating unit of the following formula (2).

Formula (2)

In the above formula (2),

1) * represents a part where the bond is connected as a repeating unit,

2) R ²¹ and R ²² are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

3) R ²¹ and R ²² are each capable of forming a ring with an adjacent group,

4) i and j are each independently an integer from 0 to 4,

5) X ²¹ is a single bond, O, CO, SO ₂ , CR'R", SiR'R", formula (H) or formula (I), more preferably formula (H).

Specific examples of the above-mentioned formulas (H) and (I) are as follows.

Formula (H)

Formula (I)

In the above formulas (H) and (I),

5-1) * indicates a binding position,

5-2) X ²³ is O, S, SO ₂ or NR';

5-3) R' is hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

5-4) R ²³ to R ²⁶ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

5-5) R ²³ to R ²⁶ can form a ring with an adjacent group,

5-6) k~n are integers from 0 to 4 independently of each other.

6) X ²² is a C ₆ ~ C ₃₀ aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; or a combination thereof.

7) R' and R" are each independently hydrogen; deuterium; halogen; C ₆ -C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom of C ₂ -C ₃₀ Heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; Fluorenyl group; Carbonyl group; Ether group; Or C ₁ ~ C ₂₀ Alkoxycarbonyl group,

8) R′ and R″ may each form a ring with an adjacent group.

Examples in which R' and R" combine with each other to form a ring are as follows.

9) A ²¹ and A ²² are each independently Formula (J) or Formula (K).

Specific examples of the above-mentioned formulas (J) and (K) are as follows.

Formula (J)

Formula (K)

In the above formulas (J) and (K),

9-1) * indicates a binding position,

9-2) R ²⁷ to R ³⁰ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

9-3) Y ²¹ and Y ²² are each independently Formula (L) or Formula (M).

Specific examples of the above-mentioned formulas (L) and (M) are as follows.

Formula (L)

Formula (M)

In the above formulas (L) and (M),

9-3-1) * indicates a binding position,

9-3-2) R ³¹ to R ³⁵ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

9-3-3) L ⁴ ~ L ⁶ are each independently a single bond, a fluorenylene group, C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene, or C ₂ ~ C ₃₀ heterocycle, ,

9-3-4) o and p are each independently an integer of 0 to 3; However, o+p=3.

10) The ratio of Formula (J) to Formula (K) in the polymer chain of the resin including the repeating unit represented by Formula (2) satisfies 1:9 to 9:1,

11) n is an integer from 1 to 200,000.

12) R ²¹ to R ³⁵ , R′, R″, X ²¹ to X ²² and L ⁴ to L ⁶ and a ring formed by bonding adjacent groups to each other are deuterium; halogen; C ₁ to C ₃₀ alkyl group Or C ₆ ~ C ₃₀ A silane group unsubstituted or substituted with an aryl group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C ₁ ~ C ₃₀ alkylthio group; C ₁ ~ C ₃₀ Alkoxy group; C ₆ ~ C ₃₀ Arylalkoxy group; C ₁ ~ C ₃₀ Alkyl group; C ₂ ~ C ₃₀ Alkenyl group; C ₂ ~ C ₃₀ Alkynyl group; C ₆ ~ C ₃₀ Aryl group; Deuterium Substituted C ₆ ~ C ₃₀ Aryl group; Fluorenyl group; C ₂ ~ C ₃₀ Heterocyclic group comprising at least one heteroatom selected from the group consisting of O, N, S, Si and P; C ₃ ~ may be further substituted with one or more substituents selected from the group consisting of C ₃₀ aliphatic ring group; C ₇ ~ C ₃₀ arylalkyl group; C ₈ ~ C ₃₀ arylalkenyl group; and combinations thereof. can be formed

The ratio of formula (L) to formula (M) in the polymer chain of the resin including the repeating unit represented by formula (2) is preferably 2:0 to 1:1, most preferably 1.5:0.5 . When the ratio of the formula (M) is higher than the ratio of the formula (L), a residue may be generated due to the too high adhesion, the amount of outgas generated may also be significantly increased, and the ratio of the formula (L) to the formula (M) When this is 1.5:0.5, the resolution of the pattern is the best and the amount of outgas can be satisfied.

The ratio of the repeating unit represented by the formula (1) to the repeating unit represented by the formula (2) in the alkali-soluble resin comprising the repeating unit represented by the formula (1) and the repeating unit represented by the formula (2) is 4: It is preferably 6 to 1:9, and more preferably, the ratio of the repeating unit represented by the formula (1) to the repeating unit represented by the formula (2) is 3:7.

In the case of an alkali-soluble resin in which the ratio of the repeating unit represented by Formula (1) to the repeating unit represented by Formula (2) is 3:7, appropriate development in the developing step during the pixel separation unit formation process of the organic light emitting device It is possible to minimize the generation of residues due to its properties, and it is possible to form a 20 to 30 degree taper angle suitable for the pixel defining layer of the organic light emitting diode by exhibiting appropriate fluidity in the post-baking step.

Alkali-soluble resin containing the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) in the same ratio or the ratio of the repeating unit of Formula (2) is lower than the ratio of the repeating unit of Formula (1) In the case of alkali-soluble resin, there is a problem that residues are generated and the resolution is lowered due to low developability, and since the fluidity is very high in the post-baking stage, when used as a pixel separation part of an organic light emitting device, the taper angle is formed too low, so that the pixel It is difficult to clearly separate the pixels, and the pixel separation portion is formed too thickly, or a fault between the organic material layer and the electrode may be caused, which is not preferable.

The alkali-soluble resin of the present invention may have a weight average molecular weight of 1,000 to 100,000 g/mol, preferably 1,000 to 50,000 g/mol, and more preferably 1,000 to 30,000 g/mol. When the weight average molecular weight of the alkali-soluble resin is within the above range, a pattern can be formed without a residue when the pattern layer is manufactured, there is no loss of film thickness during development, and a good pattern can be obtained.

The resin may be included in an amount of 1 to 40 wt%, more preferably 3 to 20 wt%, based on the total amount of the photosensitive resin composition. When the resin is included within the above range, excellent sensitivity, developability, and adhesion (adhesion) can be obtained.

The photosensitive resin composition may further include an acrylic resin in addition to the resin. The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units. The acrylic resin may be a copolymer of ethylenically unsaturated monomers including 2 to 10 types of acrylates and methacrylates, and may have a weight average molecular weight of 5,000 to 30,000 g/mol.

(2) reactive unsaturated compounds

The photosensitive resin composition according to an embodiment of the present invention includes a reactive unsaturated compound having a structure as shown in Formula (3) below.

Formula (3)

In Chemical Formula (3), at least two of Z ₁ to Z ₄ each independently have a structure of the following Chemical Formula (O); The remaining Z ₁ to Z ₄ are each independently hydrogen, deuterium, halogen, a methyl group, an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C ₁ ~ C ₂₀ alkoxycarbonyl group.

Specific examples of the above-mentioned formula (O) are as follows.

Formula (O)

In the above formula (O),

1) q is an integer from 1 to 20,

2) L ⁷ is a single bond, C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene or C ₂ ~ C ₃₀ heterocycle,

3) Y ³ is the following formula (P) or formula (Q).

