KR20210025989A - Method for preparing surface-treated titania particle, surface-treated titania particle theby, titania particle-dispersion composition and composition for coating - Google Patents
Method for preparing surface-treated titania particle, surface-treated titania particle theby, titania particle-dispersion composition and composition for coating Download PDFInfo
- Publication number
- KR20210025989A KR20210025989A KR1020190106143A KR20190106143A KR20210025989A KR 20210025989 A KR20210025989 A KR 20210025989A KR 1020190106143 A KR1020190106143 A KR 1020190106143A KR 20190106143 A KR20190106143 A KR 20190106143A KR 20210025989 A KR20210025989 A KR 20210025989A
- Authority
- KR
- South Korea
- Prior art keywords
- titania particles
- acetate
- ether
- treated
- treated titania
- Prior art date
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 316
- 239000002245 particle Substances 0.000 title claims abstract description 149
- 239000000203 mixture Substances 0.000 title claims abstract description 51
- 239000006185 dispersion Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims description 21
- 238000000576 coating method Methods 0.000 title description 7
- 239000011248 coating agent Substances 0.000 title description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 24
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 claims abstract description 21
- 239000010452 phosphate Substances 0.000 claims abstract description 21
- 239000012756 surface treatment agent Substances 0.000 claims abstract description 19
- 238000004381 surface treatment Methods 0.000 claims abstract description 16
- 238000002156 mixing Methods 0.000 claims abstract description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 28
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 27
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 27
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 24
- 239000013078 crystal Substances 0.000 claims description 21
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 18
- DXVYLFHTJZWTRF-UHFFFAOYSA-N Ethyl isobutyl ketone Chemical compound CCC(=O)CC(C)C DXVYLFHTJZWTRF-UHFFFAOYSA-N 0.000 claims description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 18
- 238000001354 calcination Methods 0.000 claims description 18
- 238000002834 transmittance Methods 0.000 claims description 17
- -1 ultraphosphate Chemical compound 0.000 claims description 15
- 239000000178 monomer Substances 0.000 claims description 13
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 12
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 11
- 238000003848 UV Light-Curing Methods 0.000 claims description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 9
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims description 9
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 9
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 9
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims description 9
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 claims description 8
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 8
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 8
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 6
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 6
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 claims description 6
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 6
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 claims description 6
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 claims description 6
- 150000002576 ketones Chemical class 0.000 claims description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 6
- 150000003254 radicals Chemical class 0.000 claims description 6
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims description 6
- 229940048086 sodium pyrophosphate Drugs 0.000 claims description 6
- 235000019832 sodium triphosphate Nutrition 0.000 claims description 6
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 claims description 6
- 235000019818 tetrasodium diphosphate Nutrition 0.000 claims description 6
- BJFHJALOWQJJSQ-UHFFFAOYSA-N (3-methoxy-3-methylpentyl) acetate Chemical compound CCC(C)(OC)CCOC(C)=O BJFHJALOWQJJSQ-UHFFFAOYSA-N 0.000 claims description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 5
- CYKONRWVCOIAHL-UHFFFAOYSA-N 5-(oxiran-2-yl)pentyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCC1CO1 CYKONRWVCOIAHL-UHFFFAOYSA-N 0.000 claims description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 5
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 claims description 5
- 150000004056 anthraquinones Chemical class 0.000 claims description 5
- 239000012965 benzophenone Substances 0.000 claims description 5
- 239000011164 primary particle Substances 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 239000011163 secondary particle Substances 0.000 claims description 5
- 239000008096 xylene Substances 0.000 claims description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 4
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 claims description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 239000012954 diazonium Substances 0.000 claims description 4
- 150000001989 diazonium salts Chemical class 0.000 claims description 4
- 229940113088 dimethylacetamide Drugs 0.000 claims description 4
- 235000011187 glycerol Nutrition 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 4
- KOSXTEKMNXZLDK-UHFFFAOYSA-N (3-methoxy-2-methylbutyl) acetate Chemical compound COC(C)C(C)COC(C)=O KOSXTEKMNXZLDK-UHFFFAOYSA-N 0.000 claims description 3
- WCRJSEARWSNVQQ-UHFFFAOYSA-N (3-methoxy-2-methylpentyl) acetate Chemical compound CCC(OC)C(C)COC(C)=O WCRJSEARWSNVQQ-UHFFFAOYSA-N 0.000 claims description 3
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 claims description 3
- QAVJODPBTLNBSW-UHFFFAOYSA-N (4-methoxy-4-methylpentyl) acetate Chemical compound COC(C)(C)CCCOC(C)=O QAVJODPBTLNBSW-UHFFFAOYSA-N 0.000 claims description 3
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 claims description 3
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 claims description 3
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 claims description 3
- HQSLKNLISLWZQH-UHFFFAOYSA-N 1-(2-propoxyethoxy)propane Chemical compound CCCOCCOCCC HQSLKNLISLWZQH-UHFFFAOYSA-N 0.000 claims description 3
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 claims description 3
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 claims description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims description 3
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 claims description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 3
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 claims description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 3
- PTBAHIRKWPUZAM-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1CO1 PTBAHIRKWPUZAM-UHFFFAOYSA-N 0.000 claims description 3
- CBKJLMZJKHOGEQ-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCC1CO1 CBKJLMZJKHOGEQ-UHFFFAOYSA-N 0.000 claims description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 3
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 claims description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 3
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 claims description 3
- IELTYWXGBMOKQF-UHFFFAOYSA-N 2-ethoxybutyl acetate Chemical compound CCOC(CC)COC(C)=O IELTYWXGBMOKQF-UHFFFAOYSA-N 0.000 claims description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 claims description 3
- 229940095095 2-hydroxyethyl acrylate Drugs 0.000 claims description 3
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 claims description 3
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 claims description 3
- ZWUWDFWEMWMTHX-UHFFFAOYSA-N 2-methoxybutyl acetate Chemical compound CCC(OC)COC(C)=O ZWUWDFWEMWMTHX-UHFFFAOYSA-N 0.000 claims description 3
- CUAXPJTWOJMABP-UHFFFAOYSA-N 2-methoxypentyl acetate Chemical compound CCCC(OC)COC(C)=O CUAXPJTWOJMABP-UHFFFAOYSA-N 0.000 claims description 3
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 claims description 3
- QMAQLCVJIYANPZ-UHFFFAOYSA-N 2-propoxyethyl acetate Chemical compound CCCOCCOC(C)=O QMAQLCVJIYANPZ-UHFFFAOYSA-N 0.000 claims description 3
- CYXODUIWJAVDAK-UHFFFAOYSA-N 3-(oxiran-2-yl)propyl prop-2-enoate Chemical compound C=CC(=O)OCCCC1CO1 CYXODUIWJAVDAK-UHFFFAOYSA-N 0.000 claims description 3
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 claims description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 claims description 3
- NMUMFCGQLRQGCR-UHFFFAOYSA-N 3-methoxypentyl acetate Chemical compound CCC(OC)CCOC(C)=O NMUMFCGQLRQGCR-UHFFFAOYSA-N 0.000 claims description 3
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 claims description 3
- MOMKYJPSVWEWPM-UHFFFAOYSA-N 4-(chloromethyl)-2-(4-methylphenyl)-1,3-thiazole Chemical compound C1=CC(C)=CC=C1C1=NC(CCl)=CS1 MOMKYJPSVWEWPM-UHFFFAOYSA-N 0.000 claims description 3
- VBWLLBDCDDWTBV-UHFFFAOYSA-N 4-ethoxybutyl acetate Chemical compound CCOCCCCOC(C)=O VBWLLBDCDDWTBV-UHFFFAOYSA-N 0.000 claims description 3
- LMLBDDCTBHGHEO-UHFFFAOYSA-N 4-methoxybutyl acetate Chemical compound COCCCCOC(C)=O LMLBDDCTBHGHEO-UHFFFAOYSA-N 0.000 claims description 3
- GQILQHFLUYJMSM-UHFFFAOYSA-N 4-methoxypentyl acetate Chemical compound COC(C)CCCOC(C)=O GQILQHFLUYJMSM-UHFFFAOYSA-N 0.000 claims description 3
- XGBAEJOFXMSUPI-UHFFFAOYSA-N 4-propoxybutyl acetate Chemical compound CCCOCCCCOC(C)=O XGBAEJOFXMSUPI-UHFFFAOYSA-N 0.000 claims description 3
- BKFFTWAVRUYWIQ-UHFFFAOYSA-N C=C.C=C.C=C.OP(O)(O)=O Chemical compound C=C.C=C.C=C.OP(O)(O)=O BKFFTWAVRUYWIQ-UHFFFAOYSA-N 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 claims description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims description 3
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 3
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 3
- 235000011180 diphosphates Nutrition 0.000 claims description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 3
- 229940035429 isobutyl alcohol Drugs 0.000 claims description 3
- 125000005341 metaphosphate group Chemical group 0.000 claims description 3
- CXHHBNMLPJOKQD-UHFFFAOYSA-M methyl carbonate Chemical compound COC([O-])=O CXHHBNMLPJOKQD-UHFFFAOYSA-M 0.000 claims description 3
- CQDGTJPVBWZJAZ-UHFFFAOYSA-N monoethyl carbonate Chemical compound CCOC(O)=O CQDGTJPVBWZJAZ-UHFFFAOYSA-N 0.000 claims description 3
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims description 3
- FOWDZVNRQHPXDO-UHFFFAOYSA-N propyl hydrogen carbonate Chemical compound CCCOC(O)=O FOWDZVNRQHPXDO-UHFFFAOYSA-N 0.000 claims description 3
- 229940048084 pyrophosphate Drugs 0.000 claims description 3
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 claims description 3
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims description 3
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims description 3
- 235000019983 sodium metaphosphate Nutrition 0.000 claims description 3
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 claims description 3
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 claims description 3
- UNXRWKVEANCORM-UHFFFAOYSA-I triphosphate(5-) Chemical compound [O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O UNXRWKVEANCORM-UHFFFAOYSA-I 0.000 claims description 3
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- OPECTNGATDYLSS-UHFFFAOYSA-N naphthalene-2-sulfonyl chloride Chemical compound C1=CC=CC2=CC(S(=O)(=O)Cl)=CC=C21 OPECTNGATDYLSS-UHFFFAOYSA-N 0.000 description 1
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- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
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Images
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/36—Compounds of titanium
- C09C1/3607—Titanium dioxide
- C09C1/3653—Treatment with inorganic compounds
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- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/08—Drying; Calcining ; After treatment of titanium oxide
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- C01P2006/12—Surface area
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
Abstract
Description
본 발명은 표면 처리된 티타니아 입자의 제조방법, 그에 의해 제조된 표면 처리된 티타니아 입자, 티타니아 입자-분산액 조성물 및 필름용 조성물에 관한 것이다.The present invention relates to a method for preparing a surface-treated titania particle, a surface-treated titania particle, titania particle-dispersion composition, and a composition for a film produced thereby.
광학적으로 투명한 고분자 재료는 낮은 비용과 양호한 가공성, 가시광 영역에서의 높은 투과율 때문에 광학적 코팅과 광전자 소재로 널리 사용되고 있다. 최근에는 고굴절의 투명한 소재가 광학 필터, 렌즈, reflector, optical waveguide, antireflection films, solar cell 및 light emitting diodes(LEDs)의 소재로 사용되고 있다. 그러나, 이러한 고분자는 굴절률(n)이 1.3~1.7으로 고분자 재료만을 사용하기 어렵기 때문에 고굴절률을 지니는 무기소재(n=1.5~2.7)를 고분자에 혼합하여 분산시키는 연구가 진행되고 있다.Optically transparent polymer materials are widely used as optical coatings and optoelectronic materials because of their low cost, good processability, and high transmittance in the visible light region. Recently, high refractive transparent materials have been used as materials for optical filters, lenses, reflectors, optical waveguides, antireflection films, solar cells and light emitting diodes (LEDs). However, since these polymers have a refractive index (n) of 1.3 to 1.7, and it is difficult to use only polymer materials, research is being conducted to mix and disperse an inorganic material (n = 1.5 to 2.7) having a high refractive index in the polymer.
