KR20210028832A - Low dielectric dye type black matrix for color filter on array - Google Patents

Low dielectric dye type black matrix for color filter on array Download PDF

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KR20210028832A
KR20210028832A KR1020190109864A KR20190109864A KR20210028832A KR 20210028832 A KR20210028832 A KR 20210028832A KR 1020190109864 A KR1020190109864 A KR 1020190109864A KR 20190109864 A KR20190109864 A KR 20190109864A KR 20210028832 A KR20210028832 A KR 20210028832A
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black matrix
dye
methoxyphenoxy
color filter
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최준
이상윤
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한국생산기술연구원
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00Porphines; Azaporphines
    • C09B47/04Phthalocyanines abbreviation: Pc
    • C09B47/08Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/085Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex substituting the central metal atom
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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Abstract

The present invention relates to a low dielectric dye type black matrix for a color filter array structure and, more specifically, to a tetrabenzocorrolazine dye with high color intensity, a wide absorption range, low dielectric strength, and high durability, to a photosensitive resin composition comprising the dye, to a black matrix comprising the dye, and to a color filter comprising the black matrix.

Description

컬러 필터 배열 구조용 저유전 염료형 블랙매트릭스{Low dielectric dye type black matrix for color filter on array}Low dielectric dye type black matrix for color filter on array

본 발명은 Color Filter On Array 구조용 블랙매트릭스 제조용 저유전성 테트라벤조코롤라진(tetrabenzocorrolazine) 염료, 이를 포함하는 감광성 수지 조성물, 및 상기 염료를 포함하는 블랙매트릭스에 관한 것이다.The present invention relates to a low dielectric tetrabenzocorrolazine dye for manufacturing a black matrix for a color filter on array structure, a photosensitive resin composition comprising the same, and a black matrix comprising the dye.

LCD 또는 대형 OLED 패널에서의 핵심 부품인 컬러필터는 디스플레이 화질 향상에 가장 비중이 큰 부품으로 블랙 매트릭스는 컬러필터의 구성요소 중 2번째로 큰 시장이며 특히 명암비 향상에 큰 기여를 한다. The color filter, which is a key component in an LCD or large OLED panel, is the most important component for improving display quality, and the black matrix is the second largest market among the components of color filters, and in particular, contributes greatly to improving the contrast ratio.

종래에는 블랙매트릭스의 소재로서 강한 블랙 색상을 내기 쉽고 내구성이 우수한 카본 블랙을 이용하였으나 개구율을 80% 이상 향상시킬 수 있고 박형화에 유리한 Color Filter On Array 모드에서는 카본 블랙의 높은 유전율이 TFT의 전기 신호를 방해하여 큰 문제가 되었다. Conventionally, carbon black, which is easy to produce a strong black color and has excellent durability, was used as a black matrix material, but in the Color Filter On Array mode, which can improve the aperture ratio by more than 80% and is advantageous for thinning, the high dielectric constant of the carbon black transmits the electrical signal of TFT It interfered and became a big problem.

이에 따라 저유전 유기 소재들이 연구 및 적용되었는데 안료 타입은 색강도가 충분히 강하지 않아 문제였고 염료 타입은 내열성이 낮고 흑색에 가까운 넓은 흡수범위를 가지기 어려웠다. Accordingly, low-dielectric organic materials were studied and applied. The pigment type was a problem because the color intensity was not strong enough, and the dye type had low heat resistance and it was difficult to have a wide absorption range close to black.

이에 Color Filter On Array 모드에서 TFT의 전기 신호를 방해하지 않는 낮은 유전율을 지닌 카본 블랙 대체 색소재료가 요구되고 있다.Accordingly, in the Color Filter On Array mode, a carbon black replacement dye material having a low dielectric constant that does not interfere with the electrical signal of TFT is required.

본 발명자들은 신규 염료 모체를 활용하여 강하고 넓은 흡수범위를 가지도록 설계하고자 노력하였으며, 이에 저유전성 테트라벤조코롤라진(tetrabenzocorrolazine) 염료, 및 이를 포함하는 감광성 수지 조성물은 높은 차폐능력을 가지고, 페릴렌계 염료와 섞어 쓸 경우 흑색에 가까운 넓은 흡수범위를 가지며, 우수한 내열성을 가지고, 3 ~ 5의 낮은 유전율을 가지어 TFT의 전기 신호를 방해하지 않는 절연막의 기능을 나타내는 특성이 있음을 확인함으로써, 본 발명을 완성하였다.The present inventors have tried to design a new dye matrix to have a strong and wide absorption range, and thus, a low dielectric tetrabenzocorrolazine dye, and a photosensitive resin composition comprising the same, have a high shielding ability, and a perylene-based dye When mixed with, it has a wide absorption range close to black, has excellent heat resistance, and has a low dielectric constant of 3 to 5, thereby confirming that there is a characteristic representing the function of an insulating film that does not interfere with the electrical signal of the TFT. Completed.

대한민국 특허등록번호 제10-1966803호Korean Patent Registration No. 10-1966803 일본 특허공개번호 제2017-193689호Japanese Patent Publication No. 2017-193689 일본 특허등록번호 제6426469호Japanese Patent Registration No. 6426469

본 발명의 목적은 기존에 전자재료용으로 사용되지 않던 새로운 모체를 활용하여 블랙매트릭스 소재로 개발하고자 발명된 것으로서, 블랙 매트릭스 소재로서의 요구 조건인 고색강도, 넒은 흡수범위, 저유전성 및 고내구성의 조건을 모두 만족하는 테트라벤조콜로라진(tetrabenzocorrolazine) 염료 및 상기 염료를 포함하는 블랙매트릭스를 제공하는 것이다. An object of the present invention was to develop a black matrix material using a new matrix that was not used for electronic materials in the past, and the conditions of high color strength, wide absorption range, low dielectric properties, and high durability, which are requirements as a black matrix material. To provide a tetrabenzocorrolazine dye satisfying all of and a black matrix comprising the dye.

상기 목적을 달성하기 위하여, 본 발명은 In order to achieve the above object, the present invention

하기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료를 제공한다.It provides a low-dielectric dye for a color filter black matrix comprising a compound represented by the following formula (1).

[화학식 1][Formula 1]

Figure pat00001
Figure pat00001

(여기서, (here,

R1은 H, CH3 또는 4-메틸사이클로헥실(4-Methylcyclohexyl)이고,R 1 is H, CH 3 or 4-methylcyclohexyl,

R2는 H, OCH3 또는 (4-메틸사이클로헥실)옥시[(4-Methylcyclohexyl)oxy]임).R 2 is H, OCH 3 or (4-methylcyclohexyl)oxy[(4-Methylcyclohexyl)oxy]).

또한, 본 발명은 In addition, the present invention

하기 화학식 2 ~ 4 중 어느 하나로 표시되는 화합물로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료를 제공한다.It provides a low-dielectric dye for a color filter black matrix comprising a compound represented by a compound represented by any one of Formulas 2 to 4 below.

[화학식 2][Formula 2]

Figure pat00002
;
Figure pat00002
;

[화학식 3][Formula 3]

Figure pat00003
; 및
Figure pat00003
; And

[화학식 4][Formula 4]

Figure pat00004
.
Figure pat00004
.

또한, 본 발명은In addition, the present invention

1) 4-니트로프탈로니트릴 및 2,5- 비스-(1,1-디메틸부틸)-메톡시페놀을 무수 DMSO에 용해시키고 무수 K2CO3를 첨가한 후 교반한 반응 혼합물을 여과 및 정제하여 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 합성하는 단계;1) 4-nitrophthalonitrile and 2,5-bis-(1,1-dimethylbutyl)-methoxyphenol were dissolved in anhydrous DMSO, anhydrous K 2 CO 3 was added, and the stirred reaction mixture was filtered and purified. Synthesizing 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile;

2) 상기 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 질소분위기 하에서 무수 크실렌과 에탄올에 녹인 용액에 Li를 첨가한 후 교반한 반응 혼합물을 추출 및 정제하여 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 합성하는 단계; 및2) The reaction was stirred after adding Li to the solution of 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile dissolved in anhydrous xylene and ethanol under a nitrogen atmosphere. Extracting and purifying the mixture to synthesize tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine; And

3) 상기 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 피리딘에 용해시킨 후 PBr3를 첨가하고 생성된 용액을 가열하고 교반한 반응 혼합물을 여과 및 정제하는 단계;를 포함하는, 상기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료의 제조 방법을 제공한다.3) After dissolving the tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine in pyridine, PBr 3 was added, and the resulting solution was heated and stirred. It provides a method of producing a low-dielectric dye for a color filter black matrix comprising the compound represented by Formula 1, including filtering and purifying.

또한, 본 발명은In addition, the present invention

1) 4-니트로프탈로니트릴 및 2,5- 비스-(1,1-디메틸부틸)-메톡시페놀을 무수 DMSO에 용해시키고 무수 K2CO3를 첨가한 후 교반한 반응 혼합물을 여과 및 정제하여 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 합성하는 단계;1) 4-nitrophthalonitrile and 2,5-bis-(1,1-dimethylbutyl)-methoxyphenol were dissolved in anhydrous DMSO, anhydrous K 2 CO 3 was added, and the stirred reaction mixture was filtered and purified. Synthesizing 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile;

2) 상기 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 질소분위기 하에서 무수 크실렌과 에탄올에 녹인 용액에 Li를 첨가한 후 교반한 반응 혼합물을 추출 및 정제하여 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 합성하는 단계; 및2) The reaction was stirred after adding Li to the solution of 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile dissolved in anhydrous xylene and ethanol under a nitrogen atmosphere. Extracting and purifying the mixture to synthesize tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine; And

3) 상기 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 피리딘에 용해시킨 후 PBr3를 첨가하고 생성된 용액을 가열하고 교반한 반응 혼합물로부터,3) After dissolving the tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine in pyridine, PBr 3 was added, and the resulting solution was heated and stirred. from,

a) 용매를 증발시킨 후, 물과 얼음 배스에 부은 다음 생성된 현탁액을 여과한 후 정제;a) after evaporating the solvent, pouring it into a water and ice bath, and then filtering the resulting suspension and purifying;

b) 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : MeOH의 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제; 또는b) After reducing the volume by vacuum distillation, after treatment with a 50:50 solution of CH 2 Cl 2 : MeOH, the resulting green solid was dissolved in CH 2 Cl 2 and filtered to remove pyridinium bromide, a white crystalline solid. Reduce the volume of the filtrate and purify it under reduced pressure; or

c) 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : 4-메틸시클로헥산올 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제; 중 어느 하나로 수행하는 단계를 포함하는, 상기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료의 제조 방법을 제공한다.c) After reducing the volume by vacuum distillation, the resulting green solid was dissolved in CH 2 Cl 2 after treatment with a CH 2 Cl 2 :4-methylcyclohexanol 50:50 solution and filtered to pyridinium as a white crystalline solid. After removing the bromide, the filtrate was reduced in volume and purified under reduced pressure; It provides a method for producing a low-dielectric dye for a color filter black matrix comprising the compound represented by Formula 1, comprising performing any one of the steps.

