KR20220022568A - Apparatus for treating substrate - Google Patents

Abstract

The present invention provides a substrate treating apparatus in which a treatment liquid flow can be improved. The substrate treating apparatus includes a stage unit for supporting a substrate and a liquid supply unit supplying a treatment liquid to the substrate supported by the stage unit, wherein the liquid supply unit includes a liquid supply head supplying the treatment liquid, a liquid storage unit storing the treatment liquid delivered to the liquid supply head, a supply flow passage for transferring the treatment liquid from the liquid storage unit to the liquid supply head, and a sensor installed in the liquid storage unit and/or the supply flow passage to measure a real-time viscosity value of the treatment liquid.

Description

Substrate processing apparatus {APPARATUS FOR TREATING SUBSTRATE}

The present invention relates to an apparatus for processing a substrate.

In general, the inkjet method of spraying liquid ink on the surface of a medium is used not only in the field of printing documents or flyers, but also in the substrate processing process in the semiconductor or display field. In a substrate processing process in the semiconductor/display field using an inkjet method, a pattern of a complex shape is formed on a substrate by discharging ink droplets to a specific position on a substrate (eg, glass).

Inkjet devices used in semiconductor or display fields include a reservoir that stores ink, an inkjet head that discharges ink to a substrate, and a supply tube that delivers the ink stored in the reservoir to the inkjet head. includes In the inkjet device, the inkjet head receives ink from the reservoir and discharges the ink in the form of droplets to the substrate.

In order for the inkjet apparatus to eject an accurate amount of ink, it is important to properly maintain the viscosity characteristics of the ink stored in the reservoir, the ink ejected by the inkjet head, or the ink flowing through the supply pipe. This is because, when the ink is cured and its viscosity value increases, the inkjet head cannot eject the correct amount of ink.

Accordingly, in a general inkjet device, a stirrer is installed in the reservoir to properly maintain the viscosity characteristics of the ink. The agitator imparts fluidity to the ink stored in the reservoir, inhibiting the curing of the ink, and improving the flow of the ink within the device. However, there is a limit in improving the flow of ink in a general inkjet device because it does not receive feedback on how much the flow of ink is improved in the device.

Also, in general, the stirrer is operated at set intervals. In this case, curing of the ink may occur between the operating cycles of the agitator. When hardening of ink occurs, the operator performs maintenance of the inkjet device based on the know-how. In this way, depending on the skill of the operator, the operation downtime of the inkjet device may be prolonged, which directly leads to a decrease in productivity. do.

An object of the present invention is to provide a substrate processing apparatus capable of efficiently processing a substrate.

Another object of the present invention is to provide a substrate processing apparatus capable of improving the flow of a processing liquid.

Another object of the present invention is to provide a substrate processing apparatus capable of supplying an accurate amount of processing liquid to a substrate.

Another object of the present invention is to provide a substrate processing apparatus capable of properly maintaining the viscosity characteristics of a processing liquid supplied to a substrate.

Another object of the present invention is to provide a substrate processing apparatus capable of measuring the viscosity characteristics of a processing liquid stored in a liquid storage unit and/or a processing liquid flowing through a supply passage in real time.

Another object of the present invention is to provide a substrate processing apparatus capable of correcting a viscosity value of a processing liquid to fall within a set viscosity range.

The object of the present invention is not limited thereto, and other objects not mentioned will be clearly understood by those skilled in the art from the following description.

The present invention provides a substrate processing apparatus. An apparatus for processing a substrate includes: a stage unit for supporting the substrate; and a liquid supply unit supplying a processing liquid to the substrate supported by the stage unit, wherein the liquid supply unit includes: a liquid supply head supplying the processing liquid; a liquid storage unit storing the treatment liquid delivered to the liquid supply head; a supply passage for transferring the processing liquid from the liquid storage unit to the liquid supply head; and a sensor installed in the liquid storage unit and/or the supply passage to measure a real-time viscosity value of the treatment liquid.

According to an embodiment, the supply passage may be provided in plurality, and the sensor and the supply valve may be installed in each of the supply passages.

According to an embodiment, the supply valve may be installed downstream of the sensor.

According to an embodiment, the device further includes a controller, wherein the controller opens a selected one of the supply valves when the real-time viscosity value is greater than or equal to a set value than the reference viscosity value of the treatment liquid. The liquid supply unit may be controlled to purge the supply passage.