고굴절 무기소재로 사용되는 물질은 TiO2(n=2.5~2.7), ZrO2(n=2.1~2.2), ZnO(n=2.0), SnO2(n=2.0), SiO2(n=1.5)와 같은 물질들이 일반적으로 사용되고 있다. 특히, TiO2는 높은 굴절률을 가지며, 독성이 없고, 가격이 저렴하기 때문에 가장 보편적으로 사용되고 있는 고굴절 무기소재이다. 그러나, TiO2는 필름으로 제조하는 경우에 노란색을 띠고 있으며, TiO2의 함량이 증가할수록 분산 정도를 나타내는 아베수(Abbe number)가 감소하기 때문에 상업적으로 사용하기 제한적이라는 단점을 가지고 있다. 특히, TiO2의 경우, 필름 제조시 황변 현상이 나타나고 이로 인해 디스플레이에 적용할 경우, 색감이 저하되고 시인성이 저하되는 문제가 있다. 또한, 다른 고굴절 무기소재 ZnO, SnO2, SiO2 등은 굴절률이 현저히 떨어지고, 가격이 비싸다는 단점을 갖는다.Materials used as high refractive inorganic materials are TiO 2 (n=2.5~2.7), ZrO 2 (n=2.1~2.2), ZnO(n=2.0), SnO 2 (n=2.0), SiO 2 (n=1.5) Materials such as are commonly used. In particular, TiO 2 has a high refractive index, is non-toxic, and is inexpensive, so it is the most commonly used high refractive inorganic material. However, TiO 2 has a disadvantage in that it has a yellow color when prepared as a film, and is limited in commercial use because the Abbe number representing the degree of dispersion decreases as the content of TiO 2 increases. In particular, in the case of TiO 2 , a yellowing phenomenon occurs during film production, and thus, when applied to a display, there is a problem in that the color feel and visibility are deteriorated. In addition, other high refractive inorganic materials such as ZnO, SnO 2 , SiO 2 have disadvantages that the refractive index is significantly lower and the price is high.
또한, 고굴절 무기소재를 포함한 고분자 복합체를 제조하기 위해서는 높은 함량의 고굴절 무기소재를 포함하는 것이 필요하다. 일반적으로 고굴절 무기물 졸은 수용액 상에서 고굴절을 지니는 무기물 전구체에 촉매를 첨가하여 교반을 통해 제조하고 있으며, 이러한 고굴절의 졸은 상이 불안정하고 불투명도가 발생할 뿐만 아니라 고함량의 무기물을 첨가하기에도 어려움이 있으며, 이로 인해 균일한 막을 제조하기에 어려움이 있다.In addition, in order to manufacture a polymer composite including a high refractive inorganic material, it is necessary to contain a high content of a high refractive inorganic material. In general, high refractive inorganic sols are prepared through stirring by adding a catalyst to an inorganic precursor having high refractive index in an aqueous solution, and such a high refractive sol has difficulty in adding a high content inorganic material as well as unstable phase and opacity. For this reason, it is difficult to manufacture a uniform film.
티타니아(TiO2)는 최근, 광촉매 특성을 이용한 실내 공기질 개선, 도로 포장을 통한 질소 산화물 제거, 구조물의 광촉매 코팅, 그리고 병원 내 멸균 시스템 등과 같은 응용범위가 크게 증가하고 있지만, 황변도로 인하여 광학 필름 제조에 어려움이 있는 바, 티타니아의 높은 유전상수를 이용하되, 복합 입자를 합성하여 고굴절의 낮은 황변성 및 저점도를 가질 수 있는 광학 조성물에 대한 니즈가 증가하고 있다.Titania (TiO 2 ) has recently been greatly increased in the range of applications such as improvement of indoor air quality using photocatalytic properties, nitrogen oxide removal through road pavement, photocatalytic coating of structures, and sterilization systems in hospitals. However, there is a growing need for an optical composition that uses a high dielectric constant of titania, but can have a high refractive index, low yellowing property, and low viscosity by synthesizing composite particles.
본 발명은 상술한 문제점을 해결하기 위한 것으로, 본 발명의 목적은, 높은 열안정성을 가지는 표면 처리된 티타니아 입자의 제조방법 및 그에 의해 제조된 표면 처리된 티타니아 입자를 제공하는 것이다.The present invention is to solve the above-described problems, and an object of the present invention is to provide a method for producing surface-treated titania particles having high thermal stability and surface-treated titania particles produced thereby.
본 발명의 다른 목적은 높은 광산란성 및 광효율이 요구되는 티타니아 분산제 입자-티타니아 입자-분산액 조성물 및 그를 포함하는 필름용 조성물을 제공하는 것이다.Another object of the present invention is to provide a titania dispersant particle-titania particle-dispersion composition and a composition for a film comprising the same, which require high light scattering property and light efficiency.
그러나, 본 발명이 해결하고자 하는 과제는 이상에서 언급한 과제로 제한되지 않으며, 언급되지 않은 또 다른 과제들은 아래의 기재로부터 통상의 기술자에게 명확하게 이해될 수 있을 것이다.However, the problem to be solved by the present invention is not limited to the problems mentioned above, and other problems that are not mentioned will be clearly understood by those skilled in the art from the following description.
본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자의 제조방법은, 티타니아 입자의 표면에 인산염계 표면 처리제를 혼합하여 표면 처리하는 단계;를 포함한다.A method of manufacturing the surface-treated titania particles according to an embodiment of the present invention includes a step of mixing a phosphate-based surface treatment agent on the surface of the titania particles to treat the surface.
일 실시형태에 있어서, 상기 인산염계 표면 처리제는, 정인산나트륨, 피로인산나트륨, 피로인산칼륨, 트리폴리인산나트륨, 메타인산나트륨, 산성인산나트륨, 산성피로인산나트륨, 올소인산염, 메타인산염, 울트라인산염, 피로인산염, 불화인산염, 트리폴리인산염, 테트라폴리인산염 및 나트륨 헥사메타인산염으로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the phosphate-based surface treatment agent is sodium orthophosphate, sodium pyrophosphate, potassium pyrophosphate, sodium tripolyphosphate, sodium metaphosphate, acid sodium phosphate, acid sodium pyrophosphate, orthophosphate, metaphosphate, ultraphosphate, It may include at least one selected from the group consisting of pyrophosphate, fluorinated phosphate, tripolyphosphate, tetrapolyphosphate, and sodium hexametaphosphate.
일 실시형태에 있어서, 상기 인산염계 표면 처리제는, 상기 티타니아 입자 대비 0.1 몰% 내지 5 몰%인 것일 수 있다.In one embodiment, the phosphate-based surface treatment agent may be 0.1 mol% to 5 mol% relative to the titania particles.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자의 평균입도는 5 nm 내지 100 nm인 것일 수 있다.In one embodiment, the surface-treated titania particles may have an average particle size of 5 nm to 100 nm.
일 실시형태에 있어서, 상기 티타니아 입자의 표면에 인산염계 표면 처리제를 혼합하여 표면 처리하는 단계 이후에, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계;를 더 포함할 수 있다.In one embodiment, after the step of surface treatment by mixing a phosphate-based surface treatment agent on the surface of the titania particles, calcining the surface-treated titania particles at a temperature range of 700° C. to 1000° C.; I can.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 1차 입자 평균입도는 20 nm 내지 100 nm이고, 2차 입자 평균입도는 100 nm 내지 500 nm인 것일 수 있다.In one embodiment, the average primary particle size of the surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C is 20 nm to 100 nm, and the secondary particles The average particle size may be 100 nm to 500 nm.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 비표면적은, 1 m2/g 내지 250 m2/g인 것일 수 있다.In one embodiment, the specific surface area of the surface-treated titania particles after the step of calcining the surface-treated titania particles in a temperature range of 700 °C to 1000 °C is 1 m 2 /g to 250 m 2 /g Can be.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자는 전체 입자 중 아나타제(anatase) 결정구조가 98 중량% 이상 존재하고, 나머지는 루타일(rutile) 결정구조로 존재하는 것일 수 있다.In one embodiment, the surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C have an anatase crystal structure of 98% by weight or more in the total particles, and , The rest may exist in a rutile crystal structure.
본 발명의 다른 실시예에 따른 표면 처리된 티타니아 입자는, 일 측면에 따른 표면 처리된 티타니아 입자의 제조방법에 의해 제조된다.The surface-treated titania particles according to another embodiment of the present invention are manufactured by the method of manufacturing the surface-treated titania particles according to one aspect.
본 발명의 또 다른 실시예에 따른 티타니아 입자-분산액 조성물은, 일 측면에 따른 표면 처리된 티타니아 입자; 및 유기용매;를 포함한다. A titania particle-dispersion composition according to another embodiment of the present invention includes a surface-treated titania particle according to an aspect; And an organic solvent;
일 실시형태에 있어서, 상기 유기용매는, 에탄올(EtOH), 메탄올(MeOH), 프로판올(PrOH), 부탄올(BuOH), 이소프로필알코올(IPA), 이소프로필 알코올 프로판올, 이소부틸알코올, 헥산올, 시클로헥산올, 디메틸아세트아미드(DMAC), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 테트라하이드로퓨란(THF), 트리에틸렌포스페이트(Triethylphosphate), 트리메틸포스페이트(Trimethylphosphate), 헥산, 벤젠, 톨루엔, 크실렌, 아세톤, 메틸에틸케톤(MEK), 에틸이소부틸케톤(EIBK), 메틸이소부틸케톤(MIBK), 디에틸케톤, 디이소부틸케톤, 아세트산에틸, 아세트산부틸, 디옥산, 디에틸에테르, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 에틸렌글리콜디프로필에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 프로필렌글리콜디메틸에테르, 프로필렌글리콜디에틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌 글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 에틸렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 프로필렌글리콜모노메틸에테르아세테이트 (PGMEA), 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 2-메톡시부틸아세테이트, 3-메톡시부틸아세테이트, 4-메톡시부틸아세테이트, 2-메틸-3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 3-에틸-3-메톡시부틸아세테이트, 2-에톡시부틸아세테이트, 4-에톡시부틸아세테이트, 4-프로폭시부틸아세테이트, 2-메톡시펜틸아세테이트, 3-메톡시펜틸아세테이트, 4-메톡시펜틸아세테이트, 2-메틸-3-메톡시펜틸아세테이트, 3-메틸-3-메톡시펜틸아세테이트, 3-메틸-4-메톡시펜틸아세테이트, 4-메틸-4-메톡시펜틸아세테이트, 아세톤, 메틸에틸케톤, 디에틸케톤, 메틸이소부틸케톤, 에틸이소부틸케톤, 탄산메틸, 탄산에틸, 탄산프로필, 탄산부틸, 벤젠, 톨루엔, 자일렌, 시클로헥사논, 에틸렌글리콜, 디에틸렌글리콜, 테트라하이드로퓨란(tetrahydrofuran), 1,4-디옥산 및 글리세린으로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the organic solvent is ethanol (EtOH), methanol (MeOH), propanol (PrOH), butanol (BuOH), isopropyl alcohol (IPA), isopropyl alcohol propanol, isobutyl alcohol, hexanol, Cyclohexanol, dimethylacetamide (DMAC), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), triethylene phosphate, trimethylphosphate, hexane, benzene, toluene , Xylene, acetone, methyl ethyl ketone (MEK), ethyl isobutyl ketone (EIBK), methyl isobutyl ketone (MIBK), diethyl ketone, diisobutyl ketone, ethyl acetate, butyl acetate, dioxane, diethyl ether, Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol monomethyl ether, propylene glycol mono Ethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol di Ethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, propylene glycol Monopropyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 2-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3- Ethyl-3-methoxybutyl acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate , 2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-me Tyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, acetone, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone, ethyl isobutyl ketone, methyl carbonate, ethyl carbonate, propyl carbonate, carbonic acid It may include at least one selected from the group consisting of butyl, benzene, toluene, xylene, cyclohexanone, ethylene glycol, diethylene glycol, tetrahydrofuran, 1,4-dioxane, and glycerin.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자는 상기 티타니아 입자-분산액 조성물 중 30 중량% 내지 50 중량%인 것일 수 있다.In one embodiment, the surface-treated titania particles may be from 30% to 50% by weight of the titania particle-dispersion composition.
본 발명의 또 다른 실시예에 따른 필름용 조성물은, 일 실시예에 따른 티타니아 입자-분산액 조성물; UV 광개시제; 및 UV 경화용 모노머;를 포함한다.Composition for a film according to another embodiment of the present invention, titania particles according to an embodiment-dispersion composition; UV photoinitiator; And UV curing monomers.