또한, 본 발명은 상기 본 발명에 따른 염료를 포함하는 컬러필터 블랙매트릭스용 감광성 수지 조성물을 제공한다.In addition, the present invention provides a photosensitive resin composition for a color filter black matrix comprising the dye according to the present invention.

또한, 본 발명은 상기 본 발명에 따른 염료 및 N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 포함하는 컬러필터 블랙매트릭스용 감광성 수지 조성물을 제공한다.In addition, the present invention relates to the dye according to the present invention and N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide ( It provides a photosensitive resin composition for a color filter black matrix including a dye N,N'-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide).

또한, 본 발명은 상기 본 발명에 따른 염료를 포함하는 블랙매트릭스를 제공한다.In addition, the present invention provides a black matrix comprising the dye according to the present invention.

또한, 본 발명은 상기 본 발명에 따른 염료 및 N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 포함하는 블랙매트릭스를 제공한다.In addition, the present invention relates to the dye according to the present invention and N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide ( It provides a black matrix including N,N'-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) dye.

아울러, 본 발명은 상기 본 발명에 따른 블랙매트릭스가 형성되어서 이루어진 컬러 필터를 제공한다.In addition, the present invention provides a color filter formed by forming the black matrix according to the present invention.

본 발명은 신규 염료 모체를 활용하여 강하고 넓은 흡수범위를 가지도록 설계한 것으로서, 기존에 전자재료용으로 사용되지 않던 새로운 모체를 활용하여 블랙매트리스 제조용 염료로 개발한 것이다.The present invention is designed to have a strong and wide absorption range using a new dye matrix, and was developed as a dye for manufacturing black mattresses using a new matrix that has not been used for electronic materials.

본 발명은 블랙매트릭스 소재로서의 요구 조건인 고색강도, 넒은 흡수범위, 저유전성, 고내구성의 조건들을 만족하여 기존 블랙매트릭스 소재인 카본 블랙을 대체할 수 있다.The present invention satisfies the requirements of a black matrix material such as high color strength, a wide absorption range, low dielectric properties, and high durability, thereby replacing carbon black, which is a black matrix material.

구체적으로, 본 발명에 따른 저유전성 tetrabenzocorrolazine 염료 및 이를 이용하여 제조된 블랙매트릭스는 색강도가 강하여 두께 3.0 um에서 광학밀도 2 이상의 차폐능력을 가지고, 페릴렌계 염료와 섞어 쓸 경우 흑색에 가까운 넓은 흡수범위를 가지며, 분자간 응집이 쉬운 구조로 내열성을 확보할 수 있을 뿐만 아니라 Color Filter On Array 모드에서 가장 중요한 유전율 측정 결과 3 ~ 5의 값을 가져 TFT의 전기 신호를 방해하지 않는 절연막의 기능을 나타낸다.Specifically, the low dielectric tetrabenzocorrolazine dye according to the present invention and the black matrix prepared using the same have strong color intensity and have an optical density of 2 or more at a thickness of 3.0 um, and have a wide absorption range close to black when mixed with perylene-based dyes. As a result of measuring the most important dielectric constant in Color Filter On Array mode, it has a structure that is easy to aggregate between molecules, and has a value of 3 to 5, indicating the function of the insulating film that does not interfere with the electrical signal of the TFT.

도 1은 본 발명에 따른 염료(RC 1 ~ 3)의 합성 과정을 보여주는 그림이다.
도 2는 본 발명에 따른 염료(3)의 합성 과정을 보여주는 그림이다.
도 3은 본 발명에 따른 합성된 염료(RC 1 ~ 3)의 흡수 스펙트럼을 보여주는 그래프이다.
도 4는 본 발명에 따른 합성된 염료(RC 1 ~ 3)의 TGA 분석 결과를 보여주는 그래프이다.
도 5는 본 발명에 따른 합성된 염료(RC 1 ~ 3)의 기하학적 최적화 구조를 보여주는 그림이다.
도 6은 본 발명에 따른 제작된 피름의 투과율 스펙트럼을 보여주는 그래프이다.
1 is a diagram showing a synthesis process of dyes (RC 1 to 3) according to the present invention.
2 is a diagram showing the synthesis process of the dye 3 according to the present invention.
3 is a graph showing absorption spectra of synthesized dyes (RC 1 to 3) according to the present invention.
4 is a graph showing the results of TGA analysis of the synthesized dyes (RC 1 to 3) according to the present invention.
5 is a diagram showing a geometric optimization structure of the synthesized dyes (RC 1 to 3) according to the present invention.
6 is a graph showing the transmittance spectrum of the film produced according to the present invention.

이하 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.

본 발명을 설명함에 있어서 관련된 공지 구성 또는 기능에 대한 상세한 설명은 생략할 수 있다.In describing the present invention, detailed descriptions of related known configurations or functions may be omitted.

본 명세서 및 특허청구범위에 사용된 용어나 단어는 통상적이거나 사전적 의미로 한정되어 해석되지 아니하며, 본 발명의 기술적 사항에 부합하는 의미와 개념으로 해석되어야 한다. Terms or words used in the present specification and claims are not limited to a conventional or dictionary meaning and are not interpreted, but should be interpreted as meanings and concepts consistent with the technical matters of the present invention.

본 명세서에 기재된 실시예와 도면에 도시된 구성은 본 발명의 바람직한 실시예이며, 본 발명의 기술적 사상을 모두 대변하는 것이 아니므로, 본 출원 시점에서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 있을 수 있다.Since the embodiments described in the present specification and the configurations shown in the drawings are preferred embodiments of the present invention, and do not represent all the technical spirit of the present invention, various equivalents and modifications that can replace them at the time of the present application are There may be.

본 발명은 The present invention

하기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료를 제공한다.It provides a low-dielectric dye for a color filter black matrix comprising a compound represented by the following formula (1).

[화학식 1][Formula 1]

Figure pat00005
Figure pat00005

(여기서, (here,

R1은 H, CH3 또는 4-메틸사이클로헥실(4-Methylcyclohexyl)이고,R 1 is H, CH 3 or 4-methylcyclohexyl,

R2는 H, OCH3 또는 (4-메틸사이클로헥실)옥시[(4-Methylcyclohexyl)oxy]임).R 2 is H, OCH 3 or (4-methylcyclohexyl)oxy[(4-Methylcyclohexyl)oxy]).

또한, 본 발명은 In addition, the present invention

하기 화학식 2 ~ 4 중 어느 하나로 표시되는 화합물로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료를 제공한다.It provides a low-dielectric dye for a color filter black matrix comprising a compound represented by a compound represented by any one of Formulas 2 to 4 below.

[화학식 2][Formula 2]

Figure pat00006
;
Figure pat00006
;

[화학식 3][Formula 3]

Figure pat00007
; 및
Figure pat00007
; And

[화학식 4][Formula 4]

Figure pat00008
.
Figure pat00008
.

상기 화합물은 The compound is

i) 하이드록시포스포러스(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)-트리아자테트라벤조코롤 하이드록사이드 (Hydroxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide);i) Hydroxyphosphorus (V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzocorol hydroxide (Hydroxyphosphorus( V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide);

ii) 디메톡시포스포러스(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4- 메톡시페녹시)-트리아자테트라벤조코롤 (Dimethoxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole); 및ii) Dimethoxyphosphorus (V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzocorol (Dimethoxyphosphorus(V)2) (3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole); And

iii) 디(4-메틸사이클로헥옥시)인(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)-트리아자테트라벤즈코롤 (Di(4-methylcyclohexoxy)phosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole)이다.iii) Di(4-methylcyclohexoxy)phosphorus (V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorol (Di(4-methylcyclohexoxy)phosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole).

또한, 본 발명은In addition, the present invention

1) 4-니트로프탈로니트릴 및 2,5- 비스-(1,1-디메틸부틸)-메톡시페놀을 무수 DMSO에 용해시키고 무수 K2CO3를 첨가한 후 교반한 반응 혼합물을 여과 및 정제하여 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 합성하는 단계;1) 4-nitrophthalonitrile and 2,5-bis-(1,1-dimethylbutyl)-methoxyphenol were dissolved in anhydrous DMSO, anhydrous K 2 CO 3 was added, and the stirred reaction mixture was filtered and purified. Synthesizing 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile;

2) 상기 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 질소분위기 하에서 무수 크실렌과 에탄올에 녹인 용액에 Li를 첨가한 후 교반한 반응 혼합물을 추출 및 정제하여 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 합성하는 단계; 및2) The reaction was stirred after adding Li to the solution of 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile dissolved in anhydrous xylene and ethanol under a nitrogen atmosphere. Extracting and purifying the mixture to synthesize tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine; And

3) 상기 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 피리딘에 용해시킨 후 PBr3를 첨가하고 생성된 용액을 가열하고 교반한 반응 혼합물을 여과 및 정제하는 단계;를 포함하는, 상기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료의 제조 방법을 제공한다.3) After dissolving the tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine in pyridine, PBr 3 was added, and the resulting solution was heated and stirred. It provides a method of producing a low-dielectric dye for a color filter black matrix comprising the compound represented by Formula 1, including filtering and purifying.

