KR20220023660A - Plasma generating apparatus - Google Patents

Abstract

A plasma generating apparatus according to an embodiment may include: an upper chamber and a lower chamber forming a space by combination; a plasma generating module disposed in the space and including a plurality of plasma generating units including a ferrite core; and a plurality of power supply parts respectively connected by the plasma generating unit and the coil to separately supply power to the plasma generating unit.

Description

Plasma generator {PLASMA GENERATING APPARATUS}

The present invention relates to a plasma generating device, and more particularly, to a technology capable of more easily controlling the plasma generating device by individually connecting a small power source to each of a plurality of plasma generating modules.

Plasma is an ionized gas, composed of positive ions, negative ions, electrons, excited atoms, molecules, and highly chemically active radicals. Also called the fourth state. Since such plasma contains ionized gas, it is accelerated using an electric or magnetic field, or a chemical reaction occurs to clean a wafer or a substrate, etch or deposit, etc., and is very usefully used in a semiconductor manufacturing process.

Recently, in a semiconductor manufacturing process, a plasma generator for generating high-density plasma is used. This is due to an increase in the demand for microfabrication as the degree of integration of semiconductor devices increases.

An inductively coupled (ICP) plasma generator is a device for generating high-density plasma, by introducing a processing gas into a chamber where plasma is generated, and applying high-frequency power through a high-frequency antenna disposed near a dielectric window formed on the upper part of the chamber, It is possible to form an induced electric field in the chamber via the dielectric window. The formed induced electric field ionizes the process gas to generate a plasma that is inductively coupled to the antenna. This plasma cleans, etches, or deposits objects such as a semiconductor wafer or a substrate mounted on the lower electrode.

As described above, the plasma generator according to the prior art includes an antenna for plasma generation as an essential component, and in order to generate a large-area plasma, the antenna is divided into a plurality of regions, or the size and structure are changed. is made

However, in the plasma generation process, when high power is applied to the antenna, the voltage difference between the area to which power is applied to the large antenna and the antenna in the ground area increases. Accordingly, an imbalance in plasma density in the reactor occurs, and the user There was a difficulty in generating as precise plasma as desired.

Therefore, the plasma generating device according to an embodiment is an invention designed to solve the above-described problems, and while generating plasma using a ferrite core without using an antenna, a small-scale power source is individually applied to each of the plurality of plasma generating modules at the same time. The purpose is to connect the plasma generator to control the plasma generator more easily than in the prior art.

A plasma generating apparatus according to an embodiment includes an upper chamber and a lower chamber forming a space by coupling, a plasma generating module including a plurality of plasma generating units disposed in the space, and a plurality of plasma generating units including a ferrite core, and the plasma generating unit; It may include a plurality of power supply units each connected through a coil to individually supply power to the plasma generating unit.

The plasma generating unit may include a plurality of ferrite cores disposed to be spaced apart from each other, a coil wound around the plurality of ferrite cores, respectively, and a lamp having both ends coupled to the plurality of ferrite cores.

The coil includes a first coil and a second coil respectively wound on a plurality of ferrite cores, and the power supply unit includes a first connection line electrically connected to the first coil and electrically connected to the second coil. It may include a second connection line that becomes

The plurality of ferrite cores may be disposed to face each other with respect to the lamp.

The plasma generating module may have a square shape in which the same number of the plasma generating units are disposed in regions forming respective sides.

The plurality of plasma generating units may be disposed to face each other with respect to the centrally disposed plasma generating unit, and lamps of the plasma generating units may be disposed parallel to each other.

The lamp of the plasma generating unit disposed at the corner of the plasma generating module may be inclined to form an acute angle with respect to the direction in which the side of the plasma generating module is formed.

The upper chamber and the lower chamber may be hinged about a coupling axis.

The upper chamber may further include a power holder in which the plurality of power supply units may be disposed.

The power holder unit may be divided into a plurality of zones by a space separation member.