Specific examples of the above-mentioned formula (P) or formula (Q) are as follows.

Formula (P)

Formula (Q)

In Formula (P), R ₄₁ is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C ₁ ~ C ₂₀ alkoxycarbonyl group.

The multi-acrylic compound having the same structure as Formula (3) may be used alone or in combination of two or more. Examples thereof include polyfunctional esters of (meth)acrylic acid having at least two ethylenically unsaturated double bonds.

In the present specification, "(meth)acrylic acid" may refer to methacrylic acid, acrylic acid, or a mixture of methacrylic acid and acrylic acid.

Since the reactive unsaturated compound has the ethylenically unsaturated double bond, sufficient polymerization occurs during exposure to light in the pattern forming process to form a pattern having excellent heat resistance, light resistance and chemical resistance.

Specific examples of the reactive unsaturated compound include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, and 1,6-hexanediol. Diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A epoxy acrylate, ethylene glycol monomethyl ether acrylic It may be at least one selected from the group consisting of lactate and trimethylolpropane triacrylate, but is not limited thereto.

Examples of commercially available products of the reactive unsaturated compound are as follows.

Examples of the bifunctional ester of (meth)acrylic acid include Aronix M-210, M-240, M-6200 of Toagosei Chemical Co., Ltd., and KAYARAD HDDA, HX- of Nihon Kayaku Co., Ltd. 220, R-604, etc., and V-260, V-312, V-335 HP of Osaka Yuki Chemical High School Co., Ltd. are mentioned.

Examples of the trifunctional ester of (meth)acrylic acid, Toagosei Chemical Co., Ltd. Aronix M-309, M-400, M-405, M-450, M-7100, M-8030, M -8060, Nihon Kayaku Co., Ltd.'s KAYARAD TMPTA, DPCA-20, DPCA-60, DPCA-120, and Osaka Yuki Kayaku High School's V-295, V-300, V-360, etc. can

These products may be used alone or in combination of two or more.

The reactive unsaturated 　 compound may be used after treatment with an acid anhydride in order to provide better developability than 　. The reactive unsaturated compound may be included in an amount of 1 to 40% by weight, for example, 1 to 20% by weight, based on the total amount of the photosensitive resin composition. When the reactive unsaturated compound is included within the above range, curing occurs sufficiently during exposure in the pattern forming process, and thus reliability is excellent, heat resistance, light resistance and chemical resistance of the pattern are excellent, and resolution and adhesion are also excellent.

(3) photoinitiators

In order to implement a negative pattern by photolithography, it is necessary to use a photoradical initiator. The photoinitiator is a photoinitiator having a maximum molar absorption coefficient of 10,000 (L/mol·cm) or more in a region of 320 to 380 nm and a reduction of 5% by weight occurs at 200° C. or less. Here, the molar extinction coefficient can be calculated by the beer-Lambert Law. In addition, weight loss was measured by raising the temperature to 300 °C at a rate of 5 °C per minute in a nitrogen atmosphere using TGA.

The photosensitive resin composition according to an embodiment of the present invention includes a photoinitiator having a structure as shown in Formula (4) below.

Formula (4)

In the above formula (4),

1) u ₁ ~ u ₃ are each independently 0 or an integer of 1,

2) L ⁸ and L ¹¹ are the following formula (R),

Specific examples of the above-mentioned formula (J) are as follows.

Formula (R)

In Formula (R), R ₅₁ is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C ₁ ~ C ₂₀ alkoxycarbonyl group.

3) L ⁹ , L ¹⁰ and L ¹² are each independently a C ₆ ~ C ₃₀ aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₃ ~ C ₃₀ An aliphatic group C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; C ₁ ~ C ₂₀ Alkoxycarbonyl; C ₁ ~ C ₃₀ alkylene; Or C ₆ ~ C ₃₀ Arylene.

In addition, it is more preferable that L ⁹ , L ¹⁰ and L ¹² in Formula (4) are each independently one of the following Formulas (S) to (V).

Specific examples of the above-mentioned formulas (S) to (V) are as follows.

Formula (S)

Formula (T)

Formula (U)

Formula (V)

In the above formulas (U) and (V),

1) A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C ₁ ~ C ₃₀ Alkyl group, C ₆ ~ C ₃₀ Aryl group or C ₂ ~ C ₃₀ A substituted or unsubstituted amino group with a heterocyclic group; C ₁ ~ C ₃₀ Alkylthio group; C ₁ ~ C ₃₀ Alkyl group; C ₁ ~ C ₃₀ Alkoxy group; C ₆ ~ C ₃₀ Arylalkoxy group; C ₂ ~ C ₃₀ Alkenyl group; C ₂ ~ C ₃₀ Alkynyl group; C ₆ ~ C ₃₀ Aryl group; C ₆ ~ C ₃₀ Aryl group substituted with deuterium; fluorenyl group; O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C ₂ ~ C ₃₀ A heterocyclic group; C ₃ ~ C ₃₀ of an aliphatic ring; C ₇ ~ C ₃₀ Arylalkyl group; C ₈ ~ C ₃₀ Aryl alkenyl group; and combinations thereof,

2) R ₅₂ to R ₅₄ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,

3) T is S, O or Se.

In the photosensitive resin composition according to an embodiment of the present invention, the oxime ester-based compound of Formula (4) may be used alone or in combination of two or more.

The initiator that can be mixed with the oxime ester-based compound is an initiator used in the photosensitive resin composition, for example, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, etc. can be used

Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloroacetophenone, p-t-Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropane- 1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.

Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethyl amino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc. are mentioned.

Examples of the thioxanthone-based compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diiso and propyl thioxanthone and 2-chlorothioxanthone.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine; 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine; 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho1-yl)-4,6 -bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho1-yl)-4,6-s(trichloromethyl)-s-triazine, 2-4-trichloromethyl (piperonyl)-6-triazine, 2-4-trichloromethyl(4'-methoxystyryl)-6-triazine, etc. are mentioned.

As the initiator, a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, or a biimidazole-based compound may be used in addition to the above compound.

As the initiator, a peroxide-based compound, an azobis-based compound, or the like may be used as a radical polymerization initiator.

Examples of the peroxide-based compound include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides such as 2,4,4,-trimethylpentyl-2-hydroperoxide, diisopropylbenzenehydroperoxide, cumene hydroperoxide, and t-butylhydroperoxide; Dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 1,3-bis(t-butyloxyisopropyl)benzene, n-butyl t-butylperoxyvalerate dialkyl peroxides such as esters; alkyl peresters such as 2,4,4-trimethylpentyl peroxyphenoxyacetate, α-cumyl peroxyneodecanoate, t-butyl peroxybenzoate and di-t-butyl peroxytrimethyl adipate; Di-3-methoxybutyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, bis-4-t-butylcyclohexyl peroxydicarbonate, diisopropyl peroxydicarbonate, acetylcyclohexylsulfonyl peroxide, t -Percarbonates, such as butyl peroxyaryl carbonate, etc. are mentioned.

Examples of the azobis-based compound include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2,-azobis( methylisobutyrate), 2,2′-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α′-azobis(isobutylnitrile) and 4,4′-azobis(4 -Cyanovaleic acid) and the like.

The photoinitiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light to enter an excited state and then transferring the energy. Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like. can be heard

The photoinitiator may be included in an amount of 0.01 to 10% by weight, for example 0.1 to 5% by weight, based on the total amount of the photosensitive resin composition. When the photoinitiator is included within the above range, curing occurs sufficiently upon exposure in the pattern forming process to obtain excellent reliability, and the pattern has excellent heat resistance, light resistance and chemical resistance, resolution and adhesion are also excellent, and due to unreacted initiator A decrease in transmittance can be prevented.

(4) Colorant

In order to color the pattern, various pigments and pigments such as dyes may be used independently or together, and both organic pigments and inorganic pigments may be used.

The pigment includes a red pigment, a green pigment, a blue pigment, a yellow pigment, and a black pigment. The pigments may be used alone or in combination of two or more, and the examples are not limited thereto.

Examples of the red pigment include 　C.I. Red pigment 254, C.I. Red pigment 255, C.I. Red pigment 264, C.I. Red pigment 270, C.I. Red pigment 272, C.I. Red pigment 177, C.I. Red pigment 89 etc. are mentioned.

Examples of the green pigment include C.I. Green pigment 36, C.I. and halogen-substituted copper phthalocyanine pigments such as green pigment 7 and the like.

Examples of the blue pigment include C.I. Blue pigment 15:6, C.I. Blue pigment 15, C.I. Blue pigment 15:1, C.I. Blue pigment 15:2, C.I. Blue pigment 15:3, C.I. Blue pigment 15:4, C.I. Blue pigment 15:5, C.I. and copper phthalocyanine pigments such as blue pigment 16.

Examples of the yellow pigment include C.I. isoindoline pigments such as yellow pigment 139, C.I. quinophthalone-based pigments such as yellow pigment 138, C.I. Nickel complex pigments, such as yellow pigment 150, etc. are mentioned.

Examples of the black pigment include benzofuranone black, lactam black, aniline black, perylene black, titanium black, carbon black, and the like.

A dispersant may be used together to disperse the pigment in the photosensitive resin composition. Specifically, the pigment may be surface-treated in advance with a dispersant, or may be used by adding a dispersing agent together with the pigment when preparing the photosensitive resin composition. As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. may be used.

Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyalcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.

Examples of commercially available products of the dispersant include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 and BASF's EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 and Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc., or Ajinomoto's PB711, PB821, etc.

The dispersant may be included in an amount of 0.1 to 15 wt% based on the total amount of the photosensitive resin composition. When the dispersing agent is included within the above range, the dispersibility of the photosensitive resin composition is excellent, and thus, stability, developability and patternability are excellent in manufacturing the light blocking layer.

The pigment may be used after pre-treatment using a water-soluble inorganic salt and a wetting agent. When the pigment is pre-treated as described above and used, the primary particle size of the pigment can be refined. The pretreatment may be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained in the kneading step. The kneading may be performed at a temperature of 40° C. to 100° C., and the filtration and washing may be performed by filtration after washing the inorganic salt with water or the like.

Examples of the water-soluble inorganic salt include, but are not limited to, sodium chloride and potassium chloride.

The wetting agent serves as a medium through which the pigment and the water-soluble inorganic salt are uniformly mixed and the pigment can be easily pulverized, for example, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. alkylene glycol monoalkyl ethers; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerin polyethylene glycol, and the like, and these may be used alone or in combination of two or more.

The pigment that has undergone the kneading step may have an average particle diameter of 20 nm to 110 nm. When the average particle diameter of the pigment is within the above range, it is possible to effectively form a fine pattern while having excellent heat resistance and light resistance.

On the other hand, as a specific example of the dye, C.I. As a solvent dye, C.I. yellow dyes such as solvent yellow 4, 14, 15, 16, 21, 23, 24, 38, 56, 62, 63, 68, 79, 82, 93, 94, 98, 99, 151, 162, 163; C.I. red dyes such as solvent red 8, 45, 49, 89, 111, 122, 125, 130, 132, 146, 179; C.I. orange dyes such as solvent orange 2, 7, 11, 15, 26, 41, 45, 56, 62; C.I. blue dyes such as solvent blue 5, 35, 36, 37, 44, 59, 67, and 70; C.I. violet dyes such as solvent violet 8, 9, 13, 14, 36, 37, 47, 49; C.I. Green dyes, such as solvent green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35, etc. are mentioned.

Among them, C.I. Among solvent dyes, C.I. Solvent Yellow 14, 16, 21, 56, 151, 79, 93; C.I. Solvent Red 8, 49, 89, 111, 122, 132, 146, 179; C.I. Solvent Orange 41, 45, 62; C.I. Solvent Blue 35, 36, 44, 45, 70; C.I. Solvent Violet 13 is preferred. In particular, C.I. Solvent Yellow 21, 79; C.I. Solvent Red 8, 122, 132; C.I. Solvent orange 45 and 62 are more preferable.

Also, C.I. As an acid dye, C.I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251, etc. of yellow dye; C.I. Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88 , 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217 , 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349 , 382, 383, 394, 401, 412, 417, 418, 422, 426 and other red dyes; orange dyes such as C.I. Acid Orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173; C.I. Acid Blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103 , 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324:1 blue dyes such as , 335 and 340; purple dyes such as C.I. Acid Violet 6B, 7, 9, 17, 19, 66; green dyes such as C.I. Acid Green 1, 3, 5, 9, 16, 25, 27, 50, 58, 63, 65, 80, 104, 105, 106, 109, and the like.

C.I. Acid Yellow 42, which has excellent solubility in organic solvents among the acid dyes; C.I. Acid Red 92; C.I. Acid Blue 80, 90; C.I. Acid Violet 66; C.I. Acid Green 27 is preferred.

In addition, as a C.I. direct dye, C.I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, yellow dyes such as 102, 108, 109, 129, 136, 138 and 141; C.I. Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211 , 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250 and other red dyes; orange dyes such as C.I. direct orange 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107; C.I. Direct Blue 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113 , 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189 , 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248 , 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, 293 blue dye; purple dyes such as C.I. direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; Green dyes, such as C.I. direct green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82, etc. are mentioned.

Also, C.I. As modanto dyes, yellow dyes such as C.I. modanto yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65; C.I. Modanto Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, red dyes such as 41, 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95; C.I. Modanto Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48, etc. orange dyes; C.I. modanto blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, blue dyes such as 43, 44, 48, 49, 53, 61, 74, 77, 83, 84; purple dyes such as C.I. modanto violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; and green dyes such as C.I. modanto green 1, 3, 4, 5, 10, 15, 19, 26, 29, 33, 34, 35, 41, 43 and 53.

In the present invention, each of the dyes may be used alone or in combination of two or more.

The pigment and dye may be included in an amount of 5 to 40 wt%, more specifically 8 to 30 wt%, based on the total amount of the photosensitive resin composition. When the pigment is included within the above range, it has an absorbance of 0.5/㎛ or more at a wavelength of 550 nm, and has excellent curability and adhesion of the pattern.

(5) solvent

As the solvent, materials having compatibility with the binder resin, the reactive unsaturated compound, the pigment, and the initiator but not reacting may be used.

Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, -n-butyl acetate, and isobutyl acetate; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxypropionic acid alkyl esters, such as 3-oxy methyl propionate and 3-oxy ethyl propionate; 3-alkoxy propionic acid alkyl esters, such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxy propionic acid alkyl esters, such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methyl propionic acid esters such as 2-oxy-2-methyl methyl propionate and 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, and 2-ethoxy-2- monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl propionic acid alkyls such as methyl ethyl propionate; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methyl ethyl propionate, ethyl hydroxyacetate, and 2-hydroxy-3-methyl methyl butanoate; and ketonic acid esters such as ethyl pyruvate.

Further, N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzylethyl Ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyric acid High boiling point solvents such as lolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate may also be used.

In consideration of compatibility and reactivity among the solvents, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate can be used.

The solvent may be included as a balance based on the total amount of the photosensitive resin composition, and specifically may be included in an amount of 50 to 90% by weight. When the solvent is included within the above range, since the photosensitive resin composition has an appropriate viscosity, processability is excellent in manufacturing the pattern layer.

In addition, another embodiment of the present invention may provide a display device.

Hereinafter, a display device will be described with reference to FIG. 1 . In the display device according to an embodiment of the present invention, a first electrode formed on a substrate and a pixel separation formed on the first electrode to partially expose the first electrode A display device including a portion and a second electrode provided to face the first electrode, wherein the pixel separation portion is formed of a photosensitive resin composition containing a polymer as an essential component of the structural unit represented by the above formula (1) as an essential component.

In the display device according to the embodiments of the present invention, since the photosensitive resin composition is the same as the photosensitive resin composition according to the above-described embodiments of the present invention, it will be omitted.

The polymerization reaction product of the photosensitive resin composition may be formed by, for example, coating the photosensitive resin composition on a TFT substrate and curing the applied photosensitive resin composition.

By including the polymerization reaction product of the photosensitive resin composition, the pixel separation unit may have excellent resolution and may have a taper angle suitable for an organic light emitting device.

The display device may include a plurality of pixels, and the pixel separation unit may be a layer that separates the plurality of pixels.

For example, a light emitting device may be positioned in a pixel of the display device, and the light emitting device may be an organic light emitting device (see FIG. 1 ). The organic light emitting device, for example, after forming the TFT layer 3 including the TFT 2 on the substrate 1, and forming the flat layer 4 thereon, the first electrode 5, The pixel separation unit 6 , the organic layer 7 , and the second electrode 8 may be sequentially stacked. In this example, the pixel separation unit 6 may be located on the first electrode, and the pixel separation unit may have an opening on the first electrode. The organic layer may be positioned in the opening and on the first electrode, and the second electrode may be positioned on the organic layer. Since the emission area of the pixel is determined by the opening area of the pixel separation unit, the above-described pixel separation unit may be a pixel defining layer.

In addition, the pixel separation unit is preferable as a light blocking layer for blocking light.

The pixel separation unit according to an embodiment of the present invention may have a tapered angle 9 . For example, the pattern layer according to an embodiment of the present invention may have a taper angle of 20 degrees to 30 degrees. The taper angle may be an inclination angle with respect to a direction parallel to the display surface at a point where the inclination starts.

The pixel separation portion, which is the above-described pixel defining layer, has an opening, and an inclined portion connecting the opening and the non-opening portion has an inclination angle.

The pixel separation unit according to an embodiment of the present invention includes a polymerization reaction product of the above-described photosensitive resin composition, and the above-described photosensitive resin composition can form a patterned layer without a residue, and in the process of forming a pattern, a melting flow Thus, a tapered angle of 20 to 30 degrees can be formed, and when the taper angle is formed to be 20 to 30 degrees, it is possible to reduce deposition defects that may occur in the deposition process of the organic light emitting diode.

In addition, the pixel separation unit according to the present invention is preferably formed to cover the edge portion of the first electrode, and the thickness of the pixel separation unit is preferably 0.5 to 10 μm.

In another embodiment, the pixel separation unit may be formed by patterning the above-described photosensitive resin composition on the organic light emitting device electrode.

Hereinafter, synthesis examples and examples according to the present invention will be specifically described, but the synthesis examples and examples of the present invention are not limited thereto.

(Synthesis Example 1)

(Preparation of compound 1-1)

9,9'-bisphenol fluorene 80 g (0.228 mol, Sigma aldrich), glycidyl chloride 42.67 g (0.461 mol, Sigma aldrich) and 191 g (1.38 mol) of anhydrous potassium carbonate were mixed with 600 ml of dimethylformamide and a distillation tube. Put it in an installed 1500ml 3-neck round-bottom flask, raise the temperature to 80°C and react for 4 hours, lower the temperature to 25°C, filter the reaction solution, and add the filtrate dropwise to 1000ml water with stirring, then precipitated powder was filtered, washed with water, and dried under reduced pressure at 40° C. to obtain 100 g (216 mmol) of compound 1-1 of Formula 15. The obtained powder showed a purity of 98% as a result of purity analysis by HPLC.

<Compound 1-1>

(Synthesis Example 2)

(Preparation of compounds 2-1 to 2-3)

25g (54mmol) of compound 1-1 obtained in Synthesis Example 1, 7.9g (0.11mol, Daejeonghwageum) acrylic acid, 0.03g (0.16mmol, Daejeonghwageum) and hydroquinone 0.01g (0.05) benzyltriethylammonium chloride mmol, Daejeong Chemical Co., Ltd.) was placed in a 300ml 3-neck round-bottom flask equipped with 52 g of toluene (Sigma Aldrich Co.) and a distillation tube, and stirred at 110° C. for 6 hours. After the reaction was completed, toluene was removed by distillation under reduced pressure to obtain a product. After packing 500 g of silica gel 60 (230-400 mesh, Merck) in a glass column with a diameter of 220 mm, 20 g (mmol) of the product was filled, and 10 L of a solvent in which hexane and ethyl acetate were mixed in a 4:1 volume ratio was added. Separation was carried out using the compound 2-1 to compound 2-3.

<Compound 2-1>

<Compound 2-2>

<Compound 2-3>

(Synthesis Examples 3 to 15)

(Preparation of Polymer 1-1 to Polymer 1-13)

Compound 2-1, compound 2-2, and compound 2-3 obtained in Synthesis Example 2 were put in a 50ml 3-neck round-bottom flask equipped with a distillation tube, respectively, as shown in Table 1 below, and 0.05 g of benzyltriethylammonium chloride (0.27mmol) ) (Daejeong Chemical Co.), hydroquinone 0.05 g (0.46 mmol) (Daejeong Chemical Co.) and 9.5 g propylene glycol methyl ether acetate (Sigma Aldrich Co.) were put into the 50ml 3-neck round-bottom flask, 3, 3′,4,4′-Biphenyltetracarboxylic dianhydride (Sigma aldrich), Tetrahydrophthalic anhydride (Sigma Aldrich), 1,6-hexamethylene diisocyanate (Sigma Aldrich), 4,4'-Methylenediphenyl diisocyanate (TCI) and Isophorone diisocyanate (Sigma Aldrich) was added in the composition shown in Table 1 below and stirred at 110° C. for 6 hours. After completion of the reaction, the reaction solution was recovered to obtain Polymers 1-1 to 1-13 in the form of a solution having a solid content of 40%. The synthesized polymers were analyzed for weight average molecular weight (Mw) using gel permeation chromatography (Agilent).