일 실시형태에 있어서, 상기 UV 광개시제는, 오늄염계, 디아조늄염계, 설포늄염계 화합물 및 이미다졸계에서 선택되는 광양이온 개시제; 및 티오크산톤계, 인계, 트리아진계, 벤조페논계, 벤조인계, 옥심계, 프로판논계, 아미노 케톤계, 케톤계, 벤조인 에테르 아세토페논계, 안트라퀴논계 및 방향족 포스핀 옥사이드계 화합물에서 선택되는 라디컬 광개시제;로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the UV photoinitiator may include a photocationic initiator selected from an onium salt-based, diazonium salt-based, sulfonium salt-based compound, and an imidazole-based compound; And thioxanthone-based, phosphorus-based, triazine-based, benzophenone-based, benzoin-based, oxime-based, propanone-based, amino ketone-based, ketone-based, benzoin ether acetophenone-based, anthraquinone-based and aromatic phosphine oxide-based compound. It may include at least one selected from the group consisting of; a radical photoinitiator.
일 실시형태에 있어서, 상기 UV 경화용 모노머는, 글리시딜아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜-알파-에틸 아크릴레이트, 글리시딜-알파-엔-프로필아크릴레이트, 글리시딜-알파-부틸아크릴레이트, 3,4-에폭시부틸메타아크릴레이트, 3,4-에폭시부틸 아크릴레이트, 6,7-에폭시펩틸메타아크릴레이트, 6,7-에폭시헵틸아크릴레이트, 6,7-에폭시헵틸-알파-에틸아크릴레이트, 2 하이드록시프로필 아크릴레이트(2 Hydroxy propyl acrylate; 2HPA), 2 하이드록시프로필 아크릴레이트(2 Hydroxy ethylacrylate; 2HEA), 테트라하이드로푸르푸릴 아크릴레이트(Tetrahydrofurfuryl acrylate; THFA), 이소보닐 아크릴레이트(Isobonyl acrylate; IBOA), 2 하이드록시 에틸 메타아크릴레이트(2 Hydroxy ethyl methacrylate; 2HEMA), 트리프로필렌 글리콜 디아크릴레이트(Tripropylene glycol diacrylate; TPGDA), 디프로필렌 글리콜 디아크릴레이트(Dipropylene glycol diacrylate; DPGDA), 1,6 헥산디올 디아크릴레이트(1,6 Hexanediol diacrylate; 1,6HDDA) 및 트리메틸프로판 트리아크릴레이트(Trimethylopropane triacrylate; TMPTA)로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the UV curing monomer is glycidyl acrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl-alpha-ethyl acrylate, glycidyl-alpha-ene -Propyl acrylate, glycidyl-alpha-butyl acrylate, 3,4-epoxybutyl methacrylate, 3,4-epoxybutyl acrylate, 6,7-epoxypeptyl methacrylate, 6,7-epoxyheptyl Acrylate, 6,7-epoxyheptyl-alpha-ethylacrylate, 2 Hydroxy propyl acrylate (2HPA), 2 Hydroxy ethylacrylate (2HEA), tetrahydrofurfuryl acrylic Tetrahydrofurfuryl acrylate (THFA), Isobonyl acrylate (IBOA), 2 Hydroxy ethyl methacrylate (2HEMA), Tripropylene glycol diacrylate (TPGDA), D At least selected from the group consisting of propylene glycol diacrylate (DPGDA), 1,6 hexanediol diacrylate (1,6 Hexanediol diacrylate; 1,6HDDA) and trimethylopropane triacrylate (TMPTA) It may include any one.
일 실시형태에 있어서, 상기 필름용 조성물의 굴절률은 1.70 이상이고, 상기 필름용 조성물의 점도는 1000 cPs 이하인 것일 수 있다.In one embodiment, the refractive index of the film composition may be 1.70 or more, and the viscosity of the film composition may be 1000 cPs or less.
본 발명의 또 다른 실시예에 따른 필름은, 본 발명의 일 실시예에 따른 필름용 조성물로 제조된다.A film according to another embodiment of the present invention is prepared from the composition for a film according to an embodiment of the present invention.
일 실시형태에 있어서, 상기 필름의 전체 투과율이 80 % 내지 90 %이고, 상기 필름의 확산 투과율이 5 % 내지 20 %이고, 상기 필름의 헤이즈(Haze)가 10 % 내지 20 %인 것일 수 있다.In one embodiment, the film may have a total transmittance of 80% to 90%, a diffuse transmittance of the film of 5% to 20%, and a haze of the film of 10% to 20%.
본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자의 제조방법에 의해 제조된 표면 처리된 티타니아 입자는 인산염계 첨가제를 이용한 표면 개질을 통해 티타니아 입자의 아나타제(anatase)에서 루타일(rutile)로의 상전이를 억제하는 높은 열안정성을 나타낼 수 있다.The surface-treated titania particles produced by the method for producing surface-treated titania particles according to an embodiment of the present invention are subjected to a phase transition of titania particles from anatase to rutile through surface modification using a phosphate-based additive. It can exhibit high thermal stability that suppresses.
본 발명의 일 실시예에 따른 티타니아 입자-분산액 조성물은 본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자를 포함함으로써 표면 처리된 티타니아 입자를 포함함으로써, 광 안정성이 높고, 광 촉매성이 저하되어 황변이 억제되고, 높은 광산란성 및 광효율이 나타나는 필름을 구현할 수 있다.The titania particle-dispersion composition according to an embodiment of the present invention includes the titania particles surface-treated by including the surface-treated titania particles according to an embodiment of the present invention, so that the light stability is high and the photocatalytic property is lowered. Yellowing is suppressed, and a film exhibiting high light scattering property and light efficiency can be implemented.
도 1은 본 발명의 실시예 1 내지 5 및 비교예 2에 따른 인산 표면처리된 티타니아 입자의 아나타제 및 루타일 결정구조를 나타낸 X-ray 회절 결과이다.
도 2는 800 ℃의 온도에서 1 시간 동안 하소한 표면처리 하지 않은 티타니아 입자의 아나타제 및 루타일 결정구조를 나타낸 X-ray 회절 결과이다.
도 3은 본 발명의 실시예 1에 따른 인산 표면처리된 티타니아 입자의 SEM 이미지이다.
도 4는 본 발명의 실시예 1에 따른 인산 표면처리된 티타니아 입자의 입도 분포를 나타낸 것이다.1 is an X-ray diffraction result showing anatase and rutile crystal structures of titania particles subjected to phosphoric acid surface treatment according to Examples 1 to 5 and Comparative Example 2 of the present invention.
FIG. 2 is an X-ray diffraction result showing anatase and rutile crystal structures of titania particles without surface treatment, which were calcined at a temperature of 800° C. for 1 hour.
3 is an SEM image of titania particles subjected to phosphoric acid surface treatment according to Example 1 of the present invention.
4 shows the particle size distribution of titania particles subjected to phosphoric acid surface treatment according to Example 1 of the present invention.
이하에서, 첨부된 도면을 참조하여 실시예들을 상세하게 설명한다. 그러나, 실시예들에는 다양한 변경이 가해질 수 있어서 특허출원의 권리 범위가 이러한 실시예들에 의해 제한되거나 한정되는 것은 아니다. 실시예들에 대한 모든 변경, 균등물 내지 대체물이 권리 범위에 포함되는 것으로 이해되어야 한다.Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. However, since various changes may be made to the embodiments, the scope of the patent application is not limited or limited by these embodiments. It is to be understood that all changes, equivalents, or substitutes to the embodiments are included in the scope of the rights.
실시예에서 사용한 용어는 단지 설명을 목적으로 사용된 것으로, 한정하려는 의도로 해석되어서는 안된다. 단수의 표현은 문맥상 명백하게 다르게 뜻하지 않는 한, 복수의 표현을 포함한다. 본 명세서에서, "포함하다" 또는 "가지다" 등의 용어는 명세서 상에 기재된 특징, 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것이 존재함을 지정하려는 것이지, 하나 또는 그 이상의 다른 특징들이나 숫자, 단계, 동작, 구성요소, 부품 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 미리 배제하지 않는 것으로 이해되어야 한다.The terms used in the examples are used for illustrative purposes only and should not be construed as limiting. Singular expressions include plural expressions unless the context clearly indicates otherwise. In the present specification, terms such as "comprise" or "have" are intended to designate the presence of features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, but one or more other features. It is to be understood that the presence or addition of elements or numbers, steps, actions, components, parts, or combinations thereof does not preclude in advance.
다르게 정의되지 않는 한, 기술적이거나 과학적인 용어를 포함해서 여기서 사용되는 모든 용어들은 실시예가 속하는 기술 분야에서 통상의 지식을 가진 자에 의해 일반적으로 이해되는 것과 동일한 의미를 가지고 있다. 일반적으로 사용되는 사전에 정의되어 있는 것과 같은 용어들은 관련 기술의 문맥 상 가지는 의미와 일치하는 의미를 가지는 것으로 해석되어야 하며, 본 출원에서 명백하게 정의하지 않는 한, 이상적이거나 과도하게 형식적인 의미로 해석되지 않는다.Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which the embodiment belongs. Terms as defined in a commonly used dictionary should be interpreted as having a meaning consistent with the meaning in the context of the related technology, and should not be interpreted as an ideal or excessive formal meaning unless explicitly defined in this application. Does not.
또한, 첨부 도면을 참조하여 설명함에 있어, 도면 부호에 관계없이 동일한 구성 요소는 동일한 참조부호를 부여하고 이에 대한 중복되는 설명은 생략하기로 한다. 실시예를 설명함에 있어서 관련된 공지 기술에 대한 구체적인 설명이 실시예의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.In addition, in the description with reference to the accompanying drawings, the same reference numerals are assigned to the same components regardless of the reference numerals, and redundant descriptions thereof will be omitted. In describing the embodiments, when it is determined that a detailed description of related known technologies may unnecessarily obscure the subject matter of the embodiments, the detailed description thereof will be omitted.
이하, 본 발명의 표면 처리된 티타니아 입자의 제조방법, 그에 의해 제조된 표면 처리된 티타니아 입자, 티타니아 입자-분산액 조성물 및 필름용 조성물에 대하여 실시예 및 도면을 참조하여 구체적으로 설명하도록 한다. 그러나, 본 발명이 이러한 실시예 및 도면에 제한되는 것은 아니다.Hereinafter, the method for preparing the surface-treated titania particles of the present invention, the surface-treated titania particles, titania particles-dispersion composition, and film composition prepared by the method of the present invention will be described in detail with reference to Examples and drawings. However, the present invention is not limited to these examples and drawings.
본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자의 제조방법은, 티타니아 입자의 표면에 인산염계 표면 처리제를 혼합하여 표면 처리하는 단계;를 포함한다.A method of manufacturing the surface-treated titania particles according to an embodiment of the present invention includes a step of mixing a phosphate-based surface treatment agent on the surface of the titania particles to treat the surface.
일 실시형태에 있어서, 상기 티타니아 입자는 고유전체 물질로, 높은 유전상수를 가질 수 있으며, 높은 굴절률을 가지는 미립자인 것일 수 있다.In one embodiment, the titania particles are high dielectric materials, may have a high dielectric constant, and may be fine particles having a high refractive index.
일 실시형태에 있어서, 상기 티타니아 입자는 시판된 입자를 준비하는 것일 수도 있고, 졸-겔 법, 수열법, 고상법 및 초임계법으로 이루어지는 군으로부터 선택되는 어느 하나의 합성법에 의해 입자를 합성하는 것일 수도 있다.In one embodiment, the titania particles may be prepared commercially available particles, or the particles are synthesized by any one synthesis method selected from the group consisting of a sol-gel method, a hydrothermal method, a solid phase method, and a supercritical method. May be.
일 실시형태에 있어서, 상기 졸-겔법에 의해 제조된 티타니아 입자는, 열적 안정성과 높은 굴절률 및 투과율을 가질 수 있다.In one embodiment, the titania particles prepared by the sol-gel method may have thermal stability, high refractive index, and transmittance.
일 실시형태에 있어서, 상기 인산염계 표면 처리제는 분산성 확보를 위한 산 조건을 충족하는 것이라면 특별히 제한되지 않으나, 바람직하게는 유기산 또는 무기산일 수 있다.In one embodiment, the phosphate-based surface treatment agent is not particularly limited as long as it satisfies the acid conditions for securing dispersibility, but may be preferably an organic acid or an inorganic acid.