The power supply unit may include an AC power supply having an AC frequency range of 200 khz to 300 khz.

It may further include a motor for moving or rotating the plasma generating unit or the ferrite core, and a controller capable of controlling the plasma generating unit, the ferrite core, and the power supply unit.

The controller may individually control the position and rotation direction of the ferrite core for each of the plurality of ferrite cores by using the motor.

The controller may individually control the on/off and operating directions of the plurality of plasma generating units for each of the plurality of plasma generating units.

The controller may individually control on/off of the plurality of power supply units and the amount of power supplied to the plasma generating unit for each of the plurality of power supply units.

Plasma generator according to an embodiment, since it is possible to individually control the on/off of the plasma generating unit and the amount of plasma generation by separately providing a power supply for each plasma generating unit, the voltage of the power supply compared to the prior art It can be implemented with a low voltage and has the advantage of uniformly distributing the density of plasma in the reaction region.

In addition, in the case of the present invention, it is possible to individually control the size of the power supplied to the plurality of plasma generating units through each power supply unit, and there is no need to provide a separate impedance matching unit. Accordingly, it is possible to implement a structurally simple plasma generator, and there is an advantage that the control of the plasma generator is also made easier.

In addition, since each plasma generating unit is independently configured, when a failure occurs in some of the plurality of plasma generating units, unlike the prior art, there is no need to replace all of the plasma generating units, only the faulty plasma generating unit needs to be replaced, so maintenance and repair has economic advantages.

1 is a cross-sectional view showing the appearance of a plasma generating apparatus according to an embodiment of the present invention.
2 is a perspective view illustrating an internal state of a plasma generating apparatus according to an embodiment of the present invention.
3 is a cross-sectional view showing the configuration of a plasma generating unit according to an embodiment of the present invention.
4 to 6 are views showing various embodiments of the plasma generating unit disposed in the plasma generating module.
7 is a diagram illustrating a configuration in which a power supply unit is individually connected to each plasma generating module according to an embodiment of the present invention.
8 is a view showing the appearance of the upper chamber and the lower chamber according to an embodiment of the present invention.
9 is a view for explaining a power holder that may be disposed on the upper chamber.
10 is a cross-sectional view for explaining the rotation structure of the upper chamber according to an embodiment of the present invention.
11 is a block diagram illustrating some components according to an embodiment of the present invention.
12 is a diagram illustrating a state in which a plasma generating unit is individually and differently controlled according to an embodiment of the present invention.
13 is a view for explaining the experimental results for the ion density according to an embodiment of the present invention.

Hereinafter, embodiments according to the present invention will be described with reference to the accompanying drawings. In adding reference numerals to the components of each drawing, it should be noted that the same components are given the same reference numerals as much as possible even though they are indicated on different drawings. In addition, in describing the embodiment of the present invention, if it is determined that a detailed description of a related known configuration or function interferes with the understanding of the embodiment of the present invention, the detailed description thereof will be omitted. In addition, although embodiments of the present invention will be described below, the technical spirit of the present invention is not limited thereto and may be modified by those skilled in the art and variously implemented.

In addition, the terms used herein are used to describe the embodiments, and are not intended to limit and/or limit the disclosed invention. The singular expression includes the plural expression unless the context clearly dictates otherwise.

In this specification, terms such as "comprises", "comprises" or "have" are intended to designate that the features, numbers, steps, operations, components, parts, or combinations thereof described in the specification exist, but one It does not preclude in advance the possibility of the presence or addition of other features or numbers, steps, operations, components, parts, or combinations thereof, or other features.

In addition, throughout the specification, when a certain part is "connected" with another part, it is not only "directly connected" but also "indirectly connected" with another element interposed therebetween. Including, terms including an ordinal number, such as "first", "second", etc. used herein may be used to describe various elements, but the elements are not limited by the terms.

Hereinafter, with reference to the accompanying drawings, the embodiments of the present invention will be described in detail so that those of ordinary skill in the art can easily implement them. And in order to clearly explain the present invention in the drawings, parts irrelevant to the description will be omitted.