The molar ratio of the dianhydride moiety and the diisocynate moiety in each of Polymer 1-1 to Polymer 1-13 of Table 1 is shown in Table 2 below.

Polymer 1-1 Polymer 1-2 Polymer 1-3 Polymer 1-4 Polymer 1-5 Polymer 1-6 Polymer 1-7 Polymer 1-8 Polymer 1-9 Polymer 1-10 Polymer 1-11 Polymer 1-12 Polymer 1-13 dianhydride moiety 7 7 7 7 7 7 7 7 6 5 3 10 7 diisocynate moiety 3 3 3 3 3 3 3 3 4 5 7 0 3

(Synthesis Example 16)

(Preparation of compound 3-1)

20 g (0.147 mol) of trichloro silane (Gelest) and 17.51 g (0.147 mol) of 6-chloro-1-hexene (Aldrich) were dissolved in 200 ml of ethyl acetate in a 3-neck round-bottom flask equipped with a distillation tube connected to cooling water. , 0.02 g of Platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution (2wt% in xylene / Aldrich) was added, nitrogen was added, and the temperature was raised to 75°C for 5 hours reaction After washing, the solution was filtered with a 0.1 μm Teflon membrane to remove the platinum catalyst. After that, 15.6 g (0.487 mol) of methanol was added dropwise at room temperature for 30 minutes, and the temperature was raised to 50° C. for an additional 2 hours, and then the reaction solution was distilled under reduced pressure to remove the solvent. 24 g (0.1 mol) of 6-Chlorohexyltrimethoxysilane obtained in this way, 8 g (0.15 mol) of sodium methoxide (Aldrich), 187 ml (0.15 mol) of hydrogen sulfide THF solution (0.8 M concentration) and 100 ml of methanol were placed in an autoclave, and 2 at 100 ° C. The reaction was allowed to proceed for hours. After cooling the reaction solution, 100 ml of hydrogen chloride in methanol (1.25M concentration) was added dropwise at room temperature for 30 minutes, the resulting salt was filtered off, and then distilled under reduced pressure to obtain compound 3-1 (23g).

<Compound 3-1>

(Synthesis Example 17)

(Preparation of compound 3-2)

Compound 3- was synthesized in the same manner as in Synthesis Example 16, except that 23.7 (0.147 mol) of 9-Chloro-1-nonene (AK Scientific) was used instead of 6-chloro-1-hexene in Synthesis Example 16. 2 (24 g) was obtained.

<Compound 3-2>

(Synthesis Example 18)

(Preparation of compound 3-3)

Compound 3- was synthesized in the same manner as in Synthesis Example 16, except that 30 g (0.147 mol) of 12-Chloro-1-dodecene (Atomax Chemicals) was used instead of 6-chloro-1-hexene in Synthesis Example 16. 3 (26 g) was obtained.

<Compound 3-3>

(Synthesis Example 19)

(Preparation of compound 3-4)

Compound 3-4 (24 g) was synthesized in the same manner as in Synthesis Example 16, except that 22.4 g (0.487 mol) of ethanol (Aldrich Corporation) was used instead of methanol added after removing platinum in Synthesis Example 16. got it

<Compound 3-4>

(Synthesis Example 20)

(Preparation of compound 3-5)

Compound 3-5 (27 g) was synthesized in the same manner as in Synthesis Example 16, except that 36 g (0.487 mol) of 1-butanol (Aldrich) was used instead of methanol added after removing platinum in Synthesis Example 16. got

<Compound 3-5>

(Synthesis Example 21)

(Preparation of compound 3-6)

Compound 3-6 (22 g) was obtained by synthesizing in the same manner as in Synthesis Example 16, except that 18 g (0.147 mol) of dichloromethylsilane was used instead of trichlorosilane in Synthesis Example 16.

<Compound 3-6>

(Synthesis Example 22)

(Preparation of Polymer 2-1)

In 360 g of the solution of Polymer 1-1 prepared in Synthesis Example 3, 6.36 g (34 mmol) of KBM 803 [3-(Trimethoxysilyl)-1-propanethiol] same as compound 3-7 (Shinetsu) was added, and the temperature was raised to 60 ° C. Then, by stirring for 4 hours, a cardo-based binder resin Polymer 2-1 in which a silane group such as Compound 3-7 is substituted was obtained.

<Compound 3-7>

(Synthesis Examples 23 to 34)

(Preparation of Polymer 2-2 to Polymer 2-13)

In Synthesis Example 22, a cardo-based binder substituted with a silane group in the same manner as in Synthesis Example 22, except that Polymer 1-2 to Polymer 1-13 shown in Table 3 was used instead of the solution of Polymer 1-1. Resins Polymer 2-2 to Polymer 2-13 were prepared.

The weight average molecular weights of Polymers 2-1 to 2-13 synthesized in Synthesis Examples 22 to 34 are shown in Table 3 below.

(Synthesis Example 35)

(Preparation of Polymer 3-1)

8.1 g (34 mmol) of 6-(Trimethoxysilyl)-1-hexanethiol (Compound 3-1) was added to 360 g of the Polymer 1-1 solution prepared in Synthesis Example 3, and the temperature was raised to 60° C., followed by stirring for 4 hours. Thus, the cardo-based binder resin Polymer 3-1 in which the same silane group as in Compound 3-1 was substituted was obtained.

(Synthesis Example 36 to Synthesis Example 47)

(Preparation of Polymer 3-2 to Polymer 3-7)

A cardo-based binder in which a silane group is substituted in the same manner as in Synthesis Example 35, except that Polymer 1-2 to Polymer 1-13 shown in Table 3 was used instead of the solution of Polymer 1-1 in Synthesis Example 35. Resins Polymer 3-2 to Polymer 3-13 were prepared.

The weight average molecular weights of Polymers 3-1 to Polymer 3-13 synthesized in Synthesis Examples 35 to 47 are shown in Table 4 below.

(Synthesis Example 48)

(Preparation of Polymer 4-1)

9.53 g (34 mmol) of 6-(Triethoxysilyl)-1-hexanethiol (Compound 3-4) was added to 360 g of the solution of Polymer 1-1 prepared in Synthesis Example 3, and the temperature was raised to 60° C., followed by stirring for 4 hours. Polymer 4-1, a cardo-based binder resin substituted with a silane group such as Compound 3-4, was obtained.

(Synthesis Example 49 to Synthesis Example 60)

(Preparation of Polymer 4-2 to Polymer 4-7)

In Synthesis Example 48, a cardo-based binder in which a silane group is substituted in the same manner as in Synthesis Example 48, except that Polymer 1-2 to Polymer 1-13 shown in Table 5 was used instead of the solution of Polymer 1-1. Resins Polymer 4-2 to Polymer 4-13 were prepared.

The weight average molecular weights of Polymer 4-1 to Polymer 4-13 synthesized in Synthesis Examples 48 to 60 are shown in Table 5 below.