In an embodiment, the liquid supply unit may include: a recovery passage configured to recover the treatment liquid from the liquid supply head to the liquid storage unit; and a pump installed in the supply passage or the recovery passage to form a flow of the treatment liquid.

According to an embodiment, the apparatus further includes a controller, wherein when the real-time viscosity value is greater than a reference viscosity value of the processing liquid by more than a set value, the controller drives the pump to remove the liquid from the liquid supply head. The liquid supply unit may be controlled to recover the treatment liquid to the liquid storage unit.

According to an embodiment, the controller may control the liquid supply unit to change the driving force of the pump according to a difference between the real-time viscosity value and the reference viscosity value.

According to an embodiment, the liquid supply unit may further include a stirrer for imparting fluidity to the treatment liquid stored in the liquid storage unit.

According to an embodiment, the device further includes a controller, wherein, when the real-time viscosity value is greater than a set value than the reference viscosity value of the treatment liquid, the controller drives the stirrer and stores the value stored in the liquid storage unit. The liquid supply unit may be controlled to impart fluidity to the treatment liquid.

According to an embodiment, the controller may control the liquid supply unit to change the driving force of the stirrer according to a difference between the real-time viscosity value and the reference viscosity value.

According to an embodiment, the liquid supply unit may further include a drain passage connected to the liquid storage unit to discharge the processing liquid stored in the liquid storage unit to the outside.

According to an embodiment, the device further includes a controller, wherein the controller is configured to discharge the treatment liquid through the drain passage when the real-time viscosity value is greater than a reference viscosity value of the treatment liquid by more than a set value. The liquid supply unit may be controlled.

According to an embodiment, the sensor may be a Doppler sensor that measures the viscosity of the treatment liquid in real time.

According to an embodiment, the liquid supply unit may further include an alarm unit that generates an alarm when the real-time viscosity value is greater than a reference viscosity value of the treatment liquid by more than a set value.

According to an embodiment, the alarm unit may change the type of the alarm to be generated according to a difference value between the real-time viscosity value and the reference viscosity value.

According to an embodiment of the present invention, it is possible to efficiently process the substrate.

In addition, according to an embodiment of the present invention, it is possible to improve the flow of the treatment liquid.

In addition, according to an embodiment of the present invention, it is possible to supply an accurate amount of the processing liquid to the substrate.

In addition, according to an embodiment of the present invention, it is possible to properly maintain the viscosity characteristics of the processing liquid supplied to the substrate.

Also, according to an embodiment of the present invention, the viscosity characteristics of the treatment liquid stored in the liquid storage unit and/or the treatment liquid flowing through the supply passage may be measured in real time.

Also, according to an embodiment of the present invention, the viscosity value of the treatment liquid may be corrected to fall within a set viscosity range.

Effects of the present invention are not limited to the above-described effects, and effects not mentioned will be clearly understood by those of ordinary skill in the art to which the present invention belongs from the present specification and accompanying drawings.

1 is a view showing a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a view showing the liquid supply unit of FIG. 1 .
3 is a table illustrating an example in which real-time viscosity values of a treatment liquid stored in a liquid storage unit and a treatment liquid flowing through a supply passage fall within a normal range.
4 is a table showing an example in which the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach the warning viscosity value.
5 is a diagram illustrating an example in which the liquid supply unit adjusts the viscosity value of the treatment liquid when the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply flow path reach a warning viscosity value.
6 is a table showing an example in which the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach the fault viscosity value.
7 is a view illustrating an example in which the liquid supply unit adjusts the viscosity value of the treatment liquid when the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach a fault viscosity value.
8 is a diagram illustrating an example in which the liquid supply unit adjusts a viscosity value of a treatment liquid.
9 is a table showing an example in which a real-time viscosity value of a treatment liquid flowing through one of the supply passages reaches a fault viscosity value.
10 is a diagram illustrating an example in which the liquid supply unit adjusts the viscosity value of the treatment liquid when the real-time viscosity value of the treatment liquid flowing through one of the supply passages reaches a fault viscosity value.