상기 제조 방법에 있어서, 상기 단계 3)은 하기 a) ~ c) 중 어느 하나로 수행하는 것이 바람직하다.In the manufacturing method, step 3) is preferably performed in any one of the following a) to c).

a) 상기 단계 3)의 반응 혼합물을 용매를 증발시킨 후, 물과 얼음 배스에 부은 다음 생성된 현탁액을 여과한 후 정제하기;a) evaporating the solvent of the reaction mixture of step 3), pouring it into a water and ice bath, filtering the resulting suspension, and purifying;

b) 상기 단계 3)의 반응 혼합물을 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : MeOH의 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제하기; 및b) After reducing the volume of the reaction mixture of step 3) by vacuum distillation, the resulting green solid was dissolved in CH 2 Cl 2 and filtered to reduce the volume of the reaction mixture with a 50:50 solution of CH 2 Cl 2 :MeOH. Reducing the volume of the filtrate under reduced pressure and purifying the filtrate after removing the solid pyridinium bromide; And

c) 상기 단계 3)의 반응 혼합물을 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : 4-메틸시클로헥산올 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제하기. c) After reducing the volume of the reaction mixture of step 3) by vacuum distillation, the resulting green solid was dissolved in CH 2 Cl 2 after treatment with a CH 2 Cl 2 :4-methylcyclohexanol 50:50 solution. After filtering to remove pyridinium bromide as a white crystalline solid, reduce the volume of the filtrate under reduced pressure and purify it.

또한, 본 발명은 상기 본 발명에 따른 염료를 포함하는 감광성 수지 조성물을 제공한다.In addition, the present invention provides a photosensitive resin composition comprising the dye according to the present invention.

상기 감광성 수지 조성물은 염료의 함유율이 1 ~ 20 중량%인 것이 바람직하고, 4 ~ 10 중량%인 것이 더욱 바람직하다.The photosensitive resin composition preferably has a dye content of 1 to 20% by weight, and more preferably 4 to 10% by weight.

상기 감광성 수지 조성물은 상기 본 발명에 따른 염료에 추가적으로 N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 더 포함하는 것이 바람직하다.The photosensitive resin composition is, in addition to the dye according to the present invention, N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide It is preferable to further include a dye (N,N'-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide).

상기 감광성 수지 조성물은 상기 본 발명에 따른 염료 외에 또다른 염료, 염료 분산제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용제를 포함할 수 있다.The photosensitive resin composition may include another dye, a dye dispersant, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent in addition to the dye according to the present invention.

상기 또다른 염료로는 유기 블랙 안료, 청색 안료, 카본블랙, 바이올렛 안료 및 레드 안료를 포함할 수 있다.The another dye may include an organic black pigment, a blue pigment, a carbon black, a violet pigment, and a red pigment.

상기 분산제로는 염료의 탈응집 및 안정성 유지를 위해 첨가하는 것으로 안료 분산제의 구체적인 예로는 양이온계, 음이온계, 비이온계, 양성계, 폴리에스테르계, 폴리아민계 등의 계면활성제 등을 들 수 있고, 이들은 각각 단독 또는 2종 이상을 조합하여 사용할 수 있다.The dispersant is added for deagglomeration and stability of the dye. Specific examples of the pigment dispersant include surfactants such as cationic, anionic, nonionic, amphoteric, polyester, and polyamine. And these may be used alone or in combination of two or more.

상기 알칼리 가용성 수지는 통상적으로 감광성 수지 조성물을 이용하여 형성된 감광성 수지층의 비노광부를 알칼리 가용성으로 만들고, 염료에 대한 결합제 수지 및 분산 매질로도 작용한다.The alkali-soluble resin generally makes the non-exposed portion of the photosensitive resin layer formed using the photosensitive resin composition alkali-soluble, and also acts as a binder resin and dispersion medium for dyes.

상기 알칼리 가용성 수지는 컬러필터의 제조를 위한 현상 단계에서 사용된 알칼리성 현상액에 용해 가능한 중합체라면 특별히 제한 없이 사용할 수 있다.The alkali-soluble resin may be used without particular limitation as long as it is a polymer soluble in an alkaline developer used in a developing step for manufacturing a color filter.

상기 광중합성 화합물은 광중합 개시제의 작용으로 중합할 수 있는 화합물로, 3 ~ 10 관능성 단량체 바람직하게는 4 ~ 8 관능성 단량체를 포함할 수 있으며, 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The photopolymerizable compound is a compound that can be polymerized by the action of a photopolymerization initiator, and may contain 3 to 10 functional monomers and preferably 4 to 8 functional monomers, and these may be used alone or in combination of two or more.

상기 광중합 개시제는 광중합성 화합물을 중합시킬 수 있는 것이라면 제한없이 사용할 수 있으나, 바람직하게는 중합특성, 개시효율, 흡수파장, 입수성, 가격 등을 고려하여 아세토페논계 화합물, 벤조인계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물, 옥심계 화합물 및 티오크산톤계 화합물로 이루어진 군에서 선택된 1종이상의 화합물일 수 있다.The photopolymerization initiator may be used without limitation as long as it can polymerize the photopolymerizable compound, but preferably, in consideration of polymerization characteristics, initiation efficiency, absorption wavelength, availability, and price, acetophenone-based compound, benzoin-based compound, benzophene It may be one or more compounds selected from the group consisting of non-based compounds, triazine-based compounds, biimidazole-based compounds, oxime-based compounds, and thioxanthone-based compounds.

상기 용제는 감광성 수지 조성물에 포함되는 다른 성분들을 용해시키는데 효과적인 것이면, 통상의 감광성 수지 조성물에서 사용되는 용제를 특별히 제한하지 않고 사용할 수 있으며, 특히 에테르류, 아세테이트류, 방향족 탄화수소류, 케톤류, 알코올류 또는 에스테르류 등이 바람직하고, 상기 용제는 각각 단독 또는 2종 이상을 혼합하여 사용할 수 있다.As long as the solvent is effective in dissolving other components included in the photosensitive resin composition, the solvent used in the usual photosensitive resin composition may be used without particular limitation, and in particular, ethers, acetates, aromatic hydrocarbons, ketones, alcohols Or esters and the like are preferred, and the solvents may be used alone or in combination of two or more.

상기 감광성 수지 조성물은 상기한 성분들 외에 본 발명의 목적을 해치지 않는 범위에서 당업자의 필요에 따라 다른 첨가제를 포함할 수 있고, 상기 첨가제는 구체적으로 예를 들면 다른 고분자 화합물, 열 개시제, 경화제, 계면활성제, 밀착 촉진제, 산화방지제, 자외선 흡수제 및 응집 방지제로 이루어진 군으로부터 선택되는 1종 이상의 첨가제를 추가로 포함할 수 있다.In addition to the above components, the photosensitive resin composition may contain other additives according to the needs of those skilled in the art within a range that does not impair the object of the present invention, and the additives are specifically, for example, other polymer compounds, thermal initiators, curing agents, interfacial It may further include one or more additives selected from the group consisting of an activator, an adhesion promoter, an antioxidant, an ultraviolet absorber, and an anti-aggregation agent.

또한, 본 발명은 상기 본 발명에 따른 염료를 포함하는 블랙매트릭스를 제공한다.In addition, the present invention provides a black matrix comprising the dye according to the present invention.

상기 블랙매트릭스는 상기 본 발명에 따른 염료에 추가적으로 N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 더 포함하는 것이 바람직하다.In addition to the dye according to the present invention, the black matrix is N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide ( It is preferable to further include N,N'-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) dye.

상기 블랙 매트릭스의 막 두께로는, 0.2 ㎛ 내지 20 ㎛가 바람직하고, 9.0 ㎛ 내지 18 ㎛가 보다 바람직하다.The thickness of the black matrix is preferably 0.2 µm to 20 µm, more preferably 9.0 µm to 18 µm.

아울러, 본 발명은 상기 본 발명에 따른 블랙매트릭스가 형성되어서 이루어진 컬러 필터를 제공한다.In addition, the present invention provides a color filter formed by forming the black matrix according to the present invention.

상기 컬러 필터는 포토리쏘그래피 방법에 따른 통상의 패터닝 공정인The color filter is a conventional patterning process according to a photolithography method.

a) 기판에 감광성 수지 조성물을 도포하는 단계;a) applying a photosensitive resin composition to a substrate;

b) 용매를 건조하는 프리베이크 단계;b) a prebaking step of drying the solvent;

c) 얻어진 피막 위에 포토 마스크를 대어 활성 광선을 조사해 노광부를 경화시키는 단계;c) placing a photo mask on the obtained film and irradiating active light to cure the exposed portion;

d) 알칼리 수용액을 이용하여 미노광부를 용해하는 현상 공정을 수행하는 단계; 및d) performing a developing process of dissolving the unexposed part using an aqueous alkali solution; And

e) 건조 및 포스트 베이크 수행단계를 포함하여 제조할 수 있다.e) It can be prepared including the steps of drying and post-baking.

상기 기판은 유리 기판이나 폴리머 판이 사용될 수 있다.The substrate may be a glass substrate or a polymer plate.

상기 도포는 원하는 두께를 얻을 수 있도록 롤 코터, 스핀 코터, 슬릿 앤드 스핀 코터, 슬릿 코터(다이 코터), 잉크젯 등의 도포 장치를 이용한 습식 코팅 방법에 의해 수행될 수 있다.The coating may be performed by a wet coating method using an application device such as a roll coater, a spin coater, a slit and spin coater, a slit coater (die coater), or inkjet to obtain a desired thickness.