1 is a cross-sectional view showing an external appearance of a plasma generating apparatus according to an embodiment of the present invention, and FIG. 2 is a perspective view showing an internal state of the plasma generating apparatus according to an embodiment of the present invention.

1 to 2 , the plasma generating apparatus 100 according to the embodiment of the present invention may include a lower chamber 101 , a reaction chamber 104 , and a plurality of plasma generating units 110 .

Specifically, the plasma generating device 100 is provided in the reaction chamber 104 in a vacuum state to contain the plasma 106 generated by ionizing the injection gas, and is provided above the reaction chamber 104 to generate plasma in the reaction chamber 104 . It may be provided with a plasma generating unit 110 for generating.

The reaction chamber 104 forms a reaction space in which plasma is formed to process a sample such as a semiconductor wafer or a glass substrate, and maintains the reaction space at a vacuum and a constant temperature. A gas nozzle (not shown) for injecting a reaction gas from the outside and an exhaust port 107 for discharging the reaction gas to the outside when the reaction is completed may be provided in the reaction chamber 104 . In addition, an electrode for mounting a sample such as a semiconductor wafer or a glass substrate may be provided inside the reaction chamber 104 .

In addition, the plasma generating apparatus 100 according to an embodiment of the present invention may include a power supply unit 160 for supplying power to generate plasma in the plasma generating unit 110 , and the power supply unit 160 . is individually connected to each plasma generating unit 110 as shown in FIG. 2 .

That is, in the case of the prior art, since power is supplied in series from one power supply to a plurality of plasma generating units, a high voltage is required to evenly supply voltages to all plasma generating units 110 (conventionally, 13.56Mhz or more). power supply of several kilowatts was required), in the present invention, the power supply unit 160 is individually connected to each plasma generating unit 110, so that only a small size power supply (AC frequency 200 ~ 300khz) each plasma Power can be stably supplied to the generating unit 110 .

In addition, in the case of the prior art, since power is supplied to the plurality of plasma generating units 110 from one power supply unit, an impedance matching unit for uniform power supply exists between the power supply unit and the plasma generating module. However, in the present invention, since the size of the power supplied to the plurality of plasma generating units 110 through each power supply unit 160 can be individually adjusted, there is no need to provide a separate impedance matching unit. Accordingly, the present invention can implement the structurally simple plasma generating apparatus 100, there is an advantage that the control of the plasma generating apparatus 100 is also easier.

3 is a cross-sectional view illustrating the configuration of a plasma generating unit according to an embodiment of the present invention, and FIGS. 4 to 6 are views showing various embodiments of the plasma generating unit disposed in the plasma generating module.

3 and 4 , the plasma generating unit 110 includes a ferrite core 140 , a coil 150 coupled to the ferrite core 140 , and both ends of each ferrite core 140 . The lamp 120 and the power supply unit 160 connected to the coil 150 to apply power to the plasma generating unit 110 may be included.

The plasma generating module 105 may include a plurality of the plasma generating units shown in FIG. 3 as shown in FIG. 4 . That is, the plasma generating module 105 may be formed by a combination of a plurality of plasma generating units 110 . Since the plasma generating module 105 is formed by the combination of the plasma generating units 110 , the plasma generating unit 110 may be referred to as a unit plasma generating device.

The ferrite core 140 of the plasma generating unit 110 may be disposed on the lower chamber 101 , and the ferrite core 140 may be rotatably coupled to the lower chamber 101 . The rotation of the ferrite core 140 may be performed by a user's external force.

Alternatively, the plasma generating unit 110 may include a driving motor (not shown) for rotating the plasma generating unit 110 . The driving motor may include a rotating shaft rotating by driving, and the rotating shaft may be coupled to the plasma generating unit 110 . Accordingly, the plasma generating unit 110 may be rotated by the control unit 200 for controlling the driving motor, and as the plasma generating unit 110 rotates, the ferrite core 140 coupled to the plasma generating unit 110 . may be rotated as well, so that the direction of plasma generated by the ferrite core 140 may also be changed at the same time.