Hereinafter, with reference to the accompanying drawings, embodiments of the present invention will be described in detail so that those of ordinary skill in the art to which the present invention pertains can easily implement them. However, the present invention may be implemented in several different forms and is not limited to the embodiments described herein. In addition, in describing a preferred embodiment of the present invention in detail, if it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the gist of the present invention, the detailed description thereof will be omitted. In addition, the same reference numerals are used throughout the drawings for parts having similar functions and functions.

"Including" a certain component means that other components may be further included, rather than excluding other components, unless otherwise stated. Specifically, terms such as “comprise” or “have” are intended to designate that a feature, number, step, action, component, part, or combination thereof described in the specification is present, and includes one or more other features or It should be understood that the existence or addition of numbers, steps, operations, components, parts, or combinations thereof does not preclude the possibility of addition.

The singular expression includes the plural expression unless the context clearly dictates otherwise. In addition, shapes and sizes of elements in the drawings may be exaggerated for clearer description.

Hereinafter, an embodiment of the present invention will be described with reference to FIGS. 1 to 10 .

1 is a view showing a substrate processing apparatus according to an embodiment of the present invention. Referring to FIG. 1 , the substrate processing apparatus 1000 according to an exemplary embodiment may process the substrate G by supplying a processing liquid L to the substrate G. The substrate processing apparatus 1000 may be an inkjet apparatus that discharges ink in the form of droplets. Also, the substrate G may be a glass substrate. In addition, the processing liquid L may be ink.

The substrate processing apparatus 1000 may include a stage unit 100 , a liquid supply unit 300 , and a controller 500 . The stage unit 100 may support the substrate G. In addition, the stage unit 100 can transport the substrate G. The stage unit 100 may include a mounting plate 110 and a transport rail 120 . The seating plate 110 may have a seating surface supporting the substrate G. The seating plate 110 may be moved along the transport rail 120 . Accordingly, the seating plate 110 may be transported to the processing area where the liquid supply unit 300 discharges the processing liquid L.

The liquid supply unit 300 may supply the processing liquid L to the substrate G supported by the stage unit 100 . The processing liquid L supplied by the liquid supply unit 300 may be ink. In addition, the liquid supply head 310 to be described later may supply the processing liquid L while reciprocating in a direction perpendicular to the transport direction of the substrate G when viewed from above.

FIG. 2 is a view showing the liquid supply unit of FIG. 1 . Referring to FIG. 2 , the liquid supply unit 300 includes a liquid supply head 310 , a liquid storage unit 330 , a pressure control member 340 , supply passages 351 , 352 , 353 , 354 , and a recovery passage 360 . ), a drain passage 370 , sensors 381 , 382 , 383 , 384 , and 385 , and an alarm unit 390 .

The liquid supply head 310 may supply the processing liquid L to the substrate G. The liquid supply head 310 may include at least one nozzle for discharging the processing liquid L. For example, the liquid supply head 310 may include a plurality of nozzles for discharging the processing liquid L. The liquid supply head 310 may be an ink jet head. The liquid supply head 310 may discharge the processing liquid L in the form of droplets.

The processing liquid L may be stored in the liquid storage unit 330 . For example, the liquid storage unit 330 may have a storage space 332 in which the processing liquid L is stored. The liquid storage unit 330 may have a cylindrical shape. The liquid storage unit 330 may be a reservoir. The processing liquid L stored in the liquid storage unit 330 may be ink. In addition, a stirrer 334 may be installed in the liquid storage unit 330 . The stirrer 334 may be installed in the storage space 332 . The stirrer 334 may provide fluidity to the treatment liquid L stored in the liquid storage unit 330 to suppress curing of the treatment liquid L.

The pressure control member 340 may adjust the pressure of the storage space 332 . The pressure control member 340 may be connected to the liquid storage unit 330 via the pressure control tube 342 . The pressure control member 340 may adjust the pressure of the storage space 332 to control the processing liquid L in the liquid supply head 310 to maintain a meniscus state. The meniscus state may be a curved state in which the processing liquid L, which is in a state of being ready to be discharged from the liquid supply head 310, is concave inward by a capillary phenomenon with respect to the nozzle inlet.