상기 프리베이크는 오븐, 핫 플레이트 등에 의해 가열함으로써 행해진다. 이때 프리베이크에 있어서의 가열 온도 및 가열 시간은 사용하는 용제에 따라 적의 선택되어 예를 들면, 80 내지 150℃의 온도로 1 내지 30분간 행해질 수 있다.The prebaking is performed by heating with an oven, a hot plate, or the like. At this time, the heating temperature and heating time in the prebaking may be appropriately selected according to the solvent used, and may be performed at a temperature of, for example, 80 to 150° C. for 1 to 30 minutes.

상기 노광은 노광기에 의해 행해져 포토 마스크를 통하여 노광함으로써 패턴에 대응한 부분만을 감광시킨다. 이때 조사하는 빛은, 예를 들면, 가시광선, 자외선, X선 및 전자선 등이 가능하다.The exposure is performed by an exposure machine to expose only a portion corresponding to the pattern by exposing through a photo mask. The irradiated light at this time may be, for example, visible light, ultraviolet light, X-ray, and electron beam.

상기 현상은 알칼리 현상 비노광 부분의 제거되지 않는 부분의 착색 감광성 수지 조성물을 제거하는 목적으로 행해져 이 현상에 의해 원하는 패턴이 형성된다. 이 알칼리 현상에 적합한 현상액으로는 알칼리 금속이나 알칼리 토류 금속의 탄산염의 수용액 등을 사용할 수 있다. The above development is performed for the purpose of removing the colored photosensitive resin composition in the non-removed portion of the non-exposed portion of the alkali development, and a desired pattern is formed by this phenomenon. As a developer suitable for this alkali development, an aqueous solution of an alkali metal or alkaline earth metal carbonate can be used.

상기 포스트베이크는 패터닝된 막과 기판과의 밀착성을 높이기 위해서 수행하며, 100 내지 220℃에서 10 내지 120분의 조건으로 열처리를 통해 이루어질 수 있으며, 포스트 베이크는 프리베이크와 동일하게, 오븐, 핫 플레이트 등을 이용하여 수행할 수 있다.The post-baking is performed to increase the adhesion between the patterned film and the substrate, and may be performed through heat treatment at 100 to 220° C. for 10 to 120 minutes, and the post-baking is the same as the pre-baking, such as an oven or a hot plate. It can be carried out using, for example.

이하, 실시예 및 실험예를 통하여 본 발명을 보다 상세히 설명하기로 한다. 이들 실시예 및 실험예는 오로지 본 발명을 보다 구체적으로 설명하기 위한 것으로, 본 발명의 요지에 따라 본 발명의 범위가 이들 실시예 및 실험예에 의해 제한되지 않는다는 것은 당업계에서 통상의 지식을 가진 자에게 있어서 자명한 것이다.Hereinafter, the present invention will be described in more detail through examples and experimental examples. These Examples and Experimental Examples are only for describing the present invention in more detail, and that the scope of the present invention is not limited by these Examples and Experimental Examples according to the gist of the present invention is one of ordinary skill in the art. It is self-evident to the person.

<< 실시예Example 1> 1>

<1-1> 4-(2,5-<1-1> 4-(2,5- 비스Vis (1,1-(1,1- 디메틸부틸Dimethylbutyl )-4-)-4- 메톡시페녹시Methoxyphenoxy )) 프탈로니트릴Phthalonitrile (4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile) (1) (4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile) (1)

4-니트로프탈로니트릴 (1 g, 5.77 mmol) 및 2,5- 비스-(1,1-디메틸부틸)-메톡시페놀 (1.68 g, 5.77 mmol)을 무수 DMSO(30 ml)에 용해시키고 무수 K2CO3 (1.06 g, 7.66 mmol)을 4시간 동안 나누어 첨가하였다. 혼합물을 질소 대기하에 40℃에서 24시간 동안 교반하였다. 반응 혼합물을 여과한 후, 잔류물을 CH2Cl2로 추출하고 회전 증발로 건조시켰다. 용리액으로서 EA/헥산 (10 : 1) 혼합물을 사용하여 실리카겔 상에서 컬럼 크로마토그래피로 순수한 생성물 (2.19 g, 5.23 mmol)을 채취하였다.4-nitrophthalonitrile (1 g, 5.77 mmol) and 2,5-bis-(1,1-dimethylbutyl)-methoxyphenol (1.68 g, 5.77 mmol) were dissolved in anhydrous DMSO (30 ml) and anhydrous K2CO3 (1.06 g, 7.66 mmol) was added in portions over 4 hours. The mixture was stirred at 40° C. for 24 hours under a nitrogen atmosphere. After filtering the reaction mixture, the residue was extracted with CH2Cl2 and dried by rotary evaporation. The pure product (2.19 g, 5.23 mmol) was collected by column chromatography on silica gel using a mixture of EA/hexane (10:1) as an eluent.

수율 91%; 1H NMR (CDCl3, ppm): 7.69 (d, 1H), 7.22 (s, 1H), 7.14 (d, 1H), 6.82 (s, 1H), 6.63(s, 1H), 3.08 (s, 3H, eOeCH3), 1.71 (m, 2H), 1.56 (m, 2H), 1.26(d, 12H), 1.04 (m, 2H), 0.96 (m, 2H), 0.81 (t, 3H), 0.71 (t, 3H).Yield 91%; 1H NMR (CDCl3, ppm): 7.69 (d, 1H), 7.22 (s, 1H), 7.14 (d, 1H), 6.82 (s, 1H), 6.63 (s, 1H), 3.08 (s, 3H, eOeCH3 ), 1.71 (m, 2H), 1.56 (m, 2H), 1.26 (d, 12H), 1.04 (m, 2H), 0.96 (m, 2H), 0.81 (t, 3H), 0.71 (t, 3H) .

<1-2> <1-2> 테트라키스Tetrakis (2,5-(2,5- 비스Vis (1,1-디메틸 부틸)-4-(1,1-dimethyl butyl)-4- 메톡시페녹시Methoxyphenoxy )-)- 프탈로시아Phthalosia 닌 (tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-phthalocyanine) (2)Nin (tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-phthalocyanine) (2)

상기 1 (0.9 g, 2.38 mmol)을 질소 분위기 하에서 무수 크실렌 (50 ml)과 에탄올 (10 ml)에 녹인 용액에 Li (0.13 g, 18.7 mmol)을 넣었다. 반응 혼합물을 150 ℃에서 5시간 동안 교반하였다. 용액을 냉각시킨 후, 생성된 슬러리를 CH2Cl2 (100 ml)로 추출하고 포화 NaCl 용액으로 세척하였다. 용리액으로서 CH2Cl2를 사용하여 실리카겔 상에서 칼럼 크로마토그래피에 의해 순수한 생성물 (0.53 g, 0.31 mmol)을 수득하였다.Li (0.13 g, 18.7 mmol) was added to a solution of 1 (0.9 g, 2.38 mmol) dissolved in anhydrous xylene (50 ml) and ethanol (10 ml) under a nitrogen atmosphere. The reaction mixture was stirred at 150° C. for 5 hours. After cooling the solution, the resulting slurry was extracted with CH2Cl2 (100 ml) and washed with saturated NaCl solution. The pure product (0.53 g, 0.31 mmol) was obtained by column chromatography on silica gel using CH2Cl2 as eluent.

수율 54%; MALDI-TOF MS: m/z 1675.9 (100%, [M+ 2K]+). FT-IR(KBr, cm-1): 3289 (N-H). Calcd for C108H138N8O8: C, 77.38; H, 8.30; N, 6.68; O, 7.64%. Found: C, 77.36; H, 8.27; N, 6.66; O, 7.69%.Yield 54%; MALDI-TOF MS: m/z 1675.9 (100%, [M+2K]+). FT-IR (KBr, cm-1): 3289 (N-H). Calcd for C108H138N8O8: C, 77.38; H, 8.30; N, 6.68; O, 7.64%. Found: C, 77.36; H, 8.27; N, 6.66; O, 7.69%.

<1-3> <1-3> 하이드록시포스포러스(V)2(3)Hydroxyphosphorus (V)2(3) -- 테트라키스Tetrakis (2,5-(2,5- 비스Vis (1,1-(1,1- 디메틸부틸Dimethylbutyl )-4-메톡시페녹시)-트리아자테트라벤조코롤 )-4-methoxyphenoxy)-triazatetrabenzocorol 하이드록사이드Hydroxide (Hydroxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide) (RC1) (Hydroxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide) (RC1)

상기 2 (1.24 g, 0.74 mmol)를 응축기 및 가스 유입 어댑터가 장착된 100 mL 플라스크에 넣고 20 mL의 피리딘에 용해시켰다. 다량의 PBr3 (9.0 g, 33.0 mmol)을 첨가하고 생성된 용액을 120℃로 가열하고 2시간 동안 교반하였다. 2시간 후, 약 3/4의 용매를 아르곤의 흐름 하에서 증발시켰다. 이어서, 혼합물을 물/얼음 배스에 부은 다음, 생성된 현탁액을 여과하여 녹색 고체를 수득하였다. 고형분을 용리액으로서 1/6 에틸 아세테이트/헥산을 사용하여 실리카 겔 컬럼상에서 정제하였다. 밝은 녹색 밴드를 수집하고 농축시켜 RC1을 밝은 녹색 고체(0.45 g, 35 %)로 생성시켰다.The 2 (1.24 g, 0.74 mmol) was placed in a 100 mL flask equipped with a condenser and a gas inlet adapter and dissolved in 20 mL of pyridine. A large amount of PBr3 (9.0 g, 33.0 mmol) was added, and the resulting solution was heated to 120° C. and stirred for 2 hours. After 2 hours, about 3/4 of the solvent was evaporated under a flow of argon. The mixture was then poured into a water/ice bath, and the resulting suspension was then filtered to give a green solid. The solid was purified on a silica gel column using 1/6 ethyl acetate/hexane as eluent. The bright green band was collected and concentrated to give RC1 as a bright green solid (0.45 g, 35%).