일 실시형태에 있어서, 상기 인산염계 표면 처리제는, 정인산나트륨, 피로인산나트륨, 피로인산칼륨, 트리폴리인산나트륨, 메타인산나트륨, 산성인산나트륨, 산성피로인산나트륨, 올소인산염, 메타인산염, 울트라인산염, 피로인산염, 불화인산염, 트리폴리인산염, 테트라폴리인산염 및 나트륨 헥사메타인산염으로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the phosphate-based surface treatment agent is sodium orthophosphate, sodium pyrophosphate, potassium pyrophosphate, sodium tripolyphosphate, sodium metaphosphate, acid sodium phosphate, acid sodium pyrophosphate, orthophosphate, metaphosphate, ultraphosphate, It may include at least one selected from the group consisting of pyrophosphate, fluorinated phosphate, tripolyphosphate, tetrapolyphosphate, and sodium hexametaphosphate.
일 실시형태에 있어서, 상기 인산염계 표면 처리제는, 상기 티타니아 입자 대비 0.1 몰% 내지 5 몰%인 것일 수 있다. 상기 인산염계 표면 처리제는, 상기 티타니아 입자 대비 0.1몰% 미만일 경우, 티타니아 입자의 분산성을 향상시키기 위한 표면 개질 효과가 떨어질 수 있고, 황변이 억제되지 못하며, 5 몰%를 초과하는 경우에는, 인산염계 표면처리제가 용매에 충분히 용해되지 않아 표면 개질 효과가 저하되고, 분산액의 점도가 상승할 수 있다. 인산염계 표면 처리제의 pH는 10 수준으로 염기성이고, 인산염계 표면 처리제의 용해도는 약 6.7 g/mL (25 ℃)일 수 있으며, 과량 첨가시 용해되지 않는 문제가 발생할 수 있으므로, 상기 범위의 인산염계 표면 처리제가 포함되는 것일 수 있다.In one embodiment, the phosphate-based surface treatment agent may be 0.1 mol% to 5 mol% relative to the titania particles. When the phosphate-based surface treatment agent is less than 0.1 mol% of the titania particles, the surface modification effect for improving the dispersibility of the titania particles may be lowered, yellowing cannot be suppressed, and when it exceeds 5 mol%, phosphate Since the system surface treatment agent is not sufficiently dissolved in the solvent, the surface modification effect may decrease, and the viscosity of the dispersion may increase. The pH of the phosphate-based surface treatment agent is basic at a level of 10, and the solubility of the phosphate-based surface treatment agent may be about 6.7 g/mL (25°C). A surface treatment agent may be included.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자의 평균입도는 5 nm 내지 100 nm인 것일 수 있다. 상기 표면 처리된 티타니아 입자의 평균입도가 5 nm 미만인 경우 나노 입자의 표면에너지 증대로 인하여 분산이 어려워지는 문제가 발생할 수 있고, 100 nm 초과인 경우 필름의 두께가 두꺼워지는 문제가 있다.In one embodiment, the surface-treated titania particles may have an average particle size of 5 nm to 100 nm. When the average particle size of the surface-treated titania particles is less than 5 nm, dispersion may be difficult due to an increase in the surface energy of the nanoparticles, and when it is more than 100 nm, there is a problem that the thickness of the film becomes thick.
일 실시형태에 있어서, 상기 티타니아 입자의 표면에 인산염계 표면 처리제를 혼합하여 표면 처리하는 단계 이후에, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계;를 더 포함할 수 있다. 루타일 결정구조가 자연에서 가장 풍부하게 생성되고, 아나타제 결정구조는 수많은 분야에 적용될 수 있고, 가장 폭넓게 사용되는 물질이다. 이러한 이유로 가장 풍부한 루타일 형태를 안정적인 아나타제 결정구조로 변형시키는 공정이 필요하다. In one embodiment, after the step of surface treatment by mixing a phosphate-based surface treatment agent on the surface of the titania particles, calcining the surface-treated titania particles at a temperature range of 700° C. to 1000° C.; I can. The rutile crystal structure is most abundantly produced in nature, and the anatase crystal structure can be applied to many fields, and is the most widely used material. For this reason, it is necessary to transform the most abundant rutile form into a stable anatase crystal structure.
일 실시형태에 있어서, 상기 하소 온도가 700 ℃ 미만인 경우 결정입자의 성장이 이루어지지 않을 수 있고, 1000 ℃ 초과인 경우 아나타제(anatase) 결정구조에서 루타일(rutile) 결정구조로의 상전이를 억제하기 어려울 수 있다. In one embodiment, when the calcination temperature is less than 700° C., crystal grain growth may not occur, and when the calcination temperature is higher than 1000° C., the phase transition from an anatase crystal structure to a rutile crystal structure is suppressed. It can be difficult.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 1차 입자 평균입도는 20 nm 내지 100 nm이고, 2차 입자 평균입도는 100 nm 내지 500 nm인 것일 수 있다. 상기 범위의 표면 처리된 티타니아 입자의 회절도가 단결정 입자보다 우수하다.In one embodiment, the average primary particle size of the surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C is 20 nm to 100 nm, and the secondary particles The average particle size may be 100 nm to 500 nm. The diffraction degree of the surface-treated titania particles in the above range is superior to that of the single crystal particles.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 비표면적은, 1 m2/g 내지 250 m2/g인 것일 수 있다. 상기 범위의 비표면적의 표면 처리된 티타니아 입자는, 응집이 거의 없거나, 응집을 저감할 수 있다.In one embodiment, the specific surface area of the surface-treated titania particles after the step of calcining the surface-treated titania particles in a temperature range of 700 °C to 1000 °C is 1 m 2 /g to 250 m 2 /g Can be. Surface-treated titania particles having a specific surface area within the above range have little or no aggregation, or aggregation can be reduced.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자의 1차 입자 평균입도는 20 nm 내지 100 nm이고, 2차 입자 평균입도는 100 nm 내지 500 nm이면서 동시에 비표면적이 1 m2/g 내지 250 m2/g인 경우 여 높은 굴절률을 가지고, 열처리시 결정립이 성장하여 분리된 결정립 구조 형성이 용이할 수 있다.In one embodiment, the surface-treated titania particles have an average primary particle size of 20 nm to 100 nm, and an average secondary particle size of 100 nm to 500 nm and a specific surface area of 1 m 2 /g to 250 m In the case of 2 /g, it has a high refractive index, and crystal grains grow during heat treatment, so that it may be easy to form a separated crystal grain structure.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자는 전체 입자 중 아나타제(anatase) 결정구조가 98 중량% 이상 존재하고, 나머지는 루타일(rutile) 결정구조로 존재하는 것일 수 있다. 상기 하소 처리된 표면 처리된 티타니아 입자는 전체 입자의 중량에 대하여 루타일 비율이 2 중량% 미만이 될 때까지, 하소 처리 온도에 의존하는 시간 동안 일정 온도에서 지속되는 것일 수 있다. 상기 언급된 일정 온도 범위에서, 하소 처리를 위한 시간은 통상 40 내지 300분이다.In one embodiment, the surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C have an anatase crystal structure of 98% by weight or more in the total particles, and , The rest may exist in a rutile crystal structure. The calcined surface-treated titania particles may be maintained at a constant temperature for a time depending on the calcining treatment temperature until the rutile ratio is less than 2% by weight with respect to the total weight of the particles. In the above-mentioned constant temperature range, the time for the calcination treatment is usually 40 to 300 minutes.
아나타제 티타니아 분율: Xa (%)=100/(1+1.265 Ir/Ia)Anatase titania fraction: Xa (%)=100/(1+1.265 Ir/Ia)
루타일 티타니아 분율: Xr (%)=100/(1+0.8 Ia/Ir)Rutile titania fraction: Xr (%)=100/(1+0.8 Ia/Ir)
Ia : 아나타제 입자 XRD Intensity (2θ: ~25.4˚), Ir : 루타일 입자 XRD Intensity (2θ: ~27.5˚)Ia: Anatase particle XRD Intensity (2θ: ~25.4˚), Ir: Rutile particle XRD Intensity (2θ: ~27.5˚)
본 발명의 다른 실시예에 따른 표면 처리된 티타니아 입자는, 일 측면에 따른 표면 처리된 티타니아 입자의 제조방법에 의해 제조된다.The surface-treated titania particles according to another embodiment of the present invention are manufactured by the method of manufacturing the surface-treated titania particles according to one aspect.
본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자는, 열적 안정성과 높은 굴절률 및 투과율을 가질 수 있다.The surface-treated titania particles according to an embodiment of the present invention may have thermal stability, high refractive index, and transmittance.
본 발명의 또 다른 실시예에 따른 티타니아 입자-분산액 조성물은, 일 측면에 따른 표면 처리된 티타니아 입자; 및 유기용매;를 포함한다.A titania particle-dispersion composition according to another embodiment of the present invention includes a surface-treated titania particle according to an aspect; And an organic solvent;
본 발명의 일 실시예에 따른 티타니아 입자-분산액 조성물은 본 발명의 일 실시예에 따른 표면 처리된 티타니아 입자를 포함함으로써 분산액 조성물 및 필름의 황변을 개선할 수 있다.The titania particle-dispersion composition according to an embodiment of the present invention may improve yellowing of the dispersion composition and film by including the surface-treated titania particles according to an embodiment of the present invention.
일 실시형태에 있어서, 상기 유기용매는, 에탄올(EtOH), 메탄올(MeOH), 프로판올(PrOH), 부탄올(BuOH), 이소프로필알코올(IPA), 이소프로필 알코올 프로판올, 이소부틸알코올, 헥산올, 시클로헥산올, 디메틸아세트아미드(DMAC), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 테트라하이드로퓨란(THF), 트리에틸렌포스페이트(Triethylphosphate), 트리메틸포스페이트(Trimethylphosphate), 헥산, 벤젠, 톨루엔, 크실렌, 아세톤, 메틸에틸케톤(MEK), 에틸이소부틸케톤(EIBK), 메틸이소부틸케톤(MIBK), 디에틸케톤, 디이소부틸케톤, 아세트산에틸, 아세트산부틸, 디옥산, 디에틸에테르, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 에틸렌글리콜디프로필에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 프로필렌글리콜디메틸에테르, 프로필렌글리콜디에틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌 글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 에틸렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 프로필렌글리콜모노메틸에테르아세테이트 (PGMEA), 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 2-메톡시부틸아세테이트, 3-메톡시부틸아세테이트, 4-메톡시부틸아세테이트, 2-메틸-3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 3-에틸-3-메톡시부틸아세테이트, 2-에톡시부틸아세테이트, 4-에톡시부틸아세테이트, 4-프로폭시부틸아세테이트, 2-메톡시펜틸아세테이트, 3-메톡시펜틸아세테이트, 4-메톡시펜틸아세테이트, 2-메틸-3-메톡시펜틸아세테이트, 3-메틸-3-메톡시펜틸아세테이트, 3-메틸-4-메톡시펜틸아세테이트, 4-메틸-4-메톡시펜틸아세테이트, 아세톤, 메틸에틸케톤, 디에틸케톤, 메틸이소부틸케톤, 에틸이소부틸케톤, 탄산메틸, 탄산에틸, 탄산프로필, 탄산부틸, 벤젠, 톨루엔, 자일렌, 시클로헥사논, 에틸렌글리콜, 디에틸렌글리콜, 테트라하이드로퓨란(tetrahydrofuran), 1,4-디옥산 및 글리세린으로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the organic solvent is ethanol (EtOH), methanol (MeOH), propanol (PrOH), butanol (BuOH), isopropyl alcohol (IPA), isopropyl alcohol propanol, isobutyl alcohol, hexanol, Cyclohexanol, dimethylacetamide (DMAC), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), triethylene phosphate, trimethylphosphate, hexane, benzene, toluene , Xylene, acetone, methyl ethyl ketone (MEK), ethyl isobutyl ketone (EIBK), methyl isobutyl ketone (MIBK), diethyl ketone, diisobutyl ketone, ethyl acetate, butyl acetate, dioxane, diethyl ether, Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol monomethyl ether, propylene glycol mono Ethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol di Ethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, propylene glycol Monopropyl ether acetate, 2-methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 2-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3- Ethyl-3-methoxybutyl acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate , 2-methyl-3-methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-me Tyl-4-methoxypentyl acetate, 4-methyl-4-methoxypentyl acetate, acetone, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone, ethyl isobutyl ketone, methyl carbonate, ethyl carbonate, propyl carbonate, carbonic acid It may include at least one selected from the group consisting of butyl, benzene, toluene, xylene, cyclohexanone, ethylene glycol, diethylene glycol, tetrahydrofuran, 1,4-dioxane, and glycerin.