The supply passages 351 , 352 , 353 , and 354 may transfer the processing liquid L from the liquid storage unit 330 to the liquid supply head 310 . One end of the supply passages 351 , 352 , 353 , and 354 may be connected to the liquid storage unit 330 , and the other end of the supply passages 351 , 352 , 353 , and 354 may be connected to the liquid supply head 310 . . At least one supply flow path 351 , 352 , 353 , and 354 may be provided. For example, a plurality of supply passages 351 , 352 , 353 , and 354 may be provided. For example, the supply passages 351 , 352 , 353 , and 354 may include a first supply passage 351 , a second supply passage 352 , a third supply passage 353 , and a fourth supply passage 354 . can However, the present invention is not limited thereto, and the number of supply passages 351 , 352 , 353 , and 354 of the liquid supply unit 300 may be variously modified as necessary.

Supply valves 356 , 357 , 358 , and 359 may be installed in the supply passages 351 , 352 , 353 , and 354 . For example, when a plurality of supply passages 351 , 352 , 353 , and 354 are provided, supply valves 356 , 357 , 358 , 359 may be installed in each of the supply passages 351 , 352 , 353 , 354 . . For example, a first supply valve 356 may be installed in the first supply passage 351 . In addition, a second supply valve 357 may be installed in the second supply passage 352 . In addition, a third supply valve 358 may be installed in the third supply passage 353 . In addition, a fourth supply valve 359 may be installed in the fourth supply passage 354 . The supply valves 356 , 357 , 358 , 359 may be on/off valves. However, the present invention is not limited thereto, and the supply valves 356 , 357 , 358 , and 359 may be provided as flow control valves.

The recovery passage 360 may recover the treatment liquid L from the liquid supply head 310 to the liquid storage unit 330 . One end of the recovery passage 360 may be connected to the liquid supply head 310 , and the other end of the recovery passage 360 may be connected to the liquid storage unit 330 . In addition, a flow meter 362 , a pump 364 , and a recovery valve 366 may be installed in the recovery passage 360 . The pump 364 may transmit pressure to the recovery flow path 360 so that a flow of the treatment liquid L is formed in the recovery flow path 360 . Also, the flow meter 362 may measure how much the processing liquid L flows through the recovery passage 360 per unit time. Also, the recovery valve 366 may selectively block or open the recovery flow path 360 so that the treatment liquid L can selectively flow through the recovery flow path 360 . Also, the recovery valve 366 may be an on/off valve. However, the present invention is not limited thereto, and the recovery valve 366 may be provided as a flow control valve.

The drain passage 370 may discharge the processing liquid L stored in the liquid storage unit 330 to the outside. A drain valve 372 is installed in the drain passage 370 to selectively discharge the processing liquid L stored in the liquid storage unit 330 .

The sensors 381 , 382 , 383 , 384 , and 385 may measure the viscosity of the treatment liquid L in real time. The sensors 381 , 382 , 383 , 384 , and 385 may be Doppler sensors. For example, the sensors 381, 382, 383, 384, and 385 utilize the Doppler Effect, and the viscosity or liquid storage unit ( 330) may be a sensor capable of measuring the viscosity of the processing liquid (L) in real time. For example, the sensors 381 , 382 , 383 , 384 , and 385 use ultrasonic waves or microwaves to measure the viscosity of the processing liquid L flowing in the supply passages 351 , 352 , 353 , 354 or the liquid storage unit 330 . It may be a sensor capable of measuring the viscosity of the stored treatment liquid (L) in real time. The sensors 381, 382, 383, 384, and 385 may be variously modified as known Doppler sensors.

The sensors 381 , 382 , 383 , 384 , and 385 may be installed in the liquid storage unit 330 . In addition, the sensors 381 , 382 , 383 , 384 , and 385 may be installed in the supply passages 351 , 352 , 353 , and 354 . For example, the sensors 381 , 382 , 383 , 384 , and 385 include a first sensor 381 installed in the first supply flow path 351 , a second sensor 382 installed in the second supply flow path 352 , and a second sensor 382 installed in the second supply flow path 352 . a third sensor 383 installed in the third supply passage 353 , a fourth sensor 384 installed in the fourth supply passage 354 , and a storage sensor 385 installed in the liquid storage unit 330 . can do.