MALDI-TOF MS: m/z 1725.0 (100%, [M + OH]+); Found: C, 75.07; H, 8.15; N, 5.75. Calc. for C108H138N7O10P: C, 75.19; H, 8.06; N, 5.68.MALDI-TOF MS: m/z 1725.0 (100%, [M + OH]&lt;+&gt;); Found: C, 75.07; H, 8.15; N, 5.75. Calc. for C108H138N7O10P: C, 75.19; H, 8.06; N, 5.68.

<< 실시예Example 2> 2>

디메톡시포스포러스(V)2(3)Dimethoxyphosphorus (V)2(3) -- 테트라키스Tetrakis (2,5-(2,5- 비스Vis (1,1-(1,1- 디메틸부틸Dimethylbutyl )-4- )-4- 메톡시페녹시Methoxyphenoxy )-트리아자테트라벤조코롤 ()-Triazatetrabenzocorol ( Dimethoxyphosphorus(V)2(3)Dimethoxyphosphorus(V)2(3) -- TetrakisTetrakis (2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole) (RC2)(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole) (RC2)

상기 2 (1.24 g, 0.74 mmol)를 응축기 및 가스 유입 어댑터가 장착된 100 mL 플라스크에 넣고 30 mL의 피리딘에 용해시켰다. 다량의 PBr3 (9.0 g, 33.0 mmol)을 첨가하고 생성된 용액을 120℃로 가열하고 2시간 동안 교반하였다. 2시간 후, 반응 혼합물의 부피를 진공 증류로 1 내지 2 mL로 감소시킨 다음, CH2Cl2/MeOH의 50/50 용액으로 2시간 동안 처리하였다. 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체로서 과량의 피리디늄 브로마이드를 제거하였다. 여액을 감압하에 부피를 감소시키고 용리액으로서 1/7 에틸 아세테이트/헥산으로 정제하기 위해 실리카겔 컬럼 상에 로딩하였다. 용리되는 밝은 녹색 밴드를 수집하고 진공 하에 건조시켜 RC2를 밝은 녹색 고체 (0.75 g, 58 %)로 수득하였다.The 2 (1.24 g, 0.74 mmol) was placed in a 100 mL flask equipped with a condenser and a gas inlet adapter and dissolved in 30 mL of pyridine. A large amount of PBr3 (9.0 g, 33.0 mmol) was added, and the resulting solution was heated to 120° C. and stirred for 2 hours. After 2 hours, the volume of the reaction mixture was reduced to 1-2 mL by vacuum distillation, and then treated with a 50/50 solution of CH2Cl2/MeOH for 2 hours. The resulting green solid was dissolved in CH2Cl2 and filtered to remove excess pyridinium bromide as a white crystalline solid. The filtrate was loaded onto a silica gel column to reduce the volume under reduced pressure and purify with 1/7 ethyl acetate/hexane as eluent. The eluting light green band was collected and dried under vacuum to give RC2 as a light green solid (0.75 g, 58%).

MALDI-TOF MS: m/z 1752.4 (100%, [M+]); Found: C, 75.17; H, 8.20; N, 5.65. Calc. for C110H142N7O10P: C, 75.35; H, 8.16; N, 5.59.MALDI-TOF MS: m/z 1752.4 (100%, [M+]); Found: C, 75.17; H, 8.20; N, 5.65. Calc. for C110H142N7O10P: C, 75.35; H, 8.16; N, 5.59.

<< 실시예Example 3> 3>

디(4-메틸사이클로헥옥시)인(V)2(3)Di(4-methylcyclohexoxy)phosphorus (V)2(3) -- 테트라키스Tetrakis (2,5-(2,5- 비스Vis (1,1-(1,1- 디메틸부틸Dimethylbutyl )-4-메톡시페녹시)-트리아자테트라벤즈코롤 ()-4-methoxyphenoxy)-triazatetrabenzcorol ( DiDi (4-(4- methylcyclohexoxy)phosphorus(V)2(3)methylcyclohexoxy)phosphorus(V)2(3) -Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole) (RC3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole) (RC3)

상기 2 (1.24 g, 0.74 mmol)를 응축기 및 가스 유입 어댑터가 장착된 100 mL 플라스크에 넣고 30 mL의 피리딘에 용해시켰다. 다량의 PBr3 (9.0 g, 33.0 mmol)을 첨가하고 생성된 용액을 120℃로 가열하고 2시간 동안 교반하였다. 2시간 후, 반응 혼합물의 부피를 진공 증류로 1 내지 2 mL로 감소시킨 다음, CH2Cl2/4-메틸시클로 헥산올의 50/50 용액으로 12시간 동안 처리하였다. 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 과량의 피리 디늄 브로마이드를 백색 결정질 고체로서 제거 하였다. 여액을 감압하에 부피를 감소시키고 용리액으로서 CH2Cl2로 정제하기 위해 실리카겔 컬럼 상에 로딩하였다. 용리되는 두 번째 밝은 녹색 밴드를 수집하고, 용리액으로서 3/40 에틸 아세테이트/헥산으로 다시 정제하기 위해 실리카겔 컬럼 상에 로딩하였다. 용리되는 첫 번째 밝은 녹색 밴드를 수집하고 진공하에 건조시켜 RC3을 광택있는 밝은 녹색 고체 (0.78g, 55 %)로 만들었다.The 2 (1.24 g, 0.74 mmol) was placed in a 100 mL flask equipped with a condenser and a gas inlet adapter and dissolved in 30 mL of pyridine. A large amount of PBr3 (9.0 g, 33.0 mmol) was added, and the resulting solution was heated to 120° C. and stirred for 2 hours. After 2 hours, the volume of the reaction mixture was reduced to 1-2 mL by vacuum distillation, and then treated with a 50/50 solution of CH2Cl2/4-methylcyclohexanol for 12 hours. The resulting green solid was dissolved in CH2Cl2 and filtered to remove excess pyridinium bromide as a white crystalline solid. The filtrate was loaded onto a silica gel column to reduce the volume under reduced pressure and purify with CH2Cl2 as eluent. The eluting second bright green band was collected and loaded onto a silica gel column for purification again with 3/40 ethyl acetate/hexane as eluent. The first light green band that elutes was collected and dried under vacuum to make RC3 a glossy light green solid (0.78 g, 55%).

MALDI-TOF MS: m/z 1917.8 (100%, [M+]); Found: C, 76.11; H, 8.56; N, 5.13. Calc. for C122H162N7O10P: C, 76.41; H, 8.52; N, 5.11.MALDI-TOF MS: m/z 1917.8 (100%, [M+]); Found: C, 76.11; H, 8.56; N, 5.13. Calc. for C122H162N7O10P: C, 76.41; H, 8.52; N, 5.11.

<< 실시예Example 4> 4>

<4-1> <4-1> N,NN,N '-'- 비스Vis (2,6-(2,6- 디이소프로필페닐Diisopropylphenyl )-1-)-One- 브로모페릴렌Bromoperylene -3,4,9,10--3,4,9,10- 테트라카르복시디이미드Tetracarboxydiimide ( ( N,NN,N '-'- BisBis (2,6-(2,6- diisopropylphenyldiisopropylphenyl )-1-)-One- bromoperylenebromoperylene -3,4,9,10-tetracarboxydiimide) (2a)-3,4,9,10-tetracarboxydiimide) (2a)

페릴렌-3,4,9,10-테트라카르복실산 이무수물(Perylene-3,4,9,10-tetracarboxylic dianhydride) (16.0g, 40.7mmol), 요오드 (0.39g, 1.52mmol) 및 황산 (98 %, 225ml)을 혼합하고 실온에서 2시간 동안 교반하였다. 반응온도를 80℃로 설정하고, 브롬 (3.58 ml, 70 mmol)을 2시간에 걸쳐 적가하였다. 혼합물을 80℃에서 16시간 동안 추가로 반응시키고, 실온으로 냉각시키고, 과량의 브롬 가스를 질소 가스로 대체 하였다. 혼합물에 빙수를 첨가한 후 수득된 침전물을 흡입 여과에 의해 수집하였다. 수성 층이 중성이 될 때까지 침전물을 물로 여러 번 세척하여 조 생성물로서 디브로모 이무수물을 수득하였다. 이어서 조 생성물을 감압 하에 100℃에서 건조시키고, 추가 정제 없이 다음 단계에 사용하였다.Perylene-3,4,9,10-tetracarboxylic dianhydride (16.0 g, 40.7 mmol), iodine (0.39 g, 1.52 mmol) and sulfuric acid ( 98%, 225ml) were mixed and stirred at room temperature for 2 hours. The reaction temperature was set to 80° C., and bromine (3.58 ml, 70 mmol) was added dropwise over 2 hours. The mixture was further reacted at 80° C. for 16 hours, cooled to room temperature, and the excess bromine gas was replaced with nitrogen gas. The precipitate obtained after adding ice water to the mixture was collected by suction filtration. The precipitate was washed several times with water until the aqueous layer became neutral to give dibromo dianhydride as a crude product. The crude product was then dried at 100° C. under reduced pressure and used in the next step without further purification.