(Production Example 1)

(Preparation of black pigment dispersion)

Black pigment (BASF, Irgaphor® Black S 0100CF) 15g, Disperbyk 163 8.5g (BYK), V259ME 5.5g (Nippon Steel Chemical), 71g of propylene glycol methyl ether acetate and 100g of 0.5mm diameter zirconia beads (Toray) ) was dispersed for 10 hours using a paint shaker (Asada) to obtain a dispersion.

(Examples 1 to 18)

Photosensitive compositions were prepared with the compositions shown in Tables 6 and 7 below.

Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Corporation / Reactive Unsaturation) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02
(BASF / photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 1-1 9.7 - - - - - - - - Polymer 1-2 - 9.7 - - - - - - - Polymer 1-3 - - 9.7 - - - - - - Polymer 1-4 - - - 9.7 - - - - - Polymer 1-5 - - - - 9.7 - - - - Polymer 1-6 - - - - - 9.7 - - - Polymer 1-7 - - - - - - 9.7 - - Polymer 1-8 - - - - - - - 9.7 - Polymer 1-9 - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daisel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 Black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Corporation / Reactive Unsaturation) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02
(BASF / photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 2-1 9.7 - - - - - - - - Polymer 2-2 - 9.7 - - - - - - - Polymer 2-3 - - 9.7 - - - - - - Polymer 2-4 - - - 9.7 - - - - - Polymer 2-5 - - - - 9.7 - - - - Polymer 2-6 - - - - - 9.7 - - - Polymer 2-7 - - - - - - 9.7 - - Polymer 3-1 - - - - - - - 9.7 - Polymer 4-1 - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daisel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

(Comparative Examples 1 to 9)

Photosensitive composition solutions were prepared with the composition shown in Table 8 below.

Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 Comparative Example 9 Black pigment dispersion of Preparation Example 1 30 30 30 30 30 30 30 30 30 M600 (Miwon Corporation / Reactive Unsaturation) 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 5.5 OXE-02
(BASF / photoinitiator) 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 0.4 Polymer 1-10 9.7 - - - - - - - - Polymer 1-11 - 9.7 - - - - - - - Polymer 1-12 - - 9.7 - - - - - - Polymer 1-13 - - - 9.7 - - - - - Polymer 2-10 - - - - 9.7 - - - - Polymer 2-11 - - - - - 9.7 - - - Polymer 2-12 - - - - - - 9.7 - - Polymer 2-13 - - - - - - - 9.7 - NPR-8000 (Miwon Corporation / Acryl binder) - - - - - - - - 9.7 Propylene glycol methyl ether acetate (Daisel) 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4 54.4

The manufacturing method of the light blocking layer using the composition solution according to Examples 1 to 18 and Comparative Examples 1 to 9 is as follows (photolithography step).

(1) Application and coating film formation step

The above-described black photosensitive resin composition was applied to a washed 10 cm * 10 cm ITO/Ag substrate to a thickness of 1.5 μm using a spin coater, and then heated at a temperature of 100° C. for 1 minute to remove the solvent, thereby forming a coating film.

(2) exposure step

In order to form a pattern required for the obtained coating film, a mask of a predetermined shape was interposed, and then actinic rays of 190 nm to 500 nm were irradiated. The exposure machine was MA-6, and the exposure amount was 100 mJ/cm ² .

(3) development step

Following the exposure step, it was developed by dipping in AZEM's AX 300 MIF developer at 25° C. for 1 minute, and then washed with water to dissolve and remove the unexposed portion, leaving only the exposed portion to form an image pattern. .

(3-1) Development time measurement

The time for which the unexposed portion of the photosensitive composition applied in the developing step is completely dissolved and a pattern is formed without a residue to complete the developing process is measured.

(4) post-processing step

In order to obtain an excellent pattern in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, and storage stability of the image pattern obtained by the above development, post baking is performed in an oven at 230°C for 30 minutes. did

(5) Measure the minimum pattern size on the substrate

The patterns of the photosensitive compositions of Examples 1 to 18 and Comparative Examples 1 to 9 obtained through the post-treatment step were measured using an optical microscope (Nikon Corporation) to measure the minimum pattern size on the substrate.

(6) Taper angle measurement

Cross-sectional images of the patterns of the photosensitive compositions of Examples 1 to 18 and Comparative Examples 1 to 9 obtained through the post-treatment step were observed using FE-SEM (Hitachi Corporation), and the critical dimension (CD: Critical dimension) was The taper angle of the patterns of 10 μm was measured.

(7) Outgas measurement

After forming a coating film on a glass substrate through the steps (1), (2), (3) and (4) above, the photosensitive compositions of Examples 1 to 18 and Comparative Examples 1 to 9 were cut to a size of 1 cm x 3 cm and sample 6 Each was prepared. The outgas was collected at 250°C for 30 minutes using JTD-505² of JAI, respectively. After measuring toluene assay samples (100, 500, and 1,000 ppm) using Shimadzu's QP2020 GC/MS, a calibration curve was drawn up, and the amount of outgas generated by the collected samples was measured.

The outgassing amount of the patterns thus obtained and the maximum resolution (minimum size pattern on the substrate) of the pattern formed on the substrate were measured, and are shown in Tables 9 to 11.

photosensitive composition Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Minimum pattern size on substrate (㎛) 4.2 4.3 4.8 4.7 4.8 4.4 4.3 3.9 4.8 Outgassing (ppm) 3.6 3.4 3.5 3.6 3.8 3.7 3.6 3.1 3.6 development time (s) 60 60 60 60 60 60 60 60 60 Taper angle (°) 28 28 29 29 29 29 30 28 27

photosensitive composition Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 Minimum pattern size on substrate (㎛) 3.3 3.2 3.7 3.8 4.0 3.6 3.4 3.4 3.2 Outgassing (ppm) 4.5 4.2 4.4 4.3 4.8 4.7 4.6 4.7 4.7 development time (s) 60 60 60 60 60 60 60 60 65 Taper angle (°) 27 27 27 27 28 28 29 28 26

photosensitive composition Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 Comparative Example 9 Minimum pattern size on substrate (㎛) 9.3 11.5 4.1 7.4 8.2 9.9 3.4 6.7 13.8 Outgassing (ppm) 3.9 4.1 3.2 3.7 4.7 4.9 4.1 4.0 8.8 development time (s) 75 90 60 60 75 90 60 60 60 Taper angle (°) 18 16 45 31 17 16 39 33 54

In the case of Examples 1 to 9 using Polymer 1-1 to Polymer 1-9 not containing a silane substituent in Table 9 as the binder resin, Polymer 2-1 to Polymer 2- containing a silane substituent in Table 10 7, it can be seen that the amount of outgas generation is lower than in Examples 10 to 18 using Polymer 3-1 and Polymer 4-1 as binder resins.

In addition, in the case of Examples 10 to 18, compared to Examples 1 to 9, the minimum pattern size on the substrate showed a tendency to be small. It is determined that, when a binder resin substituted with a silane group is used, the adhesion to the substrate is improved, so that the resolution of the final pattern after the photolithography (PR) process is improved, but the amount of outgas generated is also slightly increased.