일 실시형태에 있어서, 상기 표면 처리된 티타니아 입자는 상기 티타니아 입자-분산액 조성물 중 30 중량% 내지 50 중량%인 것일 수 있다. 상기 표면 처리된 티타니아 입자가 상기 티타니아 입자-분산액 조성물 중 30 중량% 미만인 경우 분산액 내에서 입자의 상대적 비율이 낮아져 분산액의 굴절률 및 휘도가 감소할 수 있고, 50 중량% 초과인 경우 필름의 황변(yellowish)이 나타나는 문제가 있다.In one embodiment, the surface-treated titania particles may be from 30% to 50% by weight of the titania particle-dispersion composition. When the surface-treated titania particles are less than 30% by weight of the titania particles-dispersion composition, the relative proportion of particles in the dispersion decreases, so that the refractive index and luminance of the dispersion may decrease, and when it exceeds 50% by weight, the yellowish film is yellowish. ) Appears.
본 발명의 또 다른 실시예에 따른 필름용 조성물은, 일 실시예에 따른 티타니아 입자-분산액 조성물; UV 광개시제; 및 UV 경화용 모노머;를 포함한다.Composition for a film according to another embodiment of the present invention, titania particles according to an embodiment-dispersion composition; UV photoinitiator; And UV curing monomers.
일 실시형태에 있어서, 상기 UV 광개시제는, 오늄염계, 디아조늄염계, 설포늄염계 화합물 및 이미다졸계에서 선택되는 광양이온 개시제; 및 티오크산톤계, 인계, 트리아진계, 벤조페논계, 벤조인계, 옥심계, 프로판논계, 아미노 케톤계, 케톤계, 벤조인 에테르 아세토페논계, 안트라퀴논계 및 방향족 포스핀 옥사이드계 화합물에서 선택되는 라디컬 광개시제;로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the UV photoinitiator may include a photocationic initiator selected from an onium salt-based, diazonium salt-based, sulfonium salt-based compound, and an imidazole-based compound; And thioxanthone-based, phosphorus-based, triazine-based, benzophenone-based, benzoin-based, oxime-based, propanone-based, amino ketone-based, ketone-based, benzoin ether acetophenone-based, anthraquinone-based and aromatic phosphine oxide-based compound. It may include at least one selected from the group consisting of; a radical photoinitiator.
일 실시형태에 있어서, 상기 광개시제는, 광양이온 개시제, 라디컬 광개시제 또는 이 둘을 포함할 수 있다.In one embodiment, the photoinitiator may include a photocationic initiator, a radical photoinitiator, or both.
일 실시형태에 있어서, 상기 광양이온 개시제는, 오늄염계, 디아조늄염계, 설포늄염계 화합물 및 이미다졸계로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것일 수 있다. 예를 들어, 상기 광양이온 개시제는, 디페닐요오드늄(diphenyliodonium), 4-메톡시디페닐요오드늄(4-methoxydiphenyliodonium), 비스(4-메틸페닐)요오드늄(bis(4-methylphenyl)iodonium), 비스(4-터트-부틸페닐)요오드늄(bis(4-tert-butylphenyl)iodonium), 비스(도데실페닐)요오드늄(bis(dodecylphenyl)iodonium), (4-메틸페닐)[(4-(2-메틸프로필)페닐)요오드늄(4-methylphenyl)[(4-(2-methylpropyl)phenyl)iodonium] 등의 디아릴요오드늄, 트리페닐술포늄(triphenylsulfonium), 디페닐-4-티오페닐페닐술포늄(diphenyl-4-thiophenylphenylsulfonium), 디페닐-4-티오페녹시페닐술포늄(diphenyl-4-thiophenoxyphenylsulfonium) 등의 트리아릴술포늄, 비스[4-(디페닐술포니오)페닐]술피드(bis[4-(diphenylsulfonio)phenyl]sulfide) 등의 양이온 및 헥사플루오로포스페이트(PF6 -), 테트라플루오로보레이트(BF4 -), 헥사플루오로안티모네이트(SbF6 -), 헥사플루오로아르세네이트(AsF6 -), 헥사클로로안티모네이트(SbCl6 -) 등의 음이온을 포함하는 오늄염계이며, 트리아릴술포늄 퍼플루오로알킬술포네이트, 트리아릴술포늄 트리플레이트, 트리아릴술포늄 노나플레이트, 디아릴이오도늄 노나플레이트, 숙신이미딜 트리플레이트, 2,6-디니트로벤질 술포네이트 등일 수 있으며, 이에 제한되지 않는다.In one embodiment, the photocationic initiator may include at least one selected from the group consisting of an onium salt-based, a diazonium salt-based, a sulfonium salt-based compound, and an imidazole-based compound. For example, the photocationic initiator, diphenyliodonium, 4-methoxydiphenyliodonium, bis (4-methylphenyl) iodonium (bis (4-methylphenyl) iodonium), bis (4-tert-butylphenyl) iodonium (bis(4-tert-butylphenyl)iodonium), bis(dodecylphenyl)iodonium (bis(dodecylphenyl)iodonium), (4-methylphenyl)[(4-(2- Diaryliodonium, such as methylpropyl)phenyl)iodonium (4-methylphenyl)[(4-(2-methylpropyl)phenyl)iodonium], triphenylsulfonium, diphenyl-4-thiophenylphenylsulfonium Triarylsulfoniums such as (diphenyl-4-thiophenylphenylsulfonium) and diphenyl-4-thiophenoxyphenylsulfonium, bis[4-(diphenylsulfonio)phenyl]sulfide ( bis [4- (diphenylsulfonio) phenyl] sulfide) of a cation and hexafluoro such as phosphate (PF 6 -), tetrafluoroborate (BF 4 -), anti-hexafluoro-Mo carbonate (SbF 6 -), hexafluorophosphate are Senate (AsF 6 -), hexachloro antimonate (SbCl 6 -), and onium salts containing anions such as, triarylsulfonium perfluoroalkyl sulfonate, triarylsulfonium triflate, triaryl alcohol It may be phonium nonaflate, diaryliodonium nonaflate, succinimidyl triflate, 2,6-dinitrobenzyl sulfonate, and the like, but is not limited thereto.
일 실시형태에 있어서, 광양이온 개시제; 및 티오크산톤계, 인계, 트리아진계, 벤조페논계, 벤조인계, 옥심계, 프로판논계, 아미노 케톤계, 케톤계, 벤조인 에테르 아세토페논계, 안트라퀴논계 및 방향족 포스핀 옥사이드계 화합물로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것일 수 있다. 예를 들어, 상기 라디컬 광개시제는, 벤조인, 벤조인 메틸에테르, 벤조인 에틸에테르, 벤조인 이소프로필에테르, 벤조인 n-부틸에테르, 벤조인 이소부틸에테르, 아세토페논, 디메틸아니노 아세토페논, 2,2-디메톡시-2-페닐아세토페논, 2,2-디에톡시-2-페닐아세토페논, 2,2-다이에톡시아세토페논, 2,2-다이메톡시-2-페닐아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노-프로판-1-온, 4-(2-히드록시에톡시)페닐-2-(히드록시-2-프로필)케톤, 벤조페논, 4,4-디아미노벤조페논, p-페닐벤조페논, 4,4'-디에틸아미노벤조페논, 4,4-디메톡시아세토페논, 디클로로벤조페논, 3-메틸아세토페논, 4-크놀로아세토페논, 안트라퀴논, 2-메틸안트라퀴논, 2-에틸안트라퀴논, 2-t-부틸안트라퀴논, 2-아미노안트라퀴논, 2-메틸티오잔톤(thioxanthone), 2-에틸티오잔톤, 2-클로로티오잔톤, 2,4-디메틸티오잔톤, 2,4-디에틸티오잔톤, 벤질디메틸케탈, 아세토페논 디메틸케탈, p-디메틸아미노 안식향산 에스테르, 올리고[2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판논], 비스(2,4,6-트리메틸벤조일)-페닐-포스핀옥시드, 2,4,6-트리메틸벤조일-디페닐-포스핀옥시드, 2-메틸-1-[4-(메틸티오)페닐]2-모폴린프로판온-1, 디페닐케톤 벤질디메틸케탈, 2-히드록시-2-메틸-1-페닐-1-온, 4-히드록시시클로페닐케톤, 디메톡시-2-페닐아테토페논, 플루오렌, 트리페닐아민, 카바졸, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-(4-몰포리닐)-1-프로판온, 2-벤질-2-(디메틸아미노)-1-[4-(4-몰포리닐)페닐]-1-부타논, 벤조인 메틸 에테르, 벤조인 아이소프로필 에테르, 아니소인 메틸 에테르, 2-메틸-2-하이드록시프로피오페논, 비스(2, 4, 6-트라이메틸벤조일)페닐 포스핀 옥사이드, 2-나프탈렌-설포닐 클로라이드, 1-페닐-1,2-프로판다이온-2(O-에톡시카르보닐)옥심 등일 수 있으며, 이에 제한되지 않는다.In one embodiment, a photocationic initiator; And thioxanthone-based, phosphorus-based, triazine-based, benzophenone-based, benzoin-based, oxime-based, propanone-based, amino ketone-based, ketone-based, benzoin ether acetophenone-based, anthraquinone-based and aromatic phosphine oxide-based compound. It may include at least one selected from the group. For example, the radical photoinitiator is benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-butyl ether, benzoin isobutyl ether, acetophenone, dimethylanino acetophenone , 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone , 2-hydroxy-2-methyl-1-phenylpropan-1one, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino-propane- 1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propyl)ketone, benzophenone, 4,4-diaminobenzophenone, p-phenylbenzophenone, 4,4' -Diethylaminobenzophenone, 4,4-dimethoxyacetophenone, dichlorobenzophenone, 3-methylacetophenone, 4-chronoloacetophenone, anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, 2- t-butylanthraquinone, 2-aminoanthraquinone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, Benzyldimethylketal, acetophenone dimethylketal, p-dimethylamino benzoic acid ester, oligo[2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propanone], bis(2,4, 6-trimethylbenzoyl)-phenyl-phosphine oxide, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, 2-methyl-1-[4-(methylthio)phenyl]2-morpholinepropanone- 1, diphenyl ketone benzyldimethyl ketal, 2-hydroxy-2-methyl-1-phenyl-1-one, 4-hydroxycyclophenyl ketone, dimethoxy-2-phenylatetophenone, fluorene, triphenylamine , Carbazole, 1-hydroxycyclohexylphenylketone, 2-methyl-1-[4-(methylthio)phenyl]-2-(4-morpholinyl)-1-propanone, 2-benzyl-2- (Dimethylamino)-1-[4-(4-morpholinyl)phenyl]-1-butanone, benzoin methyl ether, benzoin isopropyl ether, anisoin methyl ether, 2-methyl-2-hydroxypropy Ophenone, bis (2, 4, 6-trimethylbenzoyl) phenyl phosphine oxide, 2-naphthalene-sulfonyl chloride, 1-phenyl-1,2-propanedione-2 ( O-ethoxycarbonyl) oxime, and the like, but is not limited thereto.
일 실시형태에 있어서, 상기 광양이온 개시제 대 상기 라디컬 광개시제의 질량비는 99 : 0.1 내지 0.1 : 99로 혼합되는 것일 수 있다. 상기 혼합비 내에 포함되면 다양한 파장을 흡수하여 반응성을 촉진시켜 경화속도를 증가시키고, 코팅용 조성물의 경화 이후에 광투과도 및 컬 특성 등을 개선시킬 수 있다.In one embodiment, the mass ratio of the photocationic initiator to the radical photoinitiator may be a mixture of 99:0.1 to 0.1:99. When included in the mixing ratio, it is possible to absorb various wavelengths to promote reactivity to increase curing speed, and to improve light transmittance and curl properties after curing of the coating composition.