The first sensor 381 may measure the viscosity of the treatment liquid L flowing through the first supply passage 351 in real time. The second sensor 382 may measure the viscosity of the treatment liquid L flowing through the second supply passage 352 in real time. The third sensor 383 may measure the viscosity of the treatment liquid L flowing through the third supply passage 353 in real time. The fourth sensor 384 may measure the viscosity of the treatment liquid L flowing through the fourth supply passage 351 in real time. The storage sensor 385 may measure the viscosity of the processing liquid L stored in the liquid storage 330 in real time. The real-time viscosity value of the treatment liquid L measured by the sensors 381 , 382 , 383 , 384 , and 385 may be transmitted to the controller 500 to be described later.

If the real-time viscosity value measured by the sensors 381, 382, 383, 384, and 385 is greater than the reference viscosity value of the treatment liquid L by more than a set range, the alarm unit 390 is configured to allow the operator to recognize it. ) can occur. Also, the alarm unit 390 may change the alarm type according to a difference between the real-time viscosity value measured by the sensors 381 , 382 , 383 , 384 , and 385 and the reference viscosity value of the treatment liquid L. Here, the type of alarm is not only when the medium (eg, sound, light, image) that transmits a signal to the operator is different from each other, but also when the operator can recognize the difference in the alarm even with the same type of medium (eg, small sound and It should be interpreted as a concept that also includes loud sounds).

The controller 500 may control the substrate processing apparatus 1000 . The controller 500 may control the liquid supply unit 300 . The controller 500 compares the real-time viscosity value of the processing liquid L measured by the sensors 381 , 382 , 383 , 384 , and 385 with a pre-stored viscosity value to drive the substrates of the liquid supply unit 300 . can For example, the controller 500 compares the real-time viscosity value of the processing liquid L measured by the sensors 381 , 382 , 383 , 384 , and 385 with a pre-stored viscosity value with each other to compare the supply valve of the liquid supply unit 300 . 356 , 357 , 358 , 359 , a pump 364 , a return valve 366 , a drain valve 372 , and a stirrer 334 can be controlled. In this case, since fluidity is imparted to the treatment liquid L in the liquid supply unit 300 or the cured treatment liquid L is discharged to the outside, the viscosity value of the treatment liquid L may be corrected within a desired range.

3 is a table illustrating an example in which real-time viscosity values of a treatment liquid stored in a liquid storage unit and a treatment liquid flowing through a supply passage fall within a normal range.

Referring to FIG. 3 , the reference viscosity value may be a value indicating the viscosity characteristic of the treatment liquid L. For example, the reference viscosity value means a value previously input to the controller 500 by measuring the viscosity value of the treatment liquid L when the treatment liquid L is put into the liquid storage unit 330 of the liquid supply unit 300 . can do. In addition, the reference viscosity value may mean a value previously input to the controller 500 by measuring the viscosity value of the treatment liquid L when the treatment liquid L is initially introduced into the supply passages 351 , 352 , 353 and 354 . can In FIG. 3 , the reference viscosity value is described as 100 as an example, but this is only an example and the reference viscosity value may be variously modified depending on the type of the treatment liquid (L) and the processing conditions required for processing the substrate (G). there is.

The real-time viscosity value may mean a viscosity value of the treatment liquid L measured in real time by the sensors 381 , 382 , 383 , 384 , and 385 .

The warning viscosity value may be a set value of a viscosity value in which a set % curing has been performed with respect to a reference viscosity value. For example, the warning viscosity value may be a set value of a viscosity value in which 10% curing has been performed with respect to the reference viscosity value. For example, if the reference viscosity value is 100, the warning viscosity value may be 110. Also, if the reference viscosity value is 90, the warning viscosity value may be 99. However, the present invention is not limited thereto, and the setting % used when calculating the warning viscosity value may be variously modified.

The fault viscosity value may be a set value of a viscosity value in which a set % curing has been performed with respect to a reference viscosity value. For example, the fault viscosity value may be a set value of a viscosity value at which 20% curing has been performed with respect to the reference viscosity value. For example, if the reference viscosity value is 100, the fault viscosity value may be 120. Also, if the reference viscosity value is 90, the fault viscosity value may be 108. However, the present invention is not limited thereto, and the setting % used when calculating the warning viscosity value may be variously modified.

In addition, in the above example, the parameter (Parameter) has been described as an example having a reference viscosity value, a real-time viscosity value, a warning viscosity value, and a fault viscosity value, but it is not limited thereto. You can also add parameters.