When comparing Examples 1 to 5 of Table 9 and Examples 10 to 14 of Table 10 with Comparative Examples 4 and 8 of Table 11, in the case of Polymers 1-13 and 2-13 used in Comparative Examples 4 and 8, polymers A polymer backbone is formed by polymerizing one type of monomer and has a relatively linear shape compared to Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 depending on the structure of the monomer.

On the other hand, in the case of Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 used in Examples 1 to 5 and Examples 10 to 14, polymer 1- 13 and has a relatively reticulated structure compared to 2-13. Polymers 1-1 to 1-5 and Polymers 2-1 to 2-5 are structures more suitable for photolithography processes by effectively bonding intermolecularly with surrounding compounds due to their structural characteristics, and thus Examples 1 to 5 and It is determined that Examples 10 to 14 showed higher resolution than Comparative Examples 4 and 8 during the developing process, and the amount of outgas generated was lower.

In addition, referring to Comparative Example 9 of Table 11, when an acrylic binder (NPR-8000) was used as the binder resin, the resolution and outgas characteristics were significantly lowered compared to Examples 1 to 18 and Comparative Examples 1 to 8, and the taper angle was decreased. It was confirmed that it was formed very high.

Comparing Examples 1 and 9 of Table 9 and Comparative Examples 1 to 3 of Table 11, the minimum pattern size on the substrate, the amount of outgassing, and the development speed according to the ratio of the dianhydride moiety to the diisocynate moiety among the resins used as the binder resin , it can be seen that the taper angle has a certain tendency. In the case of Comparative Example 3 using Polymer 1-12 containing a dianhydride moiety without including a diisocynate moiety in the main chain of the resin, the minimum pattern size on the substrate, the amount of outgassing, and the development speed were similar compared to other examples. It was confirmed that the taper angle was formed very high at 45°.

In addition, in Comparative Examples 1 and 2 using Polyemr 1-10 or Polymer 1-11 in which the ratio of the diisocynate moiety is higher than the ratio of the dianhydride moiety, the ratio of the diisocynate moiety to the main chain of the resin is the same as the ratio of the dianhydride moiety. Although the taper angle was formed very low compared to other examples, there were significant differences in the minimum pattern size on the substrate, the amount of outgas generated, and the development speed.

On the other hand, in the case of Examples 1 and 9 using Polymers 1-1 and 1-9 in which the ratio of the dianhydride moiety is higher than the ratio of the diisocynate moiety, the minimum pattern size on the substrate, the amount of outgassing, the phenomenon compared to the comparative examples It exhibited very good characteristics over time, and as shown in FIG. 2 , it was confirmed that the tapered angle was formed at an angle between 25 and 30°, making it very suitable as a material for the pixel separation unit of the organic light emitting diode.

The above description is merely illustrative of the present invention, and those of ordinary skill in the art to which the present invention pertains will be able to make various modifications without departing from the essential characteristics of the present invention.

Accordingly, the embodiments disclosed in the present specification are not intended to limit the present invention, but to explain, and the spirit and scope of the present invention are not limited by these embodiments. The protection scope of the present invention should be interpreted by the claims, and all technologies within the scope equivalent thereto should be construed as being included in the scope of the present invention.

1: substrate 2: TFT
3: TFT layer 4: flattening layer
5: first electrode 6: pixel separation unit
7: organic layer 8: second electrode
9: Taper angle

Claims (21)

a resin comprising a repeating unit represented by the following formula (1);
Formula (1)

In the above formula (1),
1) * represents a part where the bond is connected as a repeating unit,
2) R ¹ and R ² are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
3) R ¹ and R ² are each capable of forming a ring with an adjacent group,
4) a and b are each independently an integer from 0 to 4,
5) X ¹ is a single bond, O, CO, SO ₂ , CR'R", SiR'R", Formula (A) or Formula (B),
Formula (A)

Formula (B)

In the above formulas (A) and (B),
5-1) * indicates a binding position,
5-2) X ₃ is O, S, SO ₂ or NR',
5-3) R' is hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
5-4) R ³ to R ⁶ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
5-5) R ³ to R ⁶ are each capable of forming a ring with an adjacent group,
5-6) c~f are independently integers from 0 to 4,

6) X ² is the formula (G),
Formula (G)

6-1) * represents a binding position,
6-2) X ³ and X ⁴ are each independently O or S,
6-3) R ¹⁶ is a fluorenylene group, C ₁ to C ₃₀ alkylene; C ₃ ~ C ₃₀ Cycloalkylene; C ₆ ~ C ₃₀ Arylene; C ₂ ~ C ₃₀ A heterocyclic ring; Or C ₁ ~ C ₃₀ Alkoxyylene,

7) R' and R" are each independently hydrogen; deuterium; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom of C ₂ ~ C ₃₀ Heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; Fluorenyl group; Carbonyl group; Ether group; Or C ₁ ~ C ₂₀ Alkoxycarbonyl group,
8) R' and R" may each form a ring with an adjacent group,
9) A ¹ and A ² are each independently Formula (C) or Formula (D),
Formula (C)

Formula (D)

In the above formulas (C) and (D),
9-1) * indicates a binding position,
9-2) R ⁷ to R ¹⁰ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
9-3) Y ¹ and Y ² are each independently Formula (E) or Formula (F),
Formula (E)

Formula (F)

In the above formulas (E) and (F),
9-3-1) * indicates a binding position,
9-3-2) R ¹¹ to R ¹⁵ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
9-3-3) L ¹ ~ L ³ are each independently a single bond, a fluorenylene group, C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene, or C ₂ ~ C ₃₀ heterocycle, ,
9-3-4) g and h are each independently an integer of 0 to 3; However, g + h = 3,

10) The ratio of Formula (C) to Formula (D) in the polymer chain of the resin including the repeating unit represented by Formula (1) satisfies 1:9 to 9:1,
11) t is an integer from 1 to 200,000,
12) the R ¹ to R ¹⁶ , R′, R″, X ¹ to X ² and L ¹ to L ³ and the rings formed by bonding adjacent groups to each other are deuterium; halogen; C ₁ to C ₃₀ alkyl group Or C ₆ ~ C ₃₀ A silane group unsubstituted or substituted with an aryl group; a siloxane group; a boron group; a germanium group; a cyano group; an amino group; a nitro group; _a C _{1 ~} C ₃₀ alkylthio group; Alkoxy group; C ₆ ~ C ₃₀ Arylalkoxy group; C ₁ ~ C ₃₀ Alkyl group; C ₂ ~ C ₃₀ alkenyl group; C ₂ ~ C ₃₀ alkynyl group; C ₆ ~ C ₃₀ aryl group; deuterium Substituted C ₆ ~ C ₃₀ Aryl group; Fluorenyl group; C ₂ ~ C ₃₀ Heterocyclic group comprising at least one heteroatom selected from the group consisting of O, N, S, Si and P; C ₃ ~ may be further substituted with one or more substituents selected from the group consisting of C ₃₀ aliphatic ring group; C ₇ ~ C ₃₀ arylalkyl group; C ₈ ~ C ₃₀ arylalkenyl group; and combinations thereof, and adjacent substituents form a ring can be formed The resin according to claim 1, wherein the resin has a weight average molecular weight of 1,000 to 100,000 g/mol. The resin according to claim 1, wherein the repeating unit represented by the formula (1) is 30% or less in the resin. (A) a resin comprising a repeating unit represented by the formula (1) of claim 1;
(B) reactive unsaturated compounds; and
(C) a photoinitiator; A photosensitive resin composition comprising a. 5. The photosensitive resin composition according to claim 4, wherein the resin including the repeating unit represented by the formula (1) further comprises a repeating unit represented by the formula (2).
Formula (2)