조 1,7-디브로모페릴렌-3,4,9,10-테트라카르복실산 이무수물(crude 1,7-dibromoperylene-3,4,9,10-tetracarboxylic dianhydride) (8.0 g, 14.5 mmol), 2,6-디이소프로필아닐린(2,6-diisopropylaniline) (8.8 ml, 46.7 mmol) 및 아세트산 (4.6 ml)을 혼합하고, 질소 분위기하에 N-메틸-2-피롤리돈(N-Methyl-2-pyrrolidone)(NMP) (100 ml)에서 120℃에서 96시간 동안 가열하였다. 혼합물에 물을 첨가한 후 수득 된 침전물을 흡입 여과에 의해 채취하였다. 조 생성물을 물로 세척하고, 건조시키고, 용리제로서 CH2Cl2를 사용하여 실리카겔 상에서 컬럼 크로마토그래피로 정제하였다. 삼 브롬화 디이미드(tribrominated diimide)를 함유하는 밴드가 먼저 분리될 수 있다. 이어서, 이 브롬화 이성질체 디이미드(dibrominated isomeric diimide)의 혼합물을 함유하는 제2 밴드를 채취하였다. 혼합물을 EtOH 및 톨루엔으로 세척하고 톨루엔 (50 ml)에서 80℃에서 12시간 동안 가열하였다. 순수한 디이미드, 적색 화합물 2b를 고온 톨루엔 용액으로부터 재결정화시켰다.Crude 1,7-dibromoperylene-3,4,9,10-tetracarboxylic dianhydride (8.0 g, 14.5 mmol) , 2,6-diisopropylaniline (8.8 ml, 46.7 mmol) and acetic acid (4.6 ml) were mixed, and N-methyl-2-pyrrolidone (N-Methyl- It was heated at 120° C. for 96 hours in 2-pyrrolidone)(NMP) (100 ml). After adding water to the mixture, the obtained precipitate was collected by suction filtration. The crude product was washed with water, dried and purified by column chromatography on silica gel using CH2Cl2 as eluent. The band containing tribrominated diimide can be separated first. Subsequently, a second band containing a mixture of this brominated isomeric diimide was collected. The mixture was washed with EtOH and toluene and heated in toluene (50 ml) at 80° C. for 12 hours. Pure diimide, red compound 2b was recrystallized from hot toluene solution.

2a는 2b의 동일한 조 생성물로부터 칼럼크로마토 그래피에 의해 분리될 수 있다. 이 브롬화 이성질체 디이미드의 혼합물을 수득한 후, 제2 용리된 화합물로서 2a를 수득하였다. 이성질체가 없기 때문에 생성물 2a를 추가 정제 없이 다음 단계에 사용하였다.2a can be separated by column chromatography from the same crude product of 2b. After obtaining a mixture of this brominated isomeric diimide, 2a was obtained as the second eluted compound. Product 2a was used in the next step without further purification as there were no isomers.

<4-2> <4-2> N,NN,N '-'- 비스Vis (2,6-(2,6- 디이소Diiso 프로필페닐Propylphenyl )-1-)-One- 페녹시Phenoxy -- 페릴렌Perylene -3,4,9,10--3,4,9,10- 테트라Tetra 카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) (3) Carboxydiimide (N,N'-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) (3)

상기 2a의 화합물 (1 g, 1.27 mmol)을 무수 탄산칼륨(potassium carbonate anhydrous) (0.7 g), 4-터트-부틸페놀(4-tert-butylphenol) (0.23 g, 1.50 mmol) 및 NMP (70 ml)와 혼합하였다. 혼합물을 아르곤 하에서 120 ℃로 가열하고, 이 온도에서 24시간 동안 교반하였다. 반응 혼합물을 실온으로 냉각시키고 5% HCl (250 ml)에 부었다. 침전물을 여과하고, 물로 반복적으로 세척하고, 70℃에서 진공 건조시켰다. 조 생성물을 용리액으로서 CH2Cl2를 사용하여 실리카겔 상에서 컬럼 크로마토그래피로 정제하여서 3을 적색 고체로서 수득하였다.The compound of 2a (1 g, 1.27 mmol) was mixed with anhydrous potassium carbonate (0.7 g), 4-tert-butylphenol (0.23 g, 1.50 mmol) and NMP (70 ml). ) And mixed. The mixture was heated to 120° C. under argon and stirred at this temperature for 24 hours. The reaction mixture was cooled to room temperature and poured into 5% HCl (250 ml). The precipitate was filtered, washed repeatedly with water, and vacuum dried at 70°C. The crude product was purified by column chromatography on silica gel using CH2Cl2 as eluent to give 3 as a red solid.

수율 86.1%: 1H NMR (CDCl3, ppm) : 9.68 (d, 1H), 8.82 (m, 2H), 8.75 (m, 3H), 8.42 (s, 1H), 7.48 (m, 4H), 7.33 (m, 4H), 7.13 (d, 2H), 2.74 (septet, 4H), 1.36 (s, 9H), 1.16 (d, 24H) ; MALDI-TOF MS : m/z 860.28 (100%, [M+2K]+).Yield 86.1%: 1H NMR (CDCl3, ppm): 9.68 (d, 1H), 8.82 (m, 2H), 8.75 (m, 3H), 8.42 (s, 1H), 7.48 (m, 4H), 7.33 (m , 4H), 7.13 (d, 2H), 2.74 (septet, 4H), 1.36 (s, 9H), 1.16 (d, 24H); MALDI-TOF MS: m/z 860.28 (100%, [M+2K]+).

<< 실시예Example 5> 5>

블랙매트릭스의 제조Manufacturing of Black Matrix

염료 타입 블랙매트릭스 제조를 위해, 합성된 염료 총 0.10 g, PGMEA 2.02 g과 acrylic binder (Kolon Industry, Inc.) 0.38 g을 혼합하여 잉크를 제조하였다. 제조된 잉크는 Midas system spin-1200D spin coater를 사용하여 투명 유리기판 위에 코팅되었다. 이때의 코팅 속도는 20초간 300 rpm 후 10초간 500 rpm이었다. 그 후 코팅된 기판의 열처리를 통하여 블랙 매트릭스를 경화하였다. 이때의 열처리 조건은 20분간 80℃에서 건조 후 100℃에서 1분간 프리베이크(prebake)하고 230℃에서 30분간 포스트베이크(postbake)하였다. To prepare a dye-type black matrix, an ink was prepared by mixing a total of 0.10 g of synthesized dye, 2.02 g of PGMEA, and 0.38 g of an acrylic binder (Kolon Industry, Inc.). The prepared ink was coated on a transparent glass substrate using a Midas system spin-1200D spin coater. The coating speed at this time was 300 rpm for 20 seconds and 500 rpm for 10 seconds. Thereafter, the black matrix was cured through heat treatment of the coated substrate. The heat treatment conditions at this time were dried at 80° C. for 20 minutes, prebaked at 100° C. for 1 minute, and post-baked at 230° C. for 30 minutes.

<< 실험예Experimental example 1> 염료의 특성 1> Dye properties

<1-1> 염료의 용해도 분석<1-1> Analysis of solubility of dyes

합성된 염료 RC1, RC2, RC3 및 3을 각각 PGMEA(Propylene glycol monomethyl ether acetate) 20℃에서 용해하여 용해도를 측정하였다.The synthesized dyes RC1, RC2, RC3, and 3 were dissolved in PGMEA (Propylene glycol monomethyl ether acetate) at 20° C. and solubility was measured.

구체적으로, 합성된 염료를 다양한 농도로 PGMEA에 첨가한 후, 초음파 세척기(ultrasonic cleaner) NXP-4020을 사용하여 용액을 5분 동안 초음파 처리하였다. 용액을 실온에서 48시간 동안 방치한 후, 염료의 용해도를 결정하기 위해 침전을 확인하였다.Specifically, after the synthesized dye was added to PGMEA at various concentrations, the solution was ultrasonicated for 5 minutes using an ultrasonic cleaner NXP-4020. After allowing the solution to stand at room temperature for 48 hours, precipitation was checked to determine the solubility of the dye.

그 결과, 표 1에 나타내었다. 합성된 염료들은 충분한 공정 용매 용해도를 가지는 것을 확인하였다.As a result, it is shown in Table 1. It was confirmed that the synthesized dyes have sufficient process solvent solubility.

합성된 염료Synthesized dye 용해도 (g/100 ml)Solubility (g/100 ml) 33 88 RC1RC1 99 RC2RC2 99 RC3RC3 1010

<1-2> 염료의 흡수 스펙트럼 분석<1-2> Analysis of absorption spectrum of dye

합성된 염료 RC1, RC2, RC3 및 3을 각각 PGMEA(5×10-6 mol litre-1)에서 Scinco Mega-800 UV-Visible spectrophotometer를 사용하여 흡수 스펙트럼을 측정하였다.The synthesized dyes RC1, RC2, RC3 and 3 were respectively measured in PGMEA (5×10 -6 mol litre -1 ) using a Scinco Mega-800 UV-Visible spectrophotometer.

그 결과, 도 3 및 표 2에 나타내었다. 합성된 염료는 매우 우수한 몰 흡광계수 보이며, 흑색에 가까운 넓은 흡수범위를 가지는 것을 확인하였고, Perylene 계열 염료 3과 섞어 쓸 경우 가시광 전 영역 커버가 가능함을 알 수 있었다.As a result, it is shown in Fig. 3 and Table 2. The synthesized dye showed a very good molar extinction coefficient, and it was confirmed that it has a wide absorption range close to black, and when mixed with Perylene-based dye 3, it was found that it was possible to cover the entire visible light area.

합성된 염료Synthesized dye λmax (nm)λmax (nm) εmax (L mol- 1 cm-1) ε max (L mol - 1 cm -1 ) RC1RC1 450 / 662450/662 183,594 / 91,996183,594 / 91,996 RC2RC2 450 / 662450/662 158,640 / 81,918158,640 / 81,918 RC3RC3 450 / 662450/662 244,538 / 126,696244,538 / 126,696 33 532532 77,43477,434

<1-3> 염료의 <1-3> of dye TGATGA 분석 analysis

합성된 염료 RC1, RC2, RC3 및 3을 각각 온도별 열중량 분석(Thermogravimetric analysis, TGA)을 측정하였다.The synthesized dyes RC1, RC2, RC3 and 3 were measured for thermogravimetric analysis (TGA) by temperature, respectively.