The plurality of ferrite cores 140 may be spaced apart from each other and connected through the lamp 120 . The plurality of ferrite cores 140 may be disposed to face each other with respect to the lamp 120 .

The ferrite core 140 may have a circular or ring-shaped cross-sectional shape, and the coil 150 may be wound around the ferrite core 140 . When power is applied to the coil 150 from the power supply unit 160 , the coil 150 may electromagnetically interact with the ferrite core 140 . That is, plasma can be generated into the reaction chamber through electromagnetic interaction.

In addition, the coil 150 may be wound on each of the plurality of ferrite cores 140 . To this end, the coil 150 in the single plasma generating unit 110 may include a first coil and a second coil.

The power supply unit 160 may be connected in parallel with the coil 150 to supply a constant voltage. The power supply unit 160 may include a first connection line 162 connected to the first coil and a second connection line 164 connected to the second coil.

The power supply unit 160 is electrically connected to the coil 150 to apply power to the plasma generating unit 110, and the power supply unit 160 is connected to each plasma generating unit 110, so that the plasma generating module ( 105) can be individually powered. That is, although only one plasma generating unit 110 and a power supply unit 160 connected thereto are shown in FIG. 3 for convenience of explanation, as shown in FIG. A power supply unit 160 may be individually connected to the plasma generating unit 110 .

The lamp 120 may emit light by reacting an electromagnetic wave transmitted through a waveguide made of a dielectric material with a noble gas and a light emitting body filled in the light bulb. Both ends of the lamp 120 may be connected to the plurality of ferrite cores 140 and the coil 150 , and the lamp 120 may have a semicircular cross-section.

Hereinafter, a structure in which the plasma generating units 110 may be disposed in the plasma generating module 105 will be described in detail.

4 to 6 are views showing various embodiments of the plasma generating unit disposed in the plasma generating module.

4 to 6 , as described above, the plasma generating module 105 may be formed by a combination of a plurality of plasma generating units 110 . For example, the plasma generating module 105 may be formed in a square shape in which the same number of plasma generating units 110 are disposed in an area forming each side.

4 to 6 illustrate that the plasma generating unit 110 is arranged in three pieces (3x3) on each side of the plasma generating module 105 , and the plasma generating unit 110 is the upper chamber 102 . ) can be rotatably coupled to the phase. 4 to 6, for convenience of explanation, the structure of three (3x3) arranged on each side of the plasma generating module 105 is described as a reference, but this is only an example and the structure of the present invention is not It is not limited, and the number of plasma generating devices included in the plasma generating module 105 may be variously changed according to the purpose and operating environment of the plasma generating device 100 .

4 to 6 , each plasma generating unit 110 may be coupled to the lower chamber 101 to rotate on the lower chamber 101 in a clockwise or counterclockwise direction. Accordingly, the ferrite core 140 coupled to the plasma generating unit 110 may rotate on the lower chamber 101 as the plasma generating unit 110 rotates. The plurality of ferrite cores 140 may rotate while maintaining a state opposite to each other with respect to the lamp 120 .

A guide part (not shown) forming a movement path of the ferrite core 140 may be disposed on the lower chamber 101 . The ferrite core 140 may slide along the guide part.

The plasma generating unit 110 may include a driving motor (not shown) for moving or rotating the plasma generating unit 110 . The driving motors are respectively connected to transmit driving force to the plurality of plasma generating units 110 , and may rotate the plasma generating unit 110 and the plurality of ferrite cores 140 together on the lower chamber 101 . Since the lamp 120 is also connected to the plasma generating unit 110 , the lamp 120 may also rotate as the plasma generating unit 110 moves.

On the other hand, it goes without saying that the rotation of the plasma generating unit 110 can also be made by the user's external force through the lamp 120 .