일 실시형태에 있어서, 상기 광개시제는 상기 코팅용 조성물 중 2 중량% 내지 5 중량%인 것일 수 있다. 상기 광개시제가 상기 코팅용 조성물 중 2 중량% 미만인 경우 코팅용 조성물의 경화가 충분히 이루어지지 않아 적절한 경도 확보가 어렵고, 5 중량%를 초과하는 경우 경화 수축으로 코팅용 조성물의 경화 이후에 크랙, 코팅층의 벗겨짐 등이 발생할 수 있다.In one embodiment, the photoinitiator may be 2% to 5% by weight of the coating composition. If the photoinitiator is less than 2% by weight of the coating composition, it is difficult to secure adequate hardness due to insufficient curing of the coating composition, and if it exceeds 5% by weight, cracks and cracks after curing of the coating composition due to curing shrinkage Peeling, etc. may occur.
일 실시형태에 있어서, 상기 UV 경화용 모노머는, 아크릴레이트계 수지를 포함하는 것일 수 있다. In one embodiment, the UV curing monomer may include an acrylate-based resin.
일 측에 따를 때, 상기 UV 경화용 모노머로서, 아크릴레이트계 수지는, 광학용 점착제로서 고투과율과 낮은 haze가 유지되는 것일 수 있으며, ITO에 대한 내부식성이 있는 것일 수 있다.According to one aspect, as the UV curing monomer, the acrylate-based resin may be one that maintains high transmittance and low haze as an optical pressure-sensitive adhesive, and may have corrosion resistance to ITO.
일 측에 따를 때, 상기 아크릴레이트계 수지는, 분자내 이중결합이 없는 포화탄화수소계 고분자로서 그 고유한 성질면에서 산화에 대한 저항성이 뛰어나므로 내후성이 우수한 것일 수 있다.According to one aspect, the acrylate-based resin is a saturated hydrocarbon-based polymer without intramolecular double bonds, and has excellent resistance to oxidation in terms of its inherent properties, and thus may have excellent weather resistance.
일 실시형태에 있어서, 상기 UV 경화용 모노머는, 광학 필름 등에 사용되는 UV 도료의 일 예이며, 자외선에 의해 광개시제가 활성화되어 올리고머와 모노머를 가교시켜 도막을 형성하는 것으로, 저온경화가 가능하고, 경화속도가 빠른 것이라면 특별히 제한되지 않는다.In one embodiment, the UV curing monomer is an example of a UV coating used in an optical film, etc., and a photoinitiator is activated by ultraviolet rays to crosslink the oligomer and the monomer to form a coating film, and low temperature curing is possible, If the curing speed is fast, it is not particularly limited.
일 실시형태에 있어서, 상기 UV 경화용 모노머는, 글리시딜아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜-알파-에틸 아크릴레이트, 글리시딜-알파-엔-프로필아크릴레이트, 글리시딜-알파-부틸아크릴레이트, 3,4-에폭시부틸메타아크릴레이트, 3,4-에폭시부틸 아크릴레이트, 6,7-에폭시펩틸메타아크릴레이트, 6,7-에폭시헵틸아크릴레이트, 6,7-에폭시헵틸-알파-에틸아크릴레이트, 2 하이드록시프로필 아크릴레이트(2 Hydroxy propyl acrylate; 2HPA), 2 하이드록시프로필 아크릴레이트(2 Hydroxy ethylacrylate; 2HEA), 테트라하이드로푸르푸릴 아크릴레이트(Tetrahydrofurfuryl acrylate; THFA), 이소보닐 아크릴레이트(Isobonyl acrylate; IBOA), 2 하이드록시 에틸 메타아크릴레이트(2 Hydroxy ethyl methacrylate; 2HEMA), 트리프로필렌 글리콜 디아크릴레이트(Tripropylene glycol diacrylate; TPGDA), 디프로필렌 글리콜 디아크릴레이트(Dipropylene glycol diacrylate; DPGDA), 1,6 헥산디올 디아크릴레이트(1,6 Hexanediol diacrylate; 1,6HDDA) 및 트리메틸프로판 트리아크릴레이트(Trimethylopropane triacrylate; TMPTA)로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the UV curing monomer is glycidyl acrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl-alpha-ethyl acrylate, glycidyl-alpha-ene -Propyl acrylate, glycidyl-alpha-butyl acrylate, 3,4-epoxybutyl methacrylate, 3,4-epoxybutyl acrylate, 6,7-epoxypeptyl methacrylate, 6,7-epoxyheptyl Acrylate, 6,7-epoxyheptyl-alpha-ethylacrylate, 2 Hydroxy propyl acrylate (2HPA), 2 Hydroxy ethylacrylate (2HEA), tetrahydrofurfuryl acrylic Tetrahydrofurfuryl acrylate (THFA), Isobonyl acrylate (IBOA), 2 Hydroxy ethyl methacrylate (2HEMA), Tripropylene glycol diacrylate (TPGDA), D At least selected from the group consisting of propylene glycol diacrylate (DPGDA), 1,6 hexanediol diacrylate (1,6 Hexanediol diacrylate; 1,6HDDA) and trimethylopropane triacrylate (TMPTA) It may include any one.
본 발명의 일 실시예에 따른 필름용 조성물은 필름의 색상이 황변이 되는 것을 개선할 수 있다.The composition for a film according to an embodiment of the present invention may improve the color of the film from yellowing.
일 실시형태에 있어서, 상기 필름용 조성물은 아크릴계 수지를 더 포함할 수 있다.In one embodiment, the composition for a film may further include an acrylic resin.
일 실시형태에 있어서, 상기 아크릴계 수지는, 하이드록시에틸아크릴레이트(HEA), 하이드록시에틸메타크릴레이트(HEMA), 헥산디올디아크릴레이트(HDDA), 트리프로필렌글리콜 디아크릴레이트(TPGDA), 에틸렌글리콜 디아크릴레이트(EGDA), 트리메틸올프로판 트리아크릴레이트(TMPTA), 트리메틸올프로판에톡시 트리아크릴레이트(TMPEOTA), 글리세린 프로폭실화 트리아크릴레이트(GPTA), 펜타에리트리톨 테트라아크릴레이트(PETA), 벤질메타크릴레이트, 페닐아크릴레이트, 디페닐아크릴레이트, 바이페닐아크릴레이트, 2-바이페닐릴아크릴레이트, 2-([1,1'-바이페닐]-2-릴옥시)에틸아크릴레이트, 페녹시벤질아크릴레이트, 3-페녹시벤질-3-(1-나프틸)아크릴레이트, 페닐메타크릴레이트, 바이페닐메타크릴레이트, 2-니트로페닐아크릴레이트, 4-니트로페닐아크릴레이트, 2-니트로페닐메타크릴레이트, 4-니트로페닐메타크릴레이트 및 디펜타에리트리톨 헥사아크릴레이트(DPHA)로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것일 수 있다.In one embodiment, the acrylic resin is hydroxyethyl acrylate (HEA), hydroxyethyl methacrylate (HEMA), hexanediol diacrylate (HDDA), tripropylene glycol diacrylate (TPGDA), ethylene Glycol diacrylate (EGDA), trimethylolpropane triacrylate (TMPTA), trimethylolpropaneethoxy triacrylate (TMPEOTA), glycerin propoxylated triacrylate (GPTA), pentaerythritol tetraacrylate (PETA) , Benzyl methacrylate, phenyl acrylate, diphenyl acrylate, biphenyl acrylate, 2-biphenylyl acrylate, 2-([1,1'-biphenyl]-2-yloxy)ethyl acrylate, Phenoxybenzylacrylate, 3-phenoxybenzyl-3-(1-naphthyl)acrylate, phenylmethacrylate, biphenylmethacrylate, 2-nitrophenylacrylate, 4-nitrophenylacrylate, 2- It may include at least one selected from the group consisting of nitrophenyl methacrylate, 4-nitrophenyl methacrylate, and dipentaerythritol hexaacrylate (DPHA).
일 실시형태에 있어서, 상기 아크릴계 수지는, 유리 전이 온도가 0 ℃이상인 것이 바람직하고, 더 바람직하게는 25 ℃내지 70 ℃더욱 바람직하게는 40 ℃내지 66 ℃인 것일 수 있다. 유리 전이 온도가 이 범위 내에 있으면, 본 발명의 티타니아 입자-분산액 조성물은 황변이 개선될 수 있다. In one embodiment, the acrylic resin may preferably have a glass transition temperature of 0° C. or higher, more preferably 25° C. to 70° C. and even more preferably 40° C. to 66° C. If the glass transition temperature is within this range, the titania particle-dispersion composition of the present invention can be improved in yellowing.
일 실시형태에 있어서, 상기 아크릴계 수지의 수평균 분자량은 바람직하게는 10,000 내지 1,000,000, 더 바람직하게는 100,000 내지 500,000의 범위인 것일 수 있다.In one embodiment, the number average molecular weight of the acrylic resin may be preferably in the range of 10,000 to 1,000,000, more preferably 100,000 to 500,000.
일 실시형태에 있어서, 상기 아크릴계 수지는, 상기 티타니아 입자-분산액 조성물 중 50 중량% 내지 70 중량%인 것일 수 있다. 상기 아크릴계 수지가 상기 티타니아 입자-분산액 조성물 중 50 중량% 미만인 경우 분산계 내 입자의 함량이 높아져 분산액의 점도가 상승하는 문제가 발생할 수 있고, 70 중량% 초과인 경우 입자의 함량이 낮아져 필름 형성 시 필름상의 굴절률 및 휘도 특성이 저하되는 문제가 있다.In one embodiment, the acrylic resin may be 50% to 70% by weight of the titania particle-dispersion composition. If the acrylic resin is less than 50% by weight of the titania particle-dispersion composition, the content of the particles in the dispersion system may increase, resulting in a problem of increasing the viscosity of the dispersion, and if it exceeds 70% by weight, the content of the particles is lowered to form a film. There is a problem that the refractive index and luminance characteristics of the image are deteriorated.
일 실시형태에 있어서, 상기 아크릴계 수지를 배합하는 것으로, 성형성, 가공성, 기계 특성이 우수한 티타니아 입자-분산액 조성물 및 필름을 얻을 수 있다. In one embodiment, by blending the acrylic resin, a titania particle-dispersion composition and film excellent in moldability, processability, and mechanical properties can be obtained.
일 실시형태에 있어서, 상기 필름용 조성물의 굴절률은 1.70 이상이고, 상기 필름용 조성물의 점도는 1000 cPs 이하인 것일 수 있다. 상기 표면 처리된 티타니아 입자를 포함함으로써, 황변이 억제되고, 높은 광산란성 및 광효율이 나타나는 필름을 구현할 수 있다. In one embodiment, the refractive index of the film composition may be 1.70 or more, and the viscosity of the film composition may be 1000 cPs or less. By including the surface-treated titania particles, yellowing is suppressed, and a film exhibiting high light scattering property and light efficiency can be implemented.
본 발명의 또 다른 실시예에 따른 필름은, 본 발명의 일 실시예에 따른 필름용 조성물로 제조된다.A film according to another embodiment of the present invention is prepared from the composition for a film according to an embodiment of the present invention.
일 실시형태에 있어서, 상기 필름의 전체 투과율이 80 % 내지 90 %이고, 상기 필름의 확산 투과율이 5 % 내지 20 %이고, 상기 필름의 헤이즈(Haze)가 10 % 내지 20 %인 것일 수 있다. 높은 광산란성을 가지기 위해 높은 haze 값이 필요하다. 필름의 헤이즈(Haze)가 10 % 내지 20 %의 범위에 있고, 이에 따라, 본 발명의 일 실시예에 따른 표면처리된 티타니아 입자를 포함하는 필름의 경우 동일 조건에서 더 높은 분산성 및 광산란성을 구현할 수 있다.In one embodiment, the film may have a total transmittance of 80% to 90%, a diffuse transmittance of the film of 5% to 20%, and a haze of the film of 10% to 20%. A high haze value is required to have high light scattering properties. Haze of the film is in the range of 10% to 20%, and accordingly, in the case of a film including the surface-treated titania particles according to an embodiment of the present invention, higher dispersibility and light scattering property under the same conditions. Can be implemented.
이하, 하기 실시예 및 비교예를 참조하여 본 발명을 상세하게 설명하기로 한다. 그러나, 본 발명의 기술적 사상이 그에 의해 제한되거나 한정되는 것은 아니다.Hereinafter, the present invention will be described in detail with reference to the following Examples and Comparative Examples. However, the technical idea of the present invention is not limited or limited thereby.