Looking at the real-time viscosity value described in FIG. 3 , the viscosity value of the treatment liquid L measured in real time by the sensors 381 , 382 , 383 , 384 and 385 is the treatment liquid L stored in the liquid storage unit 330 . The viscosity value of 100, the first supply passage 351, the second supply passage 352, the third supply passage 353, and the viscosity value of the processing liquid L flowing through the fourth supply passage 354 are 90, respectively. am. That is, the viscosity value of the processing liquid L stored in the liquid storage unit 330 and the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the fourth supply passage 354 . Since the viscosity value of the treatment liquid (L) flowing in the flow is not greater than the set value (because the warning viscosity value has not been reached), the viscosity value correction for the treatment liquid (L) is not required in the case of FIG. .

4 is a table showing an example in which the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach the warning viscosity value. Referring to FIG. 4 , the viscosity value of the processing liquid L measured in real time by the sensors 381 , 382 , 383 , 384 and 385 is 110, the viscosity value of the processing liquid L stored in the liquid storage unit 330 is 110 , the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the fourth supply passage 354 have a viscosity value of 99 of the treatment liquid L flowing through the passages 354 , respectively. That is, the viscosity value of the processing liquid L stored in the liquid storage unit 330 and the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the fourth supply passage 354 . Since the viscosity value of the treatment liquid L flowing through the sieve is larger than the reference viscosity value by more than a set value (because the warning viscosity value has been reached), in the case of FIG. 4 , correction of the viscosity value of the treatment liquid L is required.

5 is a diagram illustrating an example in which the liquid supply unit adjusts the viscosity value of the treatment liquid when the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach a warning viscosity value. Referring to FIG. 5 , the viscosity value of the processing liquid L stored in the liquid storage unit 330 is 110 , the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the third supply passage 353 , The viscosity values of the treatment liquid L flowing through the 4 supply passages 354 are 99, respectively. That is, the viscosity value of the processing liquid L stored in the liquid storage unit 330 and the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the fourth supply passage 354 . When the viscosity value of the treatment liquid L flowing in the flow is greater than the reference viscosity value by more than a set value (when a warning viscosity value is reached), the controller 500 opens the recovery valve 366 and drives the pump 364 . Thus, the treatment liquid L may be recovered from the liquid supply head 310 to the liquid storage unit 330 . In addition, fluidity may be imparted to the treatment liquid L accommodated in the liquid storage unit 330 by selectively driving the stirrer 334 installed in the liquid storage unit 330 . Accordingly, the viscosity of the treatment liquid L may be corrected.

Also, the sensors 381 , 382 , 383 , 384 , and 385 may measure the viscosity value of the treatment liquid L in real time, and transmit the measured viscosity value to the controller 500 . The controller 500 may drive the stirrer 334 and/or the pump 364 until the viscosity value of the treatment liquid L measured in real time falls within a set range (eg, 100 to 110).

Also, the controller 500 may change the driving force of the pump 364 and/or the agitator 334 according to the difference between the real-time viscosity value and the reference viscosity value. For example, when the difference between the real-time viscosity value and the reference viscosity value is large, the controller 500 may increase the driving force of the pump 364 and/or the stirrer 334 . Conversely, when the difference between the real-time viscosity value and the reference viscosity value is small, the controller 500 may decrease the driving force of the pump 364 and/or the agitator 334 . This is to prevent excessive power wasted in lowering the viscosity value, and to suppress the occurrence of bubbles in the treatment liquid L due to excessive flow of the treatment liquid L.

6 is a table showing an example in which the real-time viscosity values of the treatment liquid stored in the liquid storage unit and the treatment liquid flowing through the supply passage reach the fault viscosity value. Referring to FIG. 6 , the viscosity value of the treatment liquid L stored in the liquid storage unit 330 is 120 , the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the second The viscosity values of the treatment liquid L flowing through the 4 supply passages 354 are 108, respectively. That is, the viscosity value of the processing liquid L stored in the liquid storage unit 330 and the first supply passage 351 , the second supply passage 352 , the third supply passage 353 , and the fourth supply passage 354 . When the viscosity value of the treatment liquid L flowing in the flow is greater than the set value (when the fault viscosity value is reached) than the reference viscosity value, the controller 500 opens the supply valves 356, 357, 358, and 359 to supply A purge may be performed on the flow paths 351 , 352 , 353 , and 354 . In this case, the pressure control member 340 may apply pressure to the storage space 332 to push the processing liquid L stored in the storage space 332 to the supply passages 351 , 352 , 353 , and 354 . In this case, since fluidity is imparted to the treatment liquid L and a part of the cured treatment liquid L is discharged to the outside by the liquid supply head 310 , the viscosity of the treatment liquid L may be corrected.