4 is an example of a structure in which the plasma generating unit 110 is disposed in the plasma generating module 105. In more detail, the plasma generating module 105 has a square cross-sectional shape, and a plurality of plasma generating units 110a~ 110f) 9 can be deployed in a 3x3 model.

As shown in FIG. 4 , in the plasma generating module 105 , a plurality of plasma generating units 110b to 110i may be symmetrical to each other with respect to the plasma generating unit 110a disposed in the center.

In other words, the lamps of the plurality of plasma generating units disposed to face each other with respect to the centrally disposed plasma generating unit 110a may be disposed in parallel. In addition, the lamp of the plasma generating unit 110a disposed in the center may be disposed parallel to the lamp of at least one plasma generating unit among the plasma generating units disposed in the corner area.

As shown in FIG. 4, when the length directions of the four sides of the square are defined as the first axis (X) and the second axis (Y) perpendicular to the first axis (X), respectively, the four of the lamps 120b and 120f of the two plasma generating units 110b and 110f opposite to the plasma generating unit 110 disposed in the center among the plasma generating units forming the sides are parallel to the first axis X and the lamps 120h and 120d of the remaining two plasma generating units 110h and 110d may be arranged parallel to the second axis Y.

In addition, two plasma generating units 110i opposed to each other with respect to the plasma generating unit 110a disposed in the center of the plasma generating units 110c, 110e, 110g, 110i forming the four corners of the plasma generating module 105 as a reference. , 110e) of the lamps 120i and 120e are disposed inclined with respect to the first axis (X) or the second axis (Y), and the lamps (120c, 120g) of the remaining two plasma generating units (110c, 110g) may also be disposed to be inclined with respect to the first axis (X) or the second axis (Y).

In addition, the angle formed with the lamps 120c, 120e, 120g, 120i and the first axis (X) or the second axis (Y) of the plasma generating units 110c, 110e, 110g, 110i disposed in the corner area is It may be 45 degrees. Alternatively, the lamps 110 of the plurality of plasma generating units may be disposed parallel to each other.

5 is another example of the arrangement structure of the plasma generating module 105, and the lamps 120a to 120i of each plasma generating unit may be arranged parallel to each other. The lamps 120a to 120i of the plasma generating unit may be inclined to form an acute angle with respect to an imaginary line forming a side of the plasma generating module 105 . For example, the acute angle may be 45 degrees, and the acute angle may be freely changed by the user.

6 is another example of the arrangement structure of the plasma generating module 105, and the lamps 120a to 120i of each plasma generating unit may be arranged parallel to each other. The lamps of the plasma generating units 120a to 120i may be disposed parallel to or perpendicular to an imaginary line forming the side of the plasma generating module 105 .

According to the above structure, since the on/off and plasma generation are controlled by individually providing a power supply for each plasma generating unit, the voltage can be lower than that of the prior art, and the density of plasma generated in the reaction region can be reduced. It has the advantage of being able to distribute it evenly.

In addition, when a failure occurs in some of the plurality of plasma generating units, only the defective plasma generating unit needs to be replaced, so it is easy to replace, which is advantageous in maintenance and repair.

7 is a diagram illustrating a state in which a plurality of plasma generating units and a plurality of power supply units are individually connected according to an embodiment of the present invention.

As mentioned in FIG. 2, in the present invention, it is not a method of supplying power to all the plasma generating units 110 provided in the plasma generating device 100 in series from one large power supply unit, but a plurality of small power supply units. It is characterized in that power is individually supplied to the plasma generating unit 110 by using. Therefore, as shown in FIG. 7 , the first plasma generating unit 110a is electrically connected to the first power supply unit 160a, so it can receive power from the first power supply unit 160a, and the second plasma The generating unit 120b is connected to the second power supply unit 160b, so it can receive power from the second power supply unit 160b, and the third plasma generating unit 110c is a third power supply unit 160c and Since it is connected, it can receive power from the third power supply unit 160c. In addition, the fourth to ninth plasma generating units 110d to 110i may also receive power from the fourth to ninth power supply units 160d to 160i, respectively.