[제조예][Production Example]
인산 표면처리된 티타니아 입자 분산액 제조Phosphoric acid surface-treated titania particle dispersion preparation
250 mL 용량의 페인트 쉐이커용 용기에 50 g의 테트라하이드로퓨란 (Tetrahydrofuran, THF)와 5 g(12.5 함량%)의 커플링제로서 메타아크릴기 실란을 넣고 5 g의 분산제를 넣었다.In a 250 mL container for a paint shaker, 50 g of tetrahydrofuran (THF) and 5 g (12.5 content%) of methacrylic silane were added as a coupling agent, and 5 g of a dispersant was added.
상기 용액을 25 ℃의 온도 하에서 스터러바(stirrer bar)를 사용하여 5분간 혼합하였다. The solution was mixed for 5 minutes using a stirrer bar at a temperature of 25 °C.
이후, 상기 혼합액에 40 g의 인산 표면처리된 티타니아를 넣고, 25 ℃의 온도 하에서 스터러바를 사용하여 30 분간 혼합액을 형성하였다. Thereafter, 40 g of phosphoric acid surface-treated titania was added to the mixture, and a mixture was formed for 30 minutes using a stirrer bar at a temperature of 25°C.
이후, 상기 티타니아가 더 포함된 혼합액에 0.05 mm 비드 200 g을 넣고 페인트 쉐이커를 이용하여 3 시간 동안 분산하여 티타니아-THF 분산액을 얻었다. Thereafter, 200 g of 0.05 mm beads were added to the mixed solution further containing titania and dispersed for 3 hours using a paint shaker to obtain a titania-THF dispersion.
이 때, 상기 비드는, 0.05 mm 크기의 지르코니아이다.In this case, the bead is zirconia having a size of 0.05 mm.
이후, 티타니아-THF 분산액과 아크릴레이트계 수지 모노머를 혼합하여 진공 감압하에 용매를 제거하여 43 wt%의 티타니아-모노머 분산액을 얻었다.Thereafter, a titania-THF dispersion and an acrylate-based resin monomer were mixed to remove the solvent under vacuum to obtain a titania-monomer dispersion of 43 wt%.
[실시예 1][Example 1]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 800 ℃의 온도에서 1 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 1 hour at a temperature of 800°C.
[실시예 2][Example 2]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 750 ℃의 온도에서 3 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 3 hours at a temperature of 750°C.
[실시예 3][Example 3]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 800 ℃의 온도에서 2 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 2 hours at a temperature of 800°C.
[실시예 4][Example 4]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 800 ℃의 온도에서 3 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 3 hours at a temperature of 800°C.
[실시예 5][Example 5]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 900 ℃의 온도에서 2 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 2 hours at a temperature of 900°C.
[비교예 1][Comparative Example 1]
인산 표면처리되지 않은 티타니아 입자를 800 ℃의 온도에서 1 시간 동안 하소하였다.The titania particles without phosphoric acid surface treatment were calcined for 1 hour at a temperature of 800°C.
[비교예 2][Comparative Example 2]
상기 제조예에서 제조한 인산 표면처리된 티타니아 입자를 1000 ℃의 온도에서 2 시간 동안 하소하였다.The phosphoric acid surface-treated titania particles prepared in Preparation Example were calcined for 2 hours at a temperature of 1000°C.
실시예 1 내지 5에 따른 하소된 후의 인산 표면처리된 티타니아 입자는 결장입자의 성장이 이루어져 1차 입자 평균입도는 20 nm 내지 100 nm이고, 유기용매에 분산된 2차 입자 평균입도는 100 nm 내지 500 nm이였다.The phosphoric acid surface-treated titania particles after calcining according to Examples 1 to 5 are grown of colon particles so that the primary particle average particle size is 20 nm to 100 nm, and the secondary particle average particle size dispersed in the organic solvent is 100 nm to It was 500 nm.
도 1은 본 발명의 실시예 1 내지 5 및 비교예 2에 따른 인산 표면처리된 티타니아 입자의 아나타제 및 루타일 결정구조를 나타낸 X-ray 회절 결과이고, 도 2는 800 ℃의 온도에서 1 시간 동안 하소한 표면처리 하지 않은 티타니아 입자의 아나타제 및 루타일 결정구조를 나타낸 X-ray 회절 결과이다.1 is an X-ray diffraction result showing the anatase and rutile crystal structures of titania particles subjected to phosphoric acid surface treatment according to Examples 1 to 5 and Comparative Example 2 of the present invention, and FIG. 2 is a temperature of 800° C. for 1 hour. X-ray diffraction results showing the anatase and rutile crystal structures of titania particles without calcined surface treatment.
도 3은 본 발명의 실시예 1에 따른 인산 표면처리된 티타니아 입자의 SEM 이미지이고, 하기 표 1은 본 발명의 실시예 1에 따른 인산 표면처리된 티타니아 입자의 XRD 상 입자크기, BET 및 SEM 이미지 상 입자크기를 나타낸 것이다.3 is an SEM image of titania particles subjected to phosphoric acid surface treatment according to Example 1 of the present invention, and Table 1 below is an XRD particle size, BET, and SEM image of titania particles subjected to phosphoric acid surface treatment according to Example 1 of the present invention. It shows the phase particle size.
(nm)XRD
(nm)
(nm)BET
(nm)
(nm)SEM
(nm)
도 4는 본 발명의 실시예 1에 따른 인산 표면처리된 티타니아 입자의 입도 분포를 나타낸 것이다.4 shows the particle size distribution of titania particles subjected to phosphoric acid surface treatment according to Example 1 of the present invention.
도 1 내지 도 4에 도시된 바와 같이, 입자 크기는 20 nm 내지 500 nm의 평균 입도를 가지는 아나타제 결정구조가 대부분인 것을 확인할 수 있었으며, P-표면처리된 티타니아 입자의 회절도가 티타니아 입자보다 우수한 것을 확인할 수 있었다.As shown in Figs. 1 to 4, it was confirmed that most of the anatase crystal structures having an average particle size of 20 nm to 500 nm were found, and the diffraction degree of the P-surface-treated titania particles was superior to that of the titania particles. I could confirm.
도 1 내지 도 4를 통하여, 인산염계 첨가제를 이용한 표면 개질을 통해 티타니아 입자의 아나타제에서 루타일로의 상전이를 억제하는 높은 열안정성을 나타낸 것을 확인할 수 있다.1 to 4, it can be seen that the titania particles exhibit high thermal stability for suppressing the phase transition from anatase to rutile through surface modification using a phosphate-based additive.
본 발명의 실시예 1의 티타니아 입자-분산액 조성물 30 중량%에UV 광개시제로서 20 중량% 및 UV 경화용 모노머로서 50 중량%와 혼합하여 스터러바를 이용하여 30 분 동안 혼합하여, 코팅 도료를 제조하였다. 결과물을 바 코터(Bar coater)를 이용하여 PET 필름 위해 코팅 후 UV 경화를 진행하여 필름 물성을 측정하였다.The titania particle-dispersion composition of Example 1 of the present invention was mixed with 20% by weight as a UV photoinitiator and 50% by weight as a UV curing monomer and mixed for 30 minutes using a stirrer bar to prepare a coating coating. . The resulting product was coated for a PET film using a bar coater and then UV cured to measure film properties.
하기 표 2에 비교예 1 내지 2와 실시예 1에 사용된 티타니아 입자의 분말 분석 (비표면적, 입자크기), 티타니아 입자를 적용한 분산액의 물성 (점도, 입자 C.R., NV) 및 필름 물성 (전체 투과율, 확산 투과율, Haze)을 정리하였다.Powder analysis (specific surface area, particle size) of titania particles used in Comparative Examples 1 to 2 and Example 1 in Table 2, physical properties (viscosity, particle CR, NV) and film properties (total transmittance) of the dispersion to which titania particles are applied , Diffusion transmittance, Haze) were summarized.
입자TiO 2
particle
(m2/g)Specific surface area
(m 2 /g)
(BET, nm)Particle size
(BET, nm)
(cP)Viscosity
(cP)
C.R.
(nm)particle
CR
(nm)
(%)NV
(%)
투과율
(%)all
Transmittance
(%)
투과율
(%)diffusion
Transmittance
(%)
(%)Haze
(%)
1Comparative example
One
2Comparative example
2
1Example
One
2Example
2
상기 NV는 Non volatile의 약자로서, 고형분, solid, 불휘발분, 유효성분 등으로 사용되는데, 분산액에 열을 가하여 용매를 휘발하였을 때 남아 있는 분말 함량(비휘발)을 말하며, 이 데이터를 통해 분산액의 입자 wt%를 확인할 수 있다. 분산액에 넣은 분말의 회수율이 높을 수록 분산이 잘 되었다고 판단하고 있으며, 표 1에서는 50 %를 타겟으로 넣었으므로 50 %에 근사할 수록 분산성이 좋은 조건이다.NV is an abbreviation of non-volatile, and is used as solid, solid, non-volatile, active, etc., and refers to the remaining powder content (non-volatile) when the solvent is volatilized by applying heat to the dispersion. You can check the wt% of the particles. It is judged that the higher the recovery rate of the powder put in the dispersion, the better the dispersion, and in Table 1, 50% was put as the target, so the closer to 50%, the better the dispersibility .
표 2를 참조하면, 표면처리되지 않은 TiO2의 경우 입자 크기가 너무 크기 때문에 본 발명의 표면처리된 입자와 동일한 분산 조건에서 분산성이 저하된 결과를 얻는 것을 확인할 수 있다 (낮은 CR값, 낮은 NV값). 또한, 표면처리되지 않은 TiO2의 경우 낮은 TiO2 함량으로 인해 높은 투과율을 나타내고, 낮은haze 값 나타내는 것을 확인할 수 있다. Referring to Table 2, it can be seen that in the case of TiO 2 that is not surface-treated, the particle size is too large, so that the dispersibility is reduced under the same dispersion conditions as the surface-treated particles of the present invention (low CR value, NV value). In addition, it can be seen that the non-surface-treated TiO 2 exhibits a high transmittance due to a low TiO 2 content and a low haze value.
비교예2는 제조예에서 제조한 인산 표면처리된 티타니아 입자를 1000 ℃의 온도에서 2 시간 동안 하소한 분말을 이용한 것으로서, 도 1의 그래프를 참조하면, 루타일(Rutile) 상전이된 입자인 것을 확인할 수 있다. 표2에 도시된 바와 같이, 비교예 2는 분산성이 떨어지기 때문에 높은 C.R값, 낮은 NV값이 나타난다. 확산 투과율 및 haze 값 낮아 낮은 분산성 및 낮은 광산란성을 나타내는 것을 알 수 있다.Comparative Example 2 is a powder obtained by calcining the phosphoric acid surface-treated titania particles prepared in Preparation Example at a temperature of 1000° C. for 2 hours, and referring to the graph of FIG. 1, it was confirmed that the particles were phase-transferred to rutile. I can. As shown in Table 2, Comparative Example 2 exhibits a high C.R value and a low NV value because the dispersibility is poor. It can be seen that the diffusion transmittance and haze value are low, indicating low dispersibility and low light scattering property.
이상과 같이 실시예들이 비록 한정된 도면에 의해 설명되었으나, 해당 기술분야에서 통상의 지식을 가진 자라면 상기를 기초로 다양한 기술적 수정 및 변형을 적용할 수 있다. 예를 들어, 설명된 기술들이 설명된 방법과 다른 순서로 수행되거나, 및/또는 설명된 구성요소들이 설명된 방법과 다른 형태로 결합 또는 조합되거나, 다른 구성요소 또는 균등물에 의하여 대치되거나 치환되더라도 적절한 결과가 달성될 수 있다.As described above, although the embodiments have been described by the limited drawings, a person of ordinary skill in the art can apply various technical modifications and variations based on the above. For example, even if the described techniques are performed in a different order from the described method, and/or the described components are combined or combined in a form different from the described method, or are replaced or substituted by other components or equivalents. Appropriate results can be achieved.
그러므로, 다른 구현들, 다른 실시예들 및 특허청구범위와 균등한 것들도 후술하는 청구범위의 범위에 속한다.Therefore, other implementations, other embodiments, and claims and equivalents fall within the scope of the following claims.
Claims (18)
를 포함하는,
표면 처리된 티타니아 입자의 제조방법.