Also, the sensors 381 , 382 , 383 , 384 , and 385 may measure the viscosity value of the treatment liquid L in real time, and transmit the measured viscosity value to the controller 500 . The controller 500 drives the pressure control member 340 until the viscosity value of the treatment liquid L measured in real time falls within a set range (eg, 100 to 110), and the supply valves 356, 357, 358 and 359 may be opened to purge the supply passages 351 , 352 , 353 , and 354 .

Also, similarly to the above, the controller 500 may change the pressure applied by the pressure control member 340 according to the difference between the real-time viscosity value and the reference viscosity value.

8 is a diagram illustrating an example in which the liquid supply unit adjusts a viscosity value of a treatment liquid. 8, when the real-time viscosity value of the treatment liquid L measured by the sensors 381, 382, 383, 384, and 385 reaches a warning viscosity value or a fault viscosity value, the controller 500 controls the drain valve ( By opening 372 , the processing liquid L in the storage space 332 may be discharged to the outside through the drain passage 370 . Discharge of the treatment liquid L through the drain passage 370 is performed by purging the above-described supply passages 351 , 352 , 353 and 354 , circulation of the treatment liquid L through the recovery passage 360 , It may be performed in combination with imparting fluidity to the treatment liquid L through the stirrer 334 .

In addition, according to an embodiment of the present invention, when purging the supply passages 351 , 352 , 353 , and 354 , excessive waste of the processing liquid L may be suppressed. In some cases, the real-time viscosity value of the treatment liquid L flowing through any one of the supply passages 351 , 352 , 353 and 354 among the supply passages 351 , 352 , 353 and 354 may be large. For example, as shown in FIG. 9 , a case in which the real-time viscosity value of the treatment liquid L flowing in the first supply flow passage 108 among the supply flow passages 351 , 352 , 353 and 354 reaches the fault viscosity value there may be In this case, the controller 500 opens the supply valves 356, 357, 358, and 359 selected among the supply valves 356, 357, 358, and 359 so that the opened supply valves 356, 357, 358, and 359 are The installed supply flow passages 351 , 352 , 353 , and 354 may be purged. For example, as shown in FIG. 10 , the controller 500 may open the first supply valve 356 to perform purging of the first supply passage 351 . Accordingly, as the purge is performed, excessive waste of the processing liquid L may be suppressed as much as possible.

In the above example, when the real-time viscosity value of the treatment liquid L measured by the sensors 381, 382, 383, 384, and 385 reaches the warning viscosity value, the stirrer 334 and/or the pump 364 is operated. As an example, the purge is performed when the real-time viscosity value of the treatment liquid L measured by the sensors 381 , 382 , 383 , 384 , and 385 reaches the fault viscosity value, but is not limited thereto. For example, when a fault viscosity value is reached, the controller 500 can actuate the stirrer 334 and/or the pump 364 , and when a warning viscosity value is reached, the controller 500 sends the feed flow path 351 , 352 , 353 , and 354 may be controlled to purge the liquid supply unit 300 . In addition, driving the agitator 334 and/or the pump 364 , purging the supply passages 351 , 352 , 353 , and 354 , and discharging the treatment liquid L through the drain passage 370 are combined with each other as needed and can be used

Also, the controller 500 may store a history of performing the correction of the viscosity value of the processing liquid L, convert it into data, and determine a maintenance time for the substrate processing apparatus 1000 based on the data.

In the above-described example, it has been described that the substrate G is supported and transported by the mounting plate 110 as an example, but the present invention is not limited thereto. For example, the substrate G may be transported by an air floating method.

The above detailed description is illustrative of the present invention. In addition, the above description shows and describes preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications are possible within the scope of the concept of the invention disclosed herein, the scope equivalent to the written disclosure, and/or within the scope of skill or knowledge in the art. The written embodiment describes the best state for implementing the technical idea of the present invention, and various changes required in specific application fields and uses of the present invention are possible. Accordingly, the detailed description of the present invention is not intended to limit the present invention to the disclosed embodiments. Also, the appended claims should be construed to include other embodiments.