That is, in the case of the prior art, since power is supplied in series to a plurality of plasma modules from one power supply unit, a high voltage is required to evenly supply voltage to all plasma generating units 110 (conventionally, a number of 13.56Mhz or more) kw power supply was required), in the present invention, one power supply unit 160 is individually connected to the plasma generating unit 110, so that power is supplied to each plasma generating unit 110 only by supplying a small size of power. There is an effect of providing a stable supply.

In addition, in the case of the prior art, since power is supplied to the plurality of plasma generating units 110 from a single power supply unit, an impedance matching unit exists for uniform power supply between the power supply unit and the plasma generating module, but in the case of the present invention There is no need to provide a separate impedance matching unit capable of individually adjusting the size of the power supplied to the plurality of plasma generating units 110 through each power supply unit 160 . Accordingly, a structurally simple plasma generating apparatus 100 can be implemented, and there is an advantage that the control of the plasma generating apparatus 100 is also made easier.

In addition, when generating plasma using a ferrite core according to the prior art, in the case of a series structure, a lot of ion energy is lost due to its characteristics, but power is supplied to the plasma generating unit 110 using a plurality of power supplies as in the present invention. When power is supplied in parallel, the loss of ion energy is small, so the efficiency of power can also be increased.

In addition, the user can individually control the size of the power supplied to the plurality of plasma generating units 110 through the respective power supply units 160 through the control unit 200, which will be described later. Therefore, when the plasma generating device 100 is driven, it is not necessary to operate all the plasma generating units 110 and the user can selectively operate the plasma generating units 110 as much as he wants to generate plasma, thereby improving power efficiency. The control of the plasma generating apparatus 100 is also easier while being able to do so.

8 is a view showing the appearance of the upper chamber and the lower chamber according to an embodiment of the present invention, Figure 9 is a view for explaining a power holder that can be disposed on the upper chamber, Figure 10 is an embodiment of the present invention It is a cross-sectional view for explaining the rotation structure of the upper chamber according to an example.

8 to 10 , the upper chamber 102 may be disposed above the lower chamber 101 , and as shown in FIG. 10 , the upper chamber 102 and the lower chamber 101 are coupled to the coupling shaft. It can be hinged through (103). Accordingly, the upper chamber 102 may rotate about the coupling shaft 103 with respect to the lower chamber 101 . As the upper chamber 102 rotates, an upper region of the lower chamber 101 may be opened or covered from an external region through the upper chamber 102 .

As shown in FIG. 8 , a space 108 in which a plurality of plasma generating units are disposed may be formed in the inner space formed by the combination of the upper chamber 102 and the lower chamber 101 . Accordingly, the plurality of plasma generating units 110 may be protected from external disturbance by the upper chamber 102 .

In addition, the upper chamber 102 protects the plasma generating unit 110 from the outside, and at the same time, a power holder unit 170 in which a plurality of power supply units 160 can be disposed may be provided at the upper end of the upper chamber 102 . there is.

As shown in FIG. 7 above, each plasma generating unit 110 is individually connected to each power supply unit 160 , and the power supply unit 160 is physically coupled to the plasma generating device 100 . Since they are connected through each of the connection lines 162 and 164, there is a disadvantage in that mobility or storage is not easy. Accordingly, the upper chamber 102 according to the present invention may be provided with a power holder unit 170 capable of disposing a plurality of power supply units 160 on the upper chamber 102 .

The power holder unit 170 may be formed through a space separation member 171 that serves as a partition. Since the space separation member 171 is formed of a member that can be detachably coupled to the upper chamber 102 , the user can combine or detach the plurality of space separation members 171 to or detach the upper chamber 102 . may create as many power holder units 170 as desired.