Surface treatment by mixing a phosphate-based surface treatment agent on the surface of the titania particles;
Containing,
Method for producing surface-treated titania particles.
상기 인산염계 표면 처리제는, 정인산나트륨, 피로인산나트륨, 피로인산칼륨, 트리폴리인산나트륨, 메타인산나트륨, 산성인산나트륨, 산성피로인산나트륨, 올소인산염, 메타인산염, 울트라인산염, 피로인산염, 불화인산염, 트리폴리인산염, 테트라폴리인산염 및 나트륨 헥사메타인산염으로 이루어진 군에서 선택되는 적어도 어느 하나를 포함하는 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 1,
The phosphate-based surface treatment agents include sodium orthophosphate, sodium pyrophosphate, potassium pyrophosphate, sodium tripolyphosphate, sodium metaphosphate, acid sodium phosphate, acid sodium pyrophosphate, orthophosphate, metaphosphate, ultraphosphate, pyrophosphate, fluorophosphate, Tripolyphosphate, tetrapolyphosphate, and sodium hexametaphosphate containing at least any one selected from the group consisting of,
Method for producing surface-treated titania particles.
상기 인산염계 표면 처리제는,
상기 티타니아 입자 대비 0.1 몰% 내지 5 몰%인 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 1,
The phosphate-based surface treatment agent,
It is 0.1 mol% to 5 mol% relative to the titania particles,
Method for producing surface-treated titania particles.
상기 표면 처리된 티타니아 입자의 평균입도는 5 nm 내지 100 nm인 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 1,
The surface-treated titania particles have an average particle size of 5 nm to 100 nm,
Method for producing surface-treated titania particles.
상기 티타니아 입자의 표면에 인산염계 표면 처리제를 혼합하여 표면 처리하는 단계 이후에,
상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계;
를 더 포함하는,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 1,
After the step of surface treatment by mixing a phosphate-based surface treatment agent on the surface of the titania particles,
Calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C;
Further comprising,
Method for producing surface-treated titania particles.
상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 1차 입자 평균입도는 20 nm 내지 100 nm이고, 2차 입자 평균입도는 100 nm 내지 500 nm인 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 5,
After the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C, the average primary particle size of the surface-treated titania particles is 20 nm to 100 nm, and the secondary particle average particle size is 100 nm to 500 nm,
Method for producing surface-treated titania particles.
상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자의 비표면적은, 1 m2/g 내지 250 m2/g인 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 5,
The specific surface area of the surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700° C. to 1000° C. is 1 m 2 /g to 250 m 2 /g,
Method for producing surface-treated titania particles.
상기 표면 처리된 티타니아 입자를 700 ℃ 내지 1000 ℃의 온도 범위에서 하소하는 단계 이후의 상기 표면 처리된 티타니아 입자는 전체 입자 중 아나타제(anatase) 결정구조가 98 중량% 이상 존재하고, 나머지는 루타일(rutile) 결정구조로 존재하는 것인,
표면 처리된 티타니아 입자의 제조방법.
The method of claim 5,
The surface-treated titania particles after the step of calcining the surface-treated titania particles at a temperature range of 700°C to 1000°C have an anatase crystal structure of 98% by weight or more in the total particles, and the remainder is rutile ( rutile) exists as a crystal structure,
Method for producing surface-treated titania particles.
Surface-treated titania particles produced by the method for producing surface-treated titania particles according to any one of claims 1 to 8.
유기용매;
를 포함하는,
티타니아 입자-분산액 조성물.
The surface-treated titania particles of claim 9; And
Organic solvent;
Containing,
Titania particle-dispersion composition.
상기 유기용매는, 에탄올(EtOH), 메탄올(MeOH), 프로판올(PrOH), 부탄올(BuOH), 이소프로필알코올(IPA), 이소프로필 알코올 프로판올, 이소부틸알코올, 헥산올, 시클로헥산올, 디메틸아세트아미드(DMAC), 디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), 테트라하이드로퓨란(THF), 트리에틸렌포스페이트(Triethylphosphate), 트리메틸포스페이트(Trimethylphosphate), 헥산, 벤젠, 톨루엔, 크실렌, 아세톤, 메틸에틸케톤(MEK), 에틸이소부틸케톤(EIBK), 메틸이소부틸케톤(MIBK), 디에틸케톤, 디이소부틸케톤, 아세트산에틸, 아세트산부틸, 디옥산, 디에틸에테르, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 에틸렌글리콜디메틸에테르, 에틸렌글리콜디에틸에테르, 에틸렌글리콜디프로필에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 프로필렌글리콜디메틸에테르, 프로필렌글리콜디에틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌 글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 에틸렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노부틸에테르아세테이트, 프로필렌글리콜모노메틸에테르아세테이트 (PGMEA), 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 2-메톡시부틸아세테이트, 3-메톡시부틸아세테이트, 4-메톡시부틸아세테이트, 2-메틸-3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 3-에틸-3-메톡시부틸아세테이트, 2-에톡시부틸아세테이트, 4-에톡시부틸아세테이트, 4-프로폭시부틸아세테이트, 2-메톡시펜틸아세테이트, 3-메톡시펜틸아세테이트, 4-메톡시펜틸아세테이트, 2-메틸-3-메톡시펜틸아세테이트, 3-메틸-3-메톡시펜틸아세테이트, 3-메틸-4-메톡시펜틸아세테이트, 4-메틸-4-메톡시펜틸아세테이트, 아세톤, 메틸에틸케톤, 디에틸케톤, 메틸이소부틸케톤, 에틸이소부틸케톤, 탄산메틸, 탄산에틸, 탄산프로필, 탄산부틸, 벤젠, 톨루엔, 자일렌, 시클로헥사논, 에틸렌글리콜, 디에틸렌글리콜, 테트라하이드로퓨란(tetrahydrofuran), 1,4-디옥산 및 글리세린으로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것인,
티타니아 입자-분산액 조성물.
The method of claim 10,
The organic solvent is ethanol (EtOH), methanol (MeOH), propanol (PrOH), butanol (BuOH), isopropyl alcohol (IPA), isopropyl alcohol propanol, isobutyl alcohol, hexanol, cyclohexanol, dimethylacet Amide (DMAC), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), triethylene phosphate (Triethylphosphate), trimethylphosphate, hexane, benzene, toluene, xylene, acetone, methyl Ethyl ketone (MEK), ethyl isobutyl ketone (EIBK), methyl isobutyl ketone (MIBK), diethyl ketone, diisobutyl ketone, ethyl acetate, butyl acetate, dioxane, diethyl ether, ethylene glycol monomethyl ether, Ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dipropyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono Propyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, propylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, ethylene glycol mono Methyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 2 -Methoxybutyl acetate, 3-methoxybutyl acetate, 4-methoxybutyl acetate, 2-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-ethyl-3-methoxy Butyl acetate, 2-ethoxybutyl acetate, 4-ethoxybutyl acetate, 4-propoxybutyl acetate, 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methoxypentyl acetate, 2-methyl-3 -Methoxypentyl acetate, 3-methyl-3-methoxypentyl acetate, 3-methyl-4-methoxypentyl acetate T, 4-methyl-4-methoxypentyl acetate, acetone, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone, ethyl isobutyl ketone, methyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate, benzene, toluene, xyl It contains at least any one selected from the group consisting of ene, cyclohexanone, ethylene glycol, diethylene glycol, tetrahydrofuran, 1,4-dioxane and glycerin,
Titania particle-dispersion composition.
상기 표면 처리된 티타니아 입자는 상기 티타니아 입자-분산액 조성물 중 30 중량% 내지 50 중량%인 것인,
티타니아 입자-분산액 조성물.
The method of claim 10,
The surface-treated titania particles are from 30% to 50% by weight of the titania particle-dispersion composition,
Titania particle-dispersion composition.
UV 광개시제; 및
UV 경화용 모노머;
를 포함하는,
필름용 조성물.
The titania particle-dispersion composition of claim 10;
UV photoinitiator; And
UV curing monomer;
Containing,
Composition for films.
상기 UV 광개시제는,
오늄염계, 디아조늄염계, 설포늄염계 화합물 및 이미다졸계에서 선택되는 광양이온 개시제; 및
티오크산톤계, 인계, 트리아진계, 벤조페논계, 벤조인계, 옥심계, 프로판논계, 아미노 케톤계, 케톤계, 벤조인 에테르 아세토페논계, 안트라퀴논계 및 방향족 포스핀 옥사이드계 화합물에서 선택되는 라디컬 광개시제;
로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것인,
필름용 조성물.
The method of claim 13,
The UV photoinitiator,
Photocationic initiators selected from onium salts, diazonium salts, sulfonium salt compounds and imidazoles; And
Thioxanthone, phosphorus, triazine, benzophenone, benzoin, oxime, propanone, amino ketone, ketone, benzoin ether acetophenone, anthraquinone, and aromatic phosphine oxide compounds. Radical photoinitiators;
It includes at least any one selected from the group consisting of,
Composition for films.
상기 UV 경화용 모노머는,
글리시딜아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜메타아크릴레이트, 글리시딜-알파-에틸 아크릴레이트, 글리시딜-알파-엔-프로필아크릴레이트, 글리시딜-알파-부틸아크릴레이트, 3,4-에폭시부틸메타아크릴레이트, 3,4-에폭시부틸 아크릴레이트, 6,7-에폭시펩틸메타아크릴레이트, 6,7-에폭시헵틸아크릴레이트, 6,7-에폭시헵틸-알파-에틸아크릴레이트, 2 하이드록시프로필 아크릴레이트(2 Hydroxy propyl acrylate; 2HPA), 2 하이드록시프로필 아크릴레이트(2 Hydroxy ethylacrylate; 2HEA), 테트라하이드로푸르푸릴 아크릴레이트(Tetrahydrofurfuryl acrylate; THFA), 이소보닐 아크릴레이트(Isobonyl acrylate; IBOA), 2 하이드록시 에틸 메타아크릴레이트(2 Hydroxy ethyl methacrylate; 2HEMA), 트리프로필렌 글리콜 디아크릴레이트(Tripropylene glycol diacrylate; TPGDA), 디프로필렌 글리콜 디아크릴레이트(Dipropylene glycol diacrylate; DPGDA), 1,6 헥산디올 디아크릴레이트(1,6 Hexanediol diacrylate; 1,6HDDA) 및 트리메틸프로판 트리아크릴레이트(Trimethylopropane triacrylate; TMPTA)로 이루어진 군에서 선택된 적어도 어느 하나를 포함하는 것인,
필름용 조성물.
The method of claim 13,
The UV curing monomer,
Glycidyl acrylate, glycidyl methacrylate, glycidyl methacrylate, glycidyl-alpha-ethyl acrylate, glycidyl-alpha-ene-propyl acrylate, glycidyl-alpha-butylacrylic Rate, 3,4-epoxybutyl methacrylate, 3,4-epoxybutyl acrylate, 6,7-epoxypeptyl methacrylate, 6,7-epoxyheptyl acrylate, 6,7-epoxyheptyl-alpha-ethyl Acrylate, 2 Hydroxy propyl acrylate (2HPA), 2 Hydroxy ethylacrylate (2HEA), Tetrahydrofurfuryl acrylate (THFA), isobornyl acrylate ( Isobonyl acrylate; IBOA), 2 Hydroxy ethyl methacrylate (2HEMA), Tripropylene glycol diacrylate (TPGDA), Dipropylene glycol diacrylate (DPGDA), 1,6 hexanediol diacrylate (1,6 Hexanediol diacrylate; 1,6HDDA) and trimethylpropane triacrylate (Trimethylopropane triacrylate; TMPTA) containing at least any one selected from the group consisting of,
Composition for films.
상기 필름용 조성물의 굴절률은 1.70 이상이고,
상기 필름용 조성물의 점도는 1000 cPs 이하인 것인,
필름용 조성물.
The method of claim 13,
The refractive index of the composition for films is 1.70 or more,
The viscosity of the film composition is 1000 cPs or less,
Composition for films.
A film made of the composition for a film of claim 13.
상기 필름의 전체 투과율이 80 % 내지 90 %이고,
상기 필름의 확산 투과율이 5 % 내지 20 %이고,
상기 필름의 헤이즈(Haze)가 10 % 내지 20 %인 것인,
필름.The method of claim 17,
The total transmittance of the film is 80% to 90%,
The film has a diffuse transmittance of 5% to 20%,
The film has a haze of 10% to 20%,
film.
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