Substrate processing unit: 1000
Treatment liquid: L
Stage units: 100
Liquid supply unit: 300
Liquid supply head: 310
Liquid storage unit: 330
Storage: 332
Agitator: 334
Pressure control member: 340
Pressure regulating tube: 342
Supply Euro: 351, 352, 353, 354
1st supply flow path: 351
2nd supply flow path: 352
3rd supply flow: 353
4th supply flow: 354
Supply valves: 356, 357, 358, 359
1st supply valve: 356
Second supply valve: 357
3rd supply valve: 358
4th supply valve: 359
Recovery Euro: 360
Flowmeter: 362
Pump: 364
Return valve: 366
Drain Euro: 370
Drain valve: 372
Sensors: 381, 382, 383, 384, 385
1st sensor: 381
Second sensor: 382
3rd sensor: 383
4th sensor: 384
Storage sensor: 385
Alarm part: 390
Controller: 500

Claims (15)

An apparatus for processing a substrate, comprising:
a stage unit supporting the substrate; and
a liquid supply unit supplying a processing liquid to the substrate supported by the stage unit;
The liquid supply unit,
a liquid supply head for supplying the processing liquid;
a liquid storage unit storing the processing liquid delivered to the liquid supply head;
a supply passage for transferring the processing liquid from the liquid storage unit to the liquid supply head; and
and a sensor installed in the liquid storage unit and/or the supply passage to measure a real-time viscosity value of the processing liquid. According to claim 1,
The supply flow path is provided in plurality,
A substrate processing apparatus in which the sensor and a supply valve are installed in each of the supply passages. 3. The method of claim 2,
The supply valve is
A substrate processing apparatus installed downstream of the sensor. 4. The method of claim 2 or 3,
The device is
further comprising a controller;
The controller is
When the real-time viscosity value is greater than the reference viscosity value of the processing liquid by a set value or more, a substrate for controlling the liquid supply unit to purge the supply flow path by opening a selected supply valve among the supply valves processing unit. According to claim 1,
The liquid supply unit,
a recovery passage for recovering the treatment liquid from the liquid supply head to the liquid storage unit; and
and a pump installed in the supply passage or the recovery passage to form a flow of the processing liquid. 6. The method of claim 5,
The device is
further comprising a controller;
The controller is
When the real-time viscosity value is greater than a reference viscosity value of the processing liquid by more than a set value, the substrate processing apparatus controls the liquid supply unit to recover the processing liquid from the liquid supply head to the liquid storage unit by driving the pump. 7. The method of claim 6,
The controller is
and controlling the liquid supply unit to change a driving force of the pump according to a difference between the real-time viscosity value and the reference viscosity value. According to claim 1,
The liquid supply unit,
The substrate processing apparatus further comprising a stirrer for imparting fluidity to the processing liquid stored in the liquid storage unit. 9. The method of claim 8,
The device is
further comprising a controller;
The controller is
and when the real-time viscosity value is greater than a reference viscosity value of the processing liquid by more than a set value, controlling the liquid supply unit to provide fluidity to the processing liquid stored in the liquid storage unit by driving the stirrer. 10. The method of claim 9,
The controller is
and controlling the liquid supply unit to change a driving force of the stirrer according to a difference between the real-time viscosity value and the reference viscosity value. According to claim 1,
The liquid supply unit,
and a drain passage connected to the liquid storage unit to discharge the processing liquid stored in the liquid storage unit to the outside. 12. The method of claim 11,
The device is
further comprising a controller;
The controller is
When the real-time viscosity value is greater than a reference viscosity value of the processing liquid by more than a set value, the substrate processing apparatus controls the liquid supply unit to discharge the processing liquid through the drain passage. According to claim 1,
The sensor is
A substrate processing apparatus which is a Doppler sensor that measures the viscosity of the processing liquid in real time. According to claim 1,
The liquid supply unit,
and an alarm unit configured to generate an alarm when the real-time viscosity value is greater than a reference viscosity value of the processing liquid by more than a set value. 15. The method of claim 14,
The alarm blows,
A substrate processing apparatus for changing a type of the alarm generated according to a difference value between the real-time viscosity value and the reference viscosity value.

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