In FIG. 9 , it is shown that the power holder unit is divided into a total of three (170a, 170b, 170c), but the number of the power holder unit is not limited thereto, and may be implemented in various numbers depending on the usage environment of the plasma generating device 100 . can That is, the power holder unit 170 may be provided as many as the number of plasma generating units 110 disposed in the plasma generating apparatus 100 .

11 is a block diagram illustrating some components of a plasma generating apparatus according to an embodiment of the present invention, and FIG. 12 is a view showing a state in which the plasma generating unit is individually and differently controlled according to an embodiment of the present invention.

Referring to FIG. 11 , a plasma generating apparatus 100 according to an embodiment includes a plurality of plasma generating units 110 , a plurality of power supply units 160 , a communication unit 300 and a storage unit 400 , and a plasma generating device ( 100) may include a control unit 200 for controlling the overall operation. Since the plasma generating unit 110 and the power supply unit 160 have been described in detail with reference to the preceding drawings, a description thereof will be omitted.

The controller 200 may individually control the plurality of plasma generating units 110 and the plurality of power supply units 160 , respectively.

Specifically, the control unit 200 controls the on/off of the operation of the plurality of plasma generating units 110 and the direction in which the plasma generating unit 110 generates the plasma to generate a plurality of plasmas. Each unit 110 can be individually controlled.

For example, as shown in Fig. 12 (a), all plasma generating units 110 disposed in the plasma generating module 105 can be controlled to generate plasma, and in Fig. 12 (b) As shown, all plasma generating units except for the first plasma generating unit 110a may be controlled to generate plasma. In addition, as shown in (c) of Figure 12, except for the first, 4, 8 plasma generating units (110a, 110d, 110h) in the second row, all plasma generating units can be controlled to generate plasma .

Accordingly, in controlling the plasma generating apparatus 100 , the user can individually control the plasma generating unit 110 so that the generation direction and the amount of plasma are generated as desired by the user, the plasma generating apparatus 100 . There is an advantage in that the user's convenience and efficiency are increased.

In addition, in order for the control unit 200 to individually control the plasma generation unit 110 , the power supply unit 160 that supplies power to the plasma generation unit 110 may also be individually controlled by the control unit 200 . Specifically, the control unit 200 individually controls on/off of the plurality of power supply units 160 and the amount of power supplied to the plasma generating unit 105 for each of the plurality of power supply units 160 . can do.

13 is a view for explaining an experimental result on ion density according to an embodiment of the present invention.

13, both ends (110i-1, 110i-2, 110b-1, 110b-1, 110c-1, 110c-2) of the three plasma generating units (110i, 110b, 110c) of the lower surface It is a result of measuring the amount of plasma generated at a position 4 cm below the The spacing between the generating units is about 10 cm. As shown in the graph of FIG. 13(c), it can be seen that the density of ions measured at the lower part of each plasma generating unit is almost uniform.

This is a possible phenomenon when a plurality of plasma generating units 120 can be individually controlled as in the present invention. Accordingly, the present invention has the advantage of generating plasma having a uniform density than a plasma generating apparatus according to the prior art. .

So far, the components and features of the plasma generating apparatus 100 have been studied through the drawings.

The plasma generating apparatus 100 according to an embodiment may individually control the on/off and plasma generation of the plasma generating unit 110 by separately providing a power supply unit 160 for each plasma generating unit 110 . Therefore, compared to the prior art, the voltage of the power supply unit 160 can be implemented as a low voltage, and there is an advantage in that the density of plasma in the reaction region can be uniformly distributed.

In addition, in the case of the present invention, the size of the power supplied to the plurality of plasma generating units 110 through each power supply unit 160 can be individually controlled, so there is no need to provide a separate impedance matching unit. Accordingly, a structurally simple plasma generating apparatus 100 can be implemented, and there is an advantage that the overall control of the plasma generating apparatus 100 is also made easier.