In the above formula (2)
1) R ²¹ and R ²² are the same as those of R ¹ and R ² in the formula (1) of claim 1,
2) I and j are the same as the definitions of a and b in the formula (1) of paragraph 1,
3) X ²¹ is the same as the definition of X ¹ in Formula (1) of Paragraph 1,
4) A ²¹ and A ²² are the same as defined for A ¹ and A ² in the formula (1) of paragraph 1,
5) X ²² is a C ₆ ~ C ₃₀ aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; or a combination thereof. The photosensitive resin composition according to claim 5, wherein the formula (2) comprises the following formulas (J) and (K) in a ratio of 1:9 to 9:1:
Formula (J)

Formula (K)

In the above formulas (J) and (K),
9-1) * indicates a binding position,
9-2) R ²⁷ to R ³⁰ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
9-3) Y ²¹ and Y ²² are each independently Formula (L) or Formula (M),
Formula (L)

Formula (M)

In the above formulas (L) and (M),
9-3-1) * indicates a binding position,
9-3-2) R ³¹ to R ³⁵ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
9-3-3) L ⁴ ~ L ⁶ are each independently a single bond, a fluorenylene group, C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene, or C ₂ ~ C ₃₀ heterocycle, ,
9-3-4) o and p are each independently an integer of 0 to 3; However, o+p=3. The photosensitive resin composition according to claim 6, wherein the formulas (L) and (M) are included in a ratio of 2:0 to 1:1. The photosensitive resin composition according to claim 5, wherein the ratio of the repeating unit represented by the formula (1) to the repeating unit represented by the formula (2) is 4:6 to 1:9. The photosensitive resin composition according to claim 4, wherein the (B) reactive unsaturated compound is included in an amount of 1 to 40 wt% based on the total amount of the photosensitive resin composition; The photosensitive resin composition according to claim 4, wherein the reactive unsaturated compound comprises a compound represented by the following formula (3):
Formula (3)

In Chemical Formula (3), at least two of Z ₁ to Z ₄ each independently have a structure of the following Chemical Formula (O); The remaining Z ₁ to Z ₄ are each independently hydrogen, deuterium, halogen, a methyl group, an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
Formula (O)

In the above formula (O),
1) q is an integer from 1 to 20,
2) L ⁷ is C ₁ ~ C ₃₀ alkylene, C ₆ ~ C ₃₀ arylene, or C ₂ ~ C ₃₀ heterocycle,
3) Y ³ is the following formula (P) or formula (Q),
Formula (P)

Formula (Q)

In Formula (P), R ₄₁ is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or a C ₁ ~ C ₂₀ alkoxycarbonyl group. 5. The photosensitive resin composition according to claim 4, wherein the photoinitiator is included in an amount of 0.01 to 10 wt% based on the total amount of the photosensitive resin composition. The photosensitive resin composition according to claim 4, wherein the photoinitiator comprises a compound represented by the following formula (4):
Formula (4)

In the above formula (4),
1) u ₁ ~ u ₃ are each independently 0 or an integer of 1,
2) L ⁸ and L ¹¹ are the following formula (R),
Formula (R)

2-1) In Formula (R), R ₅₁ is hydrogen, deuterium, halogen, a methyl group, or an ethyl group; methyl hydroxy group; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
3) L ⁹ , L ¹⁰ and L ¹² are each independently a C ₆ ~ C ₃₀ aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₃ ~ C ₃₀ An aliphatic group C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; C ₁ ~ C ₂₀ Alkoxycarbonyl; C ₁ ~ C ₃₀ Alkylene or C ₆ ~ C ₃₀ Arylene. The photosensitive resin composition according to claim 12, wherein L ⁹ , L ¹⁰ and L ¹² of Formula (4) are each independently one of the following Formulas (S) to (V):
Formula (S)

Formula (T)

Formula (U)

Formula (V)

In the above formulas (U) and (V),
1) A is hydrogen; O; S; silane group; siloxane group; boron group; germanium group; cyano group; nitro group; nitrile group; C ₁ ~ C ₃₀ Alkyl group, C ₆ ~ C ₃₀ Aryl group or C ₂ ~ C ₃₀ A substituted or unsubstituted amino group with a heterocyclic group; C ₁ ~ C ₃₀ Alkylthio group; C ₁ ~ C ₃₀ Alkyl group; C ₁ ~ C ₃₀ Alkoxy group; C ₆ ~ C ₃₀ Arylalkoxy group; C ₂ ~ C ₃₀ Alkenyl group; C ₂ ~ C ₃₀ Alkynyl group; C ₆ ~ C ₃₀ Aryl group; C ₆ ~ C ₃₀ Aryl group substituted with deuterium; fluorenyl group; O, N, S, Si and P containing at least one heteroatom selected from the group consisting of C ₂ ~ C ₃₀ A heterocyclic group; C ₃ ~ C ₃₀ of an aliphatic ring; C ₇ ~ C ₃₀ Arylalkyl group; C ₈ ~ C ₃₀ Aryl alkenyl group; and combinations thereof,
2) R ₅₂ to R ₅₄ are each independently hydrogen; heavy hydrogen; halogen; C ₆ ~ C ₃₀ Aryl group; O, N, S, Si and P containing at least one heteroatom C ₂ ~ C ₃₀ A heterocyclic group; C ₆ ~ C ₃₀ A fused ring group of an aliphatic ring and an aromatic ring; C ₁ ~ C ₂₀ Alkyl group; C ₂ ~ C ₂₀ Alkenyl group; C ₂ ~ C ₂₀ Alkynyl group; C ₁ ~ C ₂₀ Alkoxy group; C ₆ ~ C ₃₀ Aryloxy group; fluorenyl group; carbonyl group; ether group; Or C ₁ ~ C ₂₀ An alkoxycarbonyl group,
3) T is S, O or Se. 5. The photosensitive resin composition according to claim 4, further comprising a colorant. 15. The photosensitive resin composition of claim 14, wherein the colorant comprises at least one selected from the group consisting of inorganic dyes, organic dyes, inorganic pigments and organic pigments. A pattern or film formed of the photosensitive composition according to claim 4 . A display device comprising: a first electrode formed on a substrate; a pixel separation unit formed on the first electrode to partially expose the first electrode; and a second electrode provided to face the first electrode, wherein the pixel separation unit A display device formed of the photosensitive resin composition according to claim 4 . 18. The display device of claim 17, wherein the pixel separator is formed to cover an edge portion of the first electrode. The display device of claim 17 , wherein the pixel separation portion has a thickness of 0.5 to 10 μm. The display device of claim 17 , wherein the pixel separation unit has a taper angle of 20 to 30 degrees. An electronic device comprising: the display device of claim 17 and a controller for driving the display device.

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