구체적으로, 400℃까지 분당 10℃씩 승온하면서, TA Instruments thermogravimetric analyzer 2050을 사용하여 TGA를 측정하였다. Specifically, the TGA was measured using a TA Instruments thermogravimetric analyzer 2050 while heating up to 400° C. by 10° C. per minute.

그 결과, 도 4에 나타내었다. 합성된 염료는 220℃ 등온 구간(30 min)에서 5wt% 이하의 weight loss로 우수한 내열성을 가지는 것을 확인하였으며, RC1은 axial 치환기가 비대칭이고 다소 불안한 구조여서 weight loss가 약간 있지만 염료 3의 내열성이 높아 혼합적용 시 내열성이 우수함을 알 수 있었다.As a result, it is shown in FIG. It was confirmed that the synthesized dye has excellent heat resistance with a weight loss of 5 wt% or less in the 220°C isothermal section (30 min), and RC1 has a slight weight loss due to the asymmetrical and somewhat unstable structure of the axial substituent, but the heat resistance of Dye 3 is high. When mixed and applied, it was found that the heat resistance was excellent.

<1-4> 염료의 기하학적 구조 분석<1-4> Analysis of dye geometry

합성된 염료 RC1, RC2, RC3에 대한 기하학적 구조를 분석하였다.The geometric structures of the synthesized dyes RC1, RC2, and RC3 were analyzed.

구체적으로, 염료의 기하학적 구조는 Gaussian 09 프로그램에서 수행된 B3LYP/6-31G (d, p)에서 밀도범함수이론(Density Functional Theory; DFT) 방법에 의해 최적화하였다.Specifically, the dye geometry was optimized by the Density Functional Theory (DFT) method in B3LYP/6-31G (d, p) performed in the Gaussian 09 program.

그 결과, 도 5에 나타내었다. 합성된 염료는 Bulky 치환기들의 입체 장애 효과로 프탈로시아닌 모체의 강한 π-π 상호작용(interaction)이 저하되어 용해도 상승에 기여를 한 것임을 알 수 있었다.As a result, it is shown in FIG. It was found that the synthesized dye contributed to an increase in solubility by lowering the strong π-π interaction of the phthalocyanine matrix due to the steric hindrance effect of the Bulky substituents.

<< 실험예Experimental example 2> 블랙매트릭스의 특성 2> Characteristics of Black Matrix

<2-1> 블랙매트릭스의 투과율 스펙트럼 분석<2-1> Analysis of transmittance spectrum of black matrix

제조된 블랙매트릭스에 대해 파장에 따른 투과 스펙트럼을 Scinco Mega-800 UV-Visible 분광 광도계를 사용하여 측정하였다.The transmission spectrum according to the wavelength of the prepared black matrix was measured using a Scinco Mega-800 UV-Visible spectrophotometer.

그 결과, 도 6에 나타내었다. 염료 함량 4 wt%, 필름 두께 9.0 μm 조건에서 빛 샘이 약간 있을 수 있는 470 nm 전후 570 nm 전후에서 약간의 투과 있었고, 몰흡광계수가 높을수록 평균적으로 투과도 낮은 값 보여주었으며, 종래 코팅 두께 참고문헌(J Incl Phenom Macrocycl Chem (2015) 82:187-194) 수준으로 맞출 경우 (18.0 μm) 전구간 투과도 0을 보였다.As a result, it is shown in FIG. In the condition of dye content of 4 wt% and film thickness of 9.0 μm, there was slight transmission around 470 nm and around 570 nm where there may be some light leakage, and the higher the molar extinction coefficient, the lower the transmittance on average. When adjusted to the (J Incl Phenom Macrocycl Chem (2015) 82:187-194) level (18.0 μm), the total transmittance was 0.

<2-2> 블랙매트릭스의 광학 밀도 분석<2-2> Optical density analysis of black matrix

제조된 블랙매트릭스에 대해 450, 550 및 650 nm에서의 광학 밀도를 분석하였다.The prepared black matrix was analyzed for optical densities at 450, 550 and 650 nm.

구체적으로, Scinco Mega-800 UV?Visible spectrophotometer 사용하여 입사광과 투과광의 세기 및 두께 계산하여 하기 수학식 1에 의해 OD 값을 환산하였다.Specifically, the intensity and thickness of incident light and transmitted light were calculated using a Scinco Mega-800 UV-Visible spectrophotometer, and the OD value was converted by Equation 1 below.

Figure pat00009
Figure pat00009

그 결과, 표 3에 나타내었다. 염료 함량 4 wt%, 필름 두께 9.0 μm 조건에서 현저히 높은 값이며, 이는 종래 염료형 중 최고 수준임을 알 수 있었다.As a result, it is shown in Table 3. It was found to be a remarkably high value under the condition of 4 wt% dye content and 9.0 μm film thickness, which is the highest level among conventional dye types.

RC1+3RC1+3 RC2+3RC2+3 RC3+3RC3+3 after
prebaking
after
prebaking
450 nm450 nm 0.516/㎛0.516/㎛ 0.494/㎛0.494/㎛ 0.597/㎛0.597/
550 nm550 nm 0.493/㎛0.493/㎛ 0.490/㎛0.490/㎛ 0.501/㎛0.501/ 650 nm650 nm 0.434/㎛0.434/㎛ 0.421/㎛0.421/㎛ 0.465/㎛0.465/㎛ after
postbaking
after
postbaking
450 nm450 nm 0.520/㎛0.520/㎛ 0.498/㎛0.498/㎛ 0.605/㎛0.605/
550 nm550 nm 0.495/㎛0.495/㎛ 0.493/㎛0.493/㎛ 0.498/㎛0.498/ 650 nm650 nm 0.440/㎛0.440/㎛ 0.425/㎛0.425/㎛ 0.466/㎛0.466/㎛

<2-3> 블랙매트릭스의 색상 변화 값 분석<2-3> Analysis of color change value of black matrix

제조된 블랙매트릭스에 대해 CIE 1931 색도 다이어그램에 따른 ΔEab 값을 분석하였다.The prepared black matrix was analyzed for ΔEab value according to the CIE 1931 chromaticity diagram.

상기 표 3의 블랙매트릭스 열처리 조건에 따라 프리베이크와 포스트베이크 공정 사이의 ΔEab 값을 Scinco color spectrometer로 측정하였다.According to the black matrix heat treatment conditions in Table 3, the ΔEab value between the pre-baking and post-baking processes was measured with a Scinco color spectrometer.

그 결과, 표 4에 나타내었다. 염료 TGA 분석과 마찬가지로 우수한 내열성이 있음을 알 수 있었다. As a result, it is shown in Table 4. Like the dye TGA analysis, it was found that it has excellent heat resistance.

RC1+3RC1+3 RC2+3RC2+3 RC3+3RC3+3 ΔEabΔEab 3.873.87 2.152.15 2.752.75

*90℃에서 10분 동안 프리 베이크한 후 200℃에서 30분 동안 포스트 베이크*Pre-baked at 90°C for 10 minutes and then post baked at 200°C for 30 minutes

<2-4> 블랙매트릭스의 유전 상수 분석<2-4> Analysis of the dielectric constant of the black matrix

제조된 블랙매트릭스에 대해 주파수(Frequency)에 따른 유전 상수를 측정하였다.The dielectric constant according to the frequency was measured for the prepared black matrix.

구체적으로, 유전 상수는 Edward E306 열 증착기(thermal evaporator) 및 HP 4294A 정밀 임피던스 분석기(precision impedance analyzer)를 이용하여 측정하였고, 블랙매트릭스의 두께는 KLA-Tencor Nanospec AFT/200 alpha step를 이용하여 측정하였다.Specifically, the dielectric constant was measured using an Edward E306 thermal evaporator and an HP 4294A precision impedance analyzer, and the thickness of the black matrix was measured using a KLA-Tencor Nanospec AFT/200 alpha step. .

그 결과, 표 5에 나타내었다. 전 영역에서 3.54 ~ 4.88의 낮은 값 보였으며, Carbon black film은 동 frequency 구간에서 17.1 ~ 26.39의 높은 값 보이는 것과 비교하여(참고문헌: J Incl Phenom Macrocycl Chem (2015) 82:187-194), 현저히 낮은 유전율을 가지는 것을 확인하였다. 특히, Working frequency range (100~500kHz)에선 특히 낮은 값을 나타내었다.As a result, it is shown in Table 5. The low value of 3.54 ~ 4.88 was seen in all areas, compared to the high value of 17.1 ~ 26.39 in the same frequency range (Reference: J Incl Phenom Macrocycl Chem (2015) 82:187-194), remarkably It was confirmed that it has a low dielectric constant. In particular, it showed a particularly low value in the working frequency range (100~500kHz).

Frequency
(kHz)
Frequency
(kHz)
유전 상수(dielectric constant) (εr average)Dielectric constant (εr average)
RC1+3RC1+3 RC2+3RC2+3 RC3+3RC3+3 0.10.1 4.884.88 3.953.95 3.893.89 1One 4.814.81 3.873.87 3.803.80 1010 4.774.77 3.793.79 3.673.67 100100 4.714.71 3.733.73 3.643.64 200200 4.694.69 3.713.71 3.613.61 500500 4.674.67 3.723.72 3.573.57 700700 4.664.66 3.703.70 3.563.56 1,0001,000 4.654.65 3.683.68 3.543.54

블랙 매트릭스는 컬러필터의 RGB 패턴 사이에 위치하여 혼색방지의 역할을 하며 픽셀전극이 형성되지 않는 부분과 픽셀 전극 주변부에 형성되는 역경사를 차폐시키는 목적으로도 사용된다. 또한, TFT의 직접적인 광 조사를 차단하여 TFT의 누설전류 증가를 방지한다. 본 발명의 블랙매트릭스 제조용 저유전성 염료, 또는 감광성 수지 조성물은 블랙 매트릭스가 이용되는 디스플레이 패널, 또는 이미지센서등에 성공적으로 적용될 수 있으며, 특히 Color Filter On Array 모드에서 기존 소재인 카본 블랙을 대체할 매우 우수한 특성을 나타낸다.The black matrix is positioned between the RGB patterns of the color filter to prevent color mixing, and is also used for the purpose of shielding a portion where a pixel electrode is not formed and a reverse slope formed around a pixel electrode. In addition, the direct light irradiation of the TFT is blocked to prevent an increase in the leakage current of the TFT. The low-dielectric dye or photosensitive resin composition for manufacturing a black matrix of the present invention can be successfully applied to a display panel or an image sensor in which a black matrix is used. Characteristics.