On the other hand, components, units, modules, components, etc. described as "~" described in this specification may be implemented together or individually as interoperable logic devices. Depictions of different features of modules, units, etc. are intended to emphasize different functional embodiments, and do not necessarily imply that they must be realized by separate hardware or software components. Rather, functionality associated with one or more modules or units may be performed by separate hardware or software components or integrated within common or separate hardware or software components.

Additionally, the logic flows and structural block diagrams described in this patent document describe corresponding acts and/or specific methods supported by corresponding functions and steps supported by the disclosed structural means, and corresponding It can also be used to build software structures and algorithms and their equivalents.

The present description sets forth the best mode of the invention, and provides examples to illustrate the invention, and to enable any person skilled in the art to make or use the invention. The specification thus prepared does not limit the present invention to the specific terms presented.

Although the above has been described with reference to the preferred embodiment of the present invention, those skilled in the art or those with ordinary skill in the art will not depart from the spirit and scope of the present invention described in the claims to be described later. It will be understood that various modifications and variations of the present invention can be made without departing from the scope of the present invention. Accordingly, the technical scope of the present invention should be defined by the claims rather than being limited to the contents described in the detailed description of the specification.

100: plasma generator 101: upper chamber
102: lower chamber 104: reaction chamber
105: plasma generating module 110: plasma generating unit
120: lamp 140: ferrite core
150: coil 160: power supply
200: control unit

Claims (15)

an upper chamber and a lower chamber forming a space by combining;
a plasma generating module disposed in the space and including a plurality of plasma generating units including a ferrite core; and
Plasma generator comprising a; a plurality of power supply units respectively connected through the plasma generating unit and the coil to separately supply power to the plasma generating unit. The method of claim 1,
The plasma generating unit includes a plurality of ferrite cores spaced apart from each other, a coil wound around the plurality of ferrite cores, respectively, and a lamp having both ends coupled to the plurality of ferrite cores. 3. The method of claim 2,
The coil includes a first coil and a second coil each wound on a plurality of ferrite cores,
The power supply unit includes a first connection line electrically connected to the first coil and a second connection line electrically connected to the second coil. 3. The method of claim 2,
The plurality of ferrite cores are disposed to face each other with respect to the lamp. 3. The method of claim 2,
The plasma generating module is a plasma generating device having a square shape in which the same number of the plasma generating units are disposed in a region forming each side. 6. The method of claim 5,
The plurality of plasma generating units are disposed to face each other with respect to the plasma generating unit disposed in the center,
The lamps of the plasma generating unit opposed to each other are parallel to each other. 6. The method of claim 5,
The lamp of the plasma generating unit disposed at the corner of the plasma generating module is inclined to form an acute angle with respect to a direction in which a side of the plasma generating module is formed. The method of claim 1,
The upper chamber and the lower chamber are hinge-coupled with respect to a coupling axis. The method of claim 1,
The upper chamber,
Plasma generator further comprising; a power holder unit in which the plurality of power supply units can be disposed. 10. The method of claim 9,
The power holder unit,
A plasma generating device that can be divided into a plurality of zones by a space separation member. The method of claim 1,
The power supply unit,
Plasma generator comprising an AC power supply having an AC frequency range of 200 khz to 300 khz. 3. The method of claim 2,
a motor for moving or rotating the plasma generating unit or the ferrite core; and
Plasma generator further comprising; a control unit capable of controlling the plasma generating unit, the ferrite core, and the power supply. 13. The method of claim 12,
The control unit is
A plasma generator for individually controlling the position and rotation direction of the ferrite core for each of the plurality of ferrite cores by using the motor. 13. The method of claim 12,
The control unit is
A plasma generating apparatus for individually controlling on/off and operating directions of the plurality of plasma generating units for each of the plurality of plasma generating units. 13. The method of claim 12,
The control unit is
A plasma generating apparatus for individually controlling on/off of the plurality of power supply units and the amount of power supplied to the plasma generating unit for each of the plurality of power supply units.

Images