Claims (11)

하기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료:
[화학식 1]
Figure pat00010

(여기서,
R1은 H, CH3 또는 4-메틸사이클로헥실(4-Methylcyclohexyl)이고,
R2는 H, OCH3 또는 (4-메틸사이클로헥실)옥시[(4-Methylcyclohexyl)oxy]임).
Low dielectric dye for a color filter black matrix comprising a compound represented by the following formula (1):
[Formula 1]
Figure pat00010

(here,
R 1 is H, CH 3 or 4-methylcyclohexyl,
R 2 is H, OCH 3 or (4-methylcyclohexyl)oxy[(4-Methylcyclohexyl)oxy]).
제1항에 있어서,
상기 화합물은 하기 화학식 2 ~ 4 중 어느 하나로 표시되는 화합물인 것을 특징으로 하는 컬러필터 블랙매트릭스용 저유전성 염료:
[화학식 2]
Figure pat00011
;
[화학식 3]
Figure pat00012
; 및
[화학식 4]
Figure pat00013
.
The method of claim 1,
The compound is a low dielectric dye for a color filter black matrix, characterized in that the compound represented by any one of the following formulas 2 to 4:
[Formula 2]
Figure pat00011
;
[Formula 3]
Figure pat00012
; And
[Formula 4]
Figure pat00013
.
제1항에 있어서,
상기 화합물은 하기 i) ~ iii) 중 어느 하나인 것을 특징으로 하는 컬러필터 블랙매트릭스용 저유전성 염료:
i) 하이드록시포스포러스(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)-트리아자테트라벤조코롤 하이드록사이드 (Hydroxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide);
ii) 디메톡시포스포러스(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4- 메톡시페녹시)-트리아자테트라벤조코롤 (Dimethoxyphosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole); 및
iii) 디(4-메틸사이클로헥옥시)인(V)2(3)-테트라키스(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)-트리아자테트라벤즈코롤 (Di(4-methylcyclohexoxy)phosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole).
The method of claim 1,
The compound is a low dielectric dye for a color filter black matrix, characterized in that any one of the following i) to iii):
i) Hydroxyphosphorus (V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzocorol hydroxide (Hydroxyphosphorus( V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole hydroxide);
ii) Dimethoxyphosphorus(V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzocorol (Dimethoxyphosphorus(V)2) (3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole); And
iii) Di(4-methylcyclohexoxy)phosphorus (V)2(3)-tetrakis(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorol (Di(4-methylcyclohexoxy)phosphorus(V)2(3)-Tetrakis(2,5-Bis(1,1-dimethylbutyl)-4-methoxyphenoxy)-triazatetrabenzcorrole).
1) 4-니트로프탈로니트릴 및 2,5- 비스-(1,1-디메틸부틸)-메톡시페놀을 무수 DMSO에 용해시키고 무수 K2CO3를 첨가한 후 교반한 반응 혼합물을 여과 및 정제하여 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 합성하는 단계;
2) 상기 4-(2,5-비스(1,1-디메틸부틸)-4-메톡시페녹시)프탈로니트릴을 질소분위기 하에서 무수 크실렌과 에탄올에 녹인 용액에 Li를 첨가한 후 교반한 반응 혼합물을 추출 및 정제하여 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 합성하는 단계; 및
3) 상기 테트라키스(2,5-비스(1,1-디메틸 부틸)-4-메톡시페녹시)-프탈로시아닌을 피리딘에 용해시킨 후 PBr3를 첨가하고 생성된 용액을 가열하고 교반한 반응 혼합물을 여과 및 정제하는 단계;를 포함하는,
하기 화학식 1로 표시되는 화합물을 포함하는 컬러필터 블랙매트릭스용 저유전성 염료의 제조 방법:
[화학식 1]
Figure pat00014

(여기서,
R1은 H, CH3 또는 4-메틸사이클로헥실(4-Methylcyclohexyl)이고,
R2는 H, OCH3 또는 (4-메틸사이클로헥실)옥시[(4-Methylcyclohexyl)oxy]임).
1) 4-nitrophthalonitrile and 2,5-bis-(1,1-dimethylbutyl)-methoxyphenol were dissolved in anhydrous DMSO, anhydrous K 2 CO 3 was added, and the stirred reaction mixture was filtered and purified. Synthesizing 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile;
2) The reaction was stirred after adding Li to the solution of 4-(2,5-bis(1,1-dimethylbutyl)-4-methoxyphenoxy)phthalonitrile dissolved in anhydrous xylene and ethanol under a nitrogen atmosphere. Extracting and purifying the mixture to synthesize tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine; And
3) After dissolving the tetrakis(2,5-bis(1,1-dimethyl butyl)-4-methoxyphenoxy)-phthalocyanine in pyridine, PBr 3 was added, and the resulting solution was heated and stirred. Including; filtering and purifying
A method for producing a low-dielectric dye for a color filter black matrix comprising a compound represented by the following formula (1):
[Formula 1]
Figure pat00014

(here,
R 1 is H, CH 3 or 4-methylcyclohexyl,
R 2 is H, OCH 3 or (4-methylcyclohexyl)oxy[(4-Methylcyclohexyl)oxy]).
제4항에 있어서,
상기 단계 3)은 하기 a) ~ c) 중 어느 하나로 수행하는 것을 특징으로 하는 컬러필터 블랙매트릭스용 저유전성 염료의 제조 방법:
a) 상기 단계 3)의 반응 혼합물을 용매를 증발시킨 후, 물과 얼음 배스에 부은 다음 생성된 현탁액을 여과한 후 정제하기;
b) 상기 단계 3)의 반응 혼합물을 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : MeOH의 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제하기; 및
c) 상기 단계 3)의 반응 혼합물을 진공 증류하여 부피를 감소시킨 후, CH2Cl2 : 4-메틸시클로헥산올 50 : 50 용액으로 처리한 후 생성된 녹색 고체를 CH2Cl2에 용해시키고 여과하여 백색 결정질 고체인 피리디늄 브로마이드를 제거한 후 여액을 감압하에 부피를 감소시키고 정제하기.
The method of claim 4,
The step 3) is a method of producing a low-dielectric dye for a color filter black matrix, characterized in that any one of the following a) to c) is performed:
a) evaporating the solvent of the reaction mixture of step 3), pouring it into a water and ice bath, filtering the resulting suspension, and purifying;
b) After reducing the volume of the reaction mixture of step 3) by vacuum distillation, the resulting green solid was dissolved in CH 2 Cl 2 and filtered to reduce the volume of the reaction mixture with a 50:50 solution of CH 2 Cl 2 :MeOH. Reducing the volume of the filtrate under reduced pressure and purifying the filtrate after removing the solid pyridinium bromide; And
c) After reducing the volume of the reaction mixture of step 3) by vacuum distillation, the resulting green solid was dissolved in CH 2 Cl 2 after treatment with a CH 2 Cl 2 :4-methylcyclohexanol 50:50 solution. After filtering to remove pyridinium bromide as a white crystalline solid, reduce the volume of the filtrate under reduced pressure and purify it.
제1항에 따른 염료를 포함하는 컬러필터 블랙매트릭스용 감광성 수지 조성물.
A photosensitive resin composition for a color filter black matrix comprising the dye according to claim 1.
제6항에 있어서,
염료의 함유율이 1 ~ 20 중량%인 것을 특징으로 하는 컬러필터 블랙매트릭스용 감광성 수지 조성물.
The method of claim 6,
A photosensitive resin composition for a color filter black matrix, characterized in that the content of the dye is 1 to 20% by weight.
제6항에 있어서,
N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 더 포함하는 것을 특징으로 하는 컬러필터 블랙매트릭스용 감광성 수지 조성물.
The method of claim 6,
N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide (N,N'-Bis(2,6-diisopropylphenyl) )-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) A photosensitive resin composition for a color filter black matrix, characterized in that it further comprises a dye.
제1항에 따른 염료를 포함하는 블랙매트릭스.
A black matrix comprising the dye according to claim 1.
제9항에 있어서,
N,N'-비스(2,6-디이소 프로필페닐)-1-페녹시-페릴렌-3,4,9,10-테트라카르복시디이미드(N,N’-Bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) 염료를 더 포함하는 것을 특징으로 하는 블랙매트릭스.
The method of claim 9,
N,N'-bis(2,6-diisopropylphenyl)-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide (N,N'-Bis(2,6-diisopropylphenyl) )-1-phenoxy-perylene-3,4,9,10-tetracarboxydiimide) Black matrix, characterized in that it further comprises a dye.
제9항 또는 제10항에 따른 블랙매트릭스가 형성되어서 이루어진 컬러 필터.
A color filter formed by forming the black matrix according to claim 9 or 10.
KR1020190109864A 2019-09-05 2019-09-05 Low dielectric dye type black matrix for color filter on array KR20210028832A (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017193689A (en) 2016-04-22 2017-10-26 大日精化工業株式会社 Black azo pigment and colorant
KR101966803B1 (en) 2017-01-20 2019-04-08 동우 화인켐 주식회사 A photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or black column spacer prepared by using the composition, and a display devide comprising the color filter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017193689A (en) 2016-04-22 2017-10-26 大日精化工業株式会社 Black azo pigment and colorant
KR101966803B1 (en) 2017-01-20 2019-04-08 동우 화인켐 주식회사 A photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or black column spacer prepared by using the composition, and a display devide comprising the color